CN115254789A

CN115254789A - Wet processing substrate processing device

Info

Publication number: CN115254789A
Application number: CN202211005235.0A
Authority: CN
Inventors: 吴昭宽; 苏士豪
Original assignee: Herman Semiconductor Technology Shenzhen Co ltd
Current assignee: Herman Semiconductor Technology Shenzhen Co ltd
Priority date: 2022-08-22
Filing date: 2022-08-22
Publication date: 2022-11-01

Abstract

An embodiment of the present invention provides a wet processing substrate processing apparatus, including: the bearing machine table is used for transporting the display substrate; the liquid-air knife assembly is arranged above the bearing machine table and is used for expelling or isolating two different media attached to the display substrate; the liquid-gas knife assembly comprises a double-knife liquid-gas knife, and the double-knife liquid-gas knife comprises a first liquid-gas knife edge and a second liquid-gas knife edge; the gas outlet direction of the first liquid-gas knife edge is reversely intersected with the transmission direction of the display substrate, and the gas outlet direction of the second liquid-gas knife edge is forwardly intersected with the transmission direction of the display substrate; by adopting the double-edge liquid air knife assembly, the isolation of good liquid medicine and washing liquid can be realized on the basis of the length and the structure of the simplified wet-process substrate processing device, the recycling of the liquid medicine is realized, the cost is reduced, and the product yield is improved at the same time.

Description

Wet processing substrate processing device

[ technical field ] A method for producing a semiconductor device

The invention relates to the technical field of display, in particular to a wet process substrate processing device.

[ background of the invention ]

The manufacturing process of related display equipment such as liquid crystal display, organic light emitting display, mini/Micro LED and the like comprises a wet process working section; for example, the etching process of LCD is divided into WET etching (WET etching) and DRY etching (DRY etching). After the etching process is completed in the etching Chamber (Final Etcher Chamber), various display substrates processed by the liquid medicine are generally required to be cleaned, the liquid medicine and the water washing liquid are isolated, and then the chemical reagent on the display surface is removed by a pure water cleaning mode; because the contact between the liquid medicine and water easily causes the mutual pollution of the liquid medicine and the water, on one hand, the subsequent product performance or the manufacturing procedure is not completely influenced due to the washing cleaning, and on the other hand, the liquid medicine is ineffective when the pollution is serious; therefore, in the prior art, the liquid is removed by using a single air knife, and the liquid is isolated by using Compressed Dry Air (CDA) supplied by an air knife.

As shown in fig. 1, fig. 1 is a wet processing apparatus in the prior art, in a transmission direction of a display substrate 09', in order to achieve a good isolation between a liquid medicine and a water region, the wet processing apparatus needs at least three air knives 01'/02'/03', the three air knives 01'/02'/03 'are respectively disposed at an outlet of a liquid medicine unit 30', an inner of a gas-liquid mixing unit 20', and an inlet of a water washing unit 10', a liquid medicine spraying device 04 'is disposed in the liquid medicine unit 30', and a water washing spraying device 05 'is disposed in the water washing unit 30'; after etching is finished, the first air knife 01' is used for isolating the mixture of the liquid medicine and the water, the second air knife 02' is used for driving the mixture of the medicine and the water, and the third air knife 03' is used for isolating the mixture of the medicine and the water from the water washing liquid; thus, the replacement of the liquid medicine and the water on the surface of the display substrate 09' is realized through the isolated cleaning process of the three air knives, and the separation of the liquid medicine unit and the water washing unit is completed; however, in this way, a large amount of liquid medicine components are mixed into the washing liquid in the gas-liquid mixing unit to become waste water, which cannot be recycled and reused, and is directly discharged to a waste liquid recovery pipeline, thereby causing waste.

[ summary of the invention ]

In view of the above, an embodiment of the present invention provides a wet processing substrate processing apparatus, including:

the bearing machine table is used for transporting the display substrate;

the liquid-gas knife assembly is arranged above the bearing machine table and is used for expelling or isolating two different media attached to the display substrate;

the liquid-gas knife assembly comprises a double-knife liquid-gas knife, and the double-knife liquid-gas knife comprises a first liquid-gas knife edge and a second liquid-gas knife edge; the air outlet direction of the first liquid-air knife edge is reversely intersected with the transmission direction of the display substrate, and the air outlet direction of the second liquid-air knife edge is forwardly intersected with the transmission direction of the display substrate.

Further optionally, the liquid medicine unit and the water washing unit are arranged along the transmission direction of the display substrate, and the liquid and air knife assembly is arranged in a critical area of the liquid medicine unit and the water washing unit;

the liquid-air knife assembly comprises a first liquid-air knife sub-part and a second liquid-air knife sub-part which are integrally connected, the first liquid-air knife sub-part comprises a first liquid-air knife edge, and the second liquid-air knife sub-part comprises a second liquid-air knife edge;

the air outlet direction of the first liquid-gas knife edge is inclined towards one side of the liquid medicine unit, and the air outlet direction of the second liquid-gas knife edge is inclined towards one side of the water washing unit.

Further optionally, a gas flow passage between the first liquid gas knife portion and the second liquid gas knife portion; the gas flow channel comprises an exhaust buffer cavity, and the exhaust buffer cavity is used for exhausting reverse gas flow generated between the double-edge liquid air knife and the display substrate.

Further optionally, the first hydro-pneumatic cutter part comprises a first hydro-pneumatic cutter frame and a first hydro-pneumatic cutter cavity enclosed by the first hydro-pneumatic cutter frame, and the bottom end, close to the bearing machine table, of the first hydro-pneumatic cutter cavity comprises a first hydro-pneumatic cutter edge; the second liquid-air knife sub-part comprises a second liquid-air knife frame and a second liquid-air knife cavity enclosed by the second liquid-air knife frame, and the bottom end, close to the bearing machine table, of the second liquid-air knife cavity comprises a second liquid-air knife edge;

the top of first liquid air sword chamber and second liquid air sword chamber communicates with the intake pipe respectively, and first liquid air sword chamber and second liquid air sword chamber are used for injecing the gaseous air current form in inside.

Further optionally, the liquid-air knife assembly comprises a support rod, the support rod is movably connected with the double-edge liquid-air knife, and the support rod is used for fixing the relative position of the double-edge liquid-air knife and the bearing machine table.

Further optionally, the bearing machine platform includes a first roller group formed by a plurality of rollers, and the first roller group forms a platform for bearing the display substrate.

Further optionally, the device comprises a residual liquid flow dividing device, wherein the residual liquid flow dividing device is positioned below the first roller group and is arranged corresponding to the liquid-gas cutter assembly; the residual liquid shunting device comprises a first diversion surface and a second diversion surface which are intersected, the first diversion surface inclines downwards to face one side of the liquid medicine unit, and the second diversion surface inclines downwards to face one side of the water washing unit.

Further optionally, a first drain pipe for discharging the washing residual liquid on the side of the washing unit and a second drain pipe for discharging the liquid medicine residual liquid on the side of the liquid medicine unit are included.

Further optionally, an air drying air knife is included, the air drying air knife is located on a side of the water washing unit away from the liquid air knife assembly along a transport direction of the display substrate, and the air drying air knife is used for drying the water-washed display substrate.

Further optionally, the liquid medicine display device comprises a protective air knife, wherein the protective air knife is positioned on one side of the liquid medicine unit far away from the liquid medicine knife assembly along the transmission direction of the displayed substrate, and the protective air knife is used for isolating external water vapor from entering the liquid medicine unit.

Further optionally, including liquid medicine confession groove, washing liquid confession groove and gaseous storage tank, liquid medicine confession groove and liquid medicine unit intercommunication, washing confession groove and washing unit intercommunication, gaseous storage tank and the air inlet intercommunication of liquid air knife tackle spare.

According to the embodiment of the invention, the double-edge liquid air knife assembly is arranged in the wet process substrate treatment device, the air outlet directions of the first liquid air knife edge and the second liquid air knife edge in the double-edge liquid air knife are respectively inclined downwards towards the two opposite sides of the double-edge liquid air assembly in the transmission direction of the display substrate, so that two different surface adhesion media passing through the two sides of the position on the display substrate below the double-edge liquid air knife can be isolated, the separation purpose of two media (such as liquid medicine and water washing liquid) is effectively achieved, and the mutual pollution caused by poor isolation effect between the two different media, the increase of cost caused by incapability of recycling or the difficulty in sewage treatment are avoided. In addition, the double-edge liquid air knife component provided by the embodiment of the invention can reduce or eliminate a water liquid replacement unit required in the prior art, reduce the length of the whole wet process substrate treatment device, reduce the cost and improve the product yield.

[ description of the drawings ]

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.

