KR101118068B1 - Apparatus for treating substrates and method of treating substrates - Google Patents

Abstract

The present invention provides an apparatus for processing a substrate in which the atmosphere in the chamber can be exhausted uniformly with respect to the width direction and the longitudinal direction of the chamber.

According to this invention, the apparatus main body 1 in which the chambers 5a-5c processed by the process liquid were formed, the conveyance roller 17 which conveys a board | substrate along the predetermined direction in a chamber, and the upper part of a board | substrate The main exhaust duct 6 disposed along the conveying direction of the substrate in the widthwise center portion of the chamber that intersects the conveying direction, and one end communicates with the main exhaust duct, and the other end is located at the widthwise end portion of the chamber to provide an atmosphere in the chamber. And a plurality of branch exhaust ducts 8 which are provided at a suction port 9 that sucks in and are provided symmetrically with respect to the width direction of the chamber with the main exhaust duct as the center.

Substrate, chamber, exhaust duct, treatment liquid, suction port, conveying roller, atmosphere

Description

Substrate processing apparatus and processing method {APPARATUS FOR TREATING SUBSTRATES AND METHOD OF TREATING SUBSTRATES}

1 is a side view of a processing apparatus showing an embodiment of the present invention.

2 is a longitudinal cross-sectional view along the width direction of the processing apparatus.

3 is a perspective view from above of a portion of the apparatus body;

4 is a perspective view from above of a portion of an apparatus body showing another embodiment of the invention.

5 is a longitudinal cross-sectional view along the width direction of the processing apparatus.

* Explanation of symbols in the drawings

1: device body, 2: bottom plate,

3: side plate 4: partition plate

5a-5c: first to third chambers, 6: main exhaust duct,

8: branch exhaust duct, 9: suction port,

10: suction duct, 11: ceiling,

12: opening, 14: cover member,

16: conveying shaft (conveying mechanism) 17: conveying roller (conveying mechanism)

The present invention relates to a processing apparatus and a processing method for processing a substrate conveyed in a chamber formed in the apparatus main body with a processing liquid.

For example, in the manufacturing process of a liquid crystal display device or a semiconductor device, the glass substrate for a liquid crystal or a semiconductor wafer as a board | substrate is etched, the board | substrate which performed the peeling process of the resist used as a mask after the etching, or the etching or peeling process was performed. There is a process of washing. In such a substrate processing process, the sheet system which processes, conveying a board | substrate one by one is employ | adopted.

When processing a board | substrate by the sheet system, the processing apparatus which sprays a process liquid from a shower nozzle on the upper surface, the lower surface, or the upper surface, conveying a board | substrate is known. This processing apparatus has an apparatus main body, in which a plurality of chambers are formed. In a chamber, the conveyance shaft which comprises a conveyance mechanism along the conveyance direction of the said board | substrate is provided rotatably. The conveyance shaft is provided with a plurality of conveying rollers at predetermined intervals in the axial direction. And the said conveyance shaft is rotated to drive the said board | substrate with a conveyance roller.

When the substrate is processed by the processing liquid in the chamber, the processing liquid injected onto the substrate becomes a mist type and floats in the chamber. The mist-type processing liquid floating in the chamber adheres to the substrate after the treatment, causing contamination of the substrate. In particular, when the mist-type processing liquid adheres to the cleaned substrate, deterioration of quality and generation of defective products may occur, which is not preferable.

Conventionally, in the processing apparatus which conveys a board | substrate in a chamber, and injects a process liquid and processes it, the exhaust duct is connected to a chamber, and the atmosphere containing the mist-type process liquid which arises in a chamber is made to exhaust.

The conveying apparatus is an operator part in which one side of the width direction which crosses the conveyance direction of the board | substrate of the apparatus main body is an operator part arrange | positioned, and the other side is a maintenance inspection part in which the drive source of a conveyance mechanism etc. are arrange | positioned, The said exhaust duct was connected to the one side surface of the width direction used as the maintenance inspection part side.

