CN114830834A - 等离子体装置 - Google Patents

等离子体装置 Download PDF

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Publication number
CN114830834A
CN114830834A CN201980103093.1A CN201980103093A CN114830834A CN 114830834 A CN114830834 A CN 114830834A CN 201980103093 A CN201980103093 A CN 201980103093A CN 114830834 A CN114830834 A CN 114830834A
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CN
China
Prior art keywords
abnormality
plasma
gas
controller
state information
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Pending
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CN201980103093.1A
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English (en)
Chinese (zh)
Inventor
泷川慎二
岩田卓也
日下航
柳原一辉
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Fuji Corp
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Fuji Corp
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Publication of CN114830834A publication Critical patent/CN114830834A/zh
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
CN201980103093.1A 2019-12-24 2019-12-24 等离子体装置 Pending CN114830834A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/050550 WO2021130847A1 (ja) 2019-12-24 2019-12-24 プラズマ装置

Publications (1)

Publication Number Publication Date
CN114830834A true CN114830834A (zh) 2022-07-29

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ID=76575766

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980103093.1A Pending CN114830834A (zh) 2019-12-24 2019-12-24 等离子体装置

Country Status (3)

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JP (1) JP7248821B2 (ja)
CN (1) CN114830834A (ja)
WO (1) WO2021130847A1 (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002094971A (ja) * 2000-09-14 2002-03-29 Omron Corp 表示切替装置および表示切替システム
US20030146845A1 (en) * 2002-02-07 2003-08-07 Komatsu Ltd. Failure diagnostic apparatus for hydraulic equipment
US20070294608A1 (en) * 2006-05-18 2007-12-20 Huettinger Elektronik Gmbh + Co. Kg Plasma process power delivery system and method with event-controlled data storage
CN101490816A (zh) * 2006-07-03 2009-07-22 学校法人立命馆 等离子体异常放电诊断方法、等离子体异常放电诊断系统以及计算机程序
US20110272098A1 (en) * 2009-01-26 2011-11-10 Panasonic Corporation Plasma processing apparatus
CN104750024A (zh) * 2015-04-07 2015-07-01 哈尔滨工业大学 一种基于plc的icp等离子体加工机床状态实时监测方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5059792B2 (ja) * 2009-01-26 2012-10-31 東京エレクトロン株式会社 プラズマ処理装置
US9200950B2 (en) * 2014-02-25 2015-12-01 Applied Materials, Inc. Pulsed plasma monitoring using optical sensor and a signal analyzer forming a mean waveform
JP6710168B2 (ja) * 2016-04-19 2020-06-17 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、装置管理コントローラ及びプログラム並びに半導体装置の製造方法
CN111602471A (zh) * 2018-01-23 2020-08-28 株式会社富士 等离子体发生装置和信息处理方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002094971A (ja) * 2000-09-14 2002-03-29 Omron Corp 表示切替装置および表示切替システム
US20030146845A1 (en) * 2002-02-07 2003-08-07 Komatsu Ltd. Failure diagnostic apparatus for hydraulic equipment
US20070294608A1 (en) * 2006-05-18 2007-12-20 Huettinger Elektronik Gmbh + Co. Kg Plasma process power delivery system and method with event-controlled data storage
CN101490816A (zh) * 2006-07-03 2009-07-22 学校法人立命馆 等离子体异常放电诊断方法、等离子体异常放电诊断系统以及计算机程序
US20110272098A1 (en) * 2009-01-26 2011-11-10 Panasonic Corporation Plasma processing apparatus
CN104750024A (zh) * 2015-04-07 2015-07-01 哈尔滨工业大学 一种基于plc的icp等离子体加工机床状态实时监测方法

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Publication number Publication date
JPWO2021130847A1 (ja) 2021-07-01
WO2021130847A1 (ja) 2021-07-01
JP7248821B2 (ja) 2023-03-29

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