JPWO2022080269A1 - - Google Patents

Info

Publication number
JPWO2022080269A1
JPWO2022080269A1 JP2022556927A JP2022556927A JPWO2022080269A1 JP WO2022080269 A1 JPWO2022080269 A1 JP WO2022080269A1 JP 2022556927 A JP2022556927 A JP 2022556927A JP 2022556927 A JP2022556927 A JP 2022556927A JP WO2022080269 A1 JPWO2022080269 A1 JP WO2022080269A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022556927A
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Japanese (ja)
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Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022080269A1 publication Critical patent/JPWO2022080269A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/38—Separation; Purification; Stabilisation; Use of additives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C21/00—Acyclic unsaturated compounds containing halogen atoms
    • C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
    • C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pens And Brushes (AREA)
JP2022556927A 2020-10-15 2021-10-08 Pending JPWO2022080269A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020173916 2020-10-15
PCT/JP2021/037423 WO2022080269A1 (ja) 2020-10-15 2021-10-08 フルオロブテンの保管方法

Publications (1)

Publication Number Publication Date
JPWO2022080269A1 true JPWO2022080269A1 (https=) 2022-04-21

Family

ID=81208062

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022556927A Pending JPWO2022080269A1 (https=) 2020-10-15 2021-10-08

Country Status (8)

Country Link
US (1) US20240018075A1 (https=)
EP (1) EP4230605A4 (https=)
JP (1) JPWO2022080269A1 (https=)
KR (1) KR102924118B1 (https=)
CN (1) CN116348438A (https=)
IL (1) IL302120A (https=)
TW (1) TWI817211B (https=)
WO (1) WO2022080269A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230373887A1 (en) * 2020-10-15 2023-11-23 Resonac Corporation Method for storing fluorobutene

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05279274A (ja) * 1991-07-25 1993-10-26 Showa Denko Kk １，１−ジクロロ−２，２，２−トリフルオロエタンの精製方法
WO1994012454A1 (fr) * 1992-11-20 1994-06-09 Daikin Industries, Ltd. Procede de production de 1,1,1,4,4,4-hexafluoro-2-butene et de 1,1,1,4,4,4-hexafluorobutane
JP2000038356A (ja) * 1998-07-23 2000-02-08 Agency Of Ind Science & Technol 含フッ素オレフィン
WO2001056961A1 (en) * 2000-02-02 2001-08-09 Daikin Industries, Ltd. Production process of hydrofluorocarbons
JP2006525339A (ja) * 2003-04-29 2006-11-09 セントラル硝子株式会社 フルオロブテン誘導体およびその製造方法
JP2012512859A (ja) * 2008-12-18 2012-06-07 ルーサイト インターナショナル ユーケー リミテッド メチルメタクリレート精製方法
JP2012195576A (ja) * 2011-02-28 2012-10-11 Tokyo Electron Ltd プラズマエッチング方法及び半導体装置の製造方法並びにコンピュータ記憶媒体
JP2017092357A (ja) * 2015-11-16 2017-05-25 セントラル硝子株式会社 ドライエッチングガスおよびドライエッチング方法
JP2018529872A (ja) * 2015-07-28 2018-10-11 ザ ケマーズ カンパニー エフシー リミテッド ライアビリティ カンパニー 動力サイクルにおける１，３，３，４，４，４−ヘキサフルオロー１−ブテンの使用
JP2020528917A (ja) * 2017-07-27 2020-10-01 ザ ケマーズ カンパニー エフシー リミテッド ライアビリティ カンパニー （ｚ）−１，１，１，４，４，４−ヘキサフルオロ−２−ブテンを調製するプロセス

