CN114632758A - Cleaning device, liquid path cleaning method and sample analyzer - Google Patents
Cleaning device, liquid path cleaning method and sample analyzer Download PDFInfo
- Publication number
- CN114632758A CN114632758A CN202011493428.6A CN202011493428A CN114632758A CN 114632758 A CN114632758 A CN 114632758A CN 202011493428 A CN202011493428 A CN 202011493428A CN 114632758 A CN114632758 A CN 114632758A
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- cleaning device
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- 239000007788 liquid Substances 0.000 title claims abstract description 242
- 238000004140 cleaning Methods 0.000 title claims abstract description 104
- 238000000034 method Methods 0.000 title claims abstract description 29
- 239000012535 impurity Substances 0.000 claims abstract description 46
- 239000000203 mixture Substances 0.000 claims abstract description 45
- 230000009471 action Effects 0.000 claims abstract description 23
- 230000000694 effects Effects 0.000 claims abstract description 6
- 239000002699 waste material Substances 0.000 claims description 9
- 239000012530 fluid Substances 0.000 claims description 8
- 238000005406 washing Methods 0.000 abstract description 11
- 239000007789 gas Substances 0.000 description 88
- 239000003153 chemical reaction reagent Substances 0.000 description 11
- 239000003570 air Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 8
- 238000001514 detection method Methods 0.000 description 6
- 230000002572 peristaltic effect Effects 0.000 description 5
- 210000004027 cell Anatomy 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 210000002159 anterior chamber Anatomy 0.000 description 1
- 210000000601 blood cell Anatomy 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 239000005556 hormone Substances 0.000 description 1
- 229940088597 hormone Drugs 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910001410 inorganic ion Inorganic materials 0.000 description 1
- 150000002632 lipids Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 239000006226 wash reagent Substances 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/1031—Investigating individual particles by measuring electrical or magnetic effects thereof, e.g. conductivity or capacity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N2015/1006—Investigating individual particles for cytology
Abstract
The application relates to the technical field of medical equipment, and particularly discloses a cleaning device, a liquid path cleaning method and a sample analyzer, wherein the cleaning device is applied to a part to be cleaned; the cleaning device at least comprises: the liquid unit is controllably connected with the part to be cleaned and is used for providing liquid for the part to be cleaned; the gas unit is controllably connected with the part to be cleaned and is used for providing gas for the part to be cleaned or collecting gas or gas-liquid mixture; wherein, gas and liquid enter the portion to be cleaned and form a gas-liquid mixture, and the small bubbles and/or impurities attached to the inner wall of the portion to be cleaned are removed under the hydrodynamic action of the gas-liquid mixture. Through the mode, the quick flowing effect of gas is utilized to this application, takes away from the attached microbubble and/or impurity on treating the washing portion inner wall, improves follow-up testing result's accuracy.
Description
Technical Field
The application relates to the technical field of medical equipment, in particular to a cleaning device, a liquid path cleaning method and a sample analyzer.
Background
A blood cell analyzer belongs to a medical precise instrument, and a cleaning solution is required to be poured to clean a solution path every day/regularly.
In the long-term research and development process, the inventor of the application finds that in the existing liquid path cleaning, a negative pressure source or a positive pressure source is generally used for controlling the cleaning liquid to flow from one direction to the other direction, so that the cleaning of the liquid path is realized. In this cleaning method, it is considered that the change in the speed (including the speed and the direction of the speed) of the cleaning liquid is small, and the washing force of the cleaning liquid to the portion to be cleaned is also small. In addition, there is another conventional solution that the cleaning effect is achieved by filling the cleaning solution into the reaction tank and soaking, sufficient cleaning solution is required for soaking, and the soaking requires waiting time, so that the problems of consumption increase of the cleaning solution and cleaning time increase are caused.
Therefore, it is necessary to provide a cleaning apparatus, a liquid path cleaning method, and a sample analyzer.
Disclosure of Invention
The application aims at solving the problems existing in the prior art to a certain extent, and provides the cleaning device, the liquid path cleaning method and the sample analyzer, which utilize the quick flow effect of gas to carry away the attached small bubbles and/or impurities on the inner wall of the part to be cleaned, and improve the accuracy of the subsequent detection result.
In order to solve the technical problem, the application adopts a technical scheme that: providing a cleaning device which is applied to a part to be cleaned; the cleaning device at least comprises: the liquid unit is controllably connected with the part to be cleaned and is used for providing liquid for the part to be cleaned; the gas unit is controllably connected with the part to be cleaned and is used for providing gas for the part to be cleaned or collecting gas or gas-liquid mixture; wherein, gas and liquid enter the portion to be cleaned and form a gas-liquid mixture, and the small bubbles and/or impurities attached to the inner wall of the portion to be cleaned are removed under the hydrodynamic action of the gas-liquid mixture.
In order to solve the technical problem, the application adopts a technical scheme that: the gas unit is controllably connected with a part to be cleaned and is used for providing gas for the part to be cleaned or collecting the gas, wherein the gas enters the part to be cleaned, and small bubbles and/or impurities attached to the inner wall of the part to be cleaned are removed under the hydrodynamic action of the gas.
In order to solve the technical problem, the application adopts a technical scheme that: the liquid path cleaning method is provided and based on the cleaning device, the cleaning method comprises the following steps: providing liquid for the part to be cleaned through the liquid unit; providing gas or collecting gas-liquid mixture for the part to be cleaned through the gas unit; wherein, gas and liquid enter the part to be cleaned and form a gas-liquid mixture, so that small bubbles and/or impurities attached to the inner wall of the part to be cleaned are removed under the hydrodynamic action of the gas-liquid mixture.
In order to solve the technical problem, the application adopts a technical scheme that: based on the cleaning device, the part to be cleaned at least comprises: the washing method comprises the following steps of: providing gas or collecting gas for the part to be cleaned through the gas unit; wherein, the gas enters the rear pool through the front pool and the through holes, so that the small bubbles and/or impurities attached to the inner wall of the front pool and/or the rear pool are removed under the action of the rapid flow of the gas.
In order to solve the technical problem, the application adopts a technical scheme that: based on the cleaning device, the part to be cleaned at least comprises: the washing method comprises the following steps of: providing gas or collecting gas for the part to be cleaned through the gas unit, so that small bubbles and/or impurities attached to the inner wall of the front pool and/or the rear pool are removed under the action of rapid flow of the gas; injecting liquid into the forebay through the first liquid supply module so that small bubbles and/or impurities attached to the inner wall of the forebay are removed under the hydrodynamic action of the liquid; and injecting liquid into the rear pool through the second liquid supply module, so that small bubbles and/or impurities attached to the inner wall of the rear pool are removed under the hydrodynamic force of the liquid.
In order to solve the technical problem, the application adopts a technical scheme that: there is provided a sample analyzer comprising: such as the aforementioned cleaning device and the portion to be cleaned.
Compared with the prior art, the method has the following beneficial effects:
the cleaning device of the present application includes at least: the gas unit is used for providing gas for the cleaning part, and the gas unit is separated from small bubbles and/or impurities attached to the inner wall of the cleaning part under the action of fluid power of gas or gas-liquid mixture, so that the consumption of cleaning reagents can be reduced, the cleaning time is shortened, and the cleaning force is improved, thereby improving the detection precision and ensuring the accuracy of a measurement result.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered as limiting the scope, and that those skilled in the art can also derive other related drawings based on these drawings without inventive effort.
FIG. 1 is a schematic structural view of a cleaning device according to a first embodiment of the present disclosure applied to a portion to be cleaned;
FIG. 2 is a schematic structural view of a cleaning device according to a second embodiment of the present application applied to a portion to be cleaned;
FIG. 3 is a schematic structural view of a cleaning apparatus according to a third embodiment of the present application, applied to a portion to be cleaned;
FIG. 4 is a schematic structural view of a cleaning apparatus according to a fourth embodiment of the present application applied to a portion to be cleaned;
FIG. 5 is a schematic structural view of a cleaning device according to a fifth embodiment of the present application applied to a portion to be cleaned;
FIG. 6 is a schematic structural view of a cleaning apparatus according to a sixth embodiment of the present application applied to a portion to be cleaned;
FIG. 7 is a schematic structural view of a cleaning apparatus according to a seventh embodiment of the present application, applied to a portion to be cleaned;
FIG. 8 is a schematic structural view of a cleaning apparatus according to an eighth embodiment of the present application applied to a portion to be cleaned;
FIG. 9 is a schematic structural view of a cleaning apparatus according to a ninth embodiment of the present application applied to a portion to be cleaned;
fig. 10 is a schematic flow chart of a fluid path cleaning method according to a tenth embodiment of the present application;
FIG. 11 is a schematic flow chart of a fluid path cleaning method according to an eleventh embodiment of the present application;
fig. 12 is a schematic flow chart of a fluid path cleaning method according to a twelfth embodiment of the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present application, as presented in the figures, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be obtained by a person skilled in the art without making creative efforts based on the embodiments of the present application, belong to the protection scope of the present application.
