CN112301239B - 一种砷化镉的制备方法 - Google Patents
一种砷化镉的制备方法 Download PDFInfo
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- CN112301239B CN112301239B CN202011065253.9A CN202011065253A CN112301239B CN 112301239 B CN112301239 B CN 112301239B CN 202011065253 A CN202011065253 A CN 202011065253A CN 112301239 B CN112301239 B CN 112301239B
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- cadmium
- cadmium arsenide
- arsenide
- furnace
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- FSIONULHYUVFFA-UHFFFAOYSA-N cadmium arsenide Chemical compound [Cd].[Cd]=[As].[Cd]=[As] FSIONULHYUVFFA-UHFFFAOYSA-N 0.000 title claims abstract description 85
- 238000002360 preparation method Methods 0.000 title claims abstract description 16
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 36
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 34
- 229910052793 cadmium Inorganic materials 0.000 claims abstract description 30
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000000843 powder Substances 0.000 claims abstract description 19
- 229910052785 arsenic Inorganic materials 0.000 claims abstract description 18
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000007789 gas Substances 0.000 claims abstract description 18
- 230000001681 protective effect Effects 0.000 claims abstract description 18
- 238000011049 filling Methods 0.000 claims abstract description 17
- 238000001816 cooling Methods 0.000 claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000001301 oxygen Substances 0.000 claims abstract description 10
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000001257 hydrogen Substances 0.000 claims abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 9
- 238000012216 screening Methods 0.000 claims abstract description 7
- 238000005984 hydrogenation reaction Methods 0.000 claims abstract description 4
- 230000002194 synthesizing effect Effects 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 17
- 238000011068 loading method Methods 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 238000003801 milling Methods 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 2
- 239000004615 ingredient Substances 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 238000011084 recovery Methods 0.000 claims description 2
- 238000009461 vacuum packaging Methods 0.000 claims description 2
- 239000008187 granular material Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 230000006872 improvement Effects 0.000 description 6
- 239000012535 impurity Substances 0.000 description 4
- 238000001451 molecular beam epitaxy Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000005303 weighing Methods 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000002096 quantum dot Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000004729 solvothermal method Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000007716 flux method Methods 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/007—Preparing arsenides or antimonides, especially of the III-VI-compound type, e.g. aluminium or gallium arsenide
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C20/00—Alloys based on cadmium
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
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CN202011065253.9A CN112301239B (zh) | 2020-09-30 | 2020-09-30 | 一种砷化镉的制备方法 |
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CN202011065253.9A CN112301239B (zh) | 2020-09-30 | 2020-09-30 | 一种砷化镉的制备方法 |
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CN112301239A CN112301239A (zh) | 2021-02-02 |
CN112301239B true CN112301239B (zh) | 2021-10-29 |
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CN113120957B (zh) * | 2021-04-23 | 2022-07-01 | 先导薄膜材料(广东)有限公司 | 一种砷化镉的除氧方法 |
CN113023688B (zh) * | 2021-04-23 | 2023-03-31 | 先导薄膜材料(广东)有限公司 | 一种掺砷碲化镉的制备方法 |
CN113603137B (zh) * | 2021-09-17 | 2023-02-17 | 广东先导稀材股份有限公司 | 一种砷化镉的制备方法 |
CN114956169B (zh) * | 2022-05-17 | 2023-08-01 | 广东先导稀材股份有限公司 | 一种低氧砷化镉的合成方法 |
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DE1265142B (de) * | 1961-03-27 | 1968-04-04 | Philips Nv | Verfahren zur Herstellung von Einkristallen, insbesondere aus Halbleitermaterial |
FR2034113A1 (en) * | 1969-02-06 | 1970-12-11 | Menoret Maurice | Semipermant hall effect memory matrix |
CN103936068B (zh) * | 2014-05-07 | 2015-10-21 | 吉林大学 | 一种砷化镉半导体纳米簇的制备方法 |
CN103936069B (zh) * | 2014-05-07 | 2015-10-21 | 吉林大学 | 一种砷化镉量子点的制备方法 |
CN104928531B (zh) * | 2015-05-12 | 2017-03-01 | 哈尔滨工业大学 | 一种均匀化TiAl合金层片组织及其制备方法 |
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Effective date of registration: 20240605 Address after: 221100 Xuzhou High tech Industrial Development Zone, Jiangsu Province, North Fifth Ring Road, West Tongchuang Road, and No.1 Qianfeng South Road Patentee after: Pioneer Electronic Technology Co.,Ltd. Country or region after: China Address before: 511500 Heyun Town Industrial Zone, Qingxin District, Qingyuan City, Guangdong Province (beside Yuba highway) Patentee before: FIRST RARE MATERIALS Co.,Ltd. Country or region before: China |
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