CN116348438A - 氟丁烯的保存方法 - Google Patents

氟丁烯的保存方法 Download PDF

Info

Publication number
CN116348438A
CN116348438A CN202180069322.XA CN202180069322A CN116348438A CN 116348438 A CN116348438 A CN 116348438A CN 202180069322 A CN202180069322 A CN 202180069322A CN 116348438 A CN116348438 A CN 116348438A
Authority
CN
China
Prior art keywords
fluorobutene
chf
gas
butene
magnesium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180069322.XA
Other languages
English (en)
Chinese (zh)
Inventor
铃木淳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Resonac Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Resonac Corp filed Critical Resonac Corp
Publication of CN116348438A publication Critical patent/CN116348438A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/38—Separation; Purification; Stabilisation; Use of additives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C21/00—Acyclic unsaturated compounds containing halogen atoms
    • C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
    • C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pens And Brushes (AREA)
CN202180069322.XA 2020-10-15 2021-10-08 氟丁烯的保存方法 Pending CN116348438A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020173916 2020-10-15
JP2020-173916 2020-10-15
PCT/JP2021/037423 WO2022080269A1 (ja) 2020-10-15 2021-10-08 フルオロブテンの保管方法

Publications (1)

Publication Number Publication Date
CN116348438A true CN116348438A (zh) 2023-06-27

Family

ID=81208062

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180069322.XA Pending CN116348438A (zh) 2020-10-15 2021-10-08 氟丁烯的保存方法

Country Status (8)

Country Link
US (1) US20240018075A1 (https=)
EP (1) EP4230605A4 (https=)
JP (1) JPWO2022080269A1 (https=)
KR (1) KR102924118B1 (https=)
CN (1) CN116348438A (https=)
IL (1) IL302120A (https=)
TW (1) TWI817211B (https=)
WO (1) WO2022080269A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230373887A1 (en) * 2020-10-15 2023-11-23 Resonac Corporation Method for storing fluorobutene