When the exhaust duct is connected to one side in the width direction of the chamber, the atmosphere in the chamber flows out from the other side in the width direction toward one side. However, when the atmosphere in the chamber is exhausted by an exhaust duct connected to one side surface in the width direction, the atmosphere in one side portion in the width direction in the chamber is more likely to be exhausted than the atmosphere in the other side portion. In other words, the atmosphere of the other side part in the width direction of the chamber becomes difficult to be exhausted.

Therefore, since the atmosphere in the chamber becomes difficult to be uniformly exhausted throughout the width direction, as a result, a mist-type processing liquid stays in the chamber, which may adhere to the substrate and cause contamination.

The present invention provides a substrate processing apparatus and a processing method for uniformly evacuating one side portion and the other side portion in the width direction of the chamber.

In the processing apparatus which processes a board | substrate with a processing liquid,

An apparatus body having a chamber for processing the substrate with a processing liquid,

A conveying mechanism for conveying the substrate along a predetermined direction in the chamber;

A main exhaust duct disposed in an upper portion of the substrate along a conveying direction of the substrate in a widthwise center portion of the chamber that intersects the conveying direction of the substrate, and

One end is in communication with the main exhaust duct and the other end is located at the widthwise end of the chamber and is installed at a suction port that sucks the atmosphere in the chamber, and is installed symmetrically with respect to the width direction of the chamber with respect to the main exhaust duct. Multiple branch exhaust duct

It is a substrate processing apparatus characterized by the above-mentioned.

In the processing apparatus which processes a board | substrate with a processing liquid,

An apparatus body having a chamber for processing the substrate with a processing liquid, and

A conveying mechanism for conveying the substrate along a predetermined direction in the chamber;

The device body,

Bottom Plate,

Side plates upright on both sides in the width direction intersecting the conveying direction of the substrate of the bottom plate;

A partition plate installed between a pair of side plates to partition the chamber between these side plates,

A main exhaust duct provided along the conveying direction of the substrate in a widthwise central portion of an upper end of the partition plate; and

A plurality of branch exhausts, one end of which is in communication with the main exhaust duct and the other end of which is located at both ends in the width direction of the chamber and is sucked into the atmosphere inside the chamber, are installed symmetrically with respect to the conveyance direction and the width direction of the substrate of the chamber. duct

It is a substrate processing apparatus characterized by the above-mentioned.

The present invention provides a processing method of treating a substrate with a processing liquid in a chamber formed in the processing apparatus.

Conveying the substrate along a predetermined direction in the chamber, and

Venting the atmosphere in the chamber symmetrically from a width direction that intersects the conveying direction of the substrate of the chamber

It is a substrate processing method comprising a.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

1 to 3 show a first embodiment of the present invention. 1 is a side view showing a processing apparatus, FIG. 2 is a longitudinal sectional view, FIG. 3 is a perspective view, and the processing apparatus includes the apparatus main body 1. As shown in Figs. 2 and 3, the apparatus main body 1 has a bottom plate 2 bent in an inverted shape, and side plates 3 are erected at both ends in the width direction of the bottom plate 2.

Between the pair of side plates 3, a plurality of partition plates 4 are hypothesized at predetermined intervals in the longitudinal direction, and the plurality of chambers are partitioned on the apparatus main body 1 by these partition plates 4. Forming. In this embodiment, as shown in Fig. 1, the first to third three chambers 5a to 5c are partitioned.

The upper end of each partition board 4 has a mountain shape, and the rectangular cylindrical main exhaust duct 6 is provided in the width direction center part over the longitudinal direction full length of the apparatus main body 1. As shown in FIG. As shown in FIG. 2, the communication opening 7 is formed in both sides of the main exhaust duct 6 at positions corresponding to both end portions in the longitudinal direction of the respective chambers 5a to 5c.