FIG. 1 is a schematic perspective view of a wet processing substrate processing system according to the prior art;

FIG. 2 is a schematic diagram of a wet processing substrate processing apparatus according to an embodiment of the present invention;

FIG. 3 is a schematic cross-sectional side view of the dual-orifice liquid air knife assembly shown in FIG. 2;

FIG. 4 is a front cross-sectional schematic view of the dual-orifice liquid air knife assembly of FIG. 2;

FIG. 5 is a schematic view of another wet processing substrate processing apparatus according to an embodiment of the present invention;

FIG. 6 is a schematic view of another wet processing substrate processing apparatus according to an embodiment of the present invention;

FIG. 7 is a schematic diagram of another wet processing substrate processing apparatus according to an embodiment of the present invention.

[ detailed description ] embodiments

For better understanding of the technical solutions of the present invention, the following detailed descriptions of the embodiments of the present invention are provided with reference to the accompanying drawings.

It should be understood that the described embodiments are only some embodiments of the invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

The terminology used in the embodiments of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used in the description of the invention and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.

It should be understood that the term "and/or" as used herein is merely one type of association that describes an associated object, meaning that three relationships may exist, e.g., a and/or B may mean: a exists alone, A and B exist simultaneously, and B exists alone. In addition, the character "/" herein generally indicates that the former and latter related objects are in an "or" relationship.

In the description of the present specification, it is to be understood that the terms "substantially", "approximately", "about", "approximately", "substantially" and the like in the claims and the examples are intended to be inclusive and mean that there may be substantial equivalents to the claims and/or tolerances, rather than an exact value.

The embodiment of the invention provides a wet processing substrate processing device used in the display field, which is used for isolating liquid medicine from washing liquid when the surface of a display substrate is washed and cleaned in a wet processing way, realizing recycling of the liquid medicine, reducing the overall process length of the whole wet processing substrate processing device and improving the operation efficiency.

FIG. 2 is a schematic diagram of a wet processing substrate processing apparatus according to an embodiment of the present invention; FIG. 3 is a side cross-sectional schematic view of the dual-orifice liquid air knife assembly of FIG. 2; FIG. 4 is a front cross-sectional schematic view of the dual-orifice liquid air knife assembly of FIG. 2; as shown in fig. 2 to 4, the wet processing substrate treatment apparatus 1000 includes: a carrier 70, the carrier 70 being used for transporting the display substrate 1; the liquid-gas knife assembly 100 is arranged above the bearing machine table 70 and is used for expelling or isolating two different media attached to the display substrate 1; the liquid-gas knife assembly 100 comprises a double-edge liquid-gas knife 10, the double-edge liquid-gas knife 10 comprising a first liquid-gas knife edge 103 and a second liquid-gas knife edge 105; the gas outlet direction of the first liquid-gas knife edge 103 is reversely intersected with the transmission direction Z of the display substrate 1, and the gas outlet direction of the second liquid-gas knife edge 105 is intersected with the transmission direction Z of the display substrate 1 in the positive direction.

Specifically, as shown in fig. 2, the substrate processing apparatus 1000 performs processing on a display substrate 1 used for manufacturing a display apparatus; it should be noted that the types of the display device include, but are not limited to, a liquid crystal display, an organic light emitting display, a Mini/Micro LED, and the like. The display substrate 1 includes, but is not limited to, an array substrate (array substrate) used in a Thin Film Transistor (TFT) to be applied to each constituent element in, for example, an LCD, an AMOLED, a Mini/Micro LED device. The substrate processing apparatus 1000 includes a carrier 70, wherein the carrier 70 is used for placing a display substrate 1 to be processed;

further optionally, the carrying machine 70 includes a first roller set composed of a plurality of rollers 701, the first roller set forms a platform for carrying the display substrate 1, directional rotation of the rollers 701 in the first roller set and transmission of the display substrate 1 located above the rollers 701 are realized, and batch streamline operation of the substrate processing apparatus 1000 is realized; furthermore, the roller 701 may also be coupled to an external mechanical or microcomputer control system to allow for cheaper control and adjustment.

