CN111630672A - 热电转换元件 - Google Patents
热电转换元件 Download PDFInfo
- Publication number
- CN111630672A CN111630672A CN201980007644.4A CN201980007644A CN111630672A CN 111630672 A CN111630672 A CN 111630672A CN 201980007644 A CN201980007644 A CN 201980007644A CN 111630672 A CN111630672 A CN 111630672A
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- CN
- China
- Prior art keywords
- electrode
- thermoelectric conversion
- silicide
- conversion element
- copper silicide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 83
- JUZTWRXHHZRLED-UHFFFAOYSA-N [Si].[Cu].[Cu].[Cu].[Cu].[Cu] Chemical compound [Si].[Cu].[Cu].[Cu].[Cu].[Cu] JUZTWRXHHZRLED-UHFFFAOYSA-N 0.000 claims abstract description 58
- 229910021360 copper silicide Inorganic materials 0.000 claims abstract description 42
- 239000000463 material Substances 0.000 claims abstract description 42
- 229910021332 silicide Inorganic materials 0.000 claims abstract description 38
- 239000010949 copper Substances 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000002184 metal Substances 0.000 claims description 25
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 14
- -1 silicide compound Chemical class 0.000 abstract description 18
- 238000005245 sintering Methods 0.000 description 42
- 239000000843 powder Substances 0.000 description 30
- 238000004519 manufacturing process Methods 0.000 description 20
- 239000007791 liquid phase Substances 0.000 description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 17
- YTHCQFKNFVSQBC-UHFFFAOYSA-N magnesium silicide Chemical compound [Mg]=[Si]=[Mg] YTHCQFKNFVSQBC-UHFFFAOYSA-N 0.000 description 15
- 229910021338 magnesium silicide Inorganic materials 0.000 description 15
- 239000000203 mixture Substances 0.000 description 14
