CN111763930A - 一种非钯活化镀铜工艺及其敏化剂、活化剂 - Google Patents

一种非钯活化镀铜工艺及其敏化剂、活化剂 Download PDF

Info

Publication number
CN111763930A
CN111763930A CN202010673449.XA CN202010673449A CN111763930A CN 111763930 A CN111763930 A CN 111763930A CN 202010673449 A CN202010673449 A CN 202010673449A CN 111763930 A CN111763930 A CN 111763930A
Authority
CN
China
Prior art keywords
workpiece
copper plating
plating process
palladium activated
sensitizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202010673449.XA
Other languages
English (en)
Other versions
CN111763930B (zh
Inventor
朱祖光
王世雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chibi Jumao New Material Technology Co ltd
Original Assignee
Chibi Jumao New Material Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chibi Jumao New Material Technology Co ltd filed Critical Chibi Jumao New Material Technology Co ltd
Priority to CN202010673449.XA priority Critical patent/CN111763930B/zh
Publication of CN111763930A publication Critical patent/CN111763930A/zh
Application granted granted Critical
Publication of CN111763930B publication Critical patent/CN111763930B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1886Multistep pretreatment
    • C23C18/1893Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/285Sensitising or activating with tin based compound or composition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemically Coating (AREA)

Abstract

本发明提供一种非钯活化镀铜工艺,包括以下步骤:步骤S1:除油;步骤S2:粗化:采用粗化液对工件进行粗化,然后进行超声水洗;步骤S3:敏化:将水洗后的工件放入敏化剂中敏化,敏化剂包括以下组分和浓度配比:甲基磺酸锡5‑100g/L、酒石酸1‑50g/L、抗坏血酸1‑10g/L、柠檬酸5‑50g/L、2,4‑氨基吡啶1‑20g/L、氨基硅烷偶联剂1‑10ml/L、表面活性剂1‑10ml/L;步骤S4:活化:将敏化后的工件放入活化剂中活化,活化剂包括以下组分和浓度配比:硝酸银1‑20g/L、氨水1‑50ml/L、EDTA1‑50g/L、三乙醇胺1‑20ml/L、2,4‑氨基吡啶0.5‑5g/L、磷酸酯表面活性剂0.1‑10ml/L;步骤S5:预铜;步骤S6:厚铜。本发明提供一种生产成本低、镀层结合结合力好、绿色环保的非钯活化镀铜工艺及其敏化剂、活化剂。

