CN113966409A - 带有防反射膜的光学构件及其制造方法 - Google Patents

带有防反射膜的光学构件及其制造方法 Download PDF

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Publication number
CN113966409A
CN113966409A CN202080043467.8A CN202080043467A CN113966409A CN 113966409 A CN113966409 A CN 113966409A CN 202080043467 A CN202080043467 A CN 202080043467A CN 113966409 A CN113966409 A CN 113966409A
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CN
China
Prior art keywords
refractive index
index layer
optical member
layer
antireflection film
Prior art date
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Pending
Application number
CN202080043467.8A
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English (en)
Chinese (zh)
Inventor
冉凡勇
白石幸一郎
速水俊治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
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Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of CN113966409A publication Critical patent/CN113966409A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
CN202080043467.8A 2019-08-08 2020-07-27 带有防反射膜的光学构件及其制造方法 Pending CN113966409A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019-146114 2019-08-08
JP2019146114A JP7493918B2 (ja) 2019-08-08 2019-08-08 反射防止膜付き光学部材及びその製造方法
PCT/JP2020/028713 WO2021024834A1 (ja) 2019-08-08 2020-07-27 反射防止膜付き光学部材及びその製造方法

Publications (1)

Publication Number Publication Date
CN113966409A true CN113966409A (zh) 2022-01-21

Family

ID=74503600

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080043467.8A Pending CN113966409A (zh) 2019-08-08 2020-07-27 带有防反射膜的光学构件及其制造方法

Country Status (3)

Country Link
JP (1) JP7493918B2 (https=)
CN (1) CN113966409A (https=)
WO (1) WO2021024834A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113593408B (zh) * 2021-07-07 2022-09-09 武汉华星光电半导体显示技术有限公司 显示模组及其制作方法、移动终端
CN113900165B (zh) * 2021-11-16 2023-09-22 天津津航技术物理研究所 一种氟化钡基底复合增透膜及其结构设计方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005338366A (ja) * 2004-05-26 2005-12-08 Olympus Corp 反射防止膜及び光学部品
JP2010140008A (ja) * 2008-11-13 2010-06-24 Seiko Epson Corp 光学物品およびその製造方法
JP2012118536A (ja) * 2009-10-09 2012-06-21 Seiko Epson Corp 光学物品、光学物品の製造方法、電子機器

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004061879A (ja) * 2002-07-29 2004-02-26 Ito Kogaku Kogyo Kk 表面保護膜を備えた光学要素
JP2004163549A (ja) * 2002-11-11 2004-06-10 Pentax Corp 反射防止膜
JP5211289B2 (ja) * 2005-11-01 2013-06-12 東海光学株式会社 可視域用プラスチックレンズ
JP4207083B2 (ja) * 2006-04-04 2009-01-14 セイコーエプソン株式会社 光学多層膜フィルタ、光学多層膜フィルタの製造方法および電子機器装置
FR2913116B1 (fr) * 2007-02-23 2009-08-28 Essilor Int Procede de fabrication d'un article optique revetu d'un revetement anti-reflets ou reflechissant ayant des proprietes d'adhesion et de resistance a l'abrasion ameliorees
JP5262066B2 (ja) * 2007-10-31 2013-08-14 凸版印刷株式会社 反射防止フィルムの製造方法及びこれを含む偏光板の製造方法
JP2009139925A (ja) * 2007-11-16 2009-06-25 Epson Toyocom Corp 光学多層膜フィルタ、光学多層膜フィルタの製造方法および電子機器装置
JP2010102157A (ja) * 2008-10-24 2010-05-06 Seiko Epson Corp 光学物品およびその製造方法
JP5777278B2 (ja) * 2009-12-01 2015-09-09 キヤノン株式会社 光学素子の製造方法
JP2012027412A (ja) * 2010-07-28 2012-02-09 Konica Minolta Opto Inc 光学素子およびその製造方法
JP5893271B2 (ja) * 2011-06-10 2016-03-23 オリンパス株式会社 反射防止膜、光学系、及び光学機器
JP6234857B2 (ja) * 2014-03-24 2017-11-22 富士フイルム株式会社 反射防止機能付きレンズの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005338366A (ja) * 2004-05-26 2005-12-08 Olympus Corp 反射防止膜及び光学部品
JP2010140008A (ja) * 2008-11-13 2010-06-24 Seiko Epson Corp 光学物品およびその製造方法
JP2012118536A (ja) * 2009-10-09 2012-06-21 Seiko Epson Corp 光学物品、光学物品の製造方法、電子機器

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
严一心等: "《薄膜技术》", 31 December 1994, 兵器工业出版社, pages: 98 - 99 *
刘金声: "《离子束沉积薄膜技术及应用》", 31 January 2003, 国防工业出版社, pages: 376 - 378 *

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WO2021024834A1 (ja) 2021-02-11
JP7493918B2 (ja) 2024-06-03
JP2021026163A (ja) 2021-02-22

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