CN114670352A - 一种实时自动控制的硅片生产方法、系统、介质及设备 - Google Patents
一种实时自动控制的硅片生产方法、系统、介质及设备 Download PDFInfo
- Publication number
- CN114670352A CN114670352A CN202210579840.2A CN202210579840A CN114670352A CN 114670352 A CN114670352 A CN 114670352A CN 202210579840 A CN202210579840 A CN 202210579840A CN 114670352 A CN114670352 A CN 114670352A
- Authority
- CN
- China
- Prior art keywords
- silicon
- silicon wafer
- robot
- degumming
- command
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 391
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 391
- 239000010703 silicon Substances 0.000 title claims abstract description 391
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 58
- 235000012431 wafers Nutrition 0.000 claims abstract description 284
- 238000004026 adhesive bonding Methods 0.000 claims abstract description 100
- 238000004140 cleaning Methods 0.000 claims abstract description 86
- 238000000034 method Methods 0.000 claims abstract description 56
- 238000005520 cutting process Methods 0.000 claims abstract description 34
- 238000004458 analytical method Methods 0.000 claims abstract description 15
- 230000032258 transport Effects 0.000 claims abstract description 14
- 238000004364 calculation method Methods 0.000 claims description 70
- 239000003292 glue Substances 0.000 claims description 67
- 238000012937 correction Methods 0.000 claims description 28
- 230000008569 process Effects 0.000 claims description 21
- 238000004590 computer program Methods 0.000 claims description 15
- 230000009471 action Effects 0.000 claims description 12
- 238000004806 packaging method and process Methods 0.000 claims description 12
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 10
- 230000006870 function Effects 0.000 claims description 9
- 229910003460 diamond Inorganic materials 0.000 claims description 8
- 239000010432 diamond Substances 0.000 claims description 8
- 238000003892 spreading Methods 0.000 claims description 8
- 230000007480 spreading Effects 0.000 claims description 8
- 230000002159 abnormal effect Effects 0.000 claims description 7
- 238000005507 spraying Methods 0.000 claims description 6
- 238000003860 storage Methods 0.000 claims description 6
- 239000012790 adhesive layer Substances 0.000 claims description 5
- 239000012459 cleaning agent Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 235000014655 lactic acid Nutrition 0.000 claims description 5
- 239000004310 lactic acid Substances 0.000 claims description 5
- 230000005856 abnormality Effects 0.000 claims description 4
- 238000000227 grinding Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000007689 inspection Methods 0.000 claims description 2
- 229920003169 water-soluble polymer Polymers 0.000 claims 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract description 20
- 238000010586 diagram Methods 0.000 description 12
- 238000011161 development Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 238000010073 coating (rubber) Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 238000012827 research and development Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