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JPS60146916U (ja) 1984-03-09 1985-09-30 シャープ株式会社 磁気ヘツドの取付装置
KR100796067B1 (ko) * 2006-05-09 2008-01-21 울산화학주식회사 반도체 제조용 건식 에칭 개스 및 그의 제조방법
JP2008081477A (ja) * 2006-09-29 2008-04-10 Nippon Zeon Co Ltd 含酸素フッ素化合物の容器充填物、含酸素フッ素化合物の保存方法、およびプラズマエッチング方法
WO2009041560A1 (ja) * 2007-09-28 2009-04-02 Zeon Corporation プラズマエッチング方法
JP5266902B2 (ja) * 2008-06-20 2013-08-21 日本ゼオン株式会社 含フッ素オレフィン化合物の製造方法
JP5607354B2 (ja) * 2009-12-28 2014-10-15 ユニオン昭和株式会社 高純度含フッ素化合物の製造方法及びその方法で得られた高純度含フッ素化合物
US8461401B2 (en) * 2010-03-26 2013-06-11 Honeywell International Inc. Method for making hexafluoro-2-butene
WO2012064477A2 (en) * 2010-11-10 2012-05-18 E. I. Du Pont De Nemours And Company Compositions comprising cis-1,1,1,4,4,4-hexafluoro-2-butene and 2-difluoromethoxy-1,1,1,2-tetrafluoroethane and uses thereof
JP2012131731A (ja) * 2010-12-21 2012-07-12 Nippon Zeon Co Ltd フッ素化アルケンの製造法
US20130090439A1 (en) * 2011-10-05 2013-04-11 Honeywell International Inc. Polymerization Of 2,3,3,3-Tetrafluoropropene And Polymers Formed From 2,3,3,3-Tetrafluoropropene
EP2842928A4 (en) 2012-04-27 2017-11-08 Asahi Glass Company, Limited Method for preservation of tetrafluoropropene and container for preservation of tetrafluoropropene
CN104885203B (zh) * 2012-10-30 2017-08-01 乔治洛德方法研究和开发液化空气有限公司 用于高纵横比氧化物蚀刻的氟碳分子
CA2902979A1 (en) * 2013-03-06 2014-09-12 Honeywell International Inc. Storage stable foamable compositions containing 1,1,1,4,4,4-hexafluoro-2-butene
TWI658509B (zh) * 2014-06-18 2019-05-01 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude 用於ｔｓｖ／ｍｅｍｓ／功率元件蝕刻的化學物質
JP5915808B1 (ja) * 2014-12-24 2016-05-11 ダイキン工業株式会社 反応に用いた触媒の取り出し方法
JP6788176B2 (ja) * 2015-04-06 2020-11-25 セントラル硝子株式会社 ドライエッチングガスおよびドライエッチング方法
US20170110336A1 (en) * 2016-12-31 2017-04-20 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges CLuadeq Methods for minimizing sidewall damage during low k etch processes
CN108727154A (zh) * 2018-06-05 2018-11-02 浙江利化新材料科技有限公司 一种六氟丙烯二聚体的制备方法
CN108911947B (zh) * 2018-06-15 2021-11-02 中国民航大学 一种1,1,1,2,4,4,4-七氟-2-丁烯的制备方法
JP6827246B2 (ja) * 2019-02-21 2021-02-10 ダイキン工業株式会社 ハロゲン化ブテン化合物の製造方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05279274A (ja) * 1991-07-25 1993-10-26 Showa Denko Kk １，１−ジクロロ−２，２，２−トリフルオロエタンの精製方法
WO1994012454A1 (fr) * 1992-11-20 1994-06-09 Daikin Industries, Ltd. Procede de production de 1,1,1,4,4,4-hexafluoro-2-butene et de 1,1,1,4,4,4-hexafluorobutane
JP2000038356A (ja) * 1998-07-23 2000-02-08 Agency Of Ind Science & Technol 含フッ素オレフィン
WO2001056961A1 (en) * 2000-02-02 2001-08-09 Daikin Industries, Ltd. Production process of hydrofluorocarbons
JP2006525339A (ja) * 2003-04-29 2006-11-09 セントラル硝子株式会社 フルオロブテン誘導体およびその製造方法
JP2012512859A (ja) * 2008-12-18 2012-06-07 ルーサイト インターナショナル ユーケー リミテッド メチルメタクリレート精製方法
JP2012195576A (ja) * 2011-02-28 2012-10-11 Tokyo Electron Ltd プラズマエッチング方法及び半導体装置の製造方法並びにコンピュータ記憶媒体
JP2018529872A (ja) * 2015-07-28 2018-10-11 ザ ケマーズ カンパニー エフシー リミテッド ライアビリティ カンパニー 動力サイクルにおける１，３，３，４，４，４−ヘキサフルオロー１−ブテンの使用
JP2017092357A (ja) * 2015-11-16 2017-05-25 セントラル硝子株式会社 ドライエッチングガスおよびドライエッチング方法
JP2020528917A (ja) * 2017-07-27 2020-10-01 ザ ケマーズ カンパニー エフシー リミテッド ライアビリティ カンパニー （ｚ）−１，１，１，４，４，４−ヘキサフルオロ−２−ブテンを調製するプロセス

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
OPTEON(登録商標)１１００カタログ, JPN6025035795, 2016, ISSN: 0005677607 *
OPTEON(登録商標)ＳＦ３３カタログ, JPN6025035796, 2018, ISSN: 0005677608 *

Also Published As

Publication number Publication date
IL302120A (en) 2023-06-01
TWI817211B (zh) 2023-10-01
KR20230066078A (ko) 2023-05-12
WO2022080269A1 (ja) 2022-04-21
KR102924118B1 (ko) 2026-02-09
EP4230605A1 (en) 2023-08-23
EP4230605A4 (en) 2024-11-20
CN116348438A (zh) 2023-06-27
TW202235402A (zh) 2022-09-16
US20240018075A1 (en) 2024-01-18

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