- 239000012298 atmosphere Substances 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 238000005219 brazing Methods 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 description 5
- 229910021334 nickel silicide Inorganic materials 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004453 electron probe microanalysis Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 230000005678 Seebeck effect Effects 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910017755 Cu-Sn Inorganic materials 0.000 description 1
- 229910017927 Cu—Sn Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000005679 Peltier effect Effects 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000005429 filling process Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- XWHPIFXRKKHEKR-UHFFFAOYSA-N iron silicon Chemical compound [Si].[Fe] XWHPIFXRKKHEKR-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- PYLLWONICXJARP-UHFFFAOYSA-N manganese silicon Chemical compound [Si].[Mn] PYLLWONICXJARP-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
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Abstract
该热电转换元件具备:元件主体(11),由硅化物系化合物的热电转换材料构成;及电极(15),分别形成于元件主体(11)的一表面及与该一表面对置的另一表面。电极(15)由硅化铜的烧结体构成,并且电极(15)与元件主体(11)直接接合。
Description
技术领域
本发明涉及一种热电转换元件,具备:元件主体,由硅化物系化合物的热电转换材料构成;及电极,分别形成于该元件主体的一表面及与该一表面对置的另一表面。
本申请主张基于2018年3月16日于日本申请的专利申请2018-049874号及2019年3月6日于日本申请的专利申请2019-040845号的优先权,并将其内容援用于此。
背景技术
由热电转换材料构成的热电转换元件是利用塞贝克效应或珀耳帖效应这种现象来能够将热和电相互转换的电子元件。塞贝克效应是将热能转换为电能的效应,是当在热电转换材料的两端产生温度差时产生电动势的现象。这种电动势由热电转换材料的特性决定。近年来,盛行利用该效应的热电发电的开发。
作为表示这样的热电转换元件(热电转换材料)的特性的指标,例如使用由以下(1)式表示的功率因数(PF)或由以下(2)式表示的无因次性能指数(ZT)。在热电转换材料中,需要在一表面和另一表面侧之间维持温度差,因此优选导热性低。
PF=S2σ……(1)
其中,S:塞贝克系数(V/K)、σ:导电率(S/m)
ZT=S2σT/κ……(2)
其中,T=绝对温度(K)、κ=导热率(W/(m×K))
作为构成元件主体的热电转换材料,可举出硅化镁等硅化物系化合物。