Description

一种非钯活化镀铜工艺及其敏化剂、活化剂
技术领域
本发明属于化学镀铜技术领域,特别涉及非钯活化镀铜工艺及其敏化剂、活化剂。
背景技术
随着5G技术的兴起与高速发展,5G手机天线工艺是在PC料手机壳上镭雕线路后,再进行活化镀铜镀镍金属化工艺来完成制备。通常的活化镀铜镀镍金属化的工艺步骤为:PC料、PPS料或者陶瓷料进过除油→粗化→超声波→敏化→活化→触发铜/镍→厚铜/镍工艺完成镀铜或者镀镍。这种活化镀铜镀镍金属化工艺可以应用在PPS料的5G基站振子、陶瓷介质滤波器的生产中。
目前,现有技术的活化镀铜镀镍金属化的工艺中是需要通过钯离子或者胶体钯作为氧化活化剂将钯离子还原成钯金属,最后再以钯金属为晶核沉积铜单质或者镍单质完成镀铜/镀镍工艺。但是,钯离子作为原料的成本高居不下,并且采用钯作为活化剂的操作工序操作难以控制,特别是PC料5G手机天线,活化与水洗的时间掌握不当,容易漏镀、溢镀。
因此,需要研究革新一种生产成本低、镀层结合结合力好、绿色环保的非钯活化镀铜工艺及其敏化剂、活化剂。
发明内容
本发明的目的是提供一种生产成本低、镀层结合结合力好、绿色环保的非钯活化镀铜工艺及其敏化剂、活化剂。
本发明的上述技术目的是通过以下技术方案得以实现的:一种非钯活化镀铜工艺,包括以下步骤:
步骤S1:除油:将工件置于清洗液中超声清洗除去表面油污;
步骤S2:粗化:采用粗化液对工件进行粗化,然后进行超声水洗;
步骤S3:敏化:将水洗后的工件放入敏化剂中敏化,所述敏化剂包括以下组分和浓度配比:甲基磺酸锡5-100g/L、酒石酸1-50g/L、抗坏血酸1-10g/L、柠檬酸5-50g/L、2,4-氨基吡啶1-20g/L、氨基硅烷偶联剂1-10ml/L、表面活性剂1-10ml/L;
步骤S4:活化:将敏化后的工件放入活化剂中活化,所述活化剂包括以下组分和浓度配比:硝酸银1-20g/L、氨水1-50ml/L、EDTA1-50g/L、三乙醇胺1-20ml/L、2,4-氨基吡啶0.5-5g/L、磷酸酯表面活性剂0.1-10ml/L;
步骤S5:预铜:将工件浸入预铜液中快速镀上一层薄铜层;
步骤S6:厚铜:将工件置于厚铜液中,缓慢均匀镀成厚铜层。
通过采用上述技术方案,PC/PPS/ABS/PE等碳链形成的塑料或者陶瓷工件经过粗化后会在工件表面形成无数均匀密布的微小孔,并且粗化液与塑料官能团进行反应,将其中的官能团键断裂,使小孔内带有负电荷,便于后序敏化、活化过程中带正电的金属离子和胶体粒子吸附沉积,再进入敏化过程,敏化剂中的具有还原性的Sn2+被微小孔表面的负电荷相吸引,均匀分布在小孔内表面,而后在活化过程中,Ag+具有氧化性,Ag+被Sn2+还原成单质Ag吸附在小孔中形成锚着效应,再进入预铜工序中,Ag形成活性晶核不断使Cu单质沉积在Ag晶核表面,形成Cu沉积金属层,再以Cu沉积金属层形成晶核不断沉积Cu单质,最后形成镀铜层。
作为本发明的进一步设置,在步骤S3和步骤S4之间还包括步骤S3’:水洗:将敏化后的工件置于装有去离子水的水洗槽中浸泡1-5min。
通过采用上述技术方案,Sn2+在敏化剂中为pH<2的酸性环境,然后再经过水洗工序中在去离子水浸液中Sn2+进行水解反应生成Sn(OH)2,再进入活化工序中与Ag+络合反应生成Sn(OH)2-Ag胶体,以Sn(OH)2-Ag胶体为活化中心,Cu2+反应活性更强,能有效提高镀铜反应的反应效率。
作为本发明的进一步设置,步骤S2中粗化液包括以下组分和重量配比:氢氧化钠50-200g、过硫酸铵20-50g和氟氢化铵1-10g。
