CN117457804B - 一种太阳能电池片的硅片表面清洗装置 - Google Patents

一种太阳能电池片的硅片表面清洗装置 Download PDF

Info

Publication number
CN117457804B
CN117457804B CN202311766777.4A CN202311766777A CN117457804B CN 117457804 B CN117457804 B CN 117457804B CN 202311766777 A CN202311766777 A CN 202311766777A CN 117457804 B CN117457804 B CN 117457804B
Authority
CN
China
Prior art keywords
basket
inserting frames
cleaning
eccentric
frame body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202311766777.4A
Other languages
English (en)
Other versions
CN117457804A (zh
Inventor
柯雨馨
许光荣
林国春
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yangguang Zhongke Fujian Energy Co ltd
Original Assignee
Yangguang Zhongke Fujian Energy Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yangguang Zhongke Fujian Energy Co ltd filed Critical Yangguang Zhongke Fujian Energy Co ltd
Priority to CN202311766777.4A priority Critical patent/CN117457804B/zh
Publication of CN117457804A publication Critical patent/CN117457804A/zh
Application granted granted Critical
Publication of CN117457804B publication Critical patent/CN117457804B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/041Cleaning travelling work
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67309Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68792Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

本发明涉及电池片生产设备领域,具体涉及一种太阳能电池片的硅片表面清洗装置,解决了现有的硅片清洗设备无法保证清洗效果均衡、良好的问题,包括清洗槽以及可架设在清洗槽内部的提篮;清洗槽的内壁设有用于架设提篮的支架组件,支架组件至少包括一组偏心曲柄,偏心曲柄上连接有驱动其偏心转动的驱动机构;提篮包括架体以及设于架体内的若干用于置入硅片的插架,架体的两侧设有与支架组件卡接的活动卡槽,与活动卡槽连接一端的偏心曲柄上布设有轴承,各插架整体为矩形结构,横截面为具有上端开口的U形结构,侧壁均设置镂空的出液槽口,四个边角位置为限制硅片脱出的挡板,当提篮受偏心曲柄带动而运动时,提篮内的插架呈倾斜分布。