上述热电转换元件为在热电转换材料的一端侧和另一端侧分别形成有电极的结构。作为形成在由硅化镁等硅化物系化合物的热电转换材料构成的元件主体上的电极,使用镍。这是因为硅化镁(Mg2Si)在室温下的热膨胀系数(15.5×10-6/℃)与镍在室温下的热膨胀系数(15.2×10-6/℃)近似。
然而,当在中温区域(300℃以上且600℃以下)中使用上述热电转换元件时,元件主体的硅化物系化合物的Si向电极侧扩散,电极的镍成为硅化镍。该硅化镍在室温下的热膨胀系数为12.0×10-6/℃,因此与由硅化物系化合物的热电转换材料构成的元件主体的热膨胀系数之差较大,元件主体上有可能产生裂纹。并且,导致元件主体与电极的界面区域附近的组成发生变化,有可能导致电阻变高或强度降低。
因此,例如,在专利文献1中提出了一种在由热电转换材料构成的元件主体与电极之间形成有由高熔点金属硅化物构成的中间层的热电转换元件。该热电转换元件通过由高熔点金属硅化物构成的中间层来抑制元素在元件主体与电极之间扩散。
并且,在专利文献2中提出了一种作为电极使用了硅化镍和金属镍的混合体的热电转换元件。
专利文献1:日本特开平07-202274号公报
专利文献2:再公表WO2012/073946号公报
然而,在专利文献1的热电转换元件中,通过蒸镀法、溅射法或CVD法来进行由高熔点金属硅化物构成的中间层的成膜,无法高效地形成中间层。并且,难以形成较厚的中间层。因此,有可能无法通过中间层充分地抑制电极的元素向元件主体扩散。
在专利文献2的热电转换元件中,作为电极使用了硅化镍,但如上所述,硅化镍与由硅化镁等构成的元件主体的热膨胀系数之差较大,通过由制造时的热历史引起的热应力,有可能导致在元件主体和电极上产生裂纹。而且,在金属镍与由硅化镁等构成的元件主体直接接触的情况下,导致元件主体的Si向金属镍侧扩散,元件主体的界面区域附近的组成发生变化,有可能电阻变高或强度降低。
发明内容
本发明是鉴于上述情况而完成的,其目的在于提供一种热电转换元件,该热电转换元件的由硅化物系化合物的热电转换材料构成的元件主体与电极可靠地接合,接合界面中的电阻足够低,且能够抑制在元件主体和电极上产生裂纹。
为了解决上述课题,本发明的热电转换元件具备:元件主体,由硅化物系化合物的热电转换材料构成;及电极,分别形成于该元件主体的一表面及与该一表面对置的另一表面,所述电极由硅化铜的烧结体构成,并且所述电极与所述元件主体直接接合。
根据该热电转换元件,电极由硅化铜的烧结体构成,因此能够减小与由硅化物系化合物的热电转换材料构成的元件主体的热膨胀系数之差。硅化铜的熔点比较低,因此在形成成为电极的烧结体时,在硅化铜的至少一部分中产生液相,能够释放热变形。因此,在制造时能够抑制元件主体及电极上产生裂纹。在形成成为电极的烧结体时,也可以使整个硅化铜成为液相。
并且,所述电极与所述元件主体直接接合,而且,如上所述,在形成成为电极的烧结体时,在硅化铜的至少一部分中产生液相,因此能够将所述电极与所述元件主体充分地接合,从而能够将界面中的电阻抑制得足够低。
在本发明的热电转换元件中,可以在所述电极的与所述元件主体相反的一侧的表面形成有金属层。此时,通过形成于与所述元件主体相反的一侧的表面的金属层,能够提高与端子的接合性。
在本发明的热电转换元件中,所述电极的厚度优选在10μm以上且300μm以下的范围内。此时,通过将所述电极的厚度设为300μm以下,电极的刚性不会高于必要以上,能够抑制制造时的元件主体的裂纹的产生。另一方面,通过将所述电极的厚度设为10μm以上,能够确保电极的导电性。
在本发明的热电转换元件中,所述电极由硅化铜的烧结体构成,所述硅化铜中的Si与Cu的原子数比Si/Cu优选在0.12以上且0.4以下的范围内。此时,构成电极的硅化铜中的Si与Cu的原子数比Si/Cu在0.12以上且0.4以下的范围内,因此能够确保电极的导电性高,并且能够抑制制造时的元件主体的裂纹的产生。
而且,在本发明的热电转换元件中,所述电极由硅化铜的烧结体构成,所述硅化铜中的气孔率优选为60%以下。此时,构成电极的硅化铜中的气孔率为60%以下,因此能够抑制电阻变高。
根据本发明,由硅化物系化合物的热电转换材料构成的元件主体与电极可靠地接合,界面中的电阻足够低,且能够抑制在元件主体和电极上产生裂纹。
附图说明