通过采用上述技术方案,粗化液中为氢氧化钠、过硫酸铵和氟氢化铵,氟氢化铵能提高微小孔形成外小内大的收口型凹坑的比例,提高后序金属离子、胶体粒子乃至铜单质吸附沉积的吸附结合力,最终铜层在这种收口型的凹坑形成像铆钉一样的结构,提高铜层的结合力。
作为本发明的进一步设置,步骤S3中氨基硅烷偶联剂为hk-550。
作为本发明的进一步设置,步骤S3中表面活性剂为氟碳表面活性剂FC。
作为本发明的进一步设置,步骤S4中磷酸酯表面活性剂为异构十三醇醚磷酸酯。
作为本发明的进一步设置,工艺应用的工件为PC、PPS、ABS、PE塑料或陶瓷的一种或多种。
本发明还提供一种非钯活化镀铜工艺的敏化剂,包括以下组分和浓度配比:甲基磺酸锡5-100g/L、酒石酸1-50g/L、抗坏血酸1-10g/L、柠檬酸5-50g/L、2,4-氨基吡啶1-20g/L、氨基硅烷偶联剂1-10ml/L、表面活性剂1-10ml/L。
本发明还提供一种非钯活化镀铜工艺的活化剂,包括以下组分和浓度配比:硝酸银1-20g/L、氨水1-50ml/L、EDTA1-50g/L、三乙醇胺1-20ml/L、2,4-氨基吡啶0.5-5g/L、磷酸酯表面活性剂0.1-10ml/L。
通过采用上述技术方案,敏化剂中锡离子与活化剂银离子共同作用,替代钯胶体形成Sn(OH)2-Ag胶体的铜离子活化中心,有效降低的生产成本,形成的镀铜层镀铜均匀,有效提高镀铜层的平整度和结合力,并且在敏化剂中添加了2,4-氨基吡啶,能有效促进Sn2+吸附在微小孔中,并且2,4-氨基吡啶能有效提高Sn2+的分散性,提高镀铜层的均匀性和镀铜结合力。
本发明的有益效果是:
1.本发明采用含锡离子的敏化剂与含银离子的活化剂配合使用,在制备工艺中不含贵金属钯,有效降低镀铜/镀镍的生产成本。
2.本发明最后采用预铜和厚铜两步操作,在预过程中,镀铜反应的速度快并且活性高,然后进入厚铜步骤,反应减缓,但是镀铜层不断加厚,镀铜的均匀性提高,有效提高镀铜层的平整性和与工件的结合力,操作过程中不会产生漏镀和溢镀现象,大大提高了产品的合格率。
3.本发明工艺步骤简单,操作方便,经济效益好。
具体实施方式
下面将对实施例中的技术方案进行清楚、完整地描述。显然,所描述的实施例仅仅是本发明的一部分实施例,而不是全部的实施例。基于本发明的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
实施例1
本发明提供一种非钯活化镀铜工艺的敏化剂,包括以下组分和浓度配比:甲基磺酸锡5g/L、酒石酸1g/L、抗坏血酸1g/L、柠檬酸5g/L、2,4-氨基吡啶1g/L、氨基硅烷偶联剂1ml/L、表面活性剂1ml/L。
本发明还提供一种非钯活化镀铜工艺的活化剂,包括以下组分和浓度配比:硝酸银1g/L、氨水1ml/L、EDTA1g/L、三乙醇胺1ml/L、2,4-氨基吡啶0.5g/L、磷酸酯表面活性剂0.1ml/L。
实施例2
本发明提供一种非钯活化镀铜工艺的敏化剂,包括以下组分和浓度配比:甲基磺酸锡100g/L、酒石酸50g/L、抗坏血酸10g/L、柠檬酸50g/L、2,4-氨基吡啶20g/L、氨基硅烷偶联剂10ml/L、表面活性剂10ml/L。
本发明还提供一种非钯活化镀铜工艺的活化剂,包括以下组分和浓度配比:硝酸银20g/L、氨水50ml/L、EDTA50g/L、三乙醇胺20ml/L、2,4-氨基吡啶5g/L、磷酸酯表面活性剂10ml/L。
实施例3