Description

一种太阳能电池片的硅片表面清洗装置
技术领域
本发明涉及电池片生产设备领域,具体涉及一种太阳能电池片的硅片表面清洗装置。
背景技术
太阳能电池片,是一种利用太阳能直接发电的半导体薄片,生产中围绕原料硅片,具有多个生产步骤,而在生产过程中,经过外形加工的切片、研磨、表面处理等工序后,硅片的表面大多会残留杂质,这些杂质包含有机物或是无机物等,而这些杂质会极大影响硅片的品质,后续的生产之前需要进行严格的清洗;而现有的清洗过程或采用静置浸泡、或采用喷淋清洗的形式进行;当采用喷淋清洗的形式时,受限于硅片的质地和不同的尺寸规格,对于喷淋水不易把控,会出现清洗不均匀、效果不一致的情况。
而又如中国专利授权公告号CN206179841U所公开的一种自动硅料清洗装置,其结构上是在静置浸泡的清洗形式的基础上的改进,包括浸泡箱,所述浸泡箱内设置有清洗花篮,所述清洗花篮为棱柱形,所述清洗花篮通体设置有若干筛孔,所述清洗花篮表面上开设有提篮开口,所述提篮开口上设置有提篮盖,所述提篮盖上设置有旋转轴,所述旋转轴与所述提篮盖旋转连接,所述旋转轴上固定设置有旋转闩,所述提篮开口两侧设置有供旋转闩旋转时插入的旋转孔,所述浸泡箱内对称设置有U型槽,所述清洗花篮两端设置有转轴,所述清洗花篮通过所述转轴与所述U型槽配合与所述浸泡箱旋转连接;在清洗时,清洗花篮两端设置的转轴能够在U型槽内进行转动,从而能够带动清洗花篮内的硅片进行旋转、翻转,能够将硅片清洗的更加彻底;所述清洗花篮两端同心设置有从动齿轮,所述浸泡箱内穿设有齿轮轴,所述齿轮轴上设置有与所述从动齿轮相啮合的主动齿轮,所述浸泡箱内还设置有驱动所述齿轮轴旋转的驱动组件。
该技术方案本质上,是通过一个装设多个硅片用的清洗花篮,并对其设计旋转机构,以使传统的浸泡清洗变化为转动后的动态清洗。
上述自动硅料清洗装置仍具有一定的弊端,包括:
封闭的清洗花篮,随着旋转的进行,虽然处于清洗液中,但硅片的晃动、硅片之间的碰撞均可能导致硅片出现磨损、破损的情况;
清洗花篮内部,硅片在装入后,内部的硅片置入后仍会出现部分堆叠的情况,从而影响清洗效果。
发明内容
因此,本发明提供一种太阳能电池片的硅片表面清洗装置,解决了现有的硅片清洗设备无法保证清洗效果均衡、良好的问题。
为达到上述目的,本发明是通过以下技术方案实现的:
一种太阳能电池片的硅片表面清洗装置,包括清洗槽以及可架设在所述清洗槽内部的提篮;
所述清洗槽包括的内壁设有用于架设所述提篮的支架组件,所述支架组件至少包括一组偏心曲柄,所述偏心曲柄上连接有驱动其偏心转动的驱动机构;
所述提篮包括架体以及设于架体内的若干用于置入硅片的插架,所述架体的两侧设有与所述支架组件卡接的活动卡槽,与所述活动卡槽连接一端的所述偏心曲柄上布设有轴承,各所述插架等间距分布,各所述插架整体为矩形结构,横截面为具有上端开口的U形结构,侧壁均设置镂空的出液槽口,四个边角位置为限制硅片脱出的挡板;当所述提篮受偏心曲柄带动而运动时,所述提篮内的插架呈倾斜分布。
优选的,所述支架组件包括一组偏心曲柄以及设于清洗槽另一侧的支撑块。
优选的,所述支架组件包括对称分布的两组偏心曲柄,两偏心曲柄同步转动。
优选的,各所述插架装入所述架体后呈竖直方向分布。
优选的,各所述插架装入所述架体后呈倾斜分布。
优选的,各所述插架之间的两侧侧壁上均设置有缓冲弹簧,且两侧缓冲弹簧的弹力不同。
优选的,所述清洗槽的底部设有排液口。
通过采用前述技术方案,本发明的有益效果是:
本技术方案通过设置支架组件,配合可灵活架设的提篮结构,提篮浸入清洗槽后,通过支架组件上连接的驱动机构,能够使提篮进行在清洗槽内部进行旋转运动,运动过程中提篮保持竖直状态或是以活动卡槽为中心呈轻微的晃动状态,能够使硅片在浸液中形成规律性的涮洗,清洗液能够从插架周侧的出液槽口以及开口处各方向进入插架内,浸没完全,相较于静止的浸泡清洗提高了清洗效果,也具有不同于喷淋清洗的均匀性;
各个硅片之间通过插架相互间隔开来,避免了因硅片之间的堆叠贴合而影响清洗效果;
当所述提篮受偏心曲柄带动而运动时,所述提篮内的插架呈倾斜分布,这就使得插架内部的硅片在清洗时也是倾斜状态,硅片之间受插架间隔开后保证了清洗液具有足够且均匀的流动空间,倾斜状态的硅片又随着提篮的环绕摆动后,增加了清洗液在各硅片表面间的流动量,进而提高涮洗效果;
清洗过程中,插架的开口始终朝上,避免了硅片从中脱出,也避免了传统自旋转提篮结构中硅片的边缘与提篮之间产生的碰撞,极大的保证了硅片清洗过程中的完整性;
偏心曲柄受驱动机构动作,可进行周期性的单向或双向运动,进一步提高了清洗的均匀性及一致性。
附图说明
图1为本发明实施例一清洗装置内部的安装结构示意图(此时偏心曲柄位于轨迹的最底端,且偏心曲柄一侧的提篮未装入)。
图2为图1中A处的局部放大结构示意图。
图3为图1中B处的局部放大结构示意图。
图4为本发明实施例一偏心曲柄的转动过程示意图。
图5为本发明实施例一插架的结构示意图。
图6为本发明实施例二清洗装置内部的安装结构示意图。
图7为本发明实施例二插架之间的结构示意图。
附图标记:1、清洗槽;11、排液口;12、控制阀;2、提篮;21、架体;211、插槽;22、插架;221、开口;222、出液槽口;223、挡板;23、活动卡槽;24、缓冲弹簧;3、偏心曲柄;31、驱动机构;311、伺服电机;312、带传动组件;32、轴承;33、倾斜退让面;4、支撑块。
具体实施方式
以下将结合具体实施例来详细说明本发明的实施方式,借此对本发明如何应用技术手段来解决技术问题,并达成技术效果的实现过程能充分理解并据以实施。
实施例一
参考图1至图5,本实施例提供一种太阳能电池片的硅片表面清洗装置,包括清洗槽1以及可架设在所述清洗槽1内部的提篮2;结构上,所述清洗槽1的底部设有排液口11,排液口11上设置控制阀12,通过控制控制阀12启闭,将用废的清洗液通过所述排液口11排出,便于实施操作。
具体的,所述清洗槽1的内壁设有用于架设所述提篮2的支架组件,所述支架组件包括一组偏心曲柄3,所述偏心曲柄3上连接有驱动其偏心转动的驱动机构31;所述驱动机构31为伺服电机311以及相适配的带传动组件312,通过伺服电机311的正反转实现偏心曲柄3的双向运动。
与所述偏心曲柄3相对布设的,是设于清洗槽1另一侧的支撑块4;其中,所述支撑块4呈球状体结构,球状的结构能够保证支撑块4一侧的结构支撑稳定性,避免脱出以及转动时的卡顿。
所述提篮2包括架体21以及设于架体21内的若干用于置入硅片的插架22,所述架体21的两侧设有与所述支架组件卡接的活动卡槽23,与所述活动卡槽23连接一端的所述偏心曲柄3上布设有轴承32,各所述插架22等间距分布,各所述插架22整体为矩形结构,横截面为具有上端开口221的U形结构,插架22的侧壁均设置镂空的出液槽口222,四个边角位置为限制硅片脱出的挡板223;结构上,提篮2两侧的活动卡槽23分别卡置在偏心曲柄3以及支撑块4上,与偏心曲柄3一侧上的轴承32相连接,在偏心曲柄3运动时,提篮2可在偏心曲柄3上的轴承32位置转动,则可始终保持开口221朝上的状态;而另一与支撑块4接触的一侧,则以球状的支撑块4为中心而环绕,提篮2的摆动幅度由偏心曲柄3一侧向支撑块4一侧逐渐减小;在设计时,为了避免提篮2与所述偏心曲柄3的干涉,所述偏心曲柄3上设有一倾斜退让面33。
