DK0900410T3 - Fotomaskeråemner med indlejret dæmpende faseforskydning - Google Patents

Fotomaskeråemner med indlejret dæmpende faseforskydning

Info

Publication number
DK0900410T3
DK0900410T3 DK97924665T DK97924665T DK0900410T3 DK 0900410 T3 DK0900410 T3 DK 0900410T3 DK 97924665 T DK97924665 T DK 97924665T DK 97924665 T DK97924665 T DK 97924665T DK 0900410 T3 DK0900410 T3 DK 0900410T3
Authority
DK
Denmark
Prior art keywords
photomask blanks
phase offset
aluminum compound
damping phase
embedded damping
Prior art date
Application number
DK97924665T
Other languages
English (en)
Inventor
Peter Francis Carcia
Roger Harquail French
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of DK0900410T3 publication Critical patent/DK0900410T3/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
DK97924665T 1996-05-20 1997-05-09 Fotomaskeråemner med indlejret dæmpende faseforskydning DK0900410T3 (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US1903996P 1996-05-20 1996-05-20
US08/797,442 US5897976A (en) 1996-05-20 1997-02-10 Attenuating embedded phase shift photomask blanks
PCT/US1997/007954 WO1997044709A1 (en) 1996-05-20 1997-05-09 Attenuating embedded phase shift photomask blanks

Publications (1)

Publication Number Publication Date
DK0900410T3 true DK0900410T3 (da) 2003-10-06

Family

ID=26691768

Family Applications (1)

Application Number Title Priority Date Filing Date
DK97924665T DK0900410T3 (da) 1996-05-20 1997-05-09 Fotomaskeråemner med indlejret dæmpende faseforskydning

Country Status (11)

Country Link
US (1) US5897976A (da)
EP (1) EP0900410B1 (da)
JP (1) JP2000511300A (da)
CN (1) CN1161656C (da)
AT (1) ATE246372T1 (da)
DE (1) DE69723829T2 (da)
DK (1) DK0900410T3 (da)
ES (1) ES2202620T3 (da)
PT (1) PT900410E (da)
TW (1) TW354391B (da)
WO (1) WO1997044709A1 (da)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11184067A (ja) * 1997-12-19 1999-07-09 Hoya Corp 位相シフトマスク及び位相シフトマスクブランク
TW371327B (en) * 1998-05-01 1999-10-01 United Microelectronics Corp Phase-shifting mask (PSM) and method for making the same
US6274280B1 (en) * 1999-01-14 2001-08-14 E.I. Du Pont De Nemours And Company Multilayer attenuating phase-shift masks
JP4163331B2 (ja) * 1999-07-14 2008-10-08 アルバック成膜株式会社 位相シフタ膜の製造方法、位相シフトマスク用ブランクスの製造方法、および、位相シフトマスクの製造方法
KR100725214B1 (ko) * 1999-12-15 2007-06-07 다이니폰 인사츠 가부시키가이샤 하프톤 위상 시프트 포토 마스크용 블랭크, 및 하프톤위상 시프트 포토 마스크
US6524755B2 (en) 2000-09-07 2003-02-25 Gray Scale Technologies, Inc. Phase-shift masks and methods of fabrication
US20020197509A1 (en) * 2001-04-19 2002-12-26 Carcia Peter Francis Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks
US20040115343A1 (en) * 2002-04-19 2004-06-17 Carcia Peter Francis Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks
US20040115537A1 (en) * 2002-04-19 2004-06-17 Carcia Peter Francis Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks
JP3988041B2 (ja) * 2002-10-08 2007-10-10 信越化学工業株式会社 ハーフトーン位相シフトマスクブランク及びその製造方法
JP2005284216A (ja) * 2004-03-31 2005-10-13 Shin Etsu Chem Co Ltd 成膜用ターゲット及び位相シフトマスクブランクの製造方法
US20050260504A1 (en) * 2004-04-08 2005-11-24 Hans Becker Mask blank having a protection layer
EP4145222A1 (en) * 2020-04-30 2023-03-08 Toppan Photomask Co., Ltd. Reflective photomask blank and reflective photomask
JP2021179549A (ja) * 2020-05-14 2021-11-18 凸版印刷株式会社 反射型マスクブランク及び反射型マスク

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW505829B (en) * 1992-11-16 2002-10-11 Dupont Photomasks Inc A transmissive embedded phase shifter-photomask blank
WO1994017449A1 (en) * 1993-01-21 1994-08-04 Sematech, Inc. Phase shifting mask structure with multilayer optical coating for improved transmission
JP3324005B2 (ja) * 1993-03-29 2002-09-17 大日本印刷株式会社 位相シフトフォトマスク用基板及びその製造法
KR100295385B1 (ko) * 1993-04-09 2001-09-17 기타지마 요시토시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법
KR100311704B1 (ko) * 1993-08-17 2001-12-15 기타오카 다카시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및그블랭크스의제조방법
JP2611734B2 (ja) * 1993-12-21 1997-05-21 日本電気株式会社 位相シフトマスク
JP2719493B2 (ja) * 1993-12-22 1998-02-25 ホーヤ株式会社 位相シフトマスクブランク及び位相シフトマスク
JPH07199447A (ja) * 1993-12-28 1995-08-04 Sony Corp 単層ハーフトーン方式位相シフトマスク及びその作製方法
JP3351892B2 (ja) * 1994-01-19 2002-12-03 大日本印刷株式会社 ハーフトーン位相シフトフォトマスク及びハーフトーン位相シフトフォトマスク用ブランクス
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter
JP3436581B2 (ja) * 1994-03-18 2003-08-11 雪印乳業株式会社 乳糖分解酵素活性の高い菌体の製造法
JP2837807B2 (ja) * 1994-06-27 1998-12-16 ホーヤ株式会社 位相シフトマスク及び位相シフトマスクブランク
US5679483A (en) * 1994-12-20 1997-10-21 Siemens Aktiengesellschaft Embedded phase shifting photomasks and method for manufacturing same
JPH08272074A (ja) * 1995-03-29 1996-10-18 Dainippon Printing Co Ltd ハーフトーン位相シフトフォトマスク及びハーフトーン位相シフトフォトマスク用ブランクス

Also Published As

Publication number Publication date
PT900410E (pt) 2003-11-28
EP0900410B1 (en) 2003-07-30
WO1997044709A1 (en) 1997-11-27
DE69723829D1 (de) 2003-09-04
CN1161656C (zh) 2004-08-11
DE69723829T2 (de) 2004-05-27
US5897976A (en) 1999-04-27
TW354391B (en) 1999-03-11
EP0900410A1 (en) 1999-03-10
ATE246372T1 (de) 2003-08-15
JP2000511300A (ja) 2000-08-29
CN1219248A (zh) 1999-06-09
ES2202620T3 (es) 2004-04-01

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