In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience in describing the present application and simplifying the description, but do not indicate or imply that the sub-units or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present application. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.
As shown in fig. 2, the present application proposes a cleaning device 20, and the cleaning device 20 is applied to a portion to be cleaned 10.
Specifically, the portion to be cleaned 10 may be a liquid path member through which a sample passes, such as a reaction or measurement chamber, a tube, a syringe, and a solenoid valve in a sheath flow impedance counter sample analyzer or a normal impedance counter sample analyzer, and is not limited thereto.
The cleaning device 20 includes at least: a gas unit 21 and a liquid unit 22. Wherein, the gas unit 21 is controllably connected to the portion to be cleaned 10 through a solenoid valve LV1, and the gas unit 21 is used for supplying gas to the portion to be cleaned 10 or collecting gas-liquid mixture. The liquid unit 22 is controllably connected to the portion to be cleaned 10 by a solenoid valve LV2, and the liquid unit 22 is used for supplying liquid to the portion to be cleaned 10.
Specifically, the gas unit 21 may include a positive pressure source for supplying gas to the portion-to-be-cleaned 10; the gas unit 21 may include a negative pressure source for collecting gas from the outside atmosphere for the portion-to-be-cleaned 10; the gas unit 21 may include a negative pressure source for collecting a gas-liquid mixture for the portion to be cleaned 10.
Further, the gas and the liquid enter the portion to be cleaned 10 to form a gas-liquid mixture, and small bubbles and/or impurities (e.g., residual proteins, sugars, lipids, enzymes, hormones, inorganic ions, disease markers, etc.) attached to the inner wall of the portion to be cleaned 10 are removed by the hydrodynamic force of the gas-liquid mixture.
Compared with the prior art, the embodiment of the application has the following beneficial effects: the cleaning device 20 of the embodiment of the present application at least includes: gas unit 21 and liquid unit 22, gas unit 21 is used for treating that cleaning portion 10 provides gas or collects gas-liquid mixture, liquid unit 22 is used for treating that cleaning portion 10 provides liquid, after forming gas-liquid mixture, utilize gaseous fast flow effect and gaseous and liquid combined action, the area leaves the tiny bubble and/or the impurity of treating that adheres to on the cleaning portion 10 inner wall, reduce the consumption of cleaning agent, the cleaning time has been shortened, the washing dynamics has been improved, thereby improve the detection precision, guarantee the accuracy of measuring result.
In one embodiment, as shown in fig. 3, the portion to be cleaned 10 includes at least: the device comprises a front tank 11, a rear tank 12 and a through hole 13 clamped between the front tank 11 and the rear tank 12, wherein the front tank 11 is communicated with the rear tank 12 through the through hole 13.
Gas enters the rear pool 12 through the front pool 11 and the through hole 13 under the action of negative pressure, liquid enters the rear pool 12, gas and liquid in the rear pool 12 form a gas-liquid mixture, and the rear pool 12 is cleaned.
Specifically, as shown in fig. 3, the rear pool 12 is provided with a first interface 1201. The gas unit 21 includes: a first negative pressure source 211. The first negative pressure source 211 includes a first negative pressure pump 2111 and a first pressure reservoir 2112, and the first negative pressure pump 2111 is activated to the first pressure reservoir 2112 to provide a certain negative pressure. The first negative pressure pump 2111 is connected to a first pressure reservoir 2112, and the first pressure reservoir 2112 is selectively communicated with the first port 1201 through a solenoid valve LV3, wherein the first negative pressure source 211 is used for maintaining the front reservoir 11 at a negative pressure so that the gas in the front reservoir 11 rapidly flows to the rear reservoir 12, and small bubbles and/or impurities attached to the inner wall of the rear reservoir 12 are removed by the rapid flow of the gas.
The first negative pressure pump 2111 is a device which can supply negative pressure, such as a piston pump, a diaphragm pump, a peristaltic pump, a plunger pump, a syringe, and an air compressor.
Further, as shown in fig. 4, a first liquid inlet 1202 is provided on the rear tank 12. The liquid unit 22 includes: the first liquid supply module 221, the first liquid supply module 221 is selectively connected with the first liquid inlet port 1202 through a solenoid valve LV4, wherein the first liquid supply module 221 is used for injecting liquid into the rear tank 12, and the liquid and the gas form a gas-liquid mixture in the rear tank 12, so that small bubbles and/or impurities attached to the inner wall of the rear tank 12 are removed under the hydrodynamic force of the gas-liquid mixture.
Preferably, the first liquid supply module 221 includes a filling needle and a filling needle driving pump. Wherein, liquid feeding needle actuation pump is connected with the liquid feeding needle, and liquid feeding needle actuation pump is configured as the drive liquid feeding needle and pours into back pond 12 with washing reagent.
Further, as shown in fig. 5, a second liquid inlet 1101 is provided on the forebay 11. The liquid unit 22 includes: and the second liquid supply module 222 injects liquid into the forebay 11 through the second liquid inlet 1101, so that small bubbles and/or impurities attached to the inner wall of the forebay 11 are removed under the hydrodynamic force of the liquid.
Preferably, the second liquid supply module 222 comprises a filling needle and a filling needle driving pump, wherein the filling needle driving pump is connected with the filling needle through a solenoid valve LV5, and the filling needle driving pump is configured to drive the filling needle to inject the washing reagent into the forebay 11 through the second inlet 1101.
The second inlet 1101 may be an open port at the top of the front pool 11, and the second inlet 1101 may be connected to the atmosphere, and it should be noted that the filling needle may be a sample needle or a liquid injection tube.
Further, as shown in fig. 6, a first liquid outlet 1102 is provided on the front pool 11. The washing device 20 further comprises a second negative pressure source 23, wherein the second negative pressure source 23 comprises a second negative pressure pump 231 and a second pressure reservoir 232, and the second negative pressure pump 231 is activated to the second pressure reservoir 232 to provide a certain negative pressure. The second negative pressure pump 231 is connected to a second pressure reservoir 232, and the second pressure reservoir 232 is controllably communicated with the first liquid outlet 1102 through a solenoid valve LV 6. The second negative pressure source 23 is used to maintain the front pool 11 at a negative pressure so that the waste liquid in the front pool 11 is discharged from the first liquid outlet 1102.
The second negative pressure pump 231 refers to a device that can provide negative pressure, such as a piston pump, a diaphragm pump, a peristaltic pump, a plunger pump, a syringe, and an air compressor.
In one embodiment, as shown in fig. 7, the portion to be cleaned 10 includes at least: front pool 14 and rear pool 15, and front pool 14 is communicated with rear pool 15, and front pool 14 includes second interface 141 and second outlet 142, and rear pool 15 includes third interface 151 and third outlet 152. The second outlet 142 is selectively connected to the waste reservoir 30 via a solenoid valve LV7, and the third outlet 152 is selectively connected to the waste reservoir 30 via a solenoid valve LV 8.
Wherein, the gas enters the forebay 14 through the second interface 141 under the pressure, the liquid enters the forebay 14 through the second interface 141, the gas and the liquid in the forebay 14 form a gas-liquid mixture, the forebay 14 is cleaned, and the gas is discharged to the waste liquid tank 30 through the second liquid outlet 142. Or, the gas enters the rear tank 15 through the third port 151 under the pressure, the liquid enters the rear tank 15 through the third port 151, the gas and the liquid in the rear tank 15 form a gas-liquid mixture, the rear tank 15 is cleaned, and the gas and the liquid are discharged to the waste liquid tank 30 through the third liquid outlet 152.
Further, as shown in fig. 7, the cleaning device 20 further includes a third positive pressure source 24 and a third liquid supply module 25, a fourth positive pressure source 26 and a fourth liquid supply module 27.
Specifically, third positive pressure source 24 is selectively connectable to second port 141 via solenoid valve LV9, and third positive pressure source 24 is operable to inject air into forward pool 14. At this point, third positive pressure source 24 is selectively connected to second port 141 via solenoid valve LV9, and third positive pressure source 24 is operable to inject air into forward pool 14. The third liquid supply module 25 is selectively communicated with the second port 141 through a solenoid valve LV10, and the third liquid supply module 25 is used for injecting liquid into the foretank 14 and forming a gas-liquid mixture in the foretank 14, so that small bubbles and/or impurities attached to the inner wall of the foretank 14 are removed under the hydrodynamic force of the gas-liquid mixture.
Alternatively, third positive pressure source 24 may be selectively connected to second port 141 via a solenoid valve LV9, and third positive pressure source 24 may be adapted to inject gas into forward tank 15 via forward tank 14. The fourth liquid supply module 27 is selectively communicated with the third interface 152 through a solenoid valve LV12, and the fourth liquid supply module 27 is used for injecting liquid into the rear pool 15 to form a gas-liquid mixture in the rear pool 15, so that small bubbles and/or impurities attached to the inner wall of the rear pool 15 are removed under the hydrodynamic force of the gas-liquid mixture.
Still alternatively, fourth positive pressure source 26 may be selectively connected to third port 152 via a solenoid valve LV11, fourth positive pressure source 26 being operable to inject gas into lagoon 15. The fourth liquid supply module 27 is selectively communicated with the third interface 152 through a solenoid valve LV12, and the fourth liquid supply module 27 is used for injecting liquid into the rear pool 15 to form a gas-liquid mixture in the rear pool 15, so that small bubbles and/or impurities attached to the inner wall of the rear pool 15 are removed under the hydrodynamic force of the gas-liquid mixture.
Still alternatively, a fourth positive pressure source 26 is used to inject gas into the forward cell 14 via the rear cell 15. Third positive pressure source 24 is selectively connectable to second port 141 via a solenoid valve LV9, and third positive pressure source 24 is operable to inject air into forward pool 14. The third liquid supply module 25 is selectively communicated with the second port 141 through a solenoid valve LV10, and the third liquid supply module 25 is used for injecting liquid into the foretank 14 and forming a gas-liquid mixture in the foretank 14, so that small bubbles and/or impurities attached to the inner wall of the foretank 14 are removed under the hydrodynamic force of the gas-liquid mixture.
Preferably, the third liquid supply module 25 comprises a filling needle and a filling needle driven pump. Wherein the filling needle actuation pump is connected to the filling needle and configured to actuate the filling needle to inject the wash reagent into forebay 14.
Third positive pressure source 24 is a device capable of providing positive pressure, such as a piston pump, diaphragm pump, peristaltic pump, plunger pump, syringe, air compressor, for example. Further, the third positive pressure source 24 may be directly connected to the outside air.
Fourth positive pressure source 26 is a device that can provide positive pressure, such as a piston pump, diaphragm pump, peristaltic pump, plunger pump, syringe, air compressor, for example. Further, fourth positive pressure source 26 may also be in direct communication with ambient air.
As shown in fig. 1, the present application proposes a cleaning device 20, which cleaning device 20 is applied to a portion to be cleaned 10. The cleaning device 20 includes at least: and a gas unit 21. The gas unit 21 is controllably connected to the part to be cleaned 10 by a solenoid valve LV1, and the gas unit 21 is used for supplying gas to the part to be cleaned 10 or collecting gas, wherein the gas enters the part to be cleaned 10, and small bubbles and/or impurities attached to the inner wall of the part to be cleaned 10 are removed under the hydrodynamic force of the gas.
Compared with the prior art, the embodiment of the application has the following beneficial effects: the cleaning device 20 of the embodiment of the present application at least includes: the gas unit 21 is used for providing gas or collecting gas for the part to be cleaned 10, and takes away the small bubbles and/or impurities attached to the inner wall of the part to be cleaned 10 by utilizing the rapid flowing effect of the gas, so that the detection precision is improved, and the accuracy of the measurement result is ensured.
As shown in fig. 8, the portion to be cleaned 10 includes at least: a front tank 11, a rear tank 12, and a through hole 13 provided between the front tank 11 and the rear tank 12 to communicate the front tank 11 with the rear tank 12. The gas unit 21 comprises a fifth positive pressure source 212, the fifth positive pressure source 212 being selectively connectable to the first liquid outlet 1102 via a solenoid valve LV13, the fifth positive pressure source 212 being adapted to inject gas into the forebay 11. Wherein, the gas enters the rear pool 12 through the front pool 11 and the through holes 13, and the small bubbles and/or impurities attached on the inner wall of the front pool 11 and/or the rear pool 12 are removed under the action of the rapid flow of the gas.
As shown in fig. 9, the cleaning device 20 further includes: the liquid unit 22, the liquid unit 22 includes a first liquid supply block 221 and a second liquid supply block 222.
The rear tank 12 is provided with a first liquid inlet 1202. The liquid unit 22 includes: the first liquid supply module 221, the first liquid supply module 221 is selectively connected with the first liquid inlet port 1202 through a solenoid valve LV4, wherein the first liquid supply module 221 is used for injecting liquid into the rear tank 12, and the liquid and the gas form a gas-liquid mixture in the rear tank 12, so that small bubbles and/or impurities attached to the inner wall of the rear tank 12 are removed under the hydrodynamic force of the gas-liquid mixture.
Preferably, the first liquid supply module 221 includes a filling needle and a filling needle driving pump. Wherein, liquid feeding needle actuation pump is connected with the liquid feeding needle, and liquid feeding needle actuation pump is configured as the drive liquid feeding needle and pours into back pond 12 with washing reagent.
The forebay 11 is provided with a second liquid inlet 1101. The liquid unit 22 includes: and the second liquid supply module 222 injects liquid into the forebay 11 through the second liquid inlet 1101, so that small bubbles and/or impurities attached to the inner wall of the forebay 11 are removed under the hydrodynamic force of the liquid.
Preferably, the second liquid supply module 222 comprises a filling needle and a filling needle driving pump, wherein the filling needle driving pump is connected with the filling needle through a solenoid valve LV5, and the filling needle driving pump is configured to drive the filling needle to inject the washing reagent into the forebay 11 through the second inlet 1101.
The forebay 11 is provided with a first liquid outlet 1102. The washing device 20 further comprises a second negative pressure source 23, wherein the second negative pressure source 23 comprises a second negative pressure pump 231 and a second pressure reservoir 232, and the second negative pressure pump 231 is activated to the second pressure reservoir 232 to provide a certain negative pressure. The second negative pressure pump 231 is connected to a second pressure reservoir 232, and the second pressure reservoir 232 is controllably communicated with the first liquid outlet 1102 through a solenoid valve LV 6. The second negative pressure source 23 is used to maintain the front pool 11 at a negative pressure so that the waste liquid in the front pool 11 is discharged from the first liquid outlet 1102.
The second negative pressure pump 231 refers to a device that can provide negative pressure, such as a piston pump, a diaphragm pump, a peristaltic pump, a plunger pump, a syringe, and an air compressor.
Through the mode, the small bubbles and/or impurities attached to the inner wall of the part to be cleaned are removed by utilizing the combined action of the gas and the liquid, so that the detection precision is improved, and the accuracy of a measurement result is ensured.
Referring to fig. 10, an embodiment of the present application provides a method for cleaning a fluid path, which is based on the cleaning apparatus 20 in fig. 2, and the method includes the following steps:
s10: the portion to be cleaned 10 is supplied with liquid by the liquid unit 22.
S20: the gas unit 21 supplies gas to the portion to be cleaned 10 or collects gas or gas-liquid mixture.
S30: the gas and the liquid enter the part to be cleaned 10 and form a gas-liquid mixture, so that small bubbles and/or impurities attached to the inner wall of the part to be cleaned 10 are removed under the hydrodynamic force of the gas-liquid mixture.
Referring to fig. 11, an embodiment of the present application provides a method for cleaning a liquid path, the method is based on the cleaning apparatus 20 in fig. 1 and 8, and the portion to be cleaned 10 at least includes: the cleaning method comprises the following steps of:
s40: the portion to be cleaned 10 is supplied with gas or collected with gas by the gas unit 21.
S50: the gas enters the rear tank 12 through the front tank 11 and the through holes 13, so that the small bubbles and/or impurities attached to the inner wall of the front tank 11 and/or the rear tank 12 are removed by the rapid flow of the gas.
Referring to fig. 9, an embodiment of the present application provides a method for cleaning a fluid path, where the method is based on the cleaning apparatus 20 in fig. 2 and 9, and the portion to be cleaned 10 at least includes: the cleaning method comprises the following steps of:
s60: the portion to be cleaned 10 is supplied with gas or collected gas through the gas unit 21 so that small bubbles and/or impurities adhering to the inner wall of the front tank 11 and/or the rear tank 12 are removed by the rapid flow of the gas.
S70: liquid is injected into the forebay 11 through the first liquid supply module 221 so that small bubbles and/or impurities attached to the inner wall of the forebay 11 are removed under the hydrodynamic force of the liquid.
S80: the liquid is injected into the rear tank 12 through the second liquid supply module 222, so that the small bubbles and/or impurities attached to the inner wall of the rear tank 12 are removed under the hydrodynamic force of the liquid.
The cleaning flow of the cleaning device 20 shown in fig. 9 to the portion to be cleaned 10 is as follows:
step 1: opening solenoid valve LV5 and second liquid supply module 222 injecting a cleaning reagent into forebay 11 to clean forebay 11;
step 2: opening an electromagnetic valve LV6 to empty the waste liquid in the forebay 11;
and step 3: opening the electromagnetic valve LV3, pumping the gas (which can be air or other inert gas) in the front tank 11 to the rear tank 12, and taking away the small bubbles and/or impurities attached to the inner wall of the rear tank 12 by using the gas, or opening the electromagnetic valve LV3 and simultaneously opening the electromagnetic valve LV4, so that a gas-liquid mixture can be formed in the rear tank 12, and the small bubbles and/or impurities attached to the inner wall of the rear tank 12 can be better cleaned;
and 4, step 4: opening solenoid valve LV5 and second liquid supply module 222 injecting a cleaning reagent into forebay 11 to clean forebay 11;
and 5: opening the electromagnetic valve LV4, and the first liquid supply module 221 injecting a cleaning reagent into the rear tank 12 to clean the rear tank 12;
step 6: opening an electromagnetic valve LV6 to empty the waste liquid in the front pool 11 and the rear pool 12;
and 7: injecting a reaction reagent into the front well 11 using a reagent needle (not shown) or the second liquid supply module 222;
and 8: opening the electromagnetic valve LV13 to inject gas into the front pool 11;
step 10: the sample is injected into the anterior chamber 11 using a sampling needle (not shown);
step 11: open solenoid valve LV13, inject gas into cuvette 11 to mix the reagent with the sample.
Step 12: and (6) carrying out sample detection.
Thereafter, the front cell 11 and the rear cell 12 may be re-cleaned to restore the impedance counting type sample analyzer to a normal state according to steps 1 to 5.
In one embodiment, the sample analyzer of the present application comprises: the cleaning device 20 and the portion to be cleaned 10 in the above embodiments.
While the application has been described in the specification and drawings with reference to specific embodiments, it will be understood by those skilled in the art that various changes may be made and equivalents may be substituted for elements thereof without departing from the scope of the application as defined in the claims. Furthermore, the combination and arrangement of features, elements and/or functions between specific embodiments herein is clearly apparent and thus, in light of this disclosure, one skilled in the art will appreciate that features, elements and/or functions of an embodiment may be incorporated into another embodiment as appropriate, unless described otherwise, above.
In addition, many modifications may be made to adapt a particular situation or material to the teachings of the application without departing from the essential scope thereof. Therefore, it is intended that the application not be limited to the particular embodiment illustrated by the drawings and described in the specification as the best mode presently contemplated for carrying out this application, but that the application will include all embodiments falling within the scope of the foregoing description and the appended claims.
Claims (16)
1. A cleaning device is characterized in that the cleaning device is applied to a part to be cleaned;
the cleaning device at least comprises:
a liquid unit controllably connected to the portion to be cleaned, the liquid unit for providing liquid to the portion to be cleaned;
a gas unit controllably connected to the part to be cleaned, the gas unit being adapted to supply gas to the part to be cleaned or to collect gas or a gas-liquid mixture;
the gas and the liquid enter the part to be cleaned to form a gas-liquid mixture, and small bubbles and/or impurities attached to the inner wall of the part to be cleaned are removed under the hydrodynamic action of the gas-liquid mixture.
2. The cleaning device of claim 1,
the portion to be cleaned includes at least: the device comprises a front pool, a rear pool and a through hole arranged between the front pool and the rear pool, so that the front pool is communicated with the rear pool;
and the gas enters the rear tank through the front tank and the through hole under the action of negative pressure, the liquid enters the rear tank, the gas and the liquid form a gas-liquid mixture in the rear tank, and the rear tank is cleaned.
3. The cleaning device of claim 2,
a first interface is arranged on the rear pool;
the gas unit includes: the first negative pressure source is selectively communicated with the first interface, wherein the first negative pressure source is used for keeping the front pool at a negative pressure so that the gas in the front pool can rapidly flow to the rear pool, and small bubbles and/or impurities attached to the inner wall of the rear pool are removed under the rapid flow action of the gas.
4. The cleaning device of claim 3,
a first liquid inlet is formed in the rear tank;
the liquid unit includes: the first liquid supply module is selectively connected with the first liquid inlet, the first liquid supply module is used for injecting the liquid into the rear pool, the liquid and the gas form the gas-liquid mixture in the rear pool, and therefore small bubbles and/or impurities attached to the inner wall of the rear pool are removed under the hydrodynamic force of the gas-liquid mixture.
5. The cleaning device according to any one of claims 2 to 4,
a second liquid inlet is formed in the forebay;
the liquid unit includes: and the second liquid supply module injects the liquid into the forebay through the second liquid inlet so as to remove small bubbles and/or impurities attached to the inner wall of the forebay under the hydrodynamic action of the liquid.
6. The cleaning device of claim 5,
a first liquid outlet is formed in the front pool;
the cleaning device further comprises a second negative pressure source, the second negative pressure source is controllably communicated with the first liquid outlet, and the second negative pressure source is used for keeping the forebay at a negative pressure so that waste liquid in the forebay can be discharged from the first liquid outlet.
7. The cleaning device of claim 1,
the portion to be cleaned includes at least: the device comprises a front tank and a rear tank, wherein the front tank is communicated with the rear tank;
the forebay includes second interface and second liquid outlet, the back pond includes third interface and third liquid outlet, gas under the pressure effect via the second interface or the third interface gets into the forebay or the back pond, liquid via the second interface or the third interface gets into the forebay or the back pond, in the forebay or in the back pond gas with liquid forms the gas-liquid mixture, to the forebay or the back pond washs, and via the second liquid outlet or the third liquid outlet is discharged.
8. The cleaning device of claim 7, further comprising a third positive pressure source and a third liquid supply module;
the third positive pressure source is selectively communicated with the second interface and is used for injecting the gas into the front pool or the rear pool;
the third liquid supply module is selectively communicated with the second interface and is used for injecting the liquid into the forebay.
9. The cleaning device according to any one of claims 7 or 8,
the cleaning device further comprises a fourth positive pressure source and a fourth liquid supply module;
the fourth positive pressure source is selectively communicated with the third interface and is used for injecting the gas into the rear pool or the front pool; the fourth liquid supply module is selectively communicated with the third interface and is used for injecting the liquid into the rear pool.
10. A cleaning device, characterized in that it is applied to a part to be cleaned, said cleaning device comprising at least:
the gas unit is controllably connected with the part to be cleaned and used for providing gas for the part to be cleaned or collecting the gas, wherein the gas enters the part to be cleaned, and small bubbles and/or impurities attached to the inner wall of the part to be cleaned are removed under the action of the fluid power of the gas.
11. The cleaning device according to claim 10, wherein the portion to be cleaned includes at least: the device comprises a front pool, a rear pool and a through hole arranged between the front pool and the rear pool, so that the front pool is communicated with the rear pool;
wherein the gas enters the rear pool through the front pool and the through holes, and small bubbles and/or impurities attached to the inner wall of the front pool and/or the rear pool are removed under the action of the rapid flow of the gas.
12. The cleaning device of claim 11, further comprising: a liquid unit including a first liquid supply module and a second liquid supply module;
the rear tank is provided with a first liquid inlet, and the first liquid supply module is selectively connected with the first liquid inlet, wherein the first liquid supply module injects liquid into the rear tank through the first liquid inlet, so that small bubbles and/or impurities attached to the inner wall of the rear tank are removed under the hydrodynamic action of the liquid;
the forebay is provided with a second liquid inlet, and the second liquid supply module is selectively connected with the second liquid inlet, wherein the second liquid supply module injects liquid into the forebay through the second liquid inlet, so that small bubbles and/or impurities attached to the inner wall of the forebay are removed under the hydrodynamic action of the liquid.
13. A method for cleaning a fluid path, based on the cleaning apparatus according to any one of claims 1 to 9, comprising:
providing liquid for the part to be cleaned through the liquid unit;
providing gas or collecting gas-liquid mixture for the part to be cleaned through a gas unit;
and the gas and the liquid enter the part to be cleaned to form the gas-liquid mixture, so that small bubbles and/or impurities attached to the inner wall of the part to be cleaned are removed under the hydrodynamic action of the gas-liquid mixture.
14. A liquid path cleaning method, based on the cleaning apparatus as claimed in claim 11, characterized in that the portion to be cleaned includes at least: the method comprises the following steps of:
providing gas or collecting gas for the part to be cleaned through a gas unit;
the gas enters the rear pool through the front pool and the through holes, so that small bubbles and/or impurities attached to the inner wall of the front pool and/or the rear pool are removed under the action of the rapid flow of the gas.
15. A liquid path cleaning method, based on the cleaning apparatus as claimed in claim 12, characterized in that the portion to be cleaned includes at least: the method comprises the following steps of:
providing gas or collecting gas for the part to be cleaned through a gas unit, so that small bubbles and/or impurities attached to the inner wall of the front pool and/or the rear pool are removed under the action of rapid flow of the gas;
injecting liquid into the forebay through a first liquid supply module so that small bubbles and/or impurities attached to the inner wall of the forebay are removed under the hydrodynamic force of the liquid;
and injecting liquid into the rear pool through a second liquid supply module, so that small bubbles and/or impurities attached to the inner wall of the rear pool are removed under the hydrodynamic force of the liquid.
16. A sample analyzer, characterized in that it comprises at least: a cleaning device and a part to be cleaned according to any one of claims 1-12.
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| CN202011493428.6A CN114632758B (en) | 2020-12-16 | 2020-12-16 | Cleaning device, liquid path cleaning method and sample analyzer |
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| CN202011493428.6A CN114632758B (en) | 2020-12-16 | 2020-12-16 | Cleaning device, liquid path cleaning method and sample analyzer |
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| CN114632758B (en) | 2024-04-09 |
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