- B24B27/0633—Grinders for cutting-off using a cutting wire
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
- B24B27/0675—Grinders for cutting-off methods therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
- B24B27/0683—Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims (10)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210579840.2A CN114670352B (zh) | 2022-05-26 | 2022-05-26 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
PCT/CN2023/089673 WO2023226643A1 (zh) | 2022-05-26 | 2023-04-21 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210579840.2A CN114670352B (zh) | 2022-05-26 | 2022-05-26 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN114670352A true CN114670352A (zh) | 2022-06-28 |
CN114670352B CN114670352B (zh) | 2022-08-12 |
Family
ID=82080319
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202210579840.2A Active CN114670352B (zh) | 2022-05-26 | 2022-05-26 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN114670352B (zh) |
WO (1) | WO2023226643A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115781423A (zh) * | 2022-12-19 | 2023-03-14 | 杭州中欣晶圆半导体股份有限公司 | 利用koyo研削机改变硅片形貌的方法 |
WO2023226643A1 (zh) * | 2022-05-26 | 2023-11-30 | 高景太阳能股份有限公司 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
Citations (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0720145A (ja) * | 1993-06-30 | 1995-01-24 | Sanyo Electric Co Ltd | 半導体加速度センサの製造方法 |
EP1443542A2 (de) * | 2003-01-29 | 2004-08-04 | Infineon Technologies AG | Verfahren und Vorrichtung zum Kontrollieren des Randes eines scheibenförmigen Gegenstandes |
DE102010008233A1 (de) * | 2010-02-11 | 2011-08-11 | Schmid Technology GmbH, 68723 | Vorrichtung und Verfahren zum Transport von Substraten |
CN102390094A (zh) * | 2011-08-07 | 2012-03-28 | 江西金葵能源科技有限公司 | 一种使用金刚石线切割的太阳能级硅晶片及其切割方法 |
CN102744796A (zh) * | 2012-06-20 | 2012-10-24 | 常州天合光能有限公司 | 硅锭切片质量监控系统及监测方法 |
CN102825670A (zh) * | 2012-09-17 | 2012-12-19 | 金坛正信光伏电子有限公司 | 一种太阳能硅棒的切片方法 |
CN103186049A (zh) * | 2011-12-30 | 2013-07-03 | 北大方正集团有限公司 | 一种涂胶显影机及其使用方法 |
CN103831253A (zh) * | 2014-02-17 | 2014-06-04 | 南京航空航天大学 | 基于dsp机器视觉的太阳能硅片表面检测装置及方法 |
CN104441282A (zh) * | 2014-10-31 | 2015-03-25 | 内蒙古中环光伏材料有限公司 | 一种应用低颗粒电镀金刚线切割硅片的方法 |
CN106696104A (zh) * | 2016-12-16 | 2017-05-24 | 苏州阿特斯阳光电力科技有限公司 | 粘棒方法及切割铸造多晶硅棒的方法 |
CN107263750A (zh) * | 2017-08-07 | 2017-10-20 | 苏州赛万玉山智能科技有限公司 | 太阳能硅片的切割方法及三维结构太阳能硅片 |
CN107457921A (zh) * | 2017-08-24 | 2017-12-12 | 天津市环欧半导体材料技术有限公司 | 一种硅片制备工艺 |
CN108097533A (zh) * | 2017-12-21 | 2018-06-01 | 重庆超硅半导体有限公司 | 一种集成电路用单晶硅棒自动涂胶粘接方法 |
CN108537808A (zh) * | 2018-04-08 | 2018-09-14 | 易思维(天津)科技有限公司 | 一种基于机器人示教点信息的涂胶在线检测方法 |
CN110518092A (zh) * | 2019-08-13 | 2019-11-29 | 安徽晶天新能源科技有限责任公司 | 一种太阳能电池片用硅片生产加工工艺 |
CN113113509A (zh) * | 2021-04-07 | 2021-07-13 | 安徽晶天新能源科技有限责任公司 | 一种太阳能硅片加工用涂胶质量分点式检测工艺 |
CN113514471A (zh) * | 2021-07-09 | 2021-10-19 | 武汉华臻志创科技有限公司 | 一种涂胶效果图像检测方法 |
CN113878738A (zh) * | 2021-10-29 | 2022-01-04 | 王会娜 | 一种半导体单晶硅棒切片用线切割机气体处理机构 |
CN215969501U (zh) * | 2021-01-07 | 2022-03-08 | 银川隆基光伏科技有限公司 | 一种硅片脱胶系统及生产系统 |
CN114311355A (zh) * | 2022-03-14 | 2022-04-12 | 广东高景太阳能科技有限公司 | 一种单晶硅片的生产方法及单晶硅片 |
CN114392961A (zh) * | 2021-12-13 | 2022-04-26 | 广东金湾高景太阳能科技有限公司 | 一种硅片线切割加工用清洗工艺 |
CN114529547A (zh) * | 2022-04-24 | 2022-05-24 | 常州捷仕特机器人科技有限公司 | 一种机器人涂胶工作站的涂胶质量检测系统及方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2001232914A1 (en) * | 2000-01-22 | 2001-07-31 | Ted Albert Loxley | Process and apparatus for cleaning silicon wafers |
CN106696103B (zh) * | 2016-12-16 | 2018-11-27 | 苏州阿特斯阳光电力科技有限公司 | 粘棒方法及切割铸造多晶硅棒的方法 |
CN107738370A (zh) * | 2017-10-27 | 2018-02-27 | 四川永祥硅材料有限公司 | 一种多晶硅片制备工艺 |
CN109454642B (zh) * | 2018-12-27 | 2021-08-17 | 南京埃克里得视觉技术有限公司 | 基于三维视觉的机器人涂胶轨迹自动生产方法 |
CN114670352B (zh) * | 2022-05-26 | 2022-08-12 | 广东高景太阳能科技有限公司 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
-
2022
- 2022-05-26 CN CN202210579840.2A patent/CN114670352B/zh active Active
-
2023
- 2023-04-21 WO PCT/CN2023/089673 patent/WO2023226643A1/zh unknown
Patent Citations (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0720145A (ja) * | 1993-06-30 | 1995-01-24 | Sanyo Electric Co Ltd | 半導体加速度センサの製造方法 |
EP1443542A2 (de) * | 2003-01-29 | 2004-08-04 | Infineon Technologies AG | Verfahren und Vorrichtung zum Kontrollieren des Randes eines scheibenförmigen Gegenstandes |
DE102010008233A1 (de) * | 2010-02-11 | 2011-08-11 | Schmid Technology GmbH, 68723 | Vorrichtung und Verfahren zum Transport von Substraten |
CN102390094A (zh) * | 2011-08-07 | 2012-03-28 | 江西金葵能源科技有限公司 | 一种使用金刚石线切割的太阳能级硅晶片及其切割方法 |
CN103186049A (zh) * | 2011-12-30 | 2013-07-03 | 北大方正集团有限公司 | 一种涂胶显影机及其使用方法 |
CN102744796A (zh) * | 2012-06-20 | 2012-10-24 | 常州天合光能有限公司 | 硅锭切片质量监控系统及监测方法 |
CN102825670A (zh) * | 2012-09-17 | 2012-12-19 | 金坛正信光伏电子有限公司 | 一种太阳能硅棒的切片方法 |
CN103831253A (zh) * | 2014-02-17 | 2014-06-04 | 南京航空航天大学 | 基于dsp机器视觉的太阳能硅片表面检测装置及方法 |
CN104441282A (zh) * | 2014-10-31 | 2015-03-25 | 内蒙古中环光伏材料有限公司 | 一种应用低颗粒电镀金刚线切割硅片的方法 |
CN106696104A (zh) * | 2016-12-16 | 2017-05-24 | 苏州阿特斯阳光电力科技有限公司 | 粘棒方法及切割铸造多晶硅棒的方法 |
CN107263750A (zh) * | 2017-08-07 | 2017-10-20 | 苏州赛万玉山智能科技有限公司 | 太阳能硅片的切割方法及三维结构太阳能硅片 |
CN107457921A (zh) * | 2017-08-24 | 2017-12-12 | 天津市环欧半导体材料技术有限公司 | 一种硅片制备工艺 |
CN108097533A (zh) * | 2017-12-21 | 2018-06-01 | 重庆超硅半导体有限公司 | 一种集成电路用单晶硅棒自动涂胶粘接方法 |
CN108537808A (zh) * | 2018-04-08 | 2018-09-14 | 易思维(天津)科技有限公司 | 一种基于机器人示教点信息的涂胶在线检测方法 |
CN110518092A (zh) * | 2019-08-13 | 2019-11-29 | 安徽晶天新能源科技有限责任公司 | 一种太阳能电池片用硅片生产加工工艺 |
CN215969501U (zh) * | 2021-01-07 | 2022-03-08 | 银川隆基光伏科技有限公司 | 一种硅片脱胶系统及生产系统 |
CN113113509A (zh) * | 2021-04-07 | 2021-07-13 | 安徽晶天新能源科技有限责任公司 | 一种太阳能硅片加工用涂胶质量分点式检测工艺 |
CN113514471A (zh) * | 2021-07-09 | 2021-10-19 | 武汉华臻志创科技有限公司 | 一种涂胶效果图像检测方法 |
CN113878738A (zh) * | 2021-10-29 | 2022-01-04 | 王会娜 | 一种半导体单晶硅棒切片用线切割机气体处理机构 |
CN114392961A (zh) * | 2021-12-13 | 2022-04-26 | 广东金湾高景太阳能科技有限公司 | 一种硅片线切割加工用清洗工艺 |
CN114311355A (zh) * | 2022-03-14 | 2022-04-12 | 广东高景太阳能科技有限公司 | 一种单晶硅片的生产方法及单晶硅片 |
CN114529547A (zh) * | 2022-04-24 | 2022-05-24 | 常州捷仕特机器人科技有限公司 | 一种机器人涂胶工作站的涂胶质量检测系统及方法 |
Non-Patent Citations (4)
Title |
---|
张迪等: "划片刀配方对砷化镓晶圆切割崩裂的影响", 《金刚石与磨料磨具工程》 * |
林粤科等: "面向涂胶机器人的胶线质量模型研究", 《机床与液压》 * |
马化营: "硅片处理系统与光刻", 《电子工业专用设备》 * |
高鹏等: "金刚线切片粘胶面崩边质量控制", 《电子世界》 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023226643A1 (zh) * | 2022-05-26 | 2023-11-30 | 高景太阳能股份有限公司 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
CN115781423A (zh) * | 2022-12-19 | 2023-03-14 | 杭州中欣晶圆半导体股份有限公司 | 利用koyo研削机改变硅片形貌的方法 |
Also Published As
Publication number | Publication date |
---|---|
CN114670352B (zh) | 2022-08-12 |
WO2023226643A1 (zh) | 2023-11-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN114670352B (zh) | 一种实时自动控制的硅片生产方法、系统、介质及设备 | |
CN1251791A (zh) | 化学机械抛光装置 | |
CN201068341Y (zh) | 石英晶片全自动装片机 | |
CN109623577A (zh) | 一种航空发动机叶片智能磨削装置及其使用方法 | |
CN110119566A (zh) | 一种适用于复杂曲面机器人砂带磨抛的切削深度预测方法及装置 | |
CN112435095A (zh) | 一种纸箱生产车间订单生产管理装置 | |
CN108942639A (zh) | 一种制程工艺参数的反馈控制方法 | |
CN110516373B (zh) | 一种圆盘锯粗加工异形平面的铣削方法 | |
CN109545716A (zh) | 一种切片分片方法和电池片串焊机 | |
CN118534850A (zh) | 一种基于数据分析的车间自动化运维管理系统 | |
CN108416180A (zh) | 一种钣金件自动化设计生产方法及系统 | |
CN111719130A (zh) | 半导体镀膜设备中的温度调整方法及半导体镀膜设备 | |
CN1183336A (zh) | 电器好坏的判定方法和冷冻装置的检查装置 | |
CN113763462A (zh) | 一种自动化控制上料的方法及系统 | |
CN107219604A (zh) | 一种镜片结构及其加工方法 | |
CN116911734A (zh) | 一种基于大数据的冲压模具管理方法 | |
CN107392384B (zh) | 一种基于带有释放时间流水车间的双代理问题的下界求解方法 | |
CN201174046Y (zh) | 切削制程的可预先修正切削路径系统 | |
CN108229830A (zh) | 考虑学习效应的动态混合流水作业极小化总完工时间问题下界算法 | |
CN112486110B (zh) | 一种硅片生产系统 | |
CN107609909A (zh) | 基于模型造型独特性因素的自动定价方法 | |
CN103579058B (zh) | 一种多批次连续运行的方法 | |
CN207447375U (zh) | 一种新型车槽刀具 | |
CN111080081B (zh) | 电力在线客服接待分配方法、系统及电力在线客服系统 | |
Quadt et al. | Production planning in semiconductor assembly |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 519000 unit B25, 2nd floor, building 4, No. 153, Rongao Road, Hengqin New District, Zhuhai City, Guangdong Province Patentee after: Gaojing Solar Co.,Ltd. Patentee after: Guangdong Jinwan Gaojing Solar Energy Technology Co.,Ltd. Address before: 519000 unit B25, 2nd floor, building 4, No. 153, Rongao Road, Hengqin New District, Zhuhai City, Guangdong Province Patentee before: Guangdong Gaojing Solar Energy Technology Co.,Ltd. Patentee before: Guangdong Jinwan Gaojing Solar Energy Technology Co.,Ltd. |
|
EE01 | Entry into force of recordation of patent licensing contract | ||
EE01 | Entry into force of recordation of patent licensing contract |
Application publication date: 20220628 Assignee: Sichuan Gaojing Solar Energy Technology Co.,Ltd. Assignor: Gaojing Solar Co.,Ltd.|Guangdong Jinwan Gaojing Solar Energy Technology Co.,Ltd. Contract record no.: X2024980004517 Denomination of invention: A real-time automatic control silicon wafer production method, system, medium, and equipment Granted publication date: 20220812 License type: Common License Record date: 20240417 |