这一结构下,在初始装设时,所述提篮2上的各所述插架22装入所述架体21后呈竖直方向分布,也即在所述架体21上等间隔布设用于装入所述插架22的插槽211,以供安装;这样在偏心曲柄3与支撑块4的配合下,架体21内部的各所述插架22在内部呈倾斜分布(与水平面之间的关系),随着提篮2的环绕摆动后,能够增加清洗液在各硅片表面间的流动量,进而提高涮洗效果。
本实施例通过设置支架组件,配合可灵活架设的提篮2结构,提篮2浸入清洗槽1后,通过支架组件上连接的驱动机构31,能够使提篮2进行在清洗槽1内部进行旋转运动,运动过程中提篮2保持竖直状态或是以活动卡槽23为中心呈轻微的晃动状态,能够使硅片在浸液中形成规律性的涮洗,清洗液能够从插架22周侧的出液槽口222以及开口221处各方向进入插架22内,浸没完全,相较于静止的浸泡清洗提高了清洗效果,也具有不同于喷淋清洗的均匀性。
各个硅片之间通过插架22相互间隔开来,避免了因硅片之间的堆叠贴合而影响清洗效果;清洗过程中,插架22的开口221始终朝上,避免了硅片从中脱出,也避免了传统自旋转提篮2结构中硅片的边缘与提篮2之间产生的碰撞,极大的保证了硅片清洗过程中的完整性;偏心曲柄3受驱动机构31动作,可进行周期性的单向或双向运动,进一步提高了清洗的均匀性及一致性。
须知的是,本发明所示的方形结构的插架22,在需要应用于圆形的硅片时,仅需保证挡板223的尺寸足够覆盖到圆形硅片的边缘、以及侧部的出液槽口222不至于使硅片脱出即可,具有广阔的泛用性;并且,所述带传动组件312也可以采用类似的传动结构代替,如齿轮组件、蜗轮蜗杆等,在此仅以带传动组件312示例。
实施例二
参考图6和图7,与实施例一相比,所述支架组件包括对称分布的两组偏心曲柄3,两偏心曲柄3同步转动;结构上,两偏心曲柄3连接有同步运行的驱动机构31,这样的结构下,提篮2在则始终保持水平状态设置;而相应的,各所述插架22装入所述架体21后呈倾斜分布;这样的结构,在提篮2两侧均设置偏心曲柄3,不仅保持了倾斜设置的硅片,以增加清洗液在各硅片表面间的流动量,提高清洗效果,又相较于一侧为支撑块4的形式,能够增大驱动机构31的运行速率,具有更强的运行稳定性,同时具有更为良好的清洗效果。
本实施例中,各所述插架22之间的两侧侧壁上均设置有缓冲弹簧24,且两侧缓冲弹簧24的弹力不同;具体的,此处所述的缓冲弹簧24设于插架22的两侧挡板223位置处;当提篮2处于静止状态时,两侧缓冲弹簧24支撑各插架22之间的间隔等距分布;而在提篮2运动时,由于倾斜设置的插架22设计,清洗液随着提篮2的运动在各硅片之间流通,进而对插架22施加一定的压力,而两侧缓冲弹簧24的不同则可形成不同的角度偏移变化,进而改变硅片之间的空间大小,以提高涮洗效果;并且,可以将相邻的插架22之间的缓冲弹簧24设置不同的弹力;这样在提篮2运动时,各插架22之间的空间受两侧不同弹力的缓冲弹簧24作用,相邻插架22之间的空间变化更大且各不相同,进而形成改变硅片间清洗液流动空间的另一形式。
以上结构,形成一个可变化的插架22布置,这一变化随着提篮2在清洗液内的运动而形成;而且,这一变化幅度受驱动机构31的转动方向、速率等参数影响,具有灵活的调整空间。
尽管结合优选实施方案具体展示和介绍了本发明,但所属领域的技术人员应该明白,在不脱离所附权利要求书所限定的本发明的精神和范围内,在形式上和细节上可以对本发明做出各种变化,均为本发明的保护范围。

