CN116057467B - 用于原位载物台校正的有源光罩载体 - Google Patents

用于原位载物台校正的有源光罩载体 Download PDF

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Publication number
CN116057467B
CN116057467B CN202180053904.9A CN202180053904A CN116057467B CN 116057467 B CN116057467 B CN 116057467B CN 202180053904 A CN202180053904 A CN 202180053904A CN 116057467 B CN116057467 B CN 116057467B
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CN
China
Prior art keywords
reticle
carrier
active
disposed
rotating plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202180053904.9A
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English (en)
Chinese (zh)
Other versions
CN116057467A (zh
Inventor
A·萨夫兰尼
A·帕希玛
R·鲁多伊
S·马克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
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Publication date
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of CN116057467A publication Critical patent/CN116057467A/zh
Application granted granted Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Library & Information Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CN202180053904.9A 2020-09-03 2021-09-01 用于原位载物台校正的有源光罩载体 Active CN116057467B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063073937P 2020-09-03 2020-09-03
US63/073,937 2020-09-03
US17/446,035 US11774866B2 (en) 2020-09-03 2021-08-26 Active reticle carrier for in situ stage correction
US17/446,035 2021-08-26
PCT/US2021/048570 WO2022051310A1 (en) 2020-09-03 2021-09-01 Active reticle carrier for in situ stage correction

Publications (2)

Publication Number Publication Date
CN116057467A CN116057467A (zh) 2023-05-02
CN116057467B true CN116057467B (zh) 2024-03-08

Family

ID=80356565

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180053904.9A Active CN116057467B (zh) 2020-09-03 2021-09-01 用于原位载物台校正的有源光罩载体

Country Status (6)

Country Link
US (1) US11774866B2 (https=)
EP (1) EP4200669A4 (https=)
JP (1) JP7592154B2 (https=)
KR (1) KR102725415B1 (https=)
CN (1) CN116057467B (https=)
WO (1) WO2022051310A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI878825B (zh) * 2023-03-10 2025-04-01 微程式資訊股份有限公司 可模擬光罩之感測總成
US20250108972A1 (en) * 2023-09-28 2025-04-03 Entegris, Inc. Large format reticle container

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH098103A (ja) * 1995-06-19 1997-01-10 Nikon Corp 投影露光装置及び投影露光方法
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
JPH11288878A (ja) * 1998-04-03 1999-10-19 Canon Inc マスク搬送装置およびマスク搬送方法、ならびに該マスク搬送装置を用いた露光装置
JPH11307425A (ja) * 1998-04-22 1999-11-05 Nikon Corp マスクの受け渡し方法、及び該方法を使用する露光装置
US6590633B1 (en) * 1997-03-25 2003-07-08 Nikon Corporation Stage apparatus and method for producing circuit device utilizing the same
CN101233454A (zh) * 2005-06-13 2008-07-30 Asml荷兰有限公司 光刻设备、确定其至少一个偏振属性的方法、检偏器和偏振传感器

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195948A (ja) * 1984-03-19 1985-10-04 Hitachi Ltd 検査装置
JP2000147747A (ja) 1998-11-16 2000-05-26 Seiko Epson Corp マスク検査装置
EP2418545B1 (en) 2010-08-12 2018-10-10 Applied Materials, Inc. Mask handling module
US10090179B2 (en) 2011-06-28 2018-10-02 Brooks Automation, Inc. Semiconductor stocker systems and methods
US9851643B2 (en) 2012-03-27 2017-12-26 Kla-Tencor Corporation Apparatus and methods for reticle handling in an EUV reticle inspection tool
US20150131071A1 (en) * 2013-11-08 2015-05-14 Samsung Electronics Co., Ltd. Semiconductor device manufacturing apparatus
JP2016170310A (ja) * 2015-03-13 2016-09-23 株式会社荏原製作所 レチクル搬送装置、検査装置およびレチクル搬送方法
WO2018111227A1 (en) 2016-12-12 2018-06-21 Intel Corporation Systems, apparatuses, and methods for performing reticle inspections
CN109426082A (zh) 2017-08-21 2019-03-05 上海微电子装备（集团）股份有限公司 一种掩模版的传输系统以及传输方法
US10663871B2 (en) * 2018-07-30 2020-05-26 Taiwan Semiconductor Manufacturing Co., Ltd. Reticle stage and method for using the same
US10976674B2 (en) * 2018-08-17 2021-04-13 Taiwan Semiconductor Manufacturing Co., Ltd. Method for detecting EUV pellicle rupture

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
JPH098103A (ja) * 1995-06-19 1997-01-10 Nikon Corp 投影露光装置及び投影露光方法
US5959721A (en) * 1995-06-19 1999-09-28 Nikon Corporation Projection exposure apparatus and projection exposure method
US6590633B1 (en) * 1997-03-25 2003-07-08 Nikon Corporation Stage apparatus and method for producing circuit device utilizing the same
JPH11288878A (ja) * 1998-04-03 1999-10-19 Canon Inc マスク搬送装置およびマスク搬送方法、ならびに該マスク搬送装置を用いた露光装置
JPH11307425A (ja) * 1998-04-22 1999-11-05 Nikon Corp マスクの受け渡し方法、及び該方法を使用する露光装置
CN101233454A (zh) * 2005-06-13 2008-07-30 Asml荷兰有限公司 光刻设备、确定其至少一个偏振属性的方法、检偏器和偏振传感器

Also Published As

Publication number Publication date
KR102725415B1 (ko) 2024-11-01
WO2022051310A1 (en) 2022-03-10
JP7592154B2 (ja) 2024-11-29
EP4200669A1 (en) 2023-06-28
CN116057467A (zh) 2023-05-02
US11774866B2 (en) 2023-10-03
KR20230058659A (ko) 2023-05-03
JP2023540297A (ja) 2023-09-22
US20220066333A1 (en) 2022-03-03
EP4200669A4 (en) 2024-10-16

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