The substrate processing system further comprises a liquid-gas knife assembly 100 positioned above the carrier table 70, wherein the liquid-gas knife assembly 100 comprises a double-edge liquid-gas knife 10, and the double-edge liquid-gas knife 10 comprises a first liquid-gas knife edge 103 and a second liquid-gas knife edge 105; taking a longitudinal section passing through the liquid-gas knife assembly 100 and perpendicular to the surface of the carrier 70 as a symmetry axis, the gas outlet direction of the first liquid-gas knife edge 103 is inclined toward the plane of the carrier 70 and is intersected with the transmission direction Z of the display substrate 1 in the opposite direction, and the gas outlet direction of the second liquid-gas knife edge 105 is also inclined toward the plane of the carrier 70 and is intersected with the transmission direction Z of the display substrate 1 in the positive direction. The liquid-gas knife assembly 100 uses the high-pressure gas discharged from the first liquid-gas knife edge 103 and the second liquid-gas knife edge 105 of the double-knife-edge liquid-gas knife 10 to clean two different surface liquid media located in two different areas on the left and right sides of the point on the surface of the display substrate 1 and below the double-knife-edge liquid-gas knife 10. The concept of the left and right sides is defined based on the transport direction Z of the display substrate 1. Specifically, two different liquid media may refer to a liquid medicine and a water washing liquid respectively, the liquid-gas knife assembly 100 is disposed in the substrate processing apparatus 1000, and in the transmission direction Z of the display substrate 1, the gas outlet directions of the first liquid-gas knife edge 103 and the second liquid-gas knife edge 105 in the double-knife-edge liquid-gas knife 10 are inclined downwards to the two opposite sides of the liquid-gas knife assembly 100, so that two different surface attachment media on the two sides of the position on the display substrate 1 passing through the lower portion of the double-knife-edge liquid-gas knife 10 can be isolated, the purpose of separating the two media (such as the liquid medicine and the water washing liquid) is effectively achieved, and mutual pollution caused by poor isolation effect between the two different media, and the cost is increased or the difficulty of sewage treatment caused by unavailable recycling is avoided. In addition, the liquid-air knife assembly 100 provided by the embodiment of the invention can reduce or eliminate a liquid replacement unit required in the prior art, reduce the length of the whole wet processing substrate processing device 1000, reduce the cost and improve the product yield.

Further optionally, as shown in fig. 2 to fig. 4, the liquid-air knife assembly 100 includes a supporting rod 40, the supporting rod 40 is movably connected to the double-edge liquid-air knife 10, and the supporting rod 40 is used for fixing a relative position between the double-edge liquid-air knife 10 and the supporting table 70.

Specifically, referring to fig. 2 to 4, the liquid-air knife assembly 100 includes a support rod 40 and a double-edge liquid-air knife 10, the support rod 40 and the double-edge liquid-air knife 10 are assembled and assembled by a fixing fitting 50, specifically, the fixing fitting 50 may be a fixing bolt, a buckle, a chain, etc., the number of the fixing fittings 50 may also be randomly adjusted according to actual needs, and the embodiment of the present invention does not limit the specific type and number of the fixing fittings 50 as long as the double-edge liquid-air knife 10 can be fixed on the support rod 40. The supporting rod 40 is provided with a supporting function by the double-edge liquid air knife 10, so that the supporting rod can be suspended above the bearing machine table 70, the height or the relative position between the double-edge liquid air knife 10 and the bearing substrate can be adjusted, and the requirement of blowing and cleaning the display substrate 1 by the double-edge liquid air knife 10 is met.

Further alternatively, with reference to fig. 2 to fig. 4, the liquid medicine unit 210 and the water washing unit 220 are disposed along the transmission direction Z of the display substrate 1, and the liquid-air knife assembly 100 is disposed in a critical area of the liquid medicine unit 210 and the water washing unit 220; the liquid-gas knife assembly 100 comprises a first liquid-gas knife sub-section 101 and a second liquid-gas knife sub-section 102 which are integrally connected, wherein the first liquid-gas knife sub-section 101 comprises the first liquid-gas knife edge 103, and the second liquid-gas knife sub-section 102 comprises the second liquid-gas knife edge 105; the gas outlet direction of the first liquid-gas knife edge 103 is inclined towards the liquid medicine unit 210 side, and the gas outlet direction of the second liquid-gas knife edge 105 is inclined towards the water washing unit 220 side.

Specifically, as shown in fig. 2, in the transmission direction of the display substrate 1, the substrate processing apparatus 1000 includes a liquid medicine unit 210, a liquid-air knife assembly 100 and a water washing unit 220, which are sequentially arranged, that is, the liquid-air knife assembly 100 is arranged in a boundary adjacent region of the liquid medicine unit 210 and the water washing unit 220; further, the central axis of the liquid-air knife assembly 100 overlaps the projection of the boundary line between the liquid medicine unit 210 and the water washing unit 220. The liquid medicine unit 210 comprises a liquid medicine spraying device 11, and liquid medicine is sprayed onto the display substrate 1 below through the liquid medicine spraying device 11 to realize wet etching of the display substrate 1; the washing unit 220 comprises a washing liquid spraying device 21, and the washing liquid is sprayed onto the display substrate 1 etched by the liquid medicine below through the washing liquid spraying device 21, so that the surface of the display substrate 1 is cleaned. The liquid-air knife assembly 100 includes a first liquid-air knife sub-section 101 and a second liquid-air knife sub-section 102 integrally connected, and more particularly, the first liquid-air knife sub-section 101 and the second liquid-air knife sub-section 102 are integrally formed by a stamp structure. The first liquid air knife sub-portion 101 comprises a first liquid air knife edge 103, the second liquid air knife sub-portion 102 comprises a second liquid air knife edge 105, the air outlet direction of the first liquid air knife edge 103 is inclined downwards to face one side of the liquid medicine unit 210, the air outlet direction of the second liquid air knife edge 105 faces one side of the washing unit 220, and the surface liquid medicine on one side of the liquid medicine unit 210 on the display substrate 1 passing through the lower portion of the first liquid air knife edge and the washing liquid on one side of the washing unit 220 can be isolated through the double-knife-edge liquid air knife 10, so that mutual pollution of the liquid medicine and the washing liquid is avoided, and the isolated and collected liquid medicine residual liquid can be recycled; in addition, since one side of the washing liquid is not easy to be mixed with the liquid medicine, the operation difficulty in the washing unit 220 is reduced, the using amount of the washing liquid can be saved, the cost is saved, and the washing residual liquid after washing is easy to be treated due to the fact that a small amount of the liquid medicine is mixed; in addition, the liquid-air knife assembly 100 provided by the embodiment of the invention can reduce or eliminate a water liquid replacement unit required in the prior art, reduce the length of the whole wet process substrate processing device 1000, save the number of the liquid-air knives, reduce the cost and improve the product yield.

Further, the liquid-air knife assembly 100 may have an axisymmetric structure, that is, the first liquid-air knife portion 101 and the second liquid-air knife portion 102 are symmetric about the symmetry axis.

Further alternatively, with continued reference to fig. 2 to 4, a gas flow passage 50 is formed between the first liquid gas knife section 101 and the second liquid gas knife section 102; the gas flow channel 50 includes an exhaust buffer chamber 502, and the exhaust buffer chamber 502 is used for exhausting the reverse gas flow 203 generated between the dual-edge liquid gas knife 10 and the display substrate 1.

Specifically, as shown in fig. 3 and 4, a hollow gap 50 exists between the first liquid gas knife sub-portion 101 and the second liquid gas knife sub-portion 102, the hollow gap 50 can realize the circulation of gas, and a gas circulation passage 50 formed by the hollow gap 50 includes a gas passage gap 501 formed between the lower liquid gas knife frame walls in the first liquid gas knife sub-portion 101 and the second liquid gas knife sub-portion 102, and an exhaust buffer chamber 502 formed between the upper liquid gas knife frame walls in the first liquid gas knife sub-portion 101 and the second liquid gas knife sub-portion 102; the air passage gap 501 is communicated with an exhaust buffer cavity 502, and the exhaust buffer cavity 502 comprises an exhaust port 503 communicated with the outside. When high-pressure gas ejected from the air outlet of the double-edge liquid air knife 10 impacts the surface of the display substrate 1, the phenomenon of cross-flow of air flow occurs on the back side of the edge of the double-edge liquid air knife 10, and the communicated air passage gap 501 and the communicated exhaust buffer cavity 502 can release the part of air flow to an external system, so that the flow guiding effect of the cross-flow air flow is effectively realized.

Further optionally, with continued reference to fig. 2 to fig. 4, the first liquid-air knife sub-portion 101 includes a first liquid-air knife frame 1011 and a first liquid-air knife cavity 202 enclosed by the first liquid-air knife frame 1011, and the first liquid-air knife cavity 202 includes the first liquid-air knife edge 103 near the bottom end of the carrier table 70; the second liquid air knife portion 102 comprises a second liquid air knife frame 1012 and a second liquid air knife cavity 201 enclosed by the second liquid air knife frame 1012, and the second liquid air knife cavity 201 close to the bottom end of the carrier stage 70 comprises the second liquid air knife opening 105; the top ends of the first liquid-air knife cavity 202 and the second liquid-air knife cavity 201 are respectively communicated with the air inlet pipe 30, and the first liquid-air knife cavity 202 and the second liquid-air knife cavity 201 are used for limiting the air flow form of the internal air.