图1是表示作为本发明的第一实施方式的热电转换元件及使用该热电转换元件的热电转换模块的剖视图。
图2是表示作为本发明的一实施方式的热电转换元件的制造方法的一例的流程图。
图3是表示在图2所示的热电转换元件的制造方法中使用的烧结装置的一例的剖视图。
图4是表示本发明的实施例中的电阻的测定方法的说明图。
具体实施方式
以下,参考附图对作为本发明的一实施方式的热电转换元件进行说明。以下各实施方式是为了更好地理解发明的宗旨而具体地进行说明的实施方式,只要没有特别指定,则并不限定本发明。关于以下的说明中所使用的附图,为了容易理解本发明的特征,以方便起见,有时将作为主要部分的部分放大表示,各构成要件的尺寸比率等并不一定与实际相同。
参考图1至图3对作为本发明的实施方式的热电转换元件10进行说明。图1表示作为本发明的第一实施方式的热电转换元件10及使用该热电转换元件10的热电转换模块1。图1所示的热电转换模块1具备热电转换元件10和配设于该热电转换元件10的一表面及另一表面的端子3、3。
热电转换元件10具备由热电转换材料构成的元件主体11和分别形成于该元件主体11的一表面及另一表面的电极15、15。如图1所示,元件主体11形成为柱状,在柱形状的两端面分别配设有电极15、15。元件主体11的形状并无限定,可以是长方体状、圆柱状、多角柱状、椭圆柱状等。元件主体11的接合有电极15、15的两面可以彼此平行,也可以稍微倾斜。
构成元件主体11的热电转换材料例如由硅化物系化合物构成,在本实施方式中,优选由硅化镁(Mg2Si)的烧结体构成。作为除了硅化镁以外能够使用的硅化物系化合物,可举出硅锗(Si-Ge)无限固溶体、锰硅(Mn-Si)、铁硅(Fe-Si)等。
构成元件主体11的热电转换材料中可以含有作为掺杂剂的Li、Na、K、B、Al、Ga、In、N、P、As、Sb、Bi、Ag、Cu及Y中的至少一种以上。在含有掺杂剂的情况下,该掺杂剂在元件主体11中的合计含量优选为0.1质量%以上且3.0质量%以下,但并不限定于该范围。
在热电转换元件10中,电极15由硅化铜的烧结体构成,并且电极15与元件主体11直接接合。该例的电极15具有与元件主体11的端面相同的平面形状。
并且,如图1所示,在本实施方式中,在电极15中的与元件主体11相反的一侧的表面形成有金属层16。即,在电极15与端子3之间配设有金属层16。该例的金属层16具有与电极15相同的平面形状。
由硅化铜的烧结体构成的电极15的厚度优选在10μm以上且300μm以下的范围内。若由硅化铜的烧结体构成的电极15的厚度为10μm以上,则能够确保电极15的导电性。若由硅化铜的烧结体构成的电极15的厚度为300μm以下,则电极15的刚性不会高于必要以上,能够抑制制造时的元件主体11的裂纹的产生。
由硅化铜的烧结体构成的电极15的厚度的下限更优选为50μm以上。由硅化铜的烧结体构成的电极15的厚度的上限更优选为150μm以下。
在构成电极15的硅化铜中,Si与Cu的原子数比Si/Cu优选在0.12以上且0.4以下的范围内。
构成电极15的硅化铜是将多个组成(Si/Cu)的硅化铜粉末进行混合并煅烧而成的,其平均值被调整为上述范围内。例如,作为硅化铜的具体例,有Cu3Si(原子数比1/3)或Cu7Si(原子数比1/7),能够将它们进行混合并用作烧结原料。
在构成电极15的硅化铜的原子数比Si/Cu为0.12以上的情况下,烧结原料是由Cu7Si的单相或者Cu7Si和由少量的其他组成构成的硅化铜的混合物形成的硅化铜粉末。通过使烧结原料的整体或一部分熔融,能够确保电极15的导电,还能够抑制元件主体11的裂纹。
在构成电极15的硅化铜的原子数比Si/Cu为0.4以下的情况下,烧结原料是由Cu3Si的单相或者Cu3Si和由少量的其他组成构成的硅化铜的混合物形成的硅化铜粉末。通过使烧结原料的整体或一部分熔融,能够确保电极15的导电,还能够抑制制造时的元件主体11的裂纹。
构成电极15的硅化铜的原子数比Si/Cu的下限更优选为0.13以上。构成电极15的硅化铜的原子数比Si/Cu的上限更优选为0.35以下。
如上所述,在本实施方式的电极15中,将多个组成(Si/Cu)的硅化铜粉末进行混合并煅烧,因此在烧结时在该硅化铜粉末的至少一部分形成液相,在电极15的一部分具有经液相凝固而形成的液相凝固部。该液相凝固部与未形成液相的区域相比,空孔少,密度局部变高。