One end of a branched cylindrical exhaust duct 8 having a smaller cross-sectional area than the main exhaust duct 6 is connected to each communication port 7. A suction port 9 is formed at the other end of each branch exhaust duct 8. Each suction port 9 is conveyed to the position which is close to the inner surface of the side plate 3 at the width direction both ends of each chamber 5a-5c, as will mention later inside each chamber 5a-5c later. Located on top of the substrate W

That is, in the ceiling 11 of each chamber 5a-5c, four branch exhaust ducts 8 are symmetrical with respect to the width direction of each chamber 5a-5c centering on the main exhaust duct 6, Moreover, it is connected to the said main exhaust duct 6 so that it may become symmetric about the longitudinal direction which cross | intersects the width direction of each chamber 5a-5c.

The connection hole 10a is formed in the upper surface of the longitudinal center part of the part corresponding to each chamber 5a-5c of the main exhaust duct 6, respectively. The suction duct 10 is connected to each connection hole 10a. Each suction duct 10 is connected to the suction pump which is not shown in figure, respectively, or one is connected. Accordingly, the suction force of the suction pump is adapted to act on the respective chambers 5a to 5c via the main exhaust duct 6 and the plurality of branched exhaust ducts 8.

In the ceiling 11 of each chamber 5a-5c, a pair of opening part 12 enclosed by the upper end part of the main exhaust duct 6, a pair of branched exhaust duct 8, and the side plate 3 is formed, have. Flange 13 is provided on both sides of the main exhaust duct 6 forming the opening 12, on the inner side of the opening 12 of the pair of branched exhaust ducts 8 and on the upper inner surface of the side plate 3, respectively. Formed. As shown in FIG. 2, the cover member 14 is attached to these flanges 13 so that attachment and detachment are possible by combining the lower surface of the periphery in an airtight manner.

That is, each pair of opening part 12 formed in the ceiling part 11 of each chamber 5a-5c is sealed by the cover member 14 in airtight manner. The cover member 14 is made of a transparent material such as glass, and the inside of the chambers 5a to 5c can be visually recognized through the cover member 14.

In each chamber 5a-5c, the some conveyance shaft 16 (only one is shown in FIG. 2) is provided so that rotation is possible at predetermined intervals along the longitudinal direction. Each conveyance shaft 16 is provided with a some conveyance roller 17 at predetermined intervals in the axial direction. On the upper part of the predetermined conveyance shaft 16, the pressing shaft 18 is rotatably provided. At both ends of the press shaft 18, a press roller 19 is provided to face the convey roller 17 located at both ends of the convey shaft 16.

Both ends of the conveyance shaft 16 protrude outward from the pair of side plates 3, and one end thereof is rotatably driven by the drive source 22 via the transmission shaft 21. That is, the chain 25 is provided in the drive sprocket 23 which is rotationally driven by the drive source 22, and the driven pulley 24 provided in the said transmission shaft 21. As shown in FIG.

Gears (not shown in detail) that mesh with each other are provided on the transmission shaft 21 and the conveyance shaft 16. Accordingly, when the drive source 22 is operated, the conveyance shaft 16 is driven to rotate through the transmission shaft 21. And rotation of the conveyance shaft 16 is transmitted to the pressurization shaft 18, and it is made to drive rotation to the opposite direction to the conveyance shaft 16. As shown in FIG.

In the partition plate 4 which forms each chamber 5a-5c, the width direction of the chambers 5a-5c is substantially the same height as the upper end of the said conveying roller 17, as shown in FIG.2 and FIG.3. A slit 27 having a length covering approximately the entire length is formed.

The substrate W is supplied from the slit 27 formed in the partition plate 4 to the first chamber 5a located at one end in the longitudinal direction of the apparatus main body 1. Thereby, the board | substrate W is conveyed inside this chamber 5a toward the next 2nd chamber 5b by the conveyance roller 17 in the 1st chamber 5a. And the board | substrate W is carried out from the 2nd chamber 5b through the 3rd chamber 5c. And the board | substrate W is conveyed, as the upper surface of the width direction both ends is pressed by the pressure roller 19. As shown in FIG.