本发明提供一种非钯活化镀铜工艺的敏化剂,包括以下组分和浓度配比:甲基磺酸锡50g/L、酒石酸25g/L、抗坏血酸5g/L、柠檬酸25g/L、2,4-氨基吡啶10g/L、氨基硅烷偶联剂5ml/L、表面活性剂5ml/L。
本发明还提供一种非钯活化镀铜工艺的活化剂,包括以下组分和浓度配比:硝酸银10g/L、氨水25ml/L、EDTA25g/L、三乙醇胺10ml/L、2,4-氨基吡啶2.5g/L、磷酸酯表面活性剂5ml/L。
实施例4
本实施例采用上述实施例1中的非钯活化镀铜工艺的活化剂和敏化剂进行非钯活化镀铜工艺,包括如下步骤:
步骤S1:除油:将工件置于清洗液中超声清洗除去表面油污;
步骤S2:粗化:采用粗化液对工件进行粗化,然后进行超声水洗;
步骤S3:敏化:将水洗后的工件放入敏化剂中敏化,所述敏化剂包括以下组分和浓度配比:甲基磺酸锡5g/L、酒石酸1g/L、抗坏血酸1g/L、柠檬酸5g/L、2,4-氨基吡啶1g/L、氨基硅烷偶联剂1ml/L、表面活性剂1ml/L;
步骤S4:活化:将敏化后的工件放入活化剂中活化,所述活化剂包括以下组分和浓度配比:硝酸银1g/L、氨水1ml/L、EDTA1g/L、三乙醇胺1ml/L、2,4-氨基吡啶0.5g/L、磷酸酯表面活性剂0.1ml/L;
步骤S5:预铜:将工件浸入预铜液中快速镀上一层薄铜层;
步骤S6:厚铜:将工件置于厚铜液中,缓慢均匀镀成厚铜层。
实施例5
本实施例采用上述实施例1中的非钯活化镀铜工艺的活化剂和敏化剂进行非钯活化镀铜工艺,包括如下步骤:
步骤S1:除油:将工件置于清洗液中超声清洗除去表面油污;
步骤S2:粗化:采用粗化液对工件进行粗化,然后进行超声水洗;
步骤S3:敏化:将水洗后的工件放入敏化剂中敏化,所述敏化剂包括以下组分和浓度配比:甲基磺酸锡100g/L、酒石酸50g/L、抗坏血酸10g/L、柠檬酸50g/L、2,4-氨基吡啶20g/L、氨基硅烷偶联剂10ml/L、表面活性剂10ml/L;
步骤S4:活化:将敏化后的工件放入活化剂中活化,所述活化剂包括以下组分和浓度配比:硝酸银20g/L、氨水50ml/L、EDTA50g/L、三乙醇胺20ml/L、2,4-氨基吡啶5g/L、磷酸酯表面活性剂10ml/L;
步骤S5:预铜:将工件浸入预铜液中快速镀上一层薄铜层;
步骤S6:厚铜:将工件置于厚铜液中,缓慢均匀镀成厚铜层。
实施例6
本实施例采用上述实施例3中的非钯活化镀铜工艺的活化剂和敏化剂进行非钯活化镀铜工艺,包括如下步骤:
步骤S1:除油:将工件置于清洗液中超声清洗除去表面油污;
步骤S2:粗化:采用粗化液对工件进行粗化,然后进行超声水洗;
步骤S3:敏化:将水洗后的工件放入敏化剂中敏化,所述敏化剂包括以下组分和浓度配比:甲基磺酸锡50g/L、酒石酸25g/L、抗坏血酸5g/L、柠檬酸25g/L、2,4-氨基吡啶10g/L、氨基硅烷偶联剂5ml/L、表面活性剂5ml/L;
步骤S4:活化:将敏化后的工件放入活化剂中活化,所述活化剂包括以下组分和浓度配比:硝酸银10g/L、氨水25ml/L、EDTA25g/L、三乙醇胺10ml/L、2,4-氨基吡啶2.5g/L、磷酸酯表面活性剂5ml/L;
步骤S5:预铜:将工件浸入预铜液中快速镀上一层薄铜层;
步骤S6:厚铜:将工件置于厚铜液中,缓慢均匀镀成厚铜层。
实施例4~6都达到较佳的镀镍效果,在显微镜下观察,可以看出,铜层上镀铜均匀、细腻、平整、颜色鲜亮,操作沉积速度可以达到18-20mu/h,镀层5um盐雾试验可达48h以上,百格测试等级可达到5B,进一步工序镀镍3-5μm钝化干燥烘烤后,盐雾试验可达72h以上,百格测试等级可达到5B。

Claims (9)

1.一种非钯活化镀铜工艺,其特征在于:包括以下步骤:
步骤S1:除油:将工件置于清洗液中超声清洗除去表面油污;
步骤S2:粗化:采用粗化液对工件进行粗化,然后进行超声水洗;
步骤S3:敏化:将水洗后的工件放入敏化剂中敏化,所述敏化剂包括以下组分和浓度配比:甲基磺酸锡5-100g/L、酒石酸1-50g/L、抗坏血酸1-10g/L、柠檬酸5-50g/L、2,4-氨基吡啶1-20g/L、氨基硅烷偶联剂1-10ml/L、表面活性剂1-10ml/L;
步骤S4:活化:将敏化后的工件放入活化剂中活化,所述活化剂包括以下组分和浓度配比:硝酸银1-20g/L、氨水1-50ml/L、EDTA 1-50g/L、三乙醇胺1-20ml/L、2,4-氨基吡啶0.5-5g/L、磷酸酯表面活性剂0.1-10ml/L;
步骤S5:预铜:将工件浸入预铜液中快速镀上一层薄铜层;
步骤S6:厚铜:将工件置于厚铜液中,缓慢均匀镀成厚铜层。
2.根据权利要求1所述的非钯活化镀铜工艺,其特征在于:在步骤S3和步骤S4之间还包括步骤S3’:水洗:将敏化后的工件置于装有去离子水的水洗槽中浸泡1-5min。
3.根据权利要求1所述的非钯活化镀铜工艺,其特征在于:所述步骤S2中粗化液包括以下组分和重量配比:氢氧化钠50-200g、过硫酸铵20-50g和氟氢化铵1-10g。
4.根据权利要求1所述的非钯活化镀铜工艺,其特征在于:所述步骤S3中氨基硅烷偶联剂为hk-550。
5.根据权利要求1所述的非钯活化镀铜工艺,其特征在于:所述步骤S3中表面活性剂为氟碳表面活性剂FC。
6.根据权利要求1所述的非钯活化镀铜工艺,其特征在于:所述步骤S4中磷酸酯表面活性剂为异构十三醇醚磷酸酯。
7.根据权利要求1所述的非钯活化镀铜工艺,其特征在于,所述工艺应用的工件为PC、PPS、ABS、PE塑料或陶瓷的一种或多种。
8.一种根据权利要求1所述的非钯活化镀铜工艺的敏化剂,其特征在于:包括以下组分和浓度配比:甲基磺酸锡5-100g/L、酒石酸1-50g/L、抗坏血酸1-10g/L、柠檬酸5-50g/L、2,4-氨基吡啶1-20g/L、氨基硅烷偶联剂1-10ml/L、表面活性剂1-10ml/L。
9.一种根据权利要求1所述的非钯活化镀铜工艺的活化剂,其特征在于:包括以下组分和浓度配比:硝酸银1-20g/L、氨水1-50ml/L、EDTA 1-50g/L、三乙醇胺1-20ml/L、2,4-氨基吡啶0.5-5g/L、磷酸酯表面活性剂0.1-10ml/L。
CN202010673449.XA 2020-07-14 2020-07-14 一种非钯活化镀铜工艺及其敏化剂、活化剂 Active CN111763930B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010673449.XA CN111763930B (zh) 2020-07-14 2020-07-14 一种非钯活化镀铜工艺及其敏化剂、活化剂

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010673449.XA CN111763930B (zh) 2020-07-14 2020-07-14 一种非钯活化镀铜工艺及其敏化剂、活化剂

Publications (2)

Publication Number Publication Date
CN111763930A true CN111763930A (zh) 2020-10-13
CN111763930B CN111763930B (zh) 2022-04-19

Family

ID=72725254

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010673449.XA Active CN111763930B (zh) 2020-07-14 2020-07-14 一种非钯活化镀铜工艺及其敏化剂、活化剂

Country Status (1)

Country Link
CN (1) CN111763930B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112359349A (zh) * 2020-10-30 2021-02-12 华东师范大学 一种柔性化学镀铜太赫兹传输空芯波导及制备方法
WO2022104942A1 (zh) * 2020-11-17 2022-05-27 胜宏科技(惠州)股份有限公司 一种pcb铝基板孔内金属层与非金属层同步金属化的方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01195281A (ja) * 1988-01-28 1989-08-07 Hitachi Chem Co Ltd 無電解めつき用触媒
US4986848A (en) * 1988-01-28 1991-01-22 Hitachi Chemical Company, Ltd. Catalyst for electroless plating
KR20050078380A (ko) * 2004-01-29 2005-08-05 포맥스 주식회사 석재의 무전해도금방법
CN101054663A (zh) * 2007-05-29 2007-10-17 南京工业大学 非金属基体化学镀的一种活化工艺
CN101210327A (zh) * 2006-12-30 2008-07-02 陈东明 塑料表面镀铜剂及其使用方法
TW201319309A (zh) * 2011-11-14 2013-05-16 Fih Hong Kong Ltd 電子裝置殼體及其製造方法
CN103212443A (zh) * 2011-12-12 2013-07-24 陶氏环球技术有限公司 稳定的银催化剂及方法
CN105755512A (zh) * 2016-03-04 2016-07-13 昆山艾森半导体材料有限公司 一种甲基磺酸锡用抗氧化剂及其制备方法和使用方法
CN106189238A (zh) * 2016-06-28 2016-12-07 陈建峰 一种碳包钴导热膏热界面材料的制备方法
CN110670050A (zh) * 2019-10-24 2020-01-10 深圳市松柏实业发展有限公司 化学镀铜活化液及其制备方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01195281A (ja) * 1988-01-28 1989-08-07 Hitachi Chem Co Ltd 無電解めつき用触媒
US4986848A (en) * 1988-01-28 1991-01-22 Hitachi Chemical Company, Ltd. Catalyst for electroless plating
KR20050078380A (ko) * 2004-01-29 2005-08-05 포맥스 주식회사 석재의 무전해도금방법
CN101210327A (zh) * 2006-12-30 2008-07-02 陈东明 塑料表面镀铜剂及其使用方法
CN101054663A (zh) * 2007-05-29 2007-10-17 南京工业大学 非金属基体化学镀的一种活化工艺
TW201319309A (zh) * 2011-11-14 2013-05-16 Fih Hong Kong Ltd 電子裝置殼體及其製造方法
CN103212443A (zh) * 2011-12-12 2013-07-24 陶氏环球技术有限公司 稳定的银催化剂及方法
CN105755512A (zh) * 2016-03-04 2016-07-13 昆山艾森半导体材料有限公司 一种甲基磺酸锡用抗氧化剂及其制备方法和使用方法
CN106189238A (zh) * 2016-06-28 2016-12-07 陈建峰 一种碳包钴导热膏热界面材料的制备方法
CN110670050A (zh) * 2019-10-24 2020-01-10 深圳市松柏实业发展有限公司 化学镀铜活化液及其制备方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112359349A (zh) * 2020-10-30 2021-02-12 华东师范大学 一种柔性化学镀铜太赫兹传输空芯波导及制备方法
WO2022104942A1 (zh) * 2020-11-17 2022-05-27 胜宏科技(惠州)股份有限公司 一种pcb铝基板孔内金属层与非金属层同步金属化的方法

Also Published As

Publication number Publication date
CN111763930B (zh) 2022-04-19

Similar Documents

Publication Publication Date Title
CN111763930B (zh) 一种非钯活化镀铜工艺及其敏化剂、活化剂
CN107245742B (zh) 一种铝合金用无氰沉锌剂及铝合金沉锌方法
CN101774025A (zh) 一种镀银铜粉的制备方法
CN102211186A (zh) 一种树枝状铜粉表面镀银的方法
CN101067206A (zh) 一种abs塑料表面无钯活化处理新工艺
CN106191825B (zh) 一种基于so42-体系的置换-还原化学镀钯液
KR101057025B1 (ko) 전도성 섬유상의 금ㆍ은 도금방법
CN106319485A (zh) 一种离子钯活化液、制备方法及活化方法
CN112746295A (zh) 一种镀银液及陶瓷表面镀银方法
CN107868947B (zh) 一种活化液及其制备方法和无钯活化化学镀镍方法
CN102031505A (zh) 一种用于聚酰亚胺粗化活化的处理液和一种聚酰亚胺表面粗化活化的方法
CN113388829A (zh) 化学镀铜液以及利用化学镀铜液镀铜基板的方法
CN101974741B (zh) 一种在聚四氟乙烯薄膜表面化学镀的方法
JP7285370B2 (ja) Pcbアルミニウム基板孔内の金属層及び非金属層を同期して金属化する方法
CN103540915A (zh) 一种聚酰亚胺表面化学镀铜的方法
CN111778496A (zh) 锡合金活化铜层镀镍的活化剂和镀镍方法
CN102560447A (zh) 一种木材化学镀铜的活化工艺
KR20040015090A (ko) 무전해 도금재의 전처리방법
CN116083890A (zh) 一种基材表面处理方法及其应用
CN110724940A (zh) 一种低温共烧陶瓷基板化学镀镍钯金工艺方法
CN114105494B (zh) 偶联剂复配离子镍无钯活化液及制备导电玄武岩纤维方法
CN112501596B (zh) 一种钛表面化学镀镍前无氟无钯银活化方法
CN102534585A (zh) Al-Ag合金粉末化学镀银的制备方法
CN102400119B (zh) 一种镁合金化学镀镍的方法
CN106283050B (zh) 一种提高金属纤维毡过滤精度的方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB03 Change of inventor or designer information

Inventor after: Zhu Zuguang

Inventor after: Wang Shixiong

Inventor after: Xiong Hanfeng

Inventor before: Zhu Zuguang

Inventor before: Wang Shixiong

CB03 Change of inventor or designer information
GR01 Patent grant
GR01 Patent grant