作为电极15整体的气孔率在本发明中并无限定,但优选为0体积%以上且60体积%以下,更优选为0体积%以上且50体积%以下。电极15内的液相凝固部的分布并无限定,但从应力缓和的观点考虑,优选液相凝固部集中在元件主体11侧并以层状分布。但是,在本发明中,液相凝固部可以在电极15内的整个区域大致均匀地分布,也可以集中在金属层16侧并以层状分布。
电极15的气孔率通过下述方法求出。
首先,测定形成硅化铜电极之前的硅化物烧结体的重量。接下来,形成电极之后,利用光学显微镜或扫描型电子显微镜测定五处的两面各自的电极的厚度,并求出其平均值。接下来,利用游标卡尺或千分尺测定两面各自的电极面的尺寸(纵宽、横宽或半径等),并求出两面各自的电极面的表面积。根据该表面积和两面各自的电极的厚度,求出两面各自的电极部分的体积。接下来,称量硅化物烧结体和电极成为一体的状态的重量,通过减去硅化物烧结体的重量,求出电极部分的重量。根据两面的电极部分的重量和体积求出电极部分的密度。将这样求出的密度作为测定密度。另一方面,从利用EPMA分析电极层的平均组成推断计算真密度,并且由(100-(测定密度/真密度×100)(%))这一算式求出了气孔率。
金属层16例如由镍、铝、铜等导电性优异的金属构成,在本实施方式中,优选由铝构成。该金属层16通过将金属箔等通过例如钎焊等与电极15接合而形成。金属层16的厚度并无限定,但优选在0.1mm以上且2.0mm以下的范围内。
端子3由导电性优异的金属材料,例如由铜或铝等板材形成。在本实施方式中,优选使用铝的轧制板。形成于电极15的金属层16和端子3例如能够通过Ag钎焊、Ag电镀等接合。从元件主体11观察时,该实施方式的一对端子3向彼此相反的一侧延伸,且彼此平行地配置,但本发明并不限定于该配置。
接下来,参考图2及图3对上述热电转换元件10的制造方法的一例进行说明。
(硅化物化合物粉末准备工序S01)
首先,准备成为构成元件主体的热电转换材料的母相的硅化物化合物粉末(硅化镁粉末)。在该硅化物化合物粉末准备工序S01中,制造硅化物化合物锭(硅化镁),并将其粉碎而筛分,由此制造规定粒径的硅化物化合物粉末(硅化镁粉末)。可以使用市售的镁系化合物粉末(硅化镁粉末)。硅化物化合物粉末(硅化镁粉末)的平均粒径优选在0.5μm以上且100μm以下的范围内。
(元件主体烧结工序S02)
接下来,将如上所述获得的硅化物化合物粉末一边加压一边加热而获得烧结体。在本实施方式中,在元件主体烧结工序S02中,使用图3所示的烧结装置(通电烧结装置100)。
图3所示的烧结装置(通电烧结装置100)例如具备耐压壳体101、对该耐压壳体101的内部进行减压的真空泵102、配置于耐压壳体101内的中空筒形的碳质模型103、对填充在碳质模型103内的烧结原料粉末Q进行加压并施加电流的一对电极部105a、105b及在电极部105a、105b之间施加电压的电源装置106。在电极部105a、105b与烧结原料粉末Q之间分别配置有碳板107、碳片108。除此以外,还具有未图示的温度计、位移计等。
在本实施方式中,在碳质模型103的外周侧配设有加热器109。加热器109以覆盖碳质模型103的外周侧的整面的方式配置于四个侧面。作为加热器109,能够利用碳加热器、镍铬合金线加热器、钼加热器、坝塔尔合金线加热器或高频加热器等。
在元件主体烧结工序S02中,首先,在图3所示的通电烧结装置100的碳质模型103内填充烧结原料粉末Q。例如,碳质模型103的内部被石墨片或碳片覆盖。使用电源装置106,使直流电流在一对电极部105a、105b之间流动,从而使电流流过烧结原料粉末Q,由此通过自身发热来升温(通电加热)。使一对电极部105a、105b中的可动侧的电极部105a朝向烧结原料粉末Q移动,在与固定侧的电极部105b之间以规定的压力对烧结原料粉末Q进行加压,并且使加热器109加热。由此,通过烧结原料粉末Q的自身发热及来自加热器109的热和加压,使烧结原料粉末Q烧结。