Specifically, as shown in fig. 3, the first liquid-air knife sub-portion 101 includes a first liquid-air knife frame 1011 and a first liquid-air knife cavity 202 enclosed by the first liquid-air knife frame 1011, and the bottom end of the first liquid-air knife cavity 202 near the carrier table 70 includes the first liquid-air knife edge 103; the second liquid air knife portion 102 comprises a second liquid air knife frame 1012 and a second liquid air knife cavity 201 enclosed by the second liquid air knife frame 1012, and the second liquid air knife cavity 201 comprises the second liquid air knife opening 105 near the bottom end of the carrier stage 70; the longitudinal section of the first hydro-pneumatic cutter cavity 202 and/or the second hydro-pneumatic cutter cavity 201 is in an irregular structure with a wide top and a narrow bottom, and the lower structure of the first hydro-pneumatic cutter cavity 202 and/or the second hydro-pneumatic cutter cavity 201 bends towards the central axis of the hydro-pneumatic cutter assembly 100. The top ends of the first liquid-air knife cavity 202 and the second liquid-air knife cavity 201 are respectively communicated with an air inlet pipe 30, the air inlet pipe 30 is used for transmitting high-pressure air to the interior of the first liquid-air knife cavity 202 and the interior of the second liquid-air knife cavity 201, and the air flow form of the high-pressure air is changed through the internal structural forms of the first liquid-air knife cavity 202 and the second liquid-air knife cavity 201, so that the high-pressure air is sprayed onto the display substrate 1 according to target requirements.

Further alternatively, as shown in fig. 2, the substrate processing apparatus 1000 includes a residual liquid diversion device 90, where the residual liquid diversion device 90 is located below the first set of rollers 701 and is disposed corresponding to the liquid-gas knife assembly 100; the residual liquid diversion device 90 includes a first diversion surface 901 and a second diversion surface 902 which are intersected, the first diversion surface 901 faces downward obliquely to one side of the liquid medicine unit 210, and the second diversion surface 902 faces downward obliquely to one side of the water washing unit 220.

Specifically, as shown in fig. 2, right below the gas-liquid knife assembly, a residual liquid diversion device 90 is included, which is disposed below the first roller 701 group, and the residual liquid diversion device 90 is used for dividing and guiding the residual liquid of the liquid medicine measured by the liquid medicine unit 210 and the residual liquid of the washing unit 220, which are cleaned by the double-edge gas-liquid knife 10; specifically, the longitudinal section structure of the residual liquid diversion device 90 is similar to an umbrella-shaped structure, and includes a first diversion surface 901 and a second diversion surface 902 which are intersected, the first diversion surface 901 inclines downwards to face one side of the liquid medicine unit 210, the second diversion surface 902 inclines downwards to face one side of the washing unit 220, and drainage guidance for the residual liquid medicine and the residual liquid washing liquid can be respectively realized through the first diversion surface 901 and the second diversion surface 902, so that respective collection of different types of residual liquid is realized, the reuse ratio of the liquid medicine is improved, and the difficulty in treating the residual liquid is reduced.

Further alternatively, with reference to fig. 2, the substrate processing apparatus 1000 includes a first drain pipe 81 and a second drain pipe 82, the first drain pipe 81 is used for draining the residual liquid of the washing process on the side of the washing unit 220, and the second drain pipe 82 is used for draining the residual liquid of the chemical process on the side of the chemical process unit 210.

Specifically, as shown in fig. 2, a first drain pipe 81 and a second drain pipe 82 are provided on a frame at the lower part of the substrate processing apparatus 1000, the second drain pipe 82 is provided at the side of the chemical solution unit 210, the first drain pipe 81 is provided at the side of the washing unit 220, the second drain pipe 82 is used for discharging the residual liquid of the chemical solution after the wet process, and the first drain pipe 81 is used for discharging the residual liquid of the washing solution collected by the washing unit 220 after the wet process; further alternatively, the second drain pipe 82 may be communicated with an external liquid medicine recovery tank, and the first drain pipe 81 may be communicated with an external washing raffinate recovery tank.

Optionally, fig. 5 is a schematic structural diagram of another wet processing substrate processing apparatus 1000 according to an embodiment of the present invention; as shown in fig. 5, the substrate processing apparatus 1000 includes an air drying air knife 7, the air drying air knife 7 is located at a side of the water washing unit 220 away from the liquid air knife assembly 100 along a transport direction Z of the display substrate 1, and the air drying air knife 7 is used for drying the water-washed display substrate 1.

Specifically, please continue to refer to fig. 5, in the transmission direction Z of the display substrate 1, the substrate processing apparatus 1000 further includes an air drying air knife 7 located at a side of the water washing unit 220 away from the liquid air knife assembly 100, wherein the air drying air knife 7 is used for blowing dry gas to the surface of the display substrate 1, so as to rapidly dry the display substrate 1 after water washing, so that the display substrate 1 can conveniently enter the next manufacturing process, and the work efficiency is improved. Further, the air-drying air knife 7 may deliver the same gas as that delivered by the double-edge liquid air knife 10, but may also deliver other different inert gases, which is not limited by the embodiments of the present invention.

Alternatively, fig. 6 is a schematic structural diagram of another wet processing substrate processing apparatus 1000 according to an embodiment of the present invention; as shown in fig. 6, the substrate processing apparatus 1000 further includes a protection air knife 8, along the transmission direction Z of the displayed substrate 1, the protection air knife 8 is located at a side of the liquid medicine unit 210 far away from the liquid medicine knife assembly 100, and the protection air knife 8 is used for isolating external water vapor from entering the liquid medicine unit 210.

Specifically, referring to fig. 6, in the transmission direction Z of the display substrate 1, the substrate processing apparatus 1000 further includes a protection air knife 8 located at a side of the liquid medicine unit 210 away from the liquid air knife assembly 100, wherein the protection air knife 8 is used for isolating external water and oxygen from entering the liquid medicine unit 210, so as to prevent external air or water vapor from entering the liquid medicine unit 210 to deteriorate the liquid medicine unit 210, thereby ensuring the component reliability of the liquid medicine unit 210, and further ensuring the process reliability of the wet finished product of the display substrate 1 in the wet process. Further, the insulated gas knife may deliver inert gas, the specific class of which is not limited by the embodiments herein.

Alternatively, fig. 7 is a schematic structural diagram of another wet processing substrate processing apparatus 1000 according to an embodiment of the present invention; as shown in fig. 7, the substrate processing apparatus 1000 includes a chemical solution supply tank 4, a rinsing solution supply tank 3, and a gas storage tank 5, the chemical solution supply tank 4 is communicated with the chemical solution unit 210, the rinsing supply tank is communicated with the rinsing unit 220, and the gas storage tank 5 is communicated with the gas inlet 301 of the liquid-gas knife assembly 100.

Specifically, as shown in fig. 7, the substrate processing apparatus 1000 includes a chemical liquid supply tank 4 communicated with the chemical liquid unit 210, wherein the chemical liquid supply tank 4 is used for supplying a chemical liquid into a chemical liquid spraying apparatus inside the chemical liquid unit 210, so as to supply a wet chemical liquid required in a wet process; the substrate processing apparatus 1000 comprises a rinsing liquid supply tank 3 communicated with the rinsing unit 220, and a liquid medicine supply tank 4 for supplying rinsing liquid into a rinsing liquid spraying apparatus inside the rinsing unit 220 so as to supply rinsing liquid required for cleaning the substrate surface in a wet process; the substrate processing apparatus 1000 includes a gas storage tank 5 in communication with the liquid-gas knife assembly 100, wherein the gas storage tank 5 is used for providing high-pressure gas to enter the first liquid-gas knife cavity 202 and the second liquid-gas knife cavity 201 inside the liquid-gas knife assembly 100 through the gas inlet 301, so as to provide high-pressure cleaning gas required for isolating the liquid medicine unit 210 and the water washing unit 220.

According to the embodiment of the invention, the double-edge liquid air knife assembly is arranged in the wet process substrate treatment device, the air outlet directions of the first liquid air knife edge and the second liquid air knife edge in the double-edge liquid air knife are respectively inclined downwards towards the two opposite sides of the double-edge liquid air assembly in the transmission direction of the display substrate, so that two different surface adhesion media passing through the two sides of the position on the display substrate below the double-edge liquid air knife can be isolated, the separation purpose of two media (such as liquid medicine and water washing liquid) is effectively achieved, and the mutual pollution caused by poor isolation effect between the two different media, the increase of cost caused by incapability of recycling or the difficulty in sewage treatment are avoided. In addition, the double-edge liquid air knife component provided by the embodiment of the invention can reduce or cancel a water liquid replacement unit required to be arranged in the prior art, reduce the length of the whole wet process substrate processing device, reduce the cost and improve the product yield.