Claims (4)

1.一种太阳能电池片的硅片表面清洗装置,其特征在于:包括清洗槽(1)以及可架设在所述清洗槽(1)内部的提篮(2);
所述清洗槽(1)的内壁设有用于架设所述提篮(2)的支架组件,所述支架组件至少包括一组偏心曲柄(3),所述偏心曲柄(3)上连接有驱动其偏心转动的驱动机构(31);
所述提篮(2)包括架体(21)以及设于架体(21)内的若干用于置入硅片的插架(22),所述架体(21)的两侧设有与所述支架组件卡接的活动卡槽(23),与所述活动卡槽(23)连接一端的所述偏心曲柄(3)上布设有轴承(32),各所述插架(22)等间距分布,各所述插架(22)整体为矩形结构,横截面为具有上端开口(221)的U形结构,侧壁均设置镂空的出液槽口(222),四个边角位置为限制硅片脱出的挡板(223);
当所述提篮(2)受偏心曲柄(3)带动而运动时,所述提篮(2)内的插架(22)呈倾斜分布;
各所述插架(22)之间的两侧侧壁上均设置有缓冲弹簧(24),且两侧缓冲弹簧(24)的弹力不同;
所述支架组件包括一组偏心曲柄(3)以及设于清洗槽(1)另一侧的支撑块(4),在偏心曲柄(3)运动时,提篮(2)可在偏心曲柄(3)上的轴承(32)位置转动,则可始终保持开口(221)朝上的状态;而另一与支撑块(4)接触的一侧,则以球状的支撑块(4)为中心而环绕,提篮(2)的摆动幅度由偏心曲柄(3)一侧向支撑块(4)一侧逐渐减小。
2.根据权利要求1所述的一种太阳能电池片的硅片表面清洗装置,其特征在于:各所述插架(22)装入所述架体(21)后呈竖直方向分布。
3.根据权利要求1所述的一种太阳能电池片的硅片表面清洗装置,其特征在于:各所述插架(22)装入所述架体(21)后呈倾斜分布。
4.根据权利要求1-3中任一权利要求所述的一种太阳能电池片的硅片表面清洗装置,其特征在于:所述清洗槽(1)的底部设有排液口(11)。
CN202311766777.4A 2023-12-21 2023-12-21 一种太阳能电池片的硅片表面清洗装置 Active CN117457804B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202311766777.4A CN117457804B (zh) 2023-12-21 2023-12-21 一种太阳能电池片的硅片表面清洗装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202311766777.4A CN117457804B (zh) 2023-12-21 2023-12-21 一种太阳能电池片的硅片表面清洗装置

Publications (2)

Publication Number Publication Date
CN117457804A CN117457804A (zh) 2024-01-26
CN117457804B true CN117457804B (zh) 2024-03-22

Family

ID=89591266

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202311766777.4A Active CN117457804B (zh) 2023-12-21 2023-12-21 一种太阳能电池片的硅片表面清洗装置

Country Status (1)

Country Link
CN (1) CN117457804B (zh)

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102319693A (zh) * 2011-07-07 2012-01-18 苏州赤诚洗净科技有限公司 带抛动装置的太阳能电池硅片的超声波清洗装置
CN103962357A (zh) * 2013-02-05 2014-08-06 西安永电电气有限责任公司 一种dbc基板清洗花篮结构及清洗方法
CN105618418A (zh) * 2014-10-31 2016-06-01 陕西盛迈石油有限公司 一种全自动太阳能硅片清洗机
CN106216314A (zh) * 2016-08-17 2016-12-14 钟文华 一种太阳能电池生产工艺用齿轮齿条式硅片清洗装置
CN206179841U (zh) * 2016-10-28 2017-05-17 北京南轩兴达电子科技有限公司 自动硅料清洗装置
CN208697105U (zh) * 2019-02-01 2019-04-05 宇晶机器(长沙)有限公司 一种自动化抛光机插架机构
CN209772909U (zh) * 2019-01-23 2019-12-13 通威太阳能(成都)有限公司 一种太阳能电池板硅片制绒的清洗装置
CN113066741A (zh) * 2021-02-25 2021-07-02 安徽绿能技术研究院有限公司 一种制造硅片用清洗制绒自动上料机构及其生产工艺
CN213996988U (zh) * 2020-10-14 2021-08-20 冯志珍 一种真空碳氢清洗机防锈油溶剂槽
WO2022052195A1 (zh) * 2020-09-09 2022-03-17 湖州奥博石英科技有限公司 一种太阳能电池硅片扩散插片工艺
CN114823433A (zh) * 2022-06-28 2022-07-29 江苏英思特半导体科技有限公司 一种用于硅片清洗的旋转式清洗槽机构及硅片旋转方法
WO2023280270A1 (zh) * 2021-07-07 2023-01-12 禄丰隆基硅材料有限公司 一种提拉装置及硅片清洗系统
CN115799398A (zh) * 2022-12-19 2023-03-14 江苏晶旺新能源科技有限公司 一种perc电池片生产用可清洗烘干的制绒机