在本实施方式中,元件主体烧结工序S02中的烧结条件设为如下条件:烧结原料粉末Q的加热温度在650℃以上且1030℃以下的范围内,在该加热温度下的保持时间为0分钟以上(例如1秒钟以上)且3分钟以下。加压荷载设为15MPa以上且60MPa以下。耐压壳体101内的气氛优选设为氩气氛等惰性气氛或真空气氛。在设为真空气氛的情况下,压力优选设为5Pa以下。
在元件主体烧结工序S02中,在使直流电流流过烧结原料粉末Q时,优选以规定的时间间隔变更一个电极部105a和另一个电极部105b的极性。即,交替地进行将一个电极部105a作为阳极而将另一个电极部105b作为阴极进行通电的状态和将一个电极部105a作为阴极而将另一个电极部105b作为阳极进行通电的状态。在本实施方式中,优选将规定的时间间隔设定在10秒钟以上且300秒钟以下的范围内。通过以上工序,制造元件主体11(热电转换材料)。通过交替地切换电流的方向,能够获得提高元件主体11的均质性的优点。
(硅化铜粉末填充工序S03)
接下来,在通电烧结装置100的碳质模型103内填充硅化铜粉末和硅化物化合物的烧结体。除去硅化物化合物的烧结体的两端面及侧面的碳片,利用研磨纸研磨烧结体的两端面。在碳质模型103中插入碳板107、碳片108,填充规定量的硅化铜粉末,然后,插入硅化物化合物的烧结体,在其上进一步填充规定量的硅化铜粉末,在其上配置碳板107、碳片108。
作为硅化铜粉末,优选使用平均粒径为0.5μm以上且50μm以下的粉末。在本实施方式中,作为硅化铜粉末,使用混合多个组成(质量比Si/Cu)的硅化铜粉末而成的粉末。
(电极烧结工序S04)
使用通电烧结装置100的电源装置106,使直流电流在一对电极部105a、105b之间流动,由此通过自身发热来升温(通电加热)。使用一对电极部105a、105b以规定的压力进行加压。并且,使加热器109加热。由此,通过烧结硅化铜粉末来形成电极15,并且将电极15与元件主体11直接接合。
在本实施方式中,电极烧结工序S04中的烧结条件优选为如下条件:加热温度在650℃以上且850℃以下的范围内,在该加热温度下的保持时间为0分钟以上(例如1秒钟以上)且3分钟以下的范围内。加压荷载优选在2MPa以上且40MPa以下的范围内。耐压壳体101内的气氛优选设为氩气氛等惰性气氛或真空气氛。在设为真空气氛的情况下,压力优选设为5Pa以下。
在本实施方式中,作为硅化铜粉末,使用混合多个组成(原子数比Si/Cu)的硅化铜粉末而成的粉末,因此在电极烧结工序S04中,在该硅化铜粉末的一部分中产生液相,在电极15的一部分形成经液相凝固而形成的液相凝固部。在电极烧结工序S04中产生液相,由此元件主体11与电极15的接合性提高。
(金属层形成工序S05)
接下来,在电极15的与元件主体11相反的一侧的表面形成金属层16。金属层16能够通过使用例如钎焊材料将镍、铝、铜等导电性优异的金属的箔材料与电极15接合而形成。作为钎焊材料,能够使用Ag-Cu-Zn-Cd、Ag-Cu-Sn等Ag钎焊等。
在本实施方式中,将厚度0.5mm的铝的轧制板切割成与热电元件的截面相同的尺寸,使用Ag钎焊(BAg-1A(JIS)),在电极15上形成了金属层16。
通过上述工序,制造由硅化物系化合物的热电转换材料构成的元件主体11与由硅化铜的烧结体构成的电极15直接接合的热电转换元件10。
根据如上所述的热电转换元件10,电极15由硅化铜的烧结体构成,因此能够减小与由硅化物系化合物(硅化镁)的热电转换材料构成的元件主体11的热膨胀系数之差,并且能够抑制由制造时或使用时的热历史引起的裂纹的产生。
并且,硅化铜的熔点比较低,因此在形成烧结体时,在该硅化铜的一部分中产生液相,能够释放热变形,从而在制造时能够抑制在元件主体11及电极15上产生裂纹。
而且,电极15与元件主体11直接接合,在形成烧结体时,在该电极15的一部分中产生液相,由此电极15与元件主体11的接合性提高,因此能够将界面中的电阻抑制得足够低。
并且,在本实施方式中,在电极15的与元件主体11相反的一侧的表面形成有金属层16,因此能够比较容易地将端子3与电极15接合,并且能够提高端子3与电极15的接合性。
并且,在本实施方式中,电极15的厚度在10μm以上且300μm以下的范围内,因此电极15的刚性不会高于必要以上,能够抑制制造时的元件主体11的裂纹的产生,并且能够确保电极15的导电性。
