CN111992221A - 三维中空高分散金属催化剂及其制备方法 - Google Patents
三维中空高分散金属催化剂及其制备方法 Download PDFInfo
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- CN111992221A CN111992221A CN202010815739.3A CN202010815739A CN111992221A CN 111992221 A CN111992221 A CN 111992221A CN 202010815739 A CN202010815739 A CN 202010815739A CN 111992221 A CN111992221 A CN 111992221A
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- Prior art keywords
- dimensional hollow
- metal
- salt
- deionized water
- bimetallic oxide
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 106
- 239000002184 metal Substances 0.000 title claims abstract description 106
- 239000003054 catalyst Substances 0.000 title claims abstract description 59
- 239000006185 dispersion Substances 0.000 title claims abstract description 25
- 238000002360 preparation method Methods 0.000 title abstract description 12
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 50
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 48
- 239000001301 oxygen Substances 0.000 claims abstract description 48
- 238000006243 chemical reaction Methods 0.000 claims abstract description 42
- 150000003839 salts Chemical class 0.000 claims abstract description 37
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 27
- 238000001027 hydrothermal synthesis Methods 0.000 claims abstract description 19
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 19
- 238000010168 coupling process Methods 0.000 claims abstract description 16
- 230000008878 coupling Effects 0.000 claims abstract description 14
- 238000005859 coupling reaction Methods 0.000 claims abstract description 14
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 14
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 13
- 238000012986 modification Methods 0.000 claims abstract description 12
- 230000004048 modification Effects 0.000 claims abstract description 11
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 10
- 150000002815 nickel Chemical class 0.000 claims abstract description 10
- 239000012752 auxiliary agent Substances 0.000 claims abstract description 9
- 238000005516 engineering process Methods 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 57
- 239000008367 deionised water Substances 0.000 claims description 54
- 229910021641 deionized water Inorganic materials 0.000 claims description 54
- 238000005406 washing Methods 0.000 claims description 48
- 238000001035 drying Methods 0.000 claims description 27
- 238000001816 cooling Methods 0.000 claims description 24
- 239000012065 filter cake Substances 0.000 claims description 24
- 238000001914 filtration Methods 0.000 claims description 24
- 239000004094 surface-active agent Substances 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 23
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 21
- 238000003756 stirring Methods 0.000 claims description 16
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical group [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 14
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical group CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 12
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical group [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
- 239000003638 chemical reducing agent Substances 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 10
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- 230000001678 irradiating effect Effects 0.000 claims description 8
- 235000006408 oxalic acid Nutrition 0.000 claims description 7
- 238000002256 photodeposition Methods 0.000 claims description 7
- 239000012716 precipitator Substances 0.000 claims description 7
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 claims description 6
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims description 6
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical group CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 claims description 6
- 125000005456 glyceride group Chemical group 0.000 claims description 6
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 6
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 6
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 6
- -1 rare earth metal salt Chemical class 0.000 claims description 6
- 239000012279 sodium borohydride Substances 0.000 claims description 6
- 229910000033 sodium borohydride Inorganic materials 0.000 claims description 6
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 6
- 239000001119 stannous chloride Substances 0.000 claims description 6
- 235000011150 stannous chloride Nutrition 0.000 claims description 6
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims description 5
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 claims description 5
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 5
- WNPMJIKMURUYFG-UHFFFAOYSA-N [N+](=O)([O-])[O-].[Ge+2].[N+](=O)([O-])[O-] Chemical group [N+](=O)([O-])[O-].[Ge+2].[N+](=O)([O-])[O-] WNPMJIKMURUYFG-UHFFFAOYSA-N 0.000 claims description 5
- 239000004202 carbamide Substances 0.000 claims description 5
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 5
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 5
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 claims description 5
- 239000004220 glutamic acid Substances 0.000 claims description 5
- 235000013922 glutamic acid Nutrition 0.000 claims description 5
- DOLZKNFSRCEOFV-UHFFFAOYSA-L nickel(2+);oxalate Chemical compound [Ni+2].[O-]C(=O)C([O-])=O DOLZKNFSRCEOFV-UHFFFAOYSA-L 0.000 claims description 5
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 claims description 5
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 claims description 5
- 239000001509 sodium citrate Substances 0.000 claims description 5
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 claims description 5
- 229940038773 trisodium citrate Drugs 0.000 claims description 5
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 4
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 claims description 4
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 claims description 4
- 238000011068 loading method Methods 0.000 claims description 4
- 229940078494 nickel acetate Drugs 0.000 claims description 4
- YWECOPREQNXXBZ-UHFFFAOYSA-N praseodymium(3+);trinitrate Chemical compound [Pr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O YWECOPREQNXXBZ-UHFFFAOYSA-N 0.000 claims description 4
- 235000002906 tartaric acid Nutrition 0.000 claims description 4
- 239000011975 tartaric acid Substances 0.000 claims description 4
- 238000001132 ultrasonic dispersion Methods 0.000 claims description 4
- 239000004246 zinc acetate Substances 0.000 claims description 4
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 3
- XURCIPRUUASYLR-UHFFFAOYSA-N Omeprazole sulfide Chemical compound N=1C2=CC(OC)=CC=C2NC=1SCC1=NC=C(C)C(OC)=C1C XURCIPRUUASYLR-UHFFFAOYSA-N 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 claims description 3
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 229940102253 isopropanolamine Drugs 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract description 29
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 abstract description 27
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract description 16
- 238000006356 dehydrogenation reaction Methods 0.000 abstract description 14
- 238000006555 catalytic reaction Methods 0.000 abstract description 5
- 230000008021 deposition Effects 0.000 abstract description 3
- 238000007086 side reaction Methods 0.000 abstract description 3
- 239000002135 nanosheet Substances 0.000 description 10
- 230000003197 catalytic effect Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000006722 reduction reaction Methods 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000001338 self-assembly Methods 0.000 description 3
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 2
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004005 microsphere Substances 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 230000001699 photocatalysis Effects 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000011946 reduction process Methods 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 238000012824 chemical production Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229910000373 gallium sulfate Inorganic materials 0.000 description 1
- SBDRYJMIQMDXRH-UHFFFAOYSA-N gallium;sulfuric acid Chemical compound [Ga].OS(O)(=O)=O SBDRYJMIQMDXRH-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011943 nanocatalyst Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
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- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/84—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/85—Chromium, molybdenum or tungsten
- B01J23/86—Chromium
- B01J23/866—Nickel and chromium
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- B01J23/002—Mixed oxides other than spinels, e.g. perovskite
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- B01J23/08—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of gallium, indium or thallium
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- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
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- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/835—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with germanium, tin or lead
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- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
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- B01J37/344—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation of electromagnetic wave energy
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Abstract
本发明公开了三维中空高分散金属催化剂及其制备方法,属于工业催化技术领域,首先通过微波水热法制备三维中空双金属氧化物,再通过对该双金属氧化物进行氧等离子体改性、硅烷偶联剂表面疏水再次改性,制得改性三维中空双金属氧化物载体,加入活性组分镍盐、助剂第IVA族元素金属盐和稀土元素金属盐,采用光沉积技术将活性组分与助剂金属负载到该改性载体上,空气流中400~600℃焙烧,得三维中空高分散金属催化剂,以该催化剂的总质量计,镍的质量百分比为20~40wt%,第IVA族元素金属的质量百分比为0.01~5wt%,稀土元素金属的质量百分比为0.01~5wt%。该催化剂应用于催化吡啶脱氢偶联合成2,2’‑联吡啶反应,具有催化剂用量低、副反应少、短流程等优点,具有良好的工业应用前景。
Description
技术领域
本发明属于工业催化技术领域,具体涉及三维中空高分散金属催化剂及其制备方法。
背景技术
2,2’-联吡啶是联吡啶重要的异构体之一,作为一种重要的化工基础原料,被广泛应用于有机合成、“三药”制备、重金属离子检测指示剂、化学镀铜添加剂等。因此,研究开发高效率、安全性好和低污染的2,2’-联吡啶绿色合成催化剂,具有重要的工业应用价值。
目前2,2’-联吡啶的合成方法报道的主要有美国专利US4147874A的吡啶羰基化合物环化法、中国专利CN107935919A的Ullmann法、中国专利CN105461620A的直接脱氢偶联法等,其中,吡啶羰基化合物环化法由于存在吡啶羰基化合物价格昂贵、反应温度高、副产物多等问题,该方法已被淘汰,而Ullmann法虽工艺比较成熟,但反应路线较长、生产效率低,生产过程还存在卤素反应物有环境污染隐患,不符合绿色化工生产要求,直接脱氢偶联法合成2,2’-联吡啶的合成路线短、副反应少、环境友好,该方法最终能工业化应用的关键是研发高效脱氢偶联催化剂。
美国专利US3152137公开了一种雷尼镍催化剂的制备方法,将主要调节镍铝合金比例优化催化剂制备方法,该催化剂应用于吡啶直接脱氢偶联合成2,2’-联吡啶反应,虽吡啶转化率高,但制备催化剂安全性差、极易自燃、催化剂寿命短、易失活,且副反应多、产物复杂;中国专利CN105859610A公开了一种以贵金属Pd、Pt、Ru、Au、Ag、Rh和非贵金属Ni、Cu、Fe、Zn、Co中任意两种组合为活性金属,氧化铝为载体的负载型双金属纳米催化剂,应用于吡啶直接脱氢偶联生产2,2’-联吡啶反应中,该催化剂制备过程简单,但催化剂使用量大,导致催化剂成本上升,且活性金属在载体上分散度低,活性金属与载体之间的相互作用力较弱,在反应过程活性组分容易流失导致催化活性下降;中国专利CN107935919A公开了一种以Al2O3-SiO2-MgO为载体的负载型镍、锰、镧、铈脱氢催化剂,用于吡啶脱氢偶联制备2,2’-联吡啶,该专利主要进行了催化剂活性组分的筛选,目前报道的吡啶脱氢偶联制备2,2’-联吡啶反应大都采用釜式间歇反应,催化剂用量大,因此,开发适用在催化剂用量低、副反应少、流程短的固定床反应器进行直接脱氢偶联法合成2,2’-联吡啶的高效催化剂具有重要意义。
发明内容
发明目的:本发明提出三维中空高分散金属催化剂,本发明还公开了其制备方法,首先通过微波水热法制备三维中空双金属氧化物,再通过对该双金属氧化物进行氧等离子体改性、硅烷偶联剂表面疏水再次改性,制得改性三维中空双金属氧化物载体,加入活性组分镍盐、助剂第IVA族元素金属盐和稀土元素金属盐,采用光沉积技术将活性组分与助剂负载到该改性载体上。
技术方案:为了实现上述发明目的,本发明采用如下技术方案:
三维中空高分散金属催化剂,该催化剂以改性三维中空双金属氧化物为载体,以镍为活性组分,第IVA族元素金属、稀土元素金属为助剂,以该催化剂总质量计,镍的质量百分比为20~40wt%,助剂中第IVA族元素金属的质量百分比为0.01~5wt%,助剂中稀土元素金属的质量百分比为0.01~5wt%,余量为改性三维中空双金属氧化物。
进一步地,所述的改性三维中空双金属氧化物是通过对三维中空双金属氧化物进行氧等离子体改性处理及硅烷偶联表面疏水再次改性制得,三维中空双金属氧化物由微波水热法制得。
进一步地,所述的三维中空高分散金属催化剂的制备方法,该催化剂是采用光沉积技术将活性组分和助剂金属负载到改性三维中空双金属氧化物载体上制得,包括如下步骤:
步骤1)室温下,将金属A盐、金属B盐、表面活性剂、多元羧酸、沉淀剂、去离子水、无水乙醇加入反应釜中,30~80℃微波水热反应0.5~3h,冷却至室温后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,干燥后升温至300~1000℃,在5~50mL/min的空气流中焙烧3~10h,降至室温,得三维中空双金属氧化物;
步骤2)室温下,将步骤1)中制得的三维中空双金属氧化物放入氧等离子体仪中处理2~10min,得氧等离子体改性材料,分别将氧等离子体改性材料、硅烷偶联剂、去离子水加入到反应釜中,超声分散0.5~2h后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,干燥后,得改性三维中空双金属氧化物;
步骤3)室温下,分别将金属镍盐、第IVA族元素金属盐、稀土元素金属盐、表面活性剂、去离子水、步骤2)中制得的改性三维中空双金属氧化物、氧牺牲剂加入反应釜中,搅拌1~2h后,再将还原剂加入反应釜中,在搅拌条件下使用紫外灯照射1~5h,过滤;用去离子水洗涤滤饼至洗涤液的pH至7,干燥后,在5~50mL/min的空气流中、400~600℃下焙烧3~10h,降至室温,得三维中空高分散金属催化剂。
进一步地,步骤1)中,去离子水:无水乙醇:金属B盐:表面活性剂:多元羧酸:沉淀剂:金属A盐的质量比为20~50:20~50:0.1~10:0.01~0.05:0.01~0.1:0.2~2:1;步骤2)中,氧等离子体改性材料:硅烷偶联剂:去离子水的质量比为0.01~0.02:0.0002~0.005:1;步骤3)中,去离子水:第IVA族元素金属盐:稀土元素金属盐:表面活性剂:还原剂:改性三维中空双金属氧化物:氧牺牲剂:金属镍盐的质量比为100~500:0.0001~0.5:0.0001~0.5:0.01~0.05:0.01~0.2:1~5:1~2:1。
进一步地,步骤1)中所述的金属A盐为硫酸铬、硝酸铟、氯化镓中的一种,所述的金属B盐为硝酸钡、醋酸锌、硫酸铜中的一种,所述的表面活性剂为脂肪酸甘油酯或N-酰基谷氨酸,所述的多元羧酸为酒石酸或草酸,所述的沉淀剂为碳酸钠或尿素。
进一步地,所述的步骤1)-3)中,所述的干燥的条件均为60~120℃下干燥12~24h。
进一步地,步骤1)中,所述的微波水热反应的微波功率为400~800W。
进一步地,步骤2)中,所述的硅烷偶联剂为乙烯基三乙氧基硅烷或乙烯基三(β-甲氧乙氧基)硅烷。
进一步地,步骤2)中,所述的氧等离子体仪处理的射频功率为100~600W,使用的气源为1~20%(v/v)O2/N2混合气,气体流速为1~100mL/min;步骤3)中,所述的紫外灯的功率为500~1500W。
进一步地,步骤3)中,所述的金属镍盐为醋酸镍、草酸镍、碳酸镍中的一种,第IVA族元素金属盐为硝酸锗或氯化亚锡,稀土元素金属盐为硝酸铈或硝酸镨,表面活性剂为聚乙烯吡咯烷酮或十六烷基三甲基溴化铵,还原剂选自硼氢化钠或柠檬酸三钠,氧牺牲剂选自异丙醇或三乙醇胺。
本发明从增大催化剂比表面积、提高活性金属分散度、改善活性组分-载体相互作用力、调节催化反应过程中反应物的吸附和脱附性能、提高催化剂稳定性出发,采用微波水热法制备三维中空双金属氧化物,通过氧等离子体处理得氧等离子体处理材料,再通过硅烷偶联剂表面疏水改性得改性三维中空双金属氧化物载体,镍和助剂金属采用光沉积技术负载到改性三维中空双金属氧化物载体表面,开发了一种适用于固定床反应器进行吡啶脱氢偶联一步合成2,2’-联吡啶的高效催化剂。
有益效果:与现有技术相比,本发明具备以下优点:
(1)本发明的微波水热法制备三维中空双金属氧化物,采用三价金属A盐、二价金属B盐与沉淀剂发生复分解反应的同时进行自组装形成了二维纳米片结构材料,在自组装过程中本发明反应过程中同时加入的多元羧酸会与沉淀剂发生反应产生CO2气体,反应性CO2气体氛确保了该二维纳米片的不团聚和高度分散性,同时加入的表面活性剂的亲水端与二维纳米片表面羟基配位进一步提高了二维纳米片的分散性,防止该二维纳米片的堆叠,确保了二维纳米片结构稳定性和高度分散性;另外本发明将微波与水热反应相结合,可使反应快速、均匀加热,有效消除反应过程中温度梯度的影响,降低水热反应温度50℃以上,降低了能耗,微波场更是提高了二维纳米片自组装速率和二维纳米片表面羟基与表面活性剂的亲水端配位速率,从而快速包裹表面活性剂的疏水端,形成二维纳米片包裹微球,该微球热分解形成了结构稳定的三维中空双金属氧化物,二维纳米片组成的三维中空结构增大了载体比表面,既为活性组分的负载和分散提供了条件,也有利于反应过程中传质和传热;
(2)采用氧等离子对三维中空双金属氧化物表面进行处理,氧等离子增加了三维中空双金属氧化物表面的羟基密度,在后续硅烷偶联剂进一步改性时,增强了硅烷偶联剂与材料的表面反应效率,提高了三维中空双金属氧化物表面疏水改性效果,进一步提高了改性材料表面稳定性;
(3)采用光沉积技术将活性组分与助剂负载到改性三维中空双金属氧化物载体表面,在光沉积过程中,化学还原与光催化还原相结合,与只采用化学还原或光催化还原单一的还原方法相比,保证了活性金属和助剂金属在光沉积过程中被充分还原。与传统的浸演法或沉淀法相比,光沉积技术不但避免了高温还原过程中活性组分的烧结和团聚,增加了活性组分和载体在载休表面的分散度,而且避免了在催化剂还原过程中耗用无法回收的氢或其它还原性气体;
(4)催化剂制备的光沉积过程中,镍、助剂金属与表面活性剂的亲水端实现了配位,同时表面活性剂疏水端之间、表面活性剂疏水端与改性三维中空双金属氧化物载体表面疏水端之间的双重静电斥力提高了镍和助剂金属在改性三维中空双金属氧化物载体表面的分散度,这种疏水驱动作用机制避免了镍和助剂金属的团聚,为催化反应提供了大量的活性位点,提高催化活性,焙烧时表面活性剂热分解会产生大量的孔道,进一步提高了催化剂的比表面积,有利于催化反应过程中的传质和传热;
(5)第IVA族元素金属的加入,进一步调变了活性金属-助剂金属-载体之间的相互作用和催化剂表面的酸碱性,有效防止催化反应过程中活性组分镍的流失,提高反应的稳定性。稀土元素金属的加入有效调节了镍颗粒周围的电子云分布,改善了反应过程中吡啶与2,2’-联吡啶的吸附和脱附性能,第IVA族元素金属和稀土元素金属相互协同提高了催化反应活性。
具体实施方式
下面结合具体实施实例对本发明进一步说明。
三维中空高分散金属催化剂,该催化剂以镍为活性组分,第IVA族元素金属、稀土元素金属为助剂,以该催化剂总质量计,镍的质量百分比为20~40wt%,助剂中第IVA族元素金属的质量百分比为0.01~5wt%,助剂中稀土元素金属的质量百分比为0.01~5wt%。该催化剂是采用光沉积技术将活性组分和助剂负载到改性三维中空双金属氧化物载体上制得,改性三维中空双金属氧化物是通过对三维中空双金属氧化物进行氧等离子体改性处理及硅烷偶联表面疏水再次改性制得,三维中空双金属氧化物由微波水热法制得。
三维中空高分散金属催化剂的制备方法,包括如下步骤:
步骤1)室温下,将金属A盐、金属B盐、表面活性剂、多元羧酸、沉淀剂、去离子水、无水乙醇加入反应釜中,30~80℃微波水热反应0.5~3h,冷却至室温后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,干燥后升温至300~1000℃,在5~50mL/min的空气流中焙烧3~10h,降至室温,得三维中空双金属氧化物;
步骤2)室温下,将步骤1)中制得的三维中空双金属氧化物放入氧等离子体仪中处理2~10min,得氧等离子体改性材料,分别将氧等离子体改性材料、硅烷偶联剂、去离子水加入到反应釜中,超声分散0.5~2h后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,干燥后,得改性三维中空双金属氧化物;
步骤3)室温下,分别将金属镍盐、第IVA族元素金属盐、稀土元素金属盐、表面活性剂、去离子水、步骤2)中制得的改性三维中空双金属氧化物、氧牺牲剂加入反应釜中,搅拌1~2h后,再将还原剂加入反应釜中,在搅拌条件下使用紫外灯照射1~5h,过滤;用去离子水洗涤滤饼至洗涤液的pH至7,干燥后,在5~50mL/min的空气流中、400~600℃下焙烧3~10h,降至室温,得三维中空高分散金属催化剂。
步骤1)中,去离子水:无水乙醇:金属B盐:表面活性剂:多元羧酸:沉淀剂:金属A盐的质量比为20~50:20~50:0.1~10:0.01~0.05:0.01~0.1:0.2~2:1;步骤2)中,氧等离子体改性材料:硅烷偶联剂:去离子水的质量比为0.01~0.02:0.0002~0.005:1;步骤3)中,去离子水:第IVA族元素金属盐:稀土元素金属盐:表面活性剂:还原剂:改性三维中空双金属氧化物:氧牺牲剂:金属镍盐的质量比为100~500:0.0001~0.5:0.0001~0.5:0.01~0.05:0.01~0.2:1~5:1~2:1。
步骤1)中金属A盐为硫酸铬、硝酸铟、氯化镓中的一种,金属B盐为硝酸钡、醋酸锌、硫酸铜中的一种,表面活性剂为脂肪酸甘油酯或N-酰基谷氨酸,多元羧酸为酒石酸或草酸,沉淀剂为碳酸钠或尿素。
步骤1)中微波水热反应的微波功率为400~800W。
步骤2)中硅烷偶联剂为乙烯基三乙氧基硅烷或乙烯基三(β-甲氧乙氧基)硅烷。
步骤2)中氧等离子体仪处理的射频功率为100~600W,使用的气源为1~20%O2/N2混合气,气体流速为1~100mL/min。
步骤3)中金属镍盐为醋酸镍、草酸镍、碳酸镍中的一种,第IVA族元素金属盐为硝酸锗或氯化亚锡,稀土元素金属盐为硝酸铈或硝酸镨,表面活性剂为聚乙烯吡咯烷酮或十六烷基三甲基溴化铵,还原剂选自硼氢化钠或柠檬酸三钠,氧牺牲剂选自异丙醇或三乙醇胺。
步骤3)中紫外灯的功率为500~1500W。
实施例1:
25℃下,将1.2g醋酸铬、3.4g硝酸钡、0.05g脂肪酸甘油酯、0.06g酒石酸、0.85g碳酸钠、30g无水乙醇、30g去离子水加入反应釜中,选用微波功率500W,在50℃下微波水热反应2h,冷却至室温后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,80℃干燥12h,在20mL/min的空气流中500℃下焙烧6h,降至室温,得三维中空双金属氧化物;
25℃下,将1.0g三维中空双金属氧化物放入氧等离子体仪中,选用射频功率500W,在50mL/min的5%O2/N2混合气流中处理5min得氧等离子体改性材料,将氧等离子体改性材料、0.13g乙烯基三乙氧基硅烷、100g去离子水加入到反应釜中,超声分散1h后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,80℃干燥12h,得改性三维中空双金属氧化物;
25℃下,将0.3g醋酸镍、0.08g硝酸锗、0.12g硝酸铈、0.01g聚乙烯吡咯烷酮、1g改性三维中空双金属氧化物、0.5g异丙醇、100g去离子水加入反应釜中,搅拌1h,加入0.05g硼氢化钠,选用功率为800W的紫外灯,在搅拌条件下照射2h,过滤;用去离子水洗涤滤饼至洗涤液的pH至7,80℃干燥12h,在20mL/min的空气流中400℃下焙烧10h,降至室温,得三维中空高分散金属催化剂。
上述催化剂催化吡啶脱氢偶联制2,2’-联吡啶的催化性能:2,2’-联吡啶的单程最高产率为9.41%,50h时2,2’-联吡啶的单程产率为1.54%。
实施例2:
25℃下,将1.7g氯化铟、4.3g醋酸锌、0.08g N-酰基谷氨酸、0.1g草酸、1.02g尿素、50g无水乙醇、50g去离子水加入反应釜中,选用微波功率400W,在60℃下微波水热反应2.5h,冷却至室温后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,80℃干燥12h,在30mL/min的空气流中600℃下焙烧3h,降至室温,得三维中空双金属氧化物;
25℃下,将1.5g三维中空双金属氧化物放入氧等离子体仪中,选用射频功率300W,在60mL/min的10%O2/N2混合气流中处理5min得氧等离子体改性材料,将氧等离子体改性材料、0.37g乙烯基三(β-甲氧乙氧基)硅烷、100g去离子水加入到反应釜中,超声分散1.5h后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,100℃干燥12h,得改性三维中空双金属氧化物;
25℃下,将0.5g草酸镍、0.17g氯化亚锡、0.12g硝酸镨、0.02g十六烷基三甲基溴化铵、1.5g改性三维中空双金属氧化物、0.7g三乙醇胺、100g去离子水加入反应釜中,搅拌1.5h,加入0.08g柠檬酸三钠,选用紫外灯功率为1200W,搅拌条件下使用紫外灯照射1h,过滤;用去离子水洗涤滤饼至洗涤液的pH至7,80℃干燥12h,在30mL/min的空气流中550℃下焙烧6h,降至室温,得三维中空高分散金属催化剂。
上述催化剂催化吡啶脱氢偶联制2,2’-联吡啶的催化性能:2,2’-联吡啶的单程最高产率为11.17%,50h时2,2’-联吡啶的单程产率为2.11%。
实施例3:
25℃下,将3.7g硫酸镓、12.6g硫酸铜、0.15g脂肪酸甘油酯、0.3g草酸、6.62g碳酸钠、80g无水乙醇、80g去离子水加入反应釜中,选用微波功率800W,在80℃下微波水热反应0.5h,冷却至室温后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,100℃干燥12h,在50mL/min的空气流中400℃下焙烧3h,降至室温,得三维中空双金属氧化物;
25℃下,将1.2g三维中空双金属氧化物放入氧等离子体仪中,选用射频功率100W,在80mL/min的10%O2/N2混合气流中处理6min得氧等离子体改性材料,将氧等离子体改性材料、0.48g乙烯基三(β-甲氧乙氧基)硅烷、100g去离子水加入到反应釜中,超声分散1h后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,120℃干燥12h,得改性三维中空双金属氧化物;
25℃下,将0.48g碳酸镍、0.18g氯化亚锡、0.16g硝酸铈、0.02g聚乙烯吡咯烷酮、1.8g改性三维中空双金属氧化物、0.6g三乙醇胺、100g去离子水加入反应釜中,搅拌2h,加入0.06g柠檬酸三钠,选用紫外灯功率为1000W,搅拌条件下使用紫外灯照射1.5h,过滤;用去离子水洗涤滤饼至洗涤液的pH至7,120℃干燥12h,在10mL/min的空气流中600℃下焙烧10h,降至室温,得三维中空高分散金属催化剂。
上述催化剂催化吡啶脱氢偶联制2,2’-联吡啶的催化性能:2,2’-联吡啶的单程最高产率为10.36%,50h时2,2’-联吡啶的单程产率为2.07%。
实施例4:
25℃下,将1.4g醋酸铬、3.7g硫酸铜、0.05g N-酰基谷氨酸、0.07g草酸、1.73g尿素、60g无水乙醇、60g去离子水加入反应釜中,选用微波功率800W,在80℃下微波水热反应1h,冷却至室温后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,90℃干燥24h,在30mL/min的空气流中800℃下焙烧3h,降至室温,得三维中空双金属氧化物;
25℃下,将1.8g三维中空双金属氧化物放入氧等离子体仪中,选用射频功率200W,在80mL/min的15%O2/N2混合气流中处理6min得氧等离子体改性材料,将氧等离子体改性材料、0.18g乙烯基三乙氧基硅烷、100g去离子水加入到反应釜中,超声分散0.5h后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,100℃干燥12h,得改性三维中空双金属氧化物;
25℃下,将0.9g草酸镍、0.17g硝酸锗、0.86g硝酸铈、0.04g十六烷基三甲基溴化铵、2.7g改性三维中空双金属氧化物、1.5g异丙醇、100g去离子水加入反应釜中,搅拌1h,加入0.07g硼氢化钠,选用紫外灯功率为1200W,搅拌条件下使用紫外灯照射4h,过滤;用去离子水洗涤滤饼至洗涤液的pH至7,90℃干燥24h,在50mL/min的空气流中500℃下焙烧5h,降至室温,得三维中空高分散金属催化剂。
上述催化剂催化吡啶脱氢偶联制2,2’-联吡啶的催化性能:2,2’-联吡啶的单程最高产率为9.16%,50h时2,2’-联吡啶的单程产率为1.27%。
实施例5:
25℃下,将3.4g氯化铟、11.6g硝酸钡、0.15g脂肪酸甘油酯、0.26g草酸、5.37g碳酸钠、80g无水乙醇、80g去离子水加入反应釜中,选用微波功率500W,在40℃下微波水热反应3h,冷却至室温后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,100℃干燥12h,在30mL/min的空气流中700℃下焙烧6h,降至室温,得三维中空双金属氧化物;
25℃下,将1.3g三维中空双金属氧化物放入氧等离子体仪中,选用射频功率500W,在20mL/min的10%O2/N2混合气流中处理2min得氧等离子体改性材料,将氧等离子体改性材料、0.31g乙烯基三乙氧基硅烷、100g去离子水加入到反应釜中,超声分散1h后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,80℃干燥12h,得改性三维中空双金属氧化物;
25℃下,将0.88g碳酸镍、0.37g氯化亚锡、0.15g硝酸铈、0.03g聚乙烯吡咯烷酮、4.1g改性三维中空双金属氧化物、1g异丙醇、100g去离子水加入反应釜中,搅拌1h,加入0.17g硼氢化钠,选用紫外灯功率为600W,搅拌条件下使用紫外灯照射4.5h,过滤;用去离子水洗涤滤饼至洗涤液的pH至7,100℃干燥12h,在20mL/min的空气流中400℃下焙烧10h,降至室温,得三维中空高分散金属催化剂。
上述催化剂催化吡啶脱氢偶联制2,2’-联吡啶的催化性能:2,2’-联吡啶的单程最高产率为9.61%,50h时2,2’-联吡啶的单程产率为1.03%。
以上所述仅是本发明的优选实施方式,应当指出:对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。
Claims (10)
1.三维中空高分散金属催化剂,其特征在于:该催化剂以改性三维中空双金属氧化物为载体,以镍为活性组分,第IVA族元素金属、稀土元素金属为助剂,以该催化剂总质量计,镍的质量百分比为20~40wt%,助剂中第IVA族元素金属的质量百分比为0.01~5wt%,助剂中稀土元素金属的质量百分比为0.01~5wt%,余量为改性三维中空双金属氧化物。
2.根据权利要求1所述的三维中空高分散金属催化剂,其特征在于:所述的改性三维中空双金属氧化物是通过对三维中空双金属氧化物进行氧等离子体改性处理及硅烷偶联表面疏水再次改性制得,三维中空双金属氧化物由微波水热法制得。
3.权利要求1所述的三维中空高分散金属催化剂的制备方法,其特征在于:该三维中空高分散金属催化剂是采用光沉积技术将活性组分和助剂金属负载到改性三维中空双金属氧化物载体上制得,包括如下步骤:
步骤1)室温下,将金属A盐、金属B盐、表面活性剂、多元羧酸、沉淀剂、去离子水、无水乙醇加入反应釜中,30~80℃微波水热反应0.5~3h,冷却至室温后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,干燥后升温至300~1000℃,在5~50mL/min的空气流中焙烧3~10h,降至室温,得三维中空双金属氧化物;
步骤2)室温下,将步骤1)中制得的三维中空双金属氧化物放入氧等离子体仪中处理2~10min,得氧等离子体改性材料,分别将氧等离子体改性材料、硅烷偶联剂、去离子水加入到反应釜中,超声分散0.5~2h后过滤,用去离子水洗涤滤饼至洗涤液的pH至7,干燥后,得改性三维中空双金属氧化物;
步骤3)室温下,分别将金属镍盐、第IVA族元素金属盐、稀土元素金属盐、表面活性剂、去离子水、步骤2)中制得的改性三维中空双金属氧化物、氧牺牲剂加入反应釜中,搅拌1~2h后,再将还原剂加入反应釜中,在搅拌条件下使用紫外灯照射1~5h,过滤;用去离子水洗涤滤饼至洗涤液的pH至7,干燥后,在5~50mL/min的空气流中、400~600℃下焙烧3~10h,降至室温,得三维中空高分散金属催化剂。
4.根据权利要求3所述的三维中空高分散金属催化剂的制备方法,其特征在于:步骤1)中,去离子水:无水乙醇:金属B盐:表面活性剂:多元羧酸:沉淀剂:金属A盐的质量比为20~50:20~50:0.1~10:0.01~0.05:0.01~0.1:0.2~2:1;步骤2)中,氧等离子体改性材料:硅烷偶联剂:去离子水的质量比为0.01~0.02:0.0002~0.005:1;步骤3)中,去离子水:第IVA族元素金属盐:稀土元素金属盐:表面活性剂:还原剂:改性三维中空双金属氧化物:氧牺牲剂:金属镍盐的质量比为100~500:0.0001~0.5:0.0001~0.5:0.01~0.05:0.01~0.2:1~5:1~2:1。
5.根据权利要求3所述的三维中空高分散金属催化剂的制备方法,其特征在于:步骤1)中所述的金属A盐为硫酸铬、硝酸铟、氯化镓中的一种,所述的金属B盐为硝酸钡、醋酸锌、硫酸铜中的一种,所述的表面活性剂为脂肪酸甘油酯或N-酰基谷氨酸,所述的多元羧酸为酒石酸或草酸,所述的沉淀剂为碳酸钠或尿素。
6.根据权利要求3所述的三维中空高分散金属催化剂的制备方法,其特征在于:所述的步骤1)-3)中,所述的干燥的条件均为60~120℃干燥12~24h。
7.根据权利要求3所述的三维中空高分散金属催化剂的制备方法,其特征在于:步骤1)中,所述的微波水热反应的微波功率为400~800W。
8.根据权利要求3所述的三维中空高分散金属催化剂的制备方法,其特征在于:步骤2)中,所述的硅烷偶联剂为乙烯基三乙氧基硅烷或乙烯基三(β-甲氧乙氧基)硅烷。
9.根据权利要求3所述的三维中空高分散金属催化剂的制备方法,其特征在于:步骤2)中,所述的氧等离子体仪处理的射频功率为100~600W,使用的气源为1~20%(v/v)O2/N2混合气,气体流速为1~100mL/min;步骤3)中,所述的紫外灯的功率为500~1500W。
10.根据权利要求3所述的三维中空高分散金属催化剂的制备方法,其特征在于:步骤3)中,所述的金属镍盐为醋酸镍、草酸镍、碳酸镍中的一种,第IVA族元素金属盐为硝酸锗或氯化亚锡,稀土元素金属盐为硝酸铈或硝酸镨,表面活性剂为聚乙烯吡咯烷酮或十六烷基三甲基溴化铵,还原剂选自硼氢化钠或柠檬酸三钠,氧牺牲剂选自异丙醇或三乙醇胺。
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