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102319693A (zh) * 2011-07-07 2012-01-18 苏州赤诚洗净科技有限公司 带抛动装置的太阳能电池硅片的超声波清洗装置
CN103962357A (zh) * 2013-02-05 2014-08-06 西安永电电气有限责任公司 一种dbc基板清洗花篮结构及清洗方法
CN105618418A (zh) * 2014-10-31 2016-06-01 陕西盛迈石油有限公司 一种全自动太阳能硅片清洗机
CN106216314A (zh) * 2016-08-17 2016-12-14 钟文华 一种太阳能电池生产工艺用齿轮齿条式硅片清洗装置
CN206179841U (zh) * 2016-10-28 2017-05-17 北京南轩兴达电子科技有限公司 自动硅料清洗装置
CN209772909U (zh) * 2019-01-23 2019-12-13 通威太阳能(成都)有限公司 一种太阳能电池板硅片制绒的清洗装置
CN208697105U (zh) * 2019-02-01 2019-04-05 宇晶机器(长沙)有限公司 一种自动化抛光机插架机构
WO2022052195A1 (zh) * 2020-09-09 2022-03-17 湖州奥博石英科技有限公司 一种太阳能电池硅片扩散插片工艺
CN213996988U (zh) * 2020-10-14 2021-08-20 冯志珍 一种真空碳氢清洗机防锈油溶剂槽
CN113066741A (zh) * 2021-02-25 2021-07-02 安徽绿能技术研究院有限公司 一种制造硅片用清洗制绒自动上料机构及其生产工艺
WO2023280270A1 (zh) * 2021-07-07 2023-01-12 禄丰隆基硅材料有限公司 一种提拉装置及硅片清洗系统
CN114823433A (zh) * 2022-06-28 2022-07-29 江苏英思特半导体科技有限公司 一种用于硅片清洗的旋转式清洗槽机构及硅片旋转方法
CN115799398A (zh) * 2022-12-19 2023-03-14 江苏晶旺新能源科技有限公司 一种perc电池片生产用可清洗烘干的制绒机

Also Published As

Publication number Publication date
CN117457804A (zh) 2024-01-26

Similar Documents

Publication Publication Date Title
CN209577595U (zh) 一种食品加工用机械类自动化原料清洗装置
CN101069888A (zh) 一种清洗单硅片的方法及装置
CN117457804B (zh) 一种太阳能电池片的硅片表面清洗装置
CN110648901B (zh) 一种半导体二极管制造加工用酸洗方法
CN113130355A (zh) 一种光伏电池生产用硅片清洗机
CN114632751B (zh) 清洗系统
CN208403192U (zh) 一种蔬菜高效清洗装置
CN216988926U (zh) 基于波动摇摆的晶圆清洗干燥节约型装置
CN214313149U (zh) 一种片盒翻转组件、浸泡池和去胶机
CN205869016U (zh) 玻璃清洗机
CN213701034U (zh) 镜片清洗设备
CN112495901A (zh) 一种机械配件清洗装置
RU50880U1 (ru) Устройство мегазвуковой очистки плоских стеклянных подложек
CN218394988U (zh) 一种钣金件清洗装置
CN219106079U (zh) 一种单片晶圆清洗装置
CN213037727U (zh) 一种香料加工用浸泡装置
CN220678745U (zh) 一种转笼清洗装置
CN220942204U (zh) 一种茶叶加工用清洗装置
CN217595352U (zh) 一种自动清洗甩干机
CN113725322B (zh) 用于太阳能光伏玻璃制作的硅片浸泡设备
CN211834092U (zh) 一种全自动蔬菜清洗装置
CN217474368U (zh) 一种人造宝石清洗装置
CN218517314U (zh) 一种硅片表面清洗烘干装置
CN208437305U (zh) 一种32.768khz石英晶振元器件的循环清洗装置
CN219664579U (zh) 一种电子零部件制造用清洗设备

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant