CN114669548B - 一种单片式半导体基材清洗机 - Google Patents
一种单片式半导体基材清洗机 Download PDFInfo
- Publication number
- CN114669548B CN114669548B CN202210582470.8A CN202210582470A CN114669548B CN 114669548 B CN114669548 B CN 114669548B CN 202210582470 A CN202210582470 A CN 202210582470A CN 114669548 B CN114669548 B CN 114669548B
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- Prior art keywords
- cleaning machine
- semiconductor substrate
- arc
- motor
- fixedly connected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004140 cleaning Methods 0.000 title claims abstract description 142
- 239000004065 semiconductor Substances 0.000 title claims abstract description 37
- 239000000758 substrate Substances 0.000 title claims abstract description 31
- 238000005406 washing Methods 0.000 claims abstract description 23
- 230000007246 mechanism Effects 0.000 claims abstract description 16
- 239000007788 liquid Substances 0.000 claims abstract description 15
- 238000007789 sealing Methods 0.000 claims description 13
- 239000007921 spray Substances 0.000 claims description 9
- 230000000694 effects Effects 0.000 claims description 5
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 238000009434 installation Methods 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 238000005096 rolling process Methods 0.000 claims description 2
- 241000883990 Flabellum Species 0.000 abstract description 7
- 230000009467 reduction Effects 0.000 abstract description 6
- 230000033001 locomotion Effects 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 239000013078 crystal Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000012535 impurity Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/74—Feeding, transfer, or discharging devices of particular kinds or types
- B65G47/90—Devices for picking-up and depositing articles or materials
- B65G47/91—Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers
- B65G47/912—Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers provided with drive systems with rectilinear movements only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210582470.8A CN114669548B (zh) | 2022-05-26 | 2022-05-26 | 一种单片式半导体基材清洗机 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210582470.8A CN114669548B (zh) | 2022-05-26 | 2022-05-26 | 一种单片式半导体基材清洗机 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN114669548A CN114669548A (zh) | 2022-06-28 |
CN114669548B true CN114669548B (zh) | 2022-08-23 |
Family
ID=82079351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202210582470.8A Active CN114669548B (zh) | 2022-05-26 | 2022-05-26 | 一种单片式半导体基材清洗机 |
Country Status (1)
Country | Link |
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CN (1) | CN114669548B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115921389B (zh) * | 2022-11-24 | 2024-03-12 | 苏州智程半导体科技股份有限公司 | 一种适用于半导体基材的清洗装备 |
CN116741666B (zh) * | 2023-06-01 | 2024-03-01 | 浙江精瓷半导体有限责任公司 | 用于半导体铜制程的水相清洗设备及组合物 |
CN116995010B (zh) * | 2023-09-28 | 2023-12-19 | 江苏奥汇能源科技有限公司 | 一种用于太阳能电池硅片的插片装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005101055A (ja) * | 2003-09-22 | 2005-04-14 | Shibaura Mechatronics Corp | 処理液による基板の処理装置 |
CN203553111U (zh) * | 2013-09-24 | 2014-04-16 | 深圳市凯尔迪光电科技有限公司 | 全自动兆声波半导体晶圆清洗设备 |
CN208390603U (zh) * | 2018-03-07 | 2019-01-18 | 苏州市吴中区双龙油漆涂料有限公司 | 一种化工油漆涂料桶的清洗装置 |
CN211073204U (zh) * | 2019-06-25 | 2020-07-24 | 德淮半导体有限公司 | 防溅装置与晶圆处理设备 |
CN211088224U (zh) * | 2020-01-08 | 2020-07-24 | 深圳市新顺鑫科技有限公司 | 一种用于晶圆背面的液体防护结构 |
CN212349667U (zh) * | 2020-05-27 | 2021-01-15 | 中城建筑材料有限公司 | 一种新型模腔清洁机 |
CN212856839U (zh) * | 2020-06-15 | 2021-04-02 | 东莞南冠自动化科技有限公司 | 一种全自动pcb板清洗机 |
CN113751409A (zh) * | 2020-07-27 | 2021-12-07 | 英迪那米(徐州)半导体科技有限公司 | 一种清洗半导体零部件的装置及方法 |
CN112038270B (zh) * | 2020-11-02 | 2021-01-19 | 宁波丞达精机股份有限公司 | 一种晶圆加工装置及加工方法 |
CN214348167U (zh) * | 2020-11-21 | 2021-10-08 | 无锡联晟光伏科技有限公司 | 一种太阳能硅片清洗装置 |
CN215508100U (zh) * | 2021-09-23 | 2022-01-14 | 合肥久炯科技发展有限公司 | 一种用于半导体酸洗的搅拌结构 |
CN215785344U (zh) * | 2021-09-28 | 2022-02-11 | 昆山普克特金属制品有限公司 | 一种半导体铝合金零部件超高洁净清洗装置 |
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- 2022-05-26 CN CN202210582470.8A patent/CN114669548B/zh active Active
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CN114669548A (zh) | 2022-06-28 |
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Address after: Room 3, 299 Yuyang Road, Yushan Town, Kunshan City, Suzhou City, Jiangsu Province Patentee after: Suzhou Zhicheng Semiconductor Technology Co.,Ltd. Address before: Room 3, 299 Yuyang Road, Yushan Town, Kunshan City, Suzhou City, Jiangsu Province Patentee before: Zhicheng semiconductor equipment technology (Kunshan) Co.,Ltd. |
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Address after: 215000, No. 889 Zhonghua Road, Bacheng Town, Kunshan City, Suzhou City, Jiangsu Province Patentee after: Suzhou Zhicheng Semiconductor Technology Co.,Ltd. Country or region after: China Address before: Room 3, 299 Yuyang Road, Yushan Town, Kunshan City, Suzhou City, Jiangsu Province Patentee before: Suzhou Zhicheng Semiconductor Technology Co.,Ltd. Country or region before: China |