CN1161656C - 光衰减隐蔽的相位移式光掩模半成品及其制法 - Google Patents

光衰减隐蔽的相位移式光掩模半成品及其制法 Download PDF

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Publication number
CN1161656C
CN1161656C CNB971947996A CN97194799A CN1161656C CN 1161656 C CN1161656 C CN 1161656C CN B971947996 A CNB971947996 A CN B971947996A CN 97194799 A CN97194799 A CN 97194799A CN 1161656 C CN1161656 C CN 1161656C
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CN
China
Prior art keywords
photomask blank
photomask
light
aluminum
aln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CNB971947996A
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English (en)
Chinese (zh)
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CN1219248A (zh
Inventor
P��F��������
P·F·卡思尔
R·H·弗伦奇
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EIDP Inc
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EI Du Pont de Nemours and Co
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Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN1219248A publication Critical patent/CN1219248A/zh
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Publication of CN1161656C publication Critical patent/CN1161656C/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
CNB971947996A 1996-05-20 1997-05-09 光衰减隐蔽的相位移式光掩模半成品及其制法 Expired - Fee Related CN1161656C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US1903996P 1996-05-20 1996-05-20
US60/019,039 1996-05-20
US08/797,442 1997-02-10
US08/797,442 US5897976A (en) 1996-05-20 1997-02-10 Attenuating embedded phase shift photomask blanks

Publications (2)

Publication Number Publication Date
CN1219248A CN1219248A (zh) 1999-06-09
CN1161656C true CN1161656C (zh) 2004-08-11

Family

ID=26691768

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB971947996A Expired - Fee Related CN1161656C (zh) 1996-05-20 1997-05-09 光衰减隐蔽的相位移式光掩模半成品及其制法

Country Status (11)

Country Link
US (1) US5897976A (https=)
EP (1) EP0900410B1 (https=)
JP (1) JP2000511300A (https=)
CN (1) CN1161656C (https=)
AT (1) ATE246372T1 (https=)
DE (1) DE69723829T2 (https=)
DK (1) DK0900410T3 (https=)
ES (1) ES2202620T3 (https=)
PT (1) PT900410E (https=)
TW (1) TW354391B (https=)
WO (1) WO1997044709A1 (https=)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11184067A (ja) * 1997-12-19 1999-07-09 Hoya Corp 位相シフトマスク及び位相シフトマスクブランク
TW371327B (en) * 1998-05-01 1999-10-01 United Microelectronics Corp Phase-shifting mask (PSM) and method for making the same
US6274280B1 (en) * 1999-01-14 2001-08-14 E.I. Du Pont De Nemours And Company Multilayer attenuating phase-shift masks
JP4163331B2 (ja) * 1999-07-14 2008-10-08 アルバック成膜株式会社 位相シフタ膜の製造方法、位相シフトマスク用ブランクスの製造方法、および、位相シフトマスクの製造方法
KR100725214B1 (ko) * 1999-12-15 2007-06-07 다이니폰 인사츠 가부시키가이샤 하프톤 위상 시프트 포토 마스크용 블랭크, 및 하프톤위상 시프트 포토 마스크
US6524755B2 (en) 2000-09-07 2003-02-25 Gray Scale Technologies, Inc. Phase-shift masks and methods of fabrication
US20020197509A1 (en) * 2001-04-19 2002-12-26 Carcia Peter Francis Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks
US20040115537A1 (en) * 2002-04-19 2004-06-17 Carcia Peter Francis Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks
US20040115343A1 (en) * 2002-04-19 2004-06-17 Carcia Peter Francis Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks
JP3988041B2 (ja) * 2002-10-08 2007-10-10 信越化学工業株式会社 ハーフトーン位相シフトマスクブランク及びその製造方法
JP2005284216A (ja) 2004-03-31 2005-10-13 Shin Etsu Chem Co Ltd 成膜用ターゲット及び位相シフトマスクブランクの製造方法
US20050260504A1 (en) * 2004-04-08 2005-11-24 Hans Becker Mask blank having a protection layer
WO2021221123A1 (ja) * 2020-04-30 2021-11-04 凸版印刷株式会社 反射型フォトマスクブランク及び反射型フォトマスク
JP7662307B2 (ja) * 2020-06-30 2025-04-15 テクセンドフォトマスク株式会社 反射型フォトマスクブランク及び反射型フォトマスク
JP7640231B2 (ja) * 2020-05-14 2025-03-05 テクセンドフォトマスク株式会社 反射型マスクブランク及び反射型マスク
JP7633832B2 (ja) * 2021-02-25 2025-02-20 Hoya株式会社 マスクブランク、反射型マスク、および半導体デバイスの製造方法
CN114884925B (zh) * 2022-04-18 2023-04-18 深圳市绿联科技股份有限公司 一种传输复合照片数据的方法、装置、系统以及电子设备

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW505829B (en) * 1992-11-16 2002-10-11 Dupont Photomasks Inc A transmissive embedded phase shifter-photomask blank
WO1994017449A1 (en) * 1993-01-21 1994-08-04 Sematech, Inc. Phase shifting mask structure with multilayer optical coating for improved transmission
JP3324005B2 (ja) * 1993-03-29 2002-09-17 大日本印刷株式会社 位相シフトフォトマスク用基板及びその製造法
KR100295385B1 (ko) * 1993-04-09 2001-09-17 기타지마 요시토시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법
KR100311704B1 (ko) * 1993-08-17 2001-12-15 기타오카 다카시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및그블랭크스의제조방법
JP2611734B2 (ja) * 1993-12-21 1997-05-21 日本電気株式会社 位相シフトマスク
JP2719493B2 (ja) * 1993-12-22 1998-02-25 ホーヤ株式会社 位相シフトマスクブランク及び位相シフトマスク
JPH07199447A (ja) * 1993-12-28 1995-08-04 Sony Corp 単層ハーフトーン方式位相シフトマスク及びその作製方法
JP3351892B2 (ja) * 1994-01-19 2002-12-03 大日本印刷株式会社 ハーフトーン位相シフトフォトマスク及びハーフトーン位相シフトフォトマスク用ブランクス
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter
JP3436581B2 (ja) * 1994-03-18 2003-08-11 雪印乳業株式会社 乳糖分解酵素活性の高い菌体の製造法
JP2837807B2 (ja) * 1994-06-27 1998-12-16 ホーヤ株式会社 位相シフトマスク及び位相シフトマスクブランク
US5679483A (en) * 1994-12-20 1997-10-21 Siemens Aktiengesellschaft Embedded phase shifting photomasks and method for manufacturing same
JPH08272074A (ja) * 1995-03-29 1996-10-18 Dainippon Printing Co Ltd ハーフトーン位相シフトフォトマスク及びハーフトーン位相シフトフォトマスク用ブランクス

Also Published As

Publication number Publication date
US5897976A (en) 1999-04-27
CN1219248A (zh) 1999-06-09
ES2202620T3 (es) 2004-04-01
DE69723829T2 (de) 2004-05-27
ATE246372T1 (de) 2003-08-15
EP0900410B1 (en) 2003-07-30
PT900410E (pt) 2003-11-28
WO1997044709A1 (en) 1997-11-27
TW354391B (en) 1999-03-11
DE69723829D1 (de) 2003-09-04
JP2000511300A (ja) 2000-08-29
EP0900410A1 (en) 1999-03-10
DK0900410T3 (da) 2003-10-06

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