The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions, improvements, etc. within the spirit and principle of the present invention should be included in the scope of the present invention.

Claims

1. A wet processing substrate processing apparatus, comprising:

the bearing machine table is used for transporting the display substrate;

the liquid-air knife assembly is arranged above the bearing machine table and is used for expelling or isolating two different media attached to the display substrate;

the liquid-gas knife assembly comprises a double-knife-edge liquid-gas knife, and the double-knife-edge liquid-gas knife comprises a first liquid-gas knife edge and a second liquid-gas knife edge; the gas outlet direction of the first liquid-gas knife edge is reversely intersected with the transmission direction of the display substrate, and the gas outlet direction of the second liquid-gas knife edge is forwardly intersected with the transmission direction of the display substrate.

2. The wet processing substrate processing apparatus of claim 1, comprising:

the liquid medicine unit and the water washing unit are arranged along the transmission direction of the display substrate, and the liquid and air knife assembly is arranged in the critical area of the liquid medicine unit and the water washing unit;

the liquid-gas knife assembly comprises a first liquid-gas knife sub-portion and a second liquid-gas knife sub-portion which are integrally connected, the first liquid-gas knife sub-portion comprises the first liquid-gas knife edge, and the second liquid-gas knife sub-portion comprises the second liquid-gas knife edge;

3. The wet processing substrate processing apparatus of claim 2,

a gas flow passage between the first liquid gas knife section and the second liquid gas knife section; the gas flow channel comprises an exhaust buffer cavity, and the exhaust buffer cavity is used for exhausting reverse gas flow generated between the double-edge liquid air knife and the display substrate.

4. The wet processing substrate processing apparatus of claim 3,

the first hydro-pneumatic cutter sub-part comprises a first hydro-pneumatic cutter frame and a first hydro-pneumatic cutter cavity enclosed by the first hydro-pneumatic cutter frame, and the bottom end, close to the bearing machine table, of the first hydro-pneumatic cutter cavity comprises a first hydro-pneumatic cutter edge; the second liquid-air knife sub-portion comprises a second liquid-air knife frame and a second liquid-air knife cavity enclosed by the second liquid-air knife frame, and the bottom end, close to the bearing machine table, of the second liquid-air knife cavity comprises a second liquid-air knife edge;

the top ends of the first liquid-gas cutter cavity and the second liquid-gas cutter cavity are respectively communicated with a gas inlet pipe, and the first liquid-gas cutter cavity and the second liquid-gas cutter cavity are used for limiting the gas flow form of the internal gas.

5. The wet processing substrate processing apparatus of claim 1,

the liquid-gas knife assembly comprises a support rod, the support rod is movably connected with the double-edge liquid gas knife, and the support rod is used for fixing the relative position of the double-edge liquid gas knife and the bearing machine table.

6. The wet processing substrate processing apparatus of claim 1, wherein the carrier comprises a first roller set comprising a plurality of rollers, the first roller set forming a platform for carrying the display substrate.

7. The wet processing substrate processing apparatus of claim 6, comprising a residual liquid diversion device, wherein the residual liquid diversion device is located below the first roller set and is arranged corresponding to the liquid-gas knife assembly; the residual liquid flow dividing device comprises a first flow guide surface and a second flow guide surface which are intersected, the first flow guide surface inclines downwards to face one side of the liquid medicine unit, and the second flow guide surface inclines downwards to face one side of the water washing unit.

8. The wet processing substrate treatment apparatus according to claim 7, comprising a first drain pipe for discharging the residual washing solution on the side of the washing unit and a second drain pipe for discharging the residual washing solution on the side of the chemical solution unit.

9. The wet processing substrate processing apparatus of claim 2, comprising an air drying air knife, the air drying air knife being located at a side of the water washing unit away from the liquid air knife assembly along a transport direction of the display substrate, the air drying air knife being configured to dry the water-washed display substrate.

10. The wet processing substrate processing apparatus of claim 2, comprising a shielding air knife positioned on a side of the liquid chemical unit away from the liquid chemical knife assembly along a transport direction of the displayed substrate, the shielding air knife configured to isolate external moisture from entering the liquid chemical unit.

11. The wet processing substrate treatment apparatus according to claim 2, comprising a liquid medicine supply tank, a rinsing liquid supply tank, and a gas storage tank, wherein the liquid medicine supply tank is communicated with the liquid medicine unit, the rinsing liquid supply tank is communicated with the rinsing unit, and the gas storage tank is communicated with a gas inlet of the liquid-gas knife assembly.