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2945927B1 (ja) * 1998-07-23 1999-09-06 工業技術院長 含フッ素オレフィン
US20070265478A1 (en) * 2006-05-09 2007-11-15 Ulsan Chemical Co., Ltd. Dry-etching gas for semiconductor process and preparation method thereof
CN102884030A (zh) * 2010-03-26 2013-01-16 霍尼韦尔国际公司 制备六氟-2-丁烯的方法
CN103958553A (zh) * 2011-10-05 2014-07-30 霍尼韦尔国际公司 2,3,3,3-四氟丙烯的聚合和由2,3,3,3-四氟丙烯形成的聚合物
US20170110336A1 (en) * 2016-12-31 2017-04-20 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges CLuadeq Methods for minimizing sidewall damage during low k etch processes
JP2017092357A (ja) * 2015-11-16 2017-05-25 セントラル硝子株式会社 ドライエッチングガスおよびドライエッチング方法
CN107533969A (zh) * 2015-04-06 2018-01-02 中央硝子株式会社 干法蚀刻气体以及干法蚀刻方法
CN108727154A (zh) * 2018-06-05 2018-11-02 浙江利化新材料科技有限公司 一种六氟丙烯二聚体的制备方法
WO2020170980A1 (ja) * 2019-02-21 2020-08-27 ダイキン工業株式会社 ハロゲン化ブテン化合物の製造方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60146916U (ja) 1984-03-09 1985-09-30 シャープ株式会社 磁気ヘツドの取付装置
JPH05279274A (ja) * 1991-07-25 1993-10-26 Showa Denko Kk １，１−ジクロロ−２，２，２−トリフルオロエタンの精製方法
US5516951A (en) * 1992-11-20 1996-05-14 Daikin Industries Ltd. Process for preparing 1,1,1,4,4,4-hexafluoro-2-butene and 1,1,1,4,4,4-hexafluorobutane
JP4724997B2 (ja) * 2000-02-02 2011-07-13 ダイキン工業株式会社 含水素フッ素化炭化水素の製造方法
US20050119512A1 (en) * 2003-04-29 2005-06-02 Central Glass Company, Limited Fluorobutene derivatives and process for producing same
JP2008081477A (ja) * 2006-09-29 2008-04-10 Nippon Zeon Co Ltd 含酸素フッ素化合物の容器充填物、含酸素フッ素化合物の保存方法、およびプラズマエッチング方法
WO2009041560A1 (ja) * 2007-09-28 2009-04-02 Zeon Corporation プラズマエッチング方法
JP5266902B2 (ja) * 2008-06-20 2013-08-21 日本ゼオン株式会社 含フッ素オレフィン化合物の製造方法
CA2744402C (en) * 2008-12-18 2018-06-05 Lucite International Uk Limited Methyl methacrylate purification process
JP5607354B2 (ja) * 2009-12-28 2014-10-15 ユニオン昭和株式会社 高純度含フッ素化合物の製造方法及びその方法で得られた高純度含フッ素化合物
WO2012064477A2 (en) * 2010-11-10 2012-05-18 E. I. Du Pont De Nemours And Company Compositions comprising cis-1,1,1,4,4,4-hexafluoro-2-butene and 2-difluoromethoxy-1,1,1,2-tetrafluoroethane and uses thereof
JP2012131731A (ja) * 2010-12-21 2012-07-12 Nippon Zeon Co Ltd フッ素化アルケンの製造法
US9039909B2 (en) * 2011-02-28 2015-05-26 Tokyo Electron Limited Plasma etching method, semiconductor device manufacturing method and computer-readable storage medium
EP2842928A4 (en) 2012-04-27 2017-11-08 Asahi Glass Company, Limited Method for preservation of tetrafluoropropene and container for preservation of tetrafluoropropene
CN104885203B (zh) * 2012-10-30 2017-08-01 乔治洛德方法研究和开发液化空气有限公司 用于高纵横比氧化物蚀刻的氟碳分子
CA2902979A1 (en) * 2013-03-06 2014-09-12 Honeywell International Inc. Storage stable foamable compositions containing 1,1,1,4,4,4-hexafluoro-2-butene
TWI658509B (zh) * 2014-06-18 2019-05-01 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude 用於ｔｓｖ／ｍｅｍｓ／功率元件蝕刻的化學物質
JP5915808B1 (ja) * 2014-12-24 2016-05-11 ダイキン工業株式会社 反応に用いた触媒の取り出し方法
CN107923266A (zh) * 2015-07-28 2018-04-17 科慕埃弗西有限公司 1,3,3,4,4,4‑六氟‑1‑丁烯在动力循环中的用途
WO2019023572A1 (en) * 2017-07-27 2019-01-31 The Chemours Company Fc, Llc PROCESS FOR THE PREPARATION OF (Z) -1,1,1,4,4,4-HEXAFLUORO-2-BUTENE
CN108911947B (zh) * 2018-06-15 2021-11-02 中国民航大学 一种1,1,1,2,4,4,4-七氟-2-丁烯的制备方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2945927B1 (ja) * 1998-07-23 1999-09-06 工業技術院長 含フッ素オレフィン
US20070265478A1 (en) * 2006-05-09 2007-11-15 Ulsan Chemical Co., Ltd. Dry-etching gas for semiconductor process and preparation method thereof
CN102884030A (zh) * 2010-03-26 2013-01-16 霍尼韦尔国际公司 制备六氟-2-丁烯的方法
CN103958553A (zh) * 2011-10-05 2014-07-30 霍尼韦尔国际公司 2,3,3,3-四氟丙烯的聚合和由2,3,3,3-四氟丙烯形成的聚合物
CN107533969A (zh) * 2015-04-06 2018-01-02 中央硝子株式会社 干法蚀刻气体以及干法蚀刻方法
JP2017092357A (ja) * 2015-11-16 2017-05-25 セントラル硝子株式会社 ドライエッチングガスおよびドライエッチング方法
US20170110336A1 (en) * 2016-12-31 2017-04-20 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges CLuadeq Methods for minimizing sidewall damage during low k etch processes
CN108727154A (zh) * 2018-06-05 2018-11-02 浙江利化新材料科技有限公司 一种六氟丙烯二聚体的制备方法
WO2020170980A1 (ja) * 2019-02-21 2020-08-27 ダイキン工業株式会社 ハロゲン化ブテン化合物の製造方法

Also Published As

Publication number Publication date
IL302120A (en) 2023-06-01
TWI817211B (zh) 2023-10-01
KR20230066078A (ko) 2023-05-12
JPWO2022080269A1 (https=) 2022-04-21
WO2022080269A1 (ja) 2022-04-21
KR102924118B1 (ko) 2026-02-09
EP4230605A1 (en) 2023-08-23
EP4230605A4 (en) 2024-11-20
TW202235402A (zh) 2022-09-16
US20240018075A1 (en) 2024-01-18

Similar Documents

Publication Publication Date Title
CN116348438A (zh) 氟丁烯的保存方法
TWI798871B (zh) 氟丁烯之保管方法
CN118891242A (zh) 氟代烯烃的储存方法
WO2023176434A1 (ja) フルオロアルケンの保管方法
TWI802044B (zh) 氟－２－丁烯之保管方法
TWI798873B (zh) 氟－２－丁烯之保管方法
TWI798876B (zh) 氟－２－丁烯之保管方法
KR20250007503A (ko) 불소 함유 질소 화합물의 보관 방법
TW202400511A (zh) 含氟之氮化合物的保存方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination