CN112573526B - 在外壳内侧具有空洞的粒子及其制造方法、含其的涂布液、及带含其的透明被膜的基材 - Google Patents

在外壳内侧具有空洞的粒子及其制造方法、含其的涂布液、及带含其的透明被膜的基材 Download PDF

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CN112573526B
CN112573526B CN202011031633.0A CN202011031633A CN112573526B CN 112573526 B CN112573526 B CN 112573526B CN 202011031633 A CN202011031633 A CN 202011031633A CN 112573526 B CN112573526 B CN 112573526B
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particles
dispersion
silica
mass
refractive index
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CN112573526A (zh
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二神涉
熊泽光章
村口良
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JGC Catalysts and Chemicals Ltd
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CN202011031633.0A 2019-09-30 2020-09-27 在外壳内侧具有空洞的粒子及其制造方法、含其的涂布液、及带含其的透明被膜的基材 Active CN112573526B (zh)

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JP2019-180756 2019-09-30
JP2019180756A JP7360294B2 (ja) 2019-09-30 2019-09-30 シリカを含む外殻の内側に空洞を有する粒子とその製造方法、該粒子を含む塗布液、及び該粒子を含む透明被膜付基材

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023074970A (ja) * 2021-11-18 2023-05-30 日揮触媒化成株式会社 官能基と珪素を含む外殻と、その内側に空洞を有する粒子の分散液及びその製造方法
JPWO2023175994A1 (ko) * 2022-03-18 2023-09-21
WO2023189785A1 (ja) * 2022-03-31 2023-10-05 日揮触媒化成株式会社 中空シリカ粒子の分散液、及びその製造方法
WO2024047769A1 (ja) * 2022-08-30 2024-03-07 株式会社アドマテックス 球状シリカ粒子

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JP2010083744A (ja) * 2008-09-05 2010-04-15 Jsr Corp シリカ粒子分散液およびその製造方法
TW201034958A (en) * 2008-12-18 2010-10-01 Jgc Catalysts & Chemicals Ltd Chain-shaped silica-based hollow fine particles and process for producing same, coating fluid for transparent coating film formation containing the fine particles, and substrate with transparent coating film
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JP2014058683A (ja) * 2013-10-30 2014-04-03 Jgc Catalysts & Chemicals Ltd 透明被膜形成用塗料の製造方法
CN104164099A (zh) * 2013-05-15 2014-11-26 日挥触媒化成株式会社 改性二氧化硅微粒及其制造方法、薄膜形成用的涂布液、带薄膜的基材、以及光电单元
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CN1972866A (zh) * 2004-07-08 2007-05-30 触媒化成工业株式会社 二氧化硅类微粒的制备方法、涂膜形成用涂料及覆有涂膜的基材
CN1989070A (zh) * 2004-07-21 2007-06-27 触媒化成工业株式会社 二氧化硅类微粒、其制备方法、涂膜形成用涂料及覆有涂膜的基材
CN101312909A (zh) * 2005-11-25 2008-11-26 触媒化成工业株式会社 中空二氧化硅微粒、含有该微粒的透明涂膜形成用组合物、及覆有透明涂膜的基材
JP2010083744A (ja) * 2008-09-05 2010-04-15 Jsr Corp シリカ粒子分散液およびその製造方法
CN102196996A (zh) * 2008-10-31 2011-09-21 旭硝子株式会社 中空粒子、其制造方法、涂料组合物及物品
TW201034958A (en) * 2008-12-18 2010-10-01 Jgc Catalysts & Chemicals Ltd Chain-shaped silica-based hollow fine particles and process for producing same, coating fluid for transparent coating film formation containing the fine particles, and substrate with transparent coating film
JP2011042527A (ja) * 2009-08-21 2011-03-03 Denki Kagaku Kogyo Kk 中空シリカ粉末、その製造方法及び用途
JP2012136363A (ja) * 2010-12-24 2012-07-19 Kao Corp 中空シリカ粒子
WO2013115367A1 (ja) * 2012-02-02 2013-08-08 日産化学工業株式会社 低屈折率膜形成用組成物
CN104080869A (zh) * 2012-02-02 2014-10-01 日产化学工业株式会社 低折射率膜形成用组合物
CN104164099A (zh) * 2013-05-15 2014-11-26 日挥触媒化成株式会社 改性二氧化硅微粒及其制造方法、薄膜形成用的涂布液、带薄膜的基材、以及光电单元
JP2014058683A (ja) * 2013-10-30 2014-04-03 Jgc Catalysts & Chemicals Ltd 透明被膜形成用塗料の製造方法
JP2016041643A (ja) * 2014-08-19 2016-03-31 学校法人東京理科大学 中空シリカ粒子の製造方法
JP2018123043A (ja) * 2017-02-03 2018-08-09 日揮触媒化成株式会社 シリカ系粒子分散液の製造方法、シリカ系粒子分散液、透明被膜形成用塗布液及び透明被膜付基材

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KR20210038362A (ko) 2021-04-07
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JP2021054685A (ja) 2021-04-08
TWI846962B (zh) 2024-07-01
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