KR102654989B1 - 노광장치 및 물품의 제조방법 - Google Patents

노광장치 및 물품의 제조방법 Download PDF

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Publication number
KR102654989B1
KR102654989B1 KR1020227010183A KR20227010183A KR102654989B1 KR 102654989 B1 KR102654989 B1 KR 102654989B1 KR 1020227010183 A KR1020227010183 A KR 1020227010183A KR 20227010183 A KR20227010183 A KR 20227010183A KR 102654989 B1 KR102654989 B1 KR 102654989B1
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South Korea
Prior art keywords
light
distance
exposure apparatus
shielding portion
shielding
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KR1020227010183A
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English (en)
Korean (ko)
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KR20220050999A (ko
Inventor
다이스케 코바야시
Original Assignee
캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
KR1020227010183A 2019-09-03 2020-07-21 노광장치 및 물품의 제조방법 Active KR102654989B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019160666A JP7336922B2 (ja) 2019-09-03 2019-09-03 露光装置及び物品の製造方法
JPJP-P-2019-160666 2019-09-03
PCT/JP2020/028196 WO2021044756A1 (ja) 2019-09-03 2020-07-21 露光装置及び物品の製造方法

Publications (2)

Publication Number Publication Date
KR20220050999A KR20220050999A (ko) 2022-04-25
KR102654989B1 true KR102654989B1 (ko) 2024-04-05

Family

ID=74849210

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227010183A Active KR102654989B1 (ko) 2019-09-03 2020-07-21 노광장치 및 물품의 제조방법

Country Status (5)

Country Link
JP (1) JP7336922B2 (https=)
KR (1) KR102654989B1 (https=)
CN (2) CN116774533A (https=)
TW (2) TWI797466B (https=)
WO (1) WO2021044756A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000106339A (ja) 1998-09-28 2000-04-11 Canon Inc 投影露光装置及びデバイスの製造方法
JP2000223406A (ja) 1999-02-03 2000-08-11 Nikon Corp 露光装置および露光方法
JP2009302354A (ja) 2008-06-16 2009-12-24 Canon Inc 露光装置、デバイス製造方法及び開口絞りの製造方法
JP2010177410A (ja) 2009-01-29 2010-08-12 Nikon Corp 遮光ユニット、照明光学系、露光装置及びデバイスの製造方法
JP2011040716A (ja) 2009-08-06 2011-02-24 Nikon Corp 露光装置、露光方法、およびデバイス製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0633506B1 (en) * 1993-06-11 2004-10-20 Nikon Corporation Scanning exposure apparatus
JPH08211787A (ja) * 1995-02-08 1996-08-20 Ricoh Co Ltd 画像形成装置
JP2000010013A (ja) * 1998-06-24 2000-01-14 Nikon Corp 位相差顕微鏡及び重ね合わせ測定装置
JP3571945B2 (ja) * 1998-12-07 2004-09-29 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
FR2831765B1 (fr) * 2001-10-31 2004-02-13 Automa Tech Sa Dispositif pour insoler une face d'un panneau
JP2004319770A (ja) 2003-04-16 2004-11-11 Nikon Corp 露光方法及びデバイス製造方法
JP3718511B2 (ja) * 2003-10-07 2005-11-24 株式会社東芝 露光装置検査用マスク、露光装置検査方法及び露光装置
JP2010073835A (ja) 2008-09-17 2010-04-02 Canon Inc 露光装置及びデバイス製造方法
WO2011010560A1 (ja) 2009-07-24 2011-01-27 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP5668999B2 (ja) 2010-01-26 2015-02-12 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
JP2011228556A (ja) * 2010-04-22 2011-11-10 Nikon Corp 可変スリット装置、照明光学系、露光装置、およびデバイス製造方法
JP2015079807A (ja) * 2013-10-16 2015-04-23 キヤノン株式会社 投影露光装置及び露光条件計算装置
JP6745647B2 (ja) 2016-06-01 2020-08-26 キヤノン株式会社 走査露光装置および物品製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000106339A (ja) 1998-09-28 2000-04-11 Canon Inc 投影露光装置及びデバイスの製造方法
JP2000223406A (ja) 1999-02-03 2000-08-11 Nikon Corp 露光装置および露光方法
JP2009302354A (ja) 2008-06-16 2009-12-24 Canon Inc 露光装置、デバイス製造方法及び開口絞りの製造方法
JP2010177410A (ja) 2009-01-29 2010-08-12 Nikon Corp 遮光ユニット、照明光学系、露光装置及びデバイスの製造方法
JP2011040716A (ja) 2009-08-06 2011-02-24 Nikon Corp 露光装置、露光方法、およびデバイス製造方法

Also Published As

Publication number Publication date
JP2021039245A (ja) 2021-03-11
TWI847583B (zh) 2024-07-01
WO2021044756A1 (ja) 2021-03-11
TWI797466B (zh) 2023-04-01
TW202111450A (zh) 2021-03-16
KR20220050999A (ko) 2022-04-25
JP7336922B2 (ja) 2023-09-01
TW202328830A (zh) 2023-07-16
CN116774533A (zh) 2023-09-19
CN114303101B (zh) 2023-07-07
CN114303101A (zh) 2022-04-08

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