In each chamber 5a-5c, the nozzle pipe 29 provided with the some nozzle 28 which injects the process liquid on the upper surface of the board | substrate W conveyed by the conveyance roller 17 at predetermined intervals is the chamber 5a. It is provided along the width direction of-5c). The processing liquid is supplied to the upper surface of the substrate W conveyed by the conveying roller 17 from the nozzle 28 of each nozzle pipe 29.

In this embodiment, the etching liquid is supplied as the processing liquid in the first chamber 5a and the second chamber 5b, and the cleaning liquid is supplied as the processing liquid in the third chamber 5c.

The drainage pipe 31 is connected to the lowest position of the bottom plate 2 of each chamber 5a-5c. The processing liquid supplied from the nozzle 28 to the upper surface of the substrate W is recovered by the drain pipe 31, returned to the tank 32, and is supplied from the tank 32 to the nozzle pipe 29. . The tank 32 is to be replenished little by little fresh treatment liquid.

And in the absence of the 1st-3rd chambers 5a-5c, the nozzle pipe 29 opposing the lower surface side of the board | substrate W so that a process liquid may be supplied not only to the upper surface of the board | substrate W to be conveyed, but also to a lower surface. ) May be installed.

Next, the operation | movement in the case of processing the board | substrate W with a process liquid with the processing apparatus of the said structure is demonstrated.

The substrate W supplied to the first chamber 5a is sequentially transferred from the first chamber 5a to the third chamber 5c via the second chamber 5b by the transfer roller 17. In the 1st chamber 5a and the 2nd chamber 5b, etching liquid is supplied to the upper surface of the board | substrate W, and predetermined etching process is performed to the upper surface of this board | substrate W. As shown in FIG. In the third chamber 5c, the cleaning liquid is supplied to the upper surface of the substrate W, and the etched substrate W is cleaned.

In each of the chambers 5a to 5c, the suction force of the suction pump acting on the suction duct 10 is applied to the branch exhaust duct 8 through the main exhaust duct 6. Therefore, the atmosphere in each chamber 5a-5c is discharged | emitted through the suction port 9 of each branch exhaust duct 8, as shown by the arrow in FIG.

Therefore, by treating the substrate W with the processing liquid in each of the chambers 5a to 5c, even if a mist-type processing liquid is generated in the chambers 5a to 5c, the mist-type processing liquid is stored in the chambers 5a to 5c. At the same time, the atmosphere is discharged.

The main exhaust duct 6 is provided in the width direction center part of the ceiling part 11 of each chamber 5a-5c over the longitudinal direction full length of the apparatus main body 1 which is a conveyance direction of the board | substrate W. As shown in FIG. In the part corresponding to each chamber 5a-5c of the main exhaust duct 6, four branch exhaust ducts 8 board | substrate W which crosses the width direction of the chambers 5a-5c, and this width direction. It is provided symmetrically with respect to the longitudinal direction of the apparatus main body 1 which is a conveyance direction of (circle).

That is, in each of the chambers 5a to 5c, four suction ports 9 of the four branched exhaust ducts 8 are located at both ends of the width direction in the longitudinal direction. Moreover, the suction duct 10 is connected to the upper surface of the center part of the longitudinal direction of the part located corresponding to each chamber 5a-5c of the main exhaust duct 6. As shown in FIG.

Therefore, the suction force which acts on each chamber 5a-5c through the suction port 9 of the suction duct 10, the main exhaust duct 6, and the four branch exhaust ducts 8 is this chamber 5a-5c. Symmetry with respect to each center in the width direction and the longitudinal direction crossing the width direction.

Therefore, since the atmosphere in each chamber 5a-5c is discharged | emitted substantially uniformly with respect to the width direction and the longitudinal direction, the mist-type process liquid stays in the chambers 5a-5c, and adheres to the board | substrate W. FIG. Can be prevented. Especially in the 3rd chamber 5c, since the board | substrate W is wash-processed with a washing | cleaning liquid, it can prevent that the mist-type processing liquid containing dust adheres to the washing | cleaning process board | substrate, and becomes contaminated.

