CN116774533A - 曝光装置以及物品的制造方法 - Google Patents
曝光装置以及物品的制造方法 Download PDFInfo
- Publication number
- CN116774533A CN116774533A CN202310823157.3A CN202310823157A CN116774533A CN 116774533 A CN116774533 A CN 116774533A CN 202310823157 A CN202310823157 A CN 202310823157A CN 116774533 A CN116774533 A CN 116774533A
- Authority
- CN
- China
- Prior art keywords
- light shielding
- light
- shielding portion
- distance
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims description 10
- 230000003287 optical effect Effects 0.000 claims abstract description 111
- 238000005286 illumination Methods 0.000 claims abstract description 50
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 238000009826 distribution Methods 0.000 claims description 30
- 230000001186 cumulative effect Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
- 230000005484 gravity Effects 0.000 description 10
- 230000000903 blocking effect Effects 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 230000004907 flux Effects 0.000 description 6
- 210000001747 pupil Anatomy 0.000 description 5
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005405 multipole Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Developing Agents For Electrophotography (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-160666 | 2019-09-03 | ||
| JP2019160666A JP7336922B2 (ja) | 2019-09-03 | 2019-09-03 | 露光装置及び物品の製造方法 |
| CN202080060934.8A CN114303101B (zh) | 2019-09-03 | 2020-07-21 | 曝光装置以及物品的制造方法 |
| PCT/JP2020/028196 WO2021044756A1 (ja) | 2019-09-03 | 2020-07-21 | 露光装置及び物品の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202080060934.8A Division CN114303101B (zh) | 2019-09-03 | 2020-07-21 | 曝光装置以及物品的制造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116774533A true CN116774533A (zh) | 2023-09-19 |
Family
ID=74849210
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310823157.3A Pending CN116774533A (zh) | 2019-09-03 | 2020-07-21 | 曝光装置以及物品的制造方法 |
| CN202080060934.8A Active CN114303101B (zh) | 2019-09-03 | 2020-07-21 | 曝光装置以及物品的制造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202080060934.8A Active CN114303101B (zh) | 2019-09-03 | 2020-07-21 | 曝光装置以及物品的制造方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7336922B2 (https=) |
| KR (1) | KR102654989B1 (https=) |
| CN (2) | CN116774533A (https=) |
| TW (2) | TWI797466B (https=) |
| WO (1) | WO2021044756A1 (https=) |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0633506B1 (en) * | 1993-06-11 | 2004-10-20 | Nikon Corporation | Scanning exposure apparatus |
| JPH08211787A (ja) * | 1995-02-08 | 1996-08-20 | Ricoh Co Ltd | 画像形成装置 |
| JP2000010013A (ja) * | 1998-06-24 | 2000-01-14 | Nikon Corp | 位相差顕微鏡及び重ね合わせ測定装置 |
| JP4392879B2 (ja) | 1998-09-28 | 2010-01-06 | キヤノン株式会社 | 投影露光装置及びデバイスの製造方法 |
| JP3571945B2 (ja) * | 1998-12-07 | 2004-09-29 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
| JP2000223406A (ja) | 1999-02-03 | 2000-08-11 | Nikon Corp | 露光装置および露光方法 |
| FR2831765B1 (fr) * | 2001-10-31 | 2004-02-13 | Automa Tech Sa | Dispositif pour insoler une face d'un panneau |
| JP2004319770A (ja) | 2003-04-16 | 2004-11-11 | Nikon Corp | 露光方法及びデバイス製造方法 |
| JP3718511B2 (ja) * | 2003-10-07 | 2005-11-24 | 株式会社東芝 | 露光装置検査用マスク、露光装置検査方法及び露光装置 |
| JP2009302354A (ja) | 2008-06-16 | 2009-12-24 | Canon Inc | 露光装置、デバイス製造方法及び開口絞りの製造方法 |
| JP2010073835A (ja) | 2008-09-17 | 2010-04-02 | Canon Inc | 露光装置及びデバイス製造方法 |
| JP5396885B2 (ja) | 2009-01-29 | 2014-01-22 | 株式会社ニコン | 遮光ユニット、照明光学系、露光装置及びデバイスの製造方法 |
| WO2011010560A1 (ja) | 2009-07-24 | 2011-01-27 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
| JP2011040716A (ja) | 2009-08-06 | 2011-02-24 | Nikon Corp | 露光装置、露光方法、およびデバイス製造方法 |
| JP5668999B2 (ja) | 2010-01-26 | 2015-02-12 | 株式会社ニコン | 露光方法及び露光装置、並びにデバイス製造方法 |
| JP2011228556A (ja) * | 2010-04-22 | 2011-11-10 | Nikon Corp | 可変スリット装置、照明光学系、露光装置、およびデバイス製造方法 |
| JP2015079807A (ja) * | 2013-10-16 | 2015-04-23 | キヤノン株式会社 | 投影露光装置及び露光条件計算装置 |
| JP6745647B2 (ja) | 2016-06-01 | 2020-08-26 | キヤノン株式会社 | 走査露光装置および物品製造方法 |
-
2019
- 2019-09-03 JP JP2019160666A patent/JP7336922B2/ja active Active
-
2020
- 2020-07-21 CN CN202310823157.3A patent/CN116774533A/zh active Pending
- 2020-07-21 CN CN202080060934.8A patent/CN114303101B/zh active Active
- 2020-07-21 KR KR1020227010183A patent/KR102654989B1/ko active Active
- 2020-07-21 WO PCT/JP2020/028196 patent/WO2021044756A1/ja not_active Ceased
- 2020-08-03 TW TW109126156A patent/TWI797466B/zh active
- 2020-08-03 TW TW112108465A patent/TWI847583B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2021039245A (ja) | 2021-03-11 |
| TWI847583B (zh) | 2024-07-01 |
| WO2021044756A1 (ja) | 2021-03-11 |
| TWI797466B (zh) | 2023-04-01 |
| TW202111450A (zh) | 2021-03-16 |
| KR20220050999A (ko) | 2022-04-25 |
| JP7336922B2 (ja) | 2023-09-01 |
| TW202328830A (zh) | 2023-07-16 |
| CN114303101B (zh) | 2023-07-07 |
| CN114303101A (zh) | 2022-04-08 |
| KR102654989B1 (ko) | 2024-04-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |