CN114670352B - 一种实时自动控制的硅片生产方法、系统、介质及设备 - Google Patents
一种实时自动控制的硅片生产方法、系统、介质及设备 Download PDFInfo
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- CN114670352B CN114670352B CN202210579840.2A CN202210579840A CN114670352B CN 114670352 B CN114670352 B CN 114670352B CN 202210579840 A CN202210579840 A CN 202210579840A CN 114670352 B CN114670352 B CN 114670352B
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 401
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 401
- 239000010703 silicon Substances 0.000 title claims abstract description 401
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- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 10
- 238000010073 coating (rubber) Methods 0.000 claims description 8
- 229910003460 diamond Inorganic materials 0.000 claims description 8
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
- B24B27/0633—Grinders for cutting-off using a cutting wire
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
- B24B27/0675—Grinders for cutting-off methods therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
- B24B27/0683—Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims (9)
Priority Applications (2)
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CN202210579840.2A CN114670352B (zh) | 2022-05-26 | 2022-05-26 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
PCT/CN2023/089673 WO2023226643A1 (zh) | 2022-05-26 | 2023-04-21 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
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CN202210579840.2A CN114670352B (zh) | 2022-05-26 | 2022-05-26 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
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CN114670352A CN114670352A (zh) | 2022-06-28 |
CN114670352B true CN114670352B (zh) | 2022-08-12 |
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CN114670352B (zh) * | 2022-05-26 | 2022-08-12 | 广东高景太阳能科技有限公司 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0720145A (ja) * | 1993-06-30 | 1995-01-24 | Sanyo Electric Co Ltd | 半導体加速度センサの製造方法 |
DE102010008233A1 (de) * | 2010-02-11 | 2011-08-11 | Schmid Technology GmbH, 68723 | Vorrichtung und Verfahren zum Transport von Substraten |
CN102390094A (zh) * | 2011-08-07 | 2012-03-28 | 江西金葵能源科技有限公司 | 一种使用金刚石线切割的太阳能级硅晶片及其切割方法 |
CN102825670A (zh) * | 2012-09-17 | 2012-12-19 | 金坛正信光伏电子有限公司 | 一种太阳能硅棒的切片方法 |
CN103186049A (zh) * | 2011-12-30 | 2013-07-03 | 北大方正集团有限公司 | 一种涂胶显影机及其使用方法 |
CN106696104A (zh) * | 2016-12-16 | 2017-05-24 | 苏州阿特斯阳光电力科技有限公司 | 粘棒方法及切割铸造多晶硅棒的方法 |
CN107263750A (zh) * | 2017-08-07 | 2017-10-20 | 苏州赛万玉山智能科技有限公司 | 太阳能硅片的切割方法及三维结构太阳能硅片 |
CN107457921A (zh) * | 2017-08-24 | 2017-12-12 | 天津市环欧半导体材料技术有限公司 | 一种硅片制备工艺 |
CN108097533A (zh) * | 2017-12-21 | 2018-06-01 | 重庆超硅半导体有限公司 | 一种集成电路用单晶硅棒自动涂胶粘接方法 |
CN113113509A (zh) * | 2021-04-07 | 2021-07-13 | 安徽晶天新能源科技有限责任公司 | 一种太阳能硅片加工用涂胶质量分点式检测工艺 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003522406A (ja) * | 2000-01-22 | 2003-07-22 | テッド アルバート ロクスリィ | シリコン・ウエハの洗浄方法及び洗浄装置 |
DE10303459A1 (de) * | 2003-01-29 | 2004-08-19 | Infineon Technologies Ag | Verfahren und Vorrichtung zum Kontrollieren des Randes eines scheibenförmigen Gegenstandes |
CN102744796A (zh) * | 2012-06-20 | 2012-10-24 | 常州天合光能有限公司 | 硅锭切片质量监控系统及监测方法 |
CN103831253B (zh) * | 2014-02-17 | 2017-01-04 | 南京航空航天大学 | 基于dsp机器视觉的太阳能硅片表面检测装置及方法 |
CN104441282B (zh) * | 2014-10-31 | 2017-02-01 | 内蒙古中环光伏材料有限公司 | 一种应用低颗粒电镀金刚线切割硅片的方法 |
CN106696103B (zh) * | 2016-12-16 | 2018-11-27 | 苏州阿特斯阳光电力科技有限公司 | 粘棒方法及切割铸造多晶硅棒的方法 |
CN107738370A (zh) * | 2017-10-27 | 2018-02-27 | 四川永祥硅材料有限公司 | 一种多晶硅片制备工艺 |
CN108537808B (zh) * | 2018-04-08 | 2019-02-22 | 易思维(天津)科技有限公司 | 一种基于机器人示教点信息的涂胶在线检测方法 |
CN109454642B (zh) * | 2018-12-27 | 2021-08-17 | 南京埃克里得视觉技术有限公司 | 基于三维视觉的机器人涂胶轨迹自动生产方法 |
CN110518092A (zh) * | 2019-08-13 | 2019-11-29 | 安徽晶天新能源科技有限责任公司 | 一种太阳能电池片用硅片生产加工工艺 |
CN215969501U (zh) * | 2021-01-07 | 2022-03-08 | 银川隆基光伏科技有限公司 | 一种硅片脱胶系统及生产系统 |
CN113514471A (zh) * | 2021-07-09 | 2021-10-19 | 武汉华臻志创科技有限公司 | 一种涂胶效果图像检测方法 |
CN113878738A (zh) * | 2021-10-29 | 2022-01-04 | 王会娜 | 一种半导体单晶硅棒切片用线切割机气体处理机构 |
CN114392961A (zh) * | 2021-12-13 | 2022-04-26 | 广东金湾高景太阳能科技有限公司 | 一种硅片线切割加工用清洗工艺 |
CN114311355B (zh) * | 2022-03-14 | 2022-05-27 | 广东高景太阳能科技有限公司 | 一种单晶硅片的生产方法及单晶硅片 |
CN114529547B (zh) * | 2022-04-24 | 2022-07-12 | 常州捷仕特机器人科技有限公司 | 一种机器人涂胶工作站的涂胶质量检测系统及方法 |
CN114670352B (zh) * | 2022-05-26 | 2022-08-12 | 广东高景太阳能科技有限公司 | 一种实时自动控制的硅片生产方法、系统、介质及设备 |
-
2022
- 2022-05-26 CN CN202210579840.2A patent/CN114670352B/zh active Active
-
2023
- 2023-04-21 WO PCT/CN2023/089673 patent/WO2023226643A1/zh unknown
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0720145A (ja) * | 1993-06-30 | 1995-01-24 | Sanyo Electric Co Ltd | 半導体加速度センサの製造方法 |
DE102010008233A1 (de) * | 2010-02-11 | 2011-08-11 | Schmid Technology GmbH, 68723 | Vorrichtung und Verfahren zum Transport von Substraten |
CN102390094A (zh) * | 2011-08-07 | 2012-03-28 | 江西金葵能源科技有限公司 | 一种使用金刚石线切割的太阳能级硅晶片及其切割方法 |
CN103186049A (zh) * | 2011-12-30 | 2013-07-03 | 北大方正集团有限公司 | 一种涂胶显影机及其使用方法 |
CN102825670A (zh) * | 2012-09-17 | 2012-12-19 | 金坛正信光伏电子有限公司 | 一种太阳能硅棒的切片方法 |
CN106696104A (zh) * | 2016-12-16 | 2017-05-24 | 苏州阿特斯阳光电力科技有限公司 | 粘棒方法及切割铸造多晶硅棒的方法 |
CN107263750A (zh) * | 2017-08-07 | 2017-10-20 | 苏州赛万玉山智能科技有限公司 | 太阳能硅片的切割方法及三维结构太阳能硅片 |
CN107457921A (zh) * | 2017-08-24 | 2017-12-12 | 天津市环欧半导体材料技术有限公司 | 一种硅片制备工艺 |
CN108097533A (zh) * | 2017-12-21 | 2018-06-01 | 重庆超硅半导体有限公司 | 一种集成电路用单晶硅棒自动涂胶粘接方法 |
CN113113509A (zh) * | 2021-04-07 | 2021-07-13 | 安徽晶天新能源科技有限责任公司 | 一种太阳能硅片加工用涂胶质量分点式检测工艺 |
Non-Patent Citations (3)
Title |
---|
划片刀配方对砷化镓晶圆切割崩裂的影响;张迪等;《金刚石与磨料磨具工程》;20200220(第01期);全文 * |
硅片处理系统与光刻;马化营;《电子工业专用设备》;19930430(第02期);全文 * |
金刚线切片粘胶面崩边质量控制;高鹏等;《电子世界》;20171008(第19期);全文 * |
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Address after: 519000 unit B25, 2nd floor, building 4, No. 153, Rongao Road, Hengqin New District, Zhuhai City, Guangdong Province Patentee after: Gaojing Solar Co.,Ltd. Patentee after: Guangdong Jinwan Gaojing Solar Energy Technology Co.,Ltd. Address before: 519000 unit B25, 2nd floor, building 4, No. 153, Rongao Road, Hengqin New District, Zhuhai City, Guangdong Province Patentee before: Guangdong Gaojing Solar Energy Technology Co.,Ltd. Patentee before: Guangdong Jinwan Gaojing Solar Energy Technology Co.,Ltd. |
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Application publication date: 20220628 Assignee: Sichuan Gaojing Solar Energy Technology Co.,Ltd. Assignor: Gaojing Solar Co.,Ltd.|Guangdong Jinwan Gaojing Solar Energy Technology Co.,Ltd. Contract record no.: X2024980004517 Denomination of invention: A real-time automatic control silicon wafer production method, system, medium, and equipment Granted publication date: 20220812 License type: Common License Record date: 20240417 |