CN114935878A - 信息处理装置、信息处理方法、物品制造系统和方法 - Google Patents
信息处理装置、信息处理方法、物品制造系统和方法 Download PDFInfo
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- CN114935878A CN114935878A CN202210099504.8A CN202210099504A CN114935878A CN 114935878 A CN114935878 A CN 114935878A CN 202210099504 A CN202210099504 A CN 202210099504A CN 114935878 A CN114935878 A CN 114935878A
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- Prior art keywords
- processing apparatus
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- information processing
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Classifications
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B23/00—Testing or monitoring of control systems or parts thereof
- G05B23/02—Electric testing or monitoring
- G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
- G05B23/0259—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the response to fault detection
- G05B23/0267—Fault communication, e.g. human machine interface [HMI]
- G05B23/0272—Presentation of monitored results, e.g. selection of status reports to be displayed; Filtering information to the user
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G5/00—Control arrangements or circuits for visual indicators common to cathode-ray tube indicators and other visual indicators
- G09G5/14—Display of multiple viewports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B23/00—Testing or monitoring of control systems or parts thereof
- G05B23/02—Electric testing or monitoring
- G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
- G05B23/0208—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the configuration of the monitoring system
- G05B23/0216—Human interface functionality, e.g. monitoring system providing help to the user in the selection of tests or in its configuration
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B23/00—Testing or monitoring of control systems or parts thereof
- G05B23/02—Electric testing or monitoring
- G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
- G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
- G05B23/0221—Preprocessing measurements, e.g. data collection rate adjustment; Standardization of measurements; Time series or signal analysis, e.g. frequency analysis or wavelets; Trustworthiness of measurements; Indexes therefor; Measurements using easily measured parameters to estimate parameters difficult to measure; Virtual sensor creation; De-noising; Sensor fusion; Unconventional preprocessing inherently present in specific fault detection methods like PCA-based methods
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/048—Interaction techniques based on graphical user interfaces [GUI]
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/048—Interaction techniques based on graphical user interfaces [GUI]
- G06F3/0481—Interaction techniques based on graphical user interfaces [GUI] based on specific properties of the displayed interaction object or a metaphor-based environment, e.g. interaction with desktop elements like windows or icons, or assisted by a cursor's changing behaviour or appearance
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/14—Digital output to display device ; Cooperation and interconnection of the display device with other functional units
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G5/00—Control arrangements or circuits for visual indicators common to cathode-ray tube indicators and other visual indicators
- G09G5/003—Details of a display terminal, the details relating to the control arrangement of the display terminal and to the interfaces thereto
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Program-control systems
- G05B19/02—Program-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form
- G05B19/409—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form characterised by using manual data input [MDI] or by using control panel, e.g. controlling functions with the panel; characterised by control panel details or by setting parameters
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/26—Pc applications
- G05B2219/2602—Wafer processing
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32128—Gui graphical user interface
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/36—Nc in input of data, input key till input tape
- G05B2219/36072—Select pattern, input modification of tolerance
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- General Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- General Factory Administration (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021016442A JP7665347B2 (ja) | 2021-02-04 | 2021-02-04 | 情報処理装置、及び情報処理方法 |
| JP2021-016442 | 2021-02-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114935878A true CN114935878A (zh) | 2022-08-23 |
Family
ID=82611400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210099504.8A Withdrawn CN114935878A (zh) | 2021-02-04 | 2022-01-27 | 信息处理装置、信息处理方法、物品制造系统和方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12298737B2 (https=) |
| JP (1) | JP7665347B2 (https=) |
| KR (1) | KR20220112673A (https=) |
| CN (1) | CN114935878A (https=) |
| TW (1) | TW202232256A (https=) |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2796482B1 (fr) * | 1999-07-16 | 2002-09-06 | Touchtunes Music Corp | Systeme de gestion a distance d'au moins un dispositif de reproduction d'informations audiovisuelles |
| JP3982428B2 (ja) * | 2002-09-04 | 2007-09-26 | 株式会社日立製作所 | 欠陥情報解析方法およびその装置 |
| JP2005093922A (ja) * | 2003-09-19 | 2005-04-07 | Dainippon Screen Mfg Co Ltd | 基板処理システム |
| TWI401580B (zh) * | 2004-11-30 | 2013-07-11 | 尼康股份有限公司 | A component processing system, an information display method, and a recorded recording medium, an exposure apparatus, a measurement and inspection apparatus |
| JP4697877B2 (ja) | 2006-04-28 | 2011-06-08 | 東京エレクトロン株式会社 | プロセス情報管理装置、およびプログラム |
| JP5461778B2 (ja) | 2007-04-02 | 2014-04-02 | 株式会社日立国際電気 | 基板処理システム、群管理システム、構成管理プログラム、接続管理プログラム、端末プログラム及び各ハードウェアの接続管理方法 |
| JP2009170612A (ja) | 2008-01-15 | 2009-07-30 | Canon Inc | 情報処理装置、情報処理方法、処理システムおよびコンピュータプログラム |
| JP2011129580A (ja) * | 2009-12-15 | 2011-06-30 | Toshiba Corp | 異常装置検出システムおよび異常装置検出プログラム |
| JP5144816B2 (ja) | 2011-03-02 | 2013-02-13 | 三菱電機株式会社 | プログラマブル表示器、及び作画データの作成方法 |
| EP2755096A4 (en) | 2011-09-05 | 2014-12-31 | Kobayashi Manufacture Co Ltd | WORK MANAGEMENT SYSTEM, WORK MANAGEMENT TERMINAL, WORK MANAGEMENT PROGRAM AND METHOD |
| US9519393B2 (en) * | 2011-09-30 | 2016-12-13 | Siemens Schweiz Ag | Management system user interface for comparative trend view |
| JP5673577B2 (ja) * | 2012-02-07 | 2015-02-18 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
| JP6222810B2 (ja) * | 2012-07-17 | 2017-11-01 | 株式会社日立国際電気 | 管理装置、基板処理装置、基板処理システム、基板処理装置のファイル管理方法及びファイル転送方法 |
| US10290088B2 (en) * | 2014-02-14 | 2019-05-14 | Kla-Tencor Corporation | Wafer and lot based hierarchical method combining customized metrics with a global classification methodology to monitor process tool condition at extremely high throughput |
| JP6645993B2 (ja) | 2016-03-29 | 2020-02-14 | 株式会社Kokusai Electric | 処理装置、装置管理コントローラ、及びプログラム並びに半導体装置の製造方法 |
| EP3291008A1 (en) | 2016-09-06 | 2018-03-07 | ASML Netherlands B.V. | Method and apparatus to monitor a process apparatus |
| WO2018138925A1 (ja) * | 2017-01-30 | 2018-08-02 | 三菱電機株式会社 | データ処理装置およびデータ処理方法 |
| JP6894318B2 (ja) | 2017-08-04 | 2021-06-30 | 株式会社荏原製作所 | 画面制御プログラムおよび半導体製造装置 |
| CN111684076A (zh) * | 2018-01-25 | 2020-09-18 | 帝斯曼知识产权资产管理有限公司 | 纤维蛋白原测试 |
| JP6808684B2 (ja) * | 2018-06-14 | 2021-01-06 | キヤノン株式会社 | 情報処理装置、判定方法、プログラム、リソグラフィシステム、および物品の製造方法 |
| JP7326856B2 (ja) | 2019-05-10 | 2023-08-16 | 京セラドキュメントソリューションズ株式会社 | 情報処理装置 |
| US11004710B2 (en) * | 2019-06-04 | 2021-05-11 | Applied Materials, Inc. | Wafer placement error detection based on measuring a current through an electrostatic chuck and solution for intervention |
| JP7570822B2 (ja) * | 2020-04-28 | 2024-10-22 | キヤノン株式会社 | 情報処理装置、及び情報処理方法 |
| JP7451287B2 (ja) * | 2020-04-30 | 2024-03-18 | 東レエンジニアリング先端半導体Miテクノロジー株式会社 | パターン欠陥検出方法 |
-
2021
- 2021-02-04 JP JP2021016442A patent/JP7665347B2/ja active Active
-
2022
- 2022-01-06 TW TW111100503A patent/TW202232256A/zh unknown
- 2022-01-19 KR KR1020220007582A patent/KR20220112673A/ko not_active Abandoned
- 2022-01-27 CN CN202210099504.8A patent/CN114935878A/zh not_active Withdrawn
- 2022-01-31 US US17/589,485 patent/US12298737B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US12298737B2 (en) | 2025-05-13 |
| JP7665347B2 (ja) | 2025-04-21 |
| JP2022119370A (ja) | 2022-08-17 |
| TW202232256A (zh) | 2022-08-16 |
| KR20220112673A (ko) | 2022-08-11 |
| US20220244700A1 (en) | 2022-08-04 |
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Legal Events
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20220823 |