JP7451287B2 - パターン欠陥検出方法 - Google Patents
パターン欠陥検出方法 Download PDFInfo
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- H01L22/10—Measuring as part of the manufacturing process
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- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Description
一態様では、前記統計量は、最大値、最小値、中央値、平均値、標準偏差値、またはそれらの組み合わせである。
図1は、画像生成装置の一実施形態を示す模式図である。図1に示すように、画像生成装置は、走査電子顕微鏡50および演算システム150を備えている。走査電子顕微鏡50は、演算システム150に接続されており、走査電子顕微鏡50の動作は演算システム150によって制御される。
第1グループ:第1配線CADパターン301、第2配線CADパターン302、およびビアCADパターン303が重なる領域
第2グループ:第1配線CADパターン301の上方に第2配線CADパターン302があり、かつビアCADパターン303がない領域
第3グループ:第1配線CADパターン301が存在し、第2配線CADパターン302およびビアCADパターン303がない領域
第4グループ:第2配線CADパターン302が存在し、第1配線CADパターン301およびビアCADパターン303がない領域
第5グループ:第1配線CADパターン301、第2配線CADパターン302、およびビアCADパターン303がない領域
ステップ1では、演算システム150は、走査電子顕微鏡50に指令を発して、複数のレイヤーに形成された複数のパターンを含む積層構造400の反射電子画像を生成させる。反射電子画像は、走査電子顕微鏡50から演算システム150に送られる。
ステップ2では、演算システム150は、積層構造400を構成するパターンの設計データから作成されたCADパターンを含む仮想積層構造300の複数の領域を、仮想積層構造300の深さ方向におけるCADパターン配列に従って複数のグループに分類する。グループの数は、仮想積層構造300の全体におけるCADパターンの配列によって変わりうる。
ステップ4では、演算システム150は、各グループに属する領域に対応する反射電子画像上の領域の輝度指標値を算定する。
ステップ5では、演算システム150は、輝度指標値が標準範囲外にあるときに、反射電子画像上の上記領域内にパターン欠陥があることを決定する。標準範囲は、グループごとに設定される。
111 電子銃
112 集束レンズ
113 X偏向器
114 Y偏向器
115 対物レンズ
116 レンズ制御装置
117 偏向制御装置
118 画像取得装置
120 試料チャンバー
121 試料ステージ
122 ステージ制御装置
124 ウェーハ
131 反射電子検出器
140 搬送装置
150 演算システム
161 データベース
162 記憶装置
163 処理装置
165 表示画面
200 積層構造
201 第1配線パターン
202 第2配線パターン
203 ビアパターン
205 絶縁層
300 仮想積層構造
301 第1配線CADパターン
302 第2配線CADパターン
303 ビアCADパターン
400 積層構造
401 第1配線パターン
402 第2配線パターン
403 ビアパターン
405 絶縁層
Claims (3)
- 複数のレイヤーに形成された複数のパターンを含む積層構造の反射電子画像を走査電子顕微鏡で生成し、
前記複数のパターンの設計データから作成されたCADパターンを含む仮想積層構造の複数の領域を、前記仮想積層構造の深さ方向におけるCADパターンの重なり方に従って複数のグループに分類し、
前記反射電子画像上の前記複数のパターンのうちの少なくとも1つと、対応するCADパターンとのマッチングを行い、
各グループに属する領域に対応する前記反射電子画像上の領域の輝度指標値を算定し、
前記輝度指標値が標準範囲外にあるときに、前記反射電子画像上の前記領域内にパターン欠陥があることを決定する、パターン欠陥検出方法。 - 前記輝度指標値は、前記反射電子画像上の前記領域内の画素の輝度の統計量で表される、請求項1に記載のパターン欠陥検出方法。
- 前記統計量は、最大値、最小値、中央値、平均値、標準偏差値、またはそれらの組み合わせである、請求項2に記載のパターン欠陥検出方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
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JP2020080497A JP7451287B2 (ja) | 2020-04-30 | 2020-04-30 | パターン欠陥検出方法 |
CN202180031114.0A CN115516613A (zh) | 2020-04-30 | 2021-04-21 | 图案缺陷检测方法 |
KR1020227041637A KR20230004811A (ko) | 2020-04-30 | 2021-04-21 | 패턴 결함 검출 방법 |
PCT/JP2021/016160 WO2021220906A1 (ja) | 2020-04-30 | 2021-04-21 | パターン欠陥検出方法 |
US17/921,331 US20230177673A1 (en) | 2020-04-30 | 2021-04-21 | Pattern defect detection method |
TW110114928A TW202205469A (zh) | 2020-04-30 | 2021-04-26 | 圖案缺陷檢測方法 |
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JP2020080497A JP7451287B2 (ja) | 2020-04-30 | 2020-04-30 | パターン欠陥検出方法 |
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JP2021174969A JP2021174969A (ja) | 2021-11-01 |
JP7451287B2 true JP7451287B2 (ja) | 2024-03-18 |
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US (1) | US20230177673A1 (ja) |
JP (1) | JP7451287B2 (ja) |
KR (1) | KR20230004811A (ja) |
CN (1) | CN115516613A (ja) |
TW (1) | TW202205469A (ja) |
WO (1) | WO2021220906A1 (ja) |
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CN116883416B (zh) * | 2023-09-08 | 2023-11-24 | 腾讯科技(深圳)有限公司 | 工业产品缺陷的检测方法、装置、设备及介质 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010268009A (ja) | 2004-02-23 | 2010-11-25 | Nano Geometry Kenkyusho:Kk | パターン検査装置および方法 |
JP2019009256A (ja) | 2017-06-23 | 2019-01-17 | 株式会社 Ngr | パターン欠陥検出方法 |
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2020
- 2020-04-30 JP JP2020080497A patent/JP7451287B2/ja active Active
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2021
- 2021-04-21 CN CN202180031114.0A patent/CN115516613A/zh active Pending
- 2021-04-21 WO PCT/JP2021/016160 patent/WO2021220906A1/ja active Application Filing
- 2021-04-21 US US17/921,331 patent/US20230177673A1/en active Pending
- 2021-04-21 KR KR1020227041637A patent/KR20230004811A/ko unknown
- 2021-04-26 TW TW110114928A patent/TW202205469A/zh unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2010268009A (ja) | 2004-02-23 | 2010-11-25 | Nano Geometry Kenkyusho:Kk | パターン検査装置および方法 |
JP2019009256A (ja) | 2017-06-23 | 2019-01-17 | 株式会社 Ngr | パターン欠陥検出方法 |
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JP2021174969A (ja) | 2021-11-01 |
KR20230004811A (ko) | 2023-01-06 |
CN115516613A (zh) | 2022-12-23 |
US20230177673A1 (en) | 2023-06-08 |
WO2021220906A1 (ja) | 2021-11-04 |
TW202205469A (zh) | 2022-02-01 |
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