JPWO2021130847A1 - - Google Patents

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Publication number
JPWO2021130847A1
JPWO2021130847A1 JP2021566423A JP2021566423A JPWO2021130847A1 JP WO2021130847 A1 JPWO2021130847 A1 JP WO2021130847A1 JP 2021566423 A JP2021566423 A JP 2021566423A JP 2021566423 A JP2021566423 A JP 2021566423A JP WO2021130847 A1 JPWO2021130847 A1 JP WO2021130847A1
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JP
Japan
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JP2021566423A
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JP7248821B2 (ja
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
JP2021566423A 2019-12-24 2019-12-24 プラズマ装置 Active JP7248821B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/050550 WO2021130847A1 (ja) 2019-12-24 2019-12-24 プラズマ装置

Publications (2)

Publication Number Publication Date
JPWO2021130847A1 true JPWO2021130847A1 (ja) 2021-07-01
JP7248821B2 JP7248821B2 (ja) 2023-03-29

Family

ID=76575766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021566423A Active JP7248821B2 (ja) 2019-12-24 2019-12-24 プラズマ装置

Country Status (3)

Country Link
JP (1) JP7248821B2 (ja)
CN (1) CN114830834A (ja)
WO (1) WO2021130847A1 (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017507501A (ja) * 2014-02-25 2017-03-16 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 光学センサを使用したパルスプラズマのモニタリング
JP2017194951A (ja) * 2016-04-19 2017-10-26 株式会社日立国際電気 基板処理装置、装置管理コントローラ、及びプログラム
WO2019145990A1 (ja) * 2018-01-23 2019-08-01 株式会社Ｆｕｊｉ プラズマ発生装置および情報処理方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002094971A (ja) * 2000-09-14 2002-03-29 Omron Corp 表示切替装置および表示切替システム
JP2003227471A (ja) * 2002-02-07 2003-08-15 Komatsu Ltd 油圧機器の故障診断装置
DE102006023232B4 (de) * 2006-05-18 2011-04-14 Hüttinger Elektronik Gmbh + Co. Kg Plasmaprozessleistungsversorgungssystem mit ereignisgesteuerter Datenspeicherung und Verfahren dazu
JP4754419B2 (ja) * 2006-07-03 2011-08-24 学校法人立命館 プラズマ異常放電診断方法、プラズマ異常放電診断システム及びコンピュータプログラム
JP5942213B2 (ja) * 2009-01-26 2016-06-29 パナソニックＩｐマネジメント株式会社 プラズマ処理装置
JP5059792B2 (ja) * 2009-01-26 2012-10-31 東京エレクトロン株式会社 プラズマ処理装置
CN104750024A (zh) * 2015-04-07 2015-07-01 哈尔滨工业大学 一种基于plc的icp等离子体加工机床状态实时监测方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017507501A (ja) * 2014-02-25 2017-03-16 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 光学センサを使用したパルスプラズマのモニタリング
JP2017194951A (ja) * 2016-04-19 2017-10-26 株式会社日立国際電気 基板処理装置、装置管理コントローラ、及びプログラム
WO2019145990A1 (ja) * 2018-01-23 2019-08-01 株式会社Ｆｕｊｉ プラズマ発生装置および情報処理方法

Also Published As

Publication number Publication date
CN114830834A (zh) 2022-07-29
WO2021130847A1 (ja) 2021-07-01
JP7248821B2 (ja) 2023-03-29

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