CN115176201A - 正型感光性树脂组合物 - Google Patents

正型感光性树脂组合物 Download PDF

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Publication number
CN115176201A
CN115176201A CN202180016628.9A CN202180016628A CN115176201A CN 115176201 A CN115176201 A CN 115176201A CN 202180016628 A CN202180016628 A CN 202180016628A CN 115176201 A CN115176201 A CN 115176201A
Authority
CN
China
Prior art keywords
positive photosensitive
photosensitive resin
resin composition
crosslinking agent
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
CN202180016628.9A
Other languages
English (en)
Chinese (zh)
Inventor
川岛正行
高桥秀幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of CN115176201A publication Critical patent/CN115176201A/zh
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
CN202180016628.9A 2020-03-04 2021-03-01 正型感光性树脂组合物 Withdrawn CN115176201A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020037173 2020-03-04
JP2020-037173 2020-03-04
PCT/JP2021/007785 WO2021177253A1 (ja) 2020-03-04 2021-03-01 ポジ型感光性樹脂組成物

Publications (1)

Publication Number Publication Date
CN115176201A true CN115176201A (zh) 2022-10-11

Family

ID=77614271

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180016628.9A Withdrawn CN115176201A (zh) 2020-03-04 2021-03-01 正型感光性树脂组合物

Country Status (5)

Country Link
JP (1) JPWO2021177253A1 (ja)
KR (1) KR20220149673A (ja)
CN (1) CN115176201A (ja)
TW (1) TW202141188A (ja)
WO (1) WO2021177253A1 (ja)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5310051B2 (ja) 2009-02-12 2013-10-09 Ｊｓｒ株式会社 感放射線性組成物、マイクロレンズおよびその形成方法
WO2013161862A1 (ja) * 2012-04-27 2013-10-31 富士フイルム株式会社 化学増幅型ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
CN106662815B (zh) * 2014-07-18 2020-06-16 Ａｇｃ株式会社 负型感光性树脂组合物、树脂固化膜、隔壁和光学元件
JP6506184B2 (ja) * 2016-01-21 2019-04-24 富士フイルム株式会社 感光性樹脂組成物、硬化物の製造方法、硬化膜、表示装置、及び、タッチパネル
JP7075243B2 (ja) * 2018-02-28 2022-05-25 太陽ホールディングス株式会社 感光性樹脂組成物、ドライフィルム、硬化物、および電子部品

Also Published As

Publication number Publication date
TW202141188A (zh) 2021-11-01
KR20220149673A (ko) 2022-11-08
JPWO2021177253A1 (ja) 2021-09-10
WO2021177253A1 (ja) 2021-09-10

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Application publication date: 20221011