CN114451256A

CN114451256A - Substrate treatment method and tobacco seed seedling raising method using substrate

Info

Publication number: CN114451256A
Application number: CN202111347978.1A
Authority: CN
Inventors: 潘威; 张立猛; 杨晓东; 宋碧清; 乔雨; 杜景诚; 宋薇
Original assignee: YUXI ZHONGYAN TOBACCO SEED CO Ltd
Current assignee: YUXI ZHONGYAN TOBACCO SEED CO Ltd
Priority date: 2021-11-15
Filing date: 2021-11-15
Publication date: 2022-05-10
Anticipated expiration: 2041-11-15
Also published as: CN114451256B

Abstract

The invention discloses a substrate treatment method, which comprises the following steps: (1) taking a commercially available tobacco matrix as a matrix to be treated, pouring the matrix to be treated onto a mesh screen for sieving, and screening out impurities or stones with overlarge particle sizes; (2) preparing butenolide solution, adding the solution into the tobacco matrix to be treated after sieving in the step (1), stirring, and fully mixing the matrix and the solution to obtain the treated matrix. The invention also discloses a tobacco seed seedling raising method using the substrate. The invention can not only enhance the low-temperature stress resistance of the tobacco seeds, improve the seedling rate of the tobacco seeds after encountering low temperature, improve the quality of the tobacco seedlings, reduce the economic loss of the seedling process caused by low-temperature stress, but also promote the agriculture and increase the income and increase the yield; and the method has the advantages of low cost, simple method, convenient realization, obvious effect and good application potential.

Description

Substrate treatment method and tobacco seed seedling raising method using substrate

Technical Field

The invention relates to the technical field of tobacco seedling culture, in particular to a substrate treatment method and a tobacco seed seedling culture method using the substrate.

Background

The tobacco seeds are the source of the tobacco industry and are the basis of high quality and stable yield of tobacco leaves. When tobacco seeds are used in domestic tobacco areas, a floating seedling raising mode is mostly adopted. The floating seedling raising operation is to sow tobacco seeds into a floating tray filled with a substrate, and the substrate is used as a moisture storage and nutrition supply material and plays an important role in the seedling emergence process of the seeds. The tobacco area investigation finds that many seedling stage problems in the seedling raising process are caused by matrix problems which are easy to ignore. And in the tobacco seed seedling raising process, the seedling emergence and seedling quality is not high due to improper method.

In view of the above, there is a need to develop a substrate treatment method and a tobacco seed seedling method using the substrate to solve the above technical problems.

Disclosure of Invention

The invention mainly aims to provide a substrate treatment method, and the second aim of the invention is to provide a tobacco seed seedling raising method using the substrate, aiming at solving the technical problem that the quality of tobacco seedling raising cannot be improved by improving the substrate performance in the prior art.

In order to achieve the purpose, the invention adopts the following technical scheme:

the first object of the present invention is achieved by a substrate treatment method comprising the steps of:

(1) taking a commercially available tobacco matrix as a matrix to be treated, pouring the matrix to be treated into a mesh screen for screening, removing impurities or stones with overlarge particle sizes, and kneading the matrix adhered into blocks in the matrix to be treated after screening for later use;

(2) preparing butenolide solution, adding the solution into the tobacco matrix to be treated after sieving in the step (1), stirring, and fully mixing the matrix and the solution until the matrix is uniformly dispersed and has sufficient content and the matrix does not agglomerate, thus obtaining the treated matrix.

Preferably, the aperture of the mesh screen in the step (1) is 4-6 mm.

Preferably, the concentration of the butenolide solution in the step (2) is 0.15-150 mu g/L.

Preferably, the mass ratio of the volume of the butenolide solution in the step (2) to the mass of the tobacco substrate to be treated after sieving is 60-80 ml:100 g.

By adopting the method, the substrate can be obviously improved after being specially treated, so that the emergence rate and the seedling quality of tobacco seeds are protected, and the method plays an important role in saving labor and reducing cost of tobacco, promoting agriculture and income, and promoting high-quality development of tobacco industry.

The second object of the invention is realized by a tobacco seed seedling raising method, which comprises the following steps:

s1, a treated substrate obtained by using a substrate treatment method according to any one of claims 1 to 4;

s2, putting the processed substrate obtained in the step S1 into a floating tray or a container, uniformly sowing tobacco seeds on the processed substrate, and spraying a butenolide solution of 0.15-150 mu g/L on the surfaces of the tobacco seeds until the tobacco seeds are wet;

s3, placing the floating tray or the container into a seedling raising pool, and placing the floating tray or the container in a normal environment for raising seedlings; when the matrix is dried, continuously spraying 0.15-150 mu g/L butenolide solution for 2-4 times, and carrying out floating seedling.

Preferably, the normal ambient temperature in step S3 is 23-28 ℃.

By adopting the method, the tobacco seeds are placed in the tobacco substrate compounded by the butenolide solution, so that the emergence rate of the tobacco seeds can be effectively improved, and the seedling quality of the tobacco seeds is improved. The low-germination seeds are subjected to the activation promotion effect of the butenolide, so that the emergence rate can be improved, the low-temperature stress resistance of the high-germination tobacco seeds can also be improved, the cold resistance determination activity result is higher than that in water, and the loss of the tobacco seeds after low-temperature cold damage can be reduced.

In conclusion, the beneficial effects of the invention are as follows:

1. the substrate treatment method and the tobacco seed seedling culture method using the substrate provided by the invention can improve the rate of emergence of tobacco seeds in floating seedling culture in the substrate, improve the quality of tobacco seedlings, reduce the economic loss in the seed seedling culture process caused by low-temperature stress, and have the effects of promoting agriculture, increasing income and increasing yield.

2. The tobacco seed seedling raising method provided by the invention can effectively improve the seedling emergence quality of tobacco seeds, is simple and easy to implement, is convenient to realize, and has a good application prospect.

Drawings

FIG. 1 shows emergence of Yunyan 85-0164 seedlings on day 6 in water-added matrix;

FIG. 2 shows the emergence of Yunyan 85-0164 on day 6 in butenolide solution treated substrate.

Detailed Description

Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and are intended to be illustrative of the invention and should not be construed as limiting the invention.

A method of treating a substrate, the method comprising the steps of:

In the step (1), the aperture of the mesh screen is 4-6 mm.

The concentration of the butenolide solution in the step (2) is 0.15-150 mu g/L.

The mass ratio of the volume of the butenolide solution to the mass of the screened tobacco matrix to be treated in the step (2) is 60-80 ml to 100 g.

A tobacco seed seedling raising method comprises the following steps:

In the step S3, the normal environment temperature is 23-28 ℃.

The invention is further illustrated by the following specific examples, which are intended to be illustrative of the invention and are not to be construed as limiting the scope thereof.

Example 1:

taking 3 batches of naked tobacco varieties with numbers of Yunyan 85-0164, Yunyan 97-0228 and MSK326-0402 respectively.

1.1 taking the tobacco substrate sold in the market, pouring the tobacco substrate onto a screen with the aperture of 5mm, shaking and sieving the tobacco substrate, screening out impurities or stones with overlarge particle size, and kneading the substrate bonded into blocks for later use. Preparing 2mg/L butenolide mother liquor, and then respectively preparing the mother liquor into butenolide solutions of 0.15 mu g/L, 1.5 mu g/L, 15 mu g/L and 150 mu g/L.

1.2 comparative example: taking 100g of sieved matrix 1 part, spreading in a germination box of 570ml, adding 80ml of water, and uniformly mixing; paving a substrate, uniformly sowing 100 tobacco naked seeds of the 3 batches in each box, repeating the sowing for 3 times, performing a seedling emergence test at 25 ℃, spraying water during the seedling emergence test, keeping the substrate wet, counting the seed emergence rate for 5-7 days, wherein the statistical standard is that 2 cotyledons are unfolded, and seedlings are normal. The emergence is shown in FIG. 1.

1.3 taking 4 parts of sieved substrates, spreading the substrates 100g in 570ml germination boxes, respectively adding 0.15 mu g/L, 1.5 mu g/L, 15 mu g/L and 150 mu g/L of butenolide solutions, uniformly mixing, spreading the substrates, uniformly sowing the 3 batches of naked tobacco seeds in each box, repeating for 3 times, placing the boxes at 25 ℃ for seedling emergence test, spraying the butenolide solutions with corresponding concentrations in the period, keeping the substrates moist, counting the seedling emergence rate for 5-7 days, and counting the development of 2 cotyledons and the normal seedlings. The emergence is shown in FIG. 2.

The effect of water and different concentrations of butenolide on seed emergence after treatment of the substrate is shown in table 1.

