JP7336922B2 - 露光装置及び物品の製造方法 - Google Patents

露光装置及び物品の製造方法 Download PDF

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Publication number
JP7336922B2
JP7336922B2 JP2019160666A JP2019160666A JP7336922B2 JP 7336922 B2 JP7336922 B2 JP 7336922B2 JP 2019160666 A JP2019160666 A JP 2019160666A JP 2019160666 A JP2019160666 A JP 2019160666A JP 7336922 B2 JP7336922 B2 JP 7336922B2
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Japan
Prior art keywords
light shielding
light
distance
exposure apparatus
shielding part
Prior art date
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Active
Application number
JP2019160666A
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English (en)
Japanese (ja)
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JP2021039245A (ja
JP2021039245A5 (https=
Inventor
大輔 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2019160666A priority Critical patent/JP7336922B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Priority to CN202310823157.3A priority patent/CN116774533A/zh
Priority to CN202080060934.8A priority patent/CN114303101B/zh
Priority to KR1020227010183A priority patent/KR102654989B1/ko
Priority to PCT/JP2020/028196 priority patent/WO2021044756A1/ja
Priority to TW112108465A priority patent/TWI847583B/zh
Priority to TW109126156A priority patent/TWI797466B/zh
Publication of JP2021039245A publication Critical patent/JP2021039245A/ja
Publication of JP2021039245A5 publication Critical patent/JP2021039245A5/ja
Application granted granted Critical
Publication of JP7336922B2 publication Critical patent/JP7336922B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
JP2019160666A 2019-09-03 2019-09-03 露光装置及び物品の製造方法 Active JP7336922B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2019160666A JP7336922B2 (ja) 2019-09-03 2019-09-03 露光装置及び物品の製造方法
CN202080060934.8A CN114303101B (zh) 2019-09-03 2020-07-21 曝光装置以及物品的制造方法
KR1020227010183A KR102654989B1 (ko) 2019-09-03 2020-07-21 노광장치 및 물품의 제조방법
PCT/JP2020/028196 WO2021044756A1 (ja) 2019-09-03 2020-07-21 露光装置及び物品の製造方法
CN202310823157.3A CN116774533A (zh) 2019-09-03 2020-07-21 曝光装置以及物品的制造方法
TW112108465A TWI847583B (zh) 2019-09-03 2020-08-03 曝光裝置及物品的製造方法
TW109126156A TWI797466B (zh) 2019-09-03 2020-08-03 曝光裝置及物品的製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019160666A JP7336922B2 (ja) 2019-09-03 2019-09-03 露光装置及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2021039245A JP2021039245A (ja) 2021-03-11
JP2021039245A5 JP2021039245A5 (https=) 2023-06-19
JP7336922B2 true JP7336922B2 (ja) 2023-09-01

Family

ID=74849210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019160666A Active JP7336922B2 (ja) 2019-09-03 2019-09-03 露光装置及び物品の製造方法

Country Status (5)

Country Link
JP (1) JP7336922B2 (https=)
KR (1) KR102654989B1 (https=)
CN (2) CN116774533A (https=)
TW (2) TWI797466B (https=)
WO (1) WO2021044756A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004319770A (ja) 2003-04-16 2004-11-11 Nikon Corp 露光方法及びデバイス製造方法
JP2010073835A (ja) 2008-09-17 2010-04-02 Canon Inc 露光装置及びデバイス製造方法
WO2011010560A1 (ja) 2009-07-24 2011-01-27 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP2011155040A (ja) 2010-01-26 2011-08-11 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
JP2017215487A (ja) 2016-06-01 2017-12-07 キヤノン株式会社 走査露光装置および物品製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0633506B1 (en) * 1993-06-11 2004-10-20 Nikon Corporation Scanning exposure apparatus
JPH08211787A (ja) * 1995-02-08 1996-08-20 Ricoh Co Ltd 画像形成装置
JP2000010013A (ja) * 1998-06-24 2000-01-14 Nikon Corp 位相差顕微鏡及び重ね合わせ測定装置
JP4392879B2 (ja) 1998-09-28 2010-01-06 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP3571945B2 (ja) * 1998-12-07 2004-09-29 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JP2000223406A (ja) 1999-02-03 2000-08-11 Nikon Corp 露光装置および露光方法
FR2831765B1 (fr) * 2001-10-31 2004-02-13 Automa Tech Sa Dispositif pour insoler une face d'un panneau
JP3718511B2 (ja) * 2003-10-07 2005-11-24 株式会社東芝 露光装置検査用マスク、露光装置検査方法及び露光装置
JP2009302354A (ja) 2008-06-16 2009-12-24 Canon Inc 露光装置、デバイス製造方法及び開口絞りの製造方法
JP5396885B2 (ja) 2009-01-29 2014-01-22 株式会社ニコン 遮光ユニット、照明光学系、露光装置及びデバイスの製造方法
JP2011040716A (ja) 2009-08-06 2011-02-24 Nikon Corp 露光装置、露光方法、およびデバイス製造方法
JP2011228556A (ja) * 2010-04-22 2011-11-10 Nikon Corp 可変スリット装置、照明光学系、露光装置、およびデバイス製造方法
JP2015079807A (ja) * 2013-10-16 2015-04-23 キヤノン株式会社 投影露光装置及び露光条件計算装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004319770A (ja) 2003-04-16 2004-11-11 Nikon Corp 露光方法及びデバイス製造方法
JP2010073835A (ja) 2008-09-17 2010-04-02 Canon Inc 露光装置及びデバイス製造方法
WO2011010560A1 (ja) 2009-07-24 2011-01-27 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP2011155040A (ja) 2010-01-26 2011-08-11 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
JP2017215487A (ja) 2016-06-01 2017-12-07 キヤノン株式会社 走査露光装置および物品製造方法

Also Published As

Publication number Publication date
JP2021039245A (ja) 2021-03-11
TWI847583B (zh) 2024-07-01
WO2021044756A1 (ja) 2021-03-11
TWI797466B (zh) 2023-04-01
TW202111450A (zh) 2021-03-16
KR20220050999A (ko) 2022-04-25
TW202328830A (zh) 2023-07-16
CN116774533A (zh) 2023-09-19
CN114303101B (zh) 2023-07-07
CN114303101A (zh) 2022-04-08
KR102654989B1 (ko) 2024-04-05

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