The main exhaust duct 6 and the branch exhaust duct 8 not only exhaust the atmosphere of each of the chambers 5a to 5c but also serve as members constituting the ceiling 11 of the respective chambers 5a to 5c. have. Therefore, since no duct is provided in the ceiling 11 of each of the chambers 5a to 5c except for the member constituting the ceiling 11, the configuration of the apparatus main body 1 can be simplified, and the size and cost can be reduced. Could. In addition, since the exhaust ducts 6 and 8 are rigid, highly angled cylinders, sufficient rigidity can be provided without providing a reinforcing member in the ceiling 11.

In the above embodiment, the case where three chambers are formed in the apparatus main body has been described, but the number of chambers formed in the apparatus main body is not limited, and the present invention can be applied if at least one chamber is formed. .

In addition, although the case where an etching process was performed in two chambers among three chambers was demonstrated, the case where a board | substrate is wash | cleaned in each of three chambers may be sufficient, and what kind of process is performed in each chamber is not limited.

Four branch exhaust ducts were arranged in each chamber, but the number is not limited, and the point is that the atmosphere in each chamber should be provided so as to be able to exhaust the atmosphere uniformly in the width direction and the longitudinal direction. Even more than that does not interfere.

4 and 5 show another embodiment of the present invention. In this embodiment, one end of the first branch exhaust duct 8A and the second branch exhaust duct 8B is connected to both side surfaces of a portion corresponding to both ends of the respective chambers 5a to 5c of the main exhaust duct 6. It is. That is, four first branch exhaust ducts 8A and second branch exhaust ducts 8B are respectively provided in the chambers 5a to 5c.

The first suction port 9A is formed at the other end of the first branch exhaust duct 8A. That is, 9 A of 1st suction openings are located in the upper part of the board | substrate W conveyed in chamber 5a-5c. The 2nd branch exhaust duct 8B is installed in parallel with the said 1st branch exhaust duct 8A, and the 1st duct part 81 with one end connected to the said main exhaust duct 6, and this 1 duct part ( An upper end is connected to the other end of the 81 and consists of a second duct part 82 installed vertically.

The lower end of the said vertical duct part 82 is located below the board | substrate W conveyed by the conveyance roller 17, The lower end side surface and the lower end surface toward the width direction inner side of each chamber 5a-5c are carried out. The second suction port 9B that is opened over is formed.

According to such a structure, when a suction force is produced in the main exhaust duct 6, the suction force is sucked in each branch exhaust duct 8A, 8B via the 1st branch exhaust duct 8A and the 2nd branch exhaust duct 8B. Acts on the population (9A, 9B).

Atmosphere of the upper part of the board | substrate W in each chamber 5a-5c is sucked out by the suction force which generate | occur | produces in the said 1st suction port 9A. The atmosphere of the lower part of the board | substrate W in each chamber 5a-5c is suction-discharged by the suction force which arises in the said 2nd suction port 9B. That is, even if the atmosphere in the chambers 5a to 5c is divided up and down on the basis of the substrate W, the atmosphere of the upper portion of the substrate W in the chambers 5a to 5c is attracted to the first suction port 9A. Is discharged by the suction force generated in the second suction port 9B.

Therefore, even if the atmosphere in each chamber 5a-5c is divided up and down by the board | substrate W, from the 1st suction port 9A and the 2nd suction port 9b, the whole inside of the chambers 5a-5c is carried out. The atmosphere is smoothly discharged, and it is possible to prevent the mist generated in each of the chambers 5a to 5c from adhering to the upper and lower surfaces of the substrate W.

In this embodiment, the first branch exhaust duct and the second branch exhaust duct are connected to the main exhaust duct, but the same configuration as the second branch exhaust duct is not connected to the main exhaust duct. That is, one branch exhaust duct comprising one first duct part connected at one end to the main exhaust duct and a second duct part vertically connected to the other end of the first duct part by the other end disposed at the lower part of the substrate can be connected. have. The first suction port located above the substrate and the second suction port located below the opening may be formed in the upper end and the lower end of the second duct portion, respectively.

In that case, since the suction force acting on the first suction port located at the upper end of the second duct portion is larger than the suction force acting on the suction port located at the lower end, the size of each suction port is changed or the degree of opening by the damper is increased. The suction force which acts on the atmosphere of the upper part and the lower part of the board | substrate which generate | occur | produce in each suction port can be adjusted by adjusting etc.

According to the present invention, since the main exhaust duct is provided in the width direction center part of the chamber, and a plurality of branch exhaust ducts are provided symmetrically with respect to the width direction of the chamber centering on the main exhaust duct, the branch exhaust duct and the main exhaust The exhaust in the chamber can be uniformly performed in the width direction through the duct.

Claims (9)

In the processing apparatus which processes a board | substrate with a process liquid, An apparatus body having a chamber including a ceiling for processing the substrate with a processing liquid, A conveying mechanism for conveying the substrate along a predetermined direction in the chamber; A main exhaust duct disposed in the ceiling of the upper portion of the substrate along a conveying direction of the substrate in a widthwise center portion of the chamber that intersects the conveying direction of the substrate, and One end is in communication with the main exhaust duct and the other end is located at the widthwise end of the chamber and is installed at a suction port that sucks the atmosphere in the chamber, and is installed symmetrically with respect to the width direction of the chamber with respect to the main exhaust duct. Multiple branch exhaust duct The substrate processing apparatus characterized by the above-mentioned. The method of claim 1, The said branch exhaust duct is symmetrical with respect to the width direction of the said chamber, and is provided symmetrically with respect to the conveyance direction of the said board | substrate, The substrate processing apparatus characterized by the above-mentioned. The method according to claim 1 or 2, The said branch exhaust duct is provided with the 1st suction opening located in the upper part of the said board | substrate conveyed by the said conveyance mechanism, and the 2nd suction opening located in the lower part of the said board | substrate. The method of claim 3, The branch exhaust duct comprises a first branch exhaust duct having the first suction port and a second branch exhaust duct having the second suction port. 3. The method of claim 2, In the apparatus main body, a plurality of chambers are partitioned at predetermined intervals with respect to the conveyance direction of the substrate, and the main exhaust duct is provided over the entire length of the plurality of chambers, corresponding to each chamber of the main exhaust duct. The suction duct is connected to the center part of the conveyance direction of the said board | substrate of a part, The substrate processing apparatus characterized by the above-mentioned. In the processing apparatus which processes a board | substrate with a process liquid, An apparatus body having a chamber for processing the substrate with a processing liquid, and A conveying mechanism for conveying the substrate along a predetermined direction in the chamber; The device body, Bottom Plate, Side plates upright on both sides in the width direction intersecting the conveying direction of the substrate of the bottom plate; A partition plate provided between a pair of side plates to partition the chamber including a ceiling between these side plates, A main exhaust duct provided along the conveying direction of the substrate in the ceiling portion of the width direction central portion of the upper end of the partition plate; and A plurality of branch exhausts, one end of which is in communication with the main exhaust duct and the other end of which is located at both ends in the width direction of the chamber and is sucked into the atmosphere inside the chamber, are installed symmetrically with respect to the conveyance direction and the width direction of the substrate of the chamber. duct The substrate processing apparatus characterized by the above-mentioned. The method of claim 6, A pair of branch exhaust ducts are provided at both ends along the conveyance direction of the substrate of the chamber, and the ceiling of the chamber is provided with a pair of openings surrounded by the main exhaust duct, a pair of branch exhaust ducts, and an upper end of the side plate. And a ceiling portion in which each opening portion is sealed by a cover member. In the processing method which processes a board | substrate with a processing liquid in the chamber formed in the processing apparatus, Conveying the substrate along a predetermined direction in the chamber, and Venting the atmosphere in the chamber symmetrically from a width direction that intersects the conveying direction of the substrate of the chamber Processing method of a substrate comprising a. The method of claim 8, And exhausting the atmosphere in the chamber symmetrically from the width direction intersecting with the conveyance direction of the substrate of the chamber and symmetrically evacuating from the direction along the conveyance direction of the substrate. Way.

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