TABLE 1

As can be seen from Table 1, compared with water treatment, when the butenolide solution is mixed with the matrix to be used as a seedling culture carrier, the early-stage emergence rate of seeds can be remarkably improved, for example, Yunyan tobacco 97-0228, the matrix doped with the butenolide solution of 0.15-150 mug/L has a promoting effect on the emergence of the seeds, particularly, the matrix added with the butenolide solution of 150 mug/L can enable the emergence rate of 5d of Yunyan tobacco 97-0228 seeds to reach 52.50%, compared with water, the emergence rate is improved by 15.17%, the promoting effect is more remarkable along with the increase of the concentration of the solution added into the matrix, the emergence rate of the seeds after 7d is basically stable, but the promoting effect still exists. In other 2 batches of seeds, the promotion effect and the trend of the method on the seed emergence performance are basically the same as those of the Yunyan 97 seeds.

Example 2:

this example 2 differs from example 1 in that the tobacco seeds sown were 3 batches of the same variety for different storage years (different vigors): 2001-0064, 2002-0138 and 2014-2882. And (3) treating the sowed seeds at a low temperature of 5 ℃ for 4 days, transferring the seeds to a temperature of 25 ℃ for emergence of seedlings, and transferring the seeds to a temperature of 25 ℃ for 7 days for counting the emergence rate of the seeds, wherein the emergence rate is used as a measurement result of cold resistance activity of the seeds.

As can be seen from Table 2, when raising seedlings by using a substrate mixed with butenolide, the normal seedling emergence temperature is recovered after the seeds encounter low-temperature stress, the seedling emergence rate of the seeds in the substrate containing 0.15-15 mu g/L butenolide solution is higher than that of a water-containing substrate, for example, the seedling emergence rate of 2002-0138 seeds in the substrate treated by 0.15-15 mu g/L solution is respectively improved by 2.66%, 6.33% and 3.00% compared with that in the water-containing substrate, and the seedling emergence conditions of other 2 batches of seeds are similar, which indicates that for tobacco seeds with different vigor levels, the substrates treated by using the butenolide solutions can effectively improve the low-temperature stress resistance of the seeds and improve the seedling rate of the seeds after encountering low temperature. The results of the cold resistance activity test of the seeds treated with different concentrations are shown in table 2.

TABLE 2

In general, the substrate mixed with the butenolide solution of 0.15-150 mug/L is used for floating seedling raising, so that the rate of emergence of tobacco seeds at normal temperature can be effectively improved, the quality of emergence of the seeds is ensured, the emergence performance of the seeds subjected to low-temperature adverse circumstances can be improved, the cold resistance of the seeds is improved, the seedling raising quality of the tobacco seeds can be further improved if the substrate is popularized and applied, the seedling raising risk is reduced, and contribution is made to guaranteeing benefits of tobacco growers and promoting the income of the tobacco growers.

In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made in the above embodiments by those of ordinary skill in the art without departing from the principle and spirit of the present invention.

Claims

1. A method of treating a substrate, the method comprising the steps of:

(1) taking a commercially available tobacco matrix as a matrix to be treated, pouring the matrix to be treated on a mesh screen for sieving, removing impurities or stones with overlarge particle sizes, and kneading the matrix adhered into blocks in the matrix to be treated after sieving for later use;

2. The substrate treating method according to claim 1, wherein the mesh screen in the step (1) has a pore size of 4 to 6 mm.

3. The substrate treatment method according to claim 1, wherein the concentration of the butenolide solution in the step (2) is 0.15 to 150 μ g/L.

4. The substrate treatment method according to claim 3, wherein the mass ratio of the volume of the butenolide solution in the step (2) to the mass of the tobacco substrate to be treated after sieving is 60-80 ml:100 g.

5. A tobacco seed seedling raising method is characterized by comprising the following steps:

s2, putting the processed substrate in the step S1 into a floating tray or a container, uniformly sowing tobacco seeds on the processed substrate, and spraying a butenolide solution of 0.15-150 mu g/L on the surfaces of the tobacco seeds until the tobacco seeds are wet;

s3, placing the floating tray or the container into a seedling raising pool, placing the floating tray or the container in a normal environment for seedling raising, continuously spraying a butenolide solution for 2-4 times when the matrix is dried, and carrying out floating seedling raising.

6. The substrate treating method according to claim 5, wherein the normal ambient temperature in step S3 is 23-28 ℃.