而且,在本实施方式中,构成电极15的硅化铜中的Si与Cu的原子数比Si/Cu在0.12以上且0.4以下的范围内,因此能够确保电极15的导电性,并且能够抑制制造时的元件主体11的裂纹的产生。
以上,对本发明的实施方式进行了说明,但本发明并不限定于此,在不脱离本发明的技术思想的范围内,能够适当进行变更。例如,在本实施方式中,对构成图1所示那样的结构的热电转换元件及热电转换模块的情况进行了说明,但并不限定于此,只要使用本发明的热电转换元件,则端子的结构及配置等并无特别限制。
并且,在本实施方式中,将构成元件主体的硅化物系化合物作为硅化镁(Mg2Si)进行了说明,但并不限定于此,只要是具有热电特性的化合物,则可以是其他组成的硅化物系化合物。
并且,在上述实施方式中,作为硅化铜粉末,使用了混合多个组成(原子数比Si/Cu)的硅化铜粉末而成的粉末,但并不限于此,能够使用单一组成的硅化铜粉末。此时,通过控制电极烧结工序中的烧结温度,还能够容易地使整个电极作成液相并与元件主体接合。此时,整个电极成为液相,因此电极难以从元件主体剥离,并且还能够确保导电性。
实施例
以下,对为了确认本发明的效果而实施的实验结果进行说明。
准备了由硅化镁(Mg2Si)的烧结体(气孔率为2体积%)构成的圆柱状的元件主体(尺寸:直径20mm×厚度10mm)。使用在上述实施方式中说明的图3所示的通电烧结装置,在元件主体的两面填充表1所示的材质的粉末,并且通过上述方法进行通电烧结,在元件主体的两端形成了恒定厚度的电极。由此,制造了实施例1~11及比较例1~3的热电转换元件。将电极的气孔率记载于表1中。除了实施例5以外,混合使用Si/Cu比不同的多个硅化铜粉末并设为表1中记载的比率,在实施例5中,使用了具有表1中记载的Si/Cu比的单一组成的硅化铜粉末。
对所获得的实施例及比较例的热电转换元件,以如下方式评价了电阻值、制造时的裂纹的有无及电极的Si/Cu比。
(电阻)
从所获得的热电转换元件切出10mm×10mm×10mm的立方体的样品10用于评价。在电阻值的测定中,使用直流电源和万用表组成图4的电路,使50mA的恒定电流在两电极15之间流动,从距离一个电极15为1mm的位置起到9mm为止以1mm间隔使数字万用表的电极E与元件主体11的侧面抵接,测定各电压。接下来,根据电压与电流的关系求出电阻值,并且根据距电极端的距离和电阻值的曲线图进行直线拟合,将其切片作为电阻。
(制造时的裂纹)
关于制造时的裂纹的有无,在进行通电烧结并形成电极之后,在从通电烧结装置取出时,或者在切割成热电转换元件尺寸之后,通过目视观察热电转换元件,确认了裂纹的有无。
(电极的Si/Cu比)
关于电极的Si/Cu比,通过EPMA(JEOL Ltd.制造的JXA-8800RL)测定热电转换元件的表面(形成有电极的表面)的Cu量及Si量,求出了Si/Cu比。
具体而言,研磨所述立方体样品的电极面,通过EPMA测定电极面的任意五处的Cu量及Si量,并求出了平均值。另外,在测定点为空洞的情况或粒子的端部的情况下,测定了最接近测定点的粒子的中心部。
[表1]
在由硅化镍构成电极的比较例1中,在制造时产生了裂纹。因此,未对电阻值和电极的气孔率进行评价。在由镍构成电极的比较例2中,在制造时产生了裂纹。因此,未对电阻值和电极的气孔率进行评价。在由铝构成电极的比较例3中,在制造时未产生裂纹,但电阻值达到非常高的0.19Ω。
相对于此,在由硅化铜构成电极的实施例1~11中,在制造时未产生裂纹,并且电阻值也较低。
综上所述,确认到根据实施例1~11,能够提供一种热电转换元件,该热电转换元件的由硅化物系化合物的热电转换材料构成的元件主体与电极可靠地接合,界面中的电阻足够低,且能够抑制在元件主体和电极上产生裂纹。另外,在气孔率超过60%的实施例11中,电阻值虽然低于比较例3,但与实施例1~10相比稍高。
产业上的可利用性
根据本发明的热电转换元件,由硅化物系化合物的热电转换材料构成的元件主体与电极可靠地接合,界面中的电阻足够低,且能够抑制在元件主体和电极上产生裂纹,因此能够在产业上利用。
符号说明
1 热电转换模块
3 端子
10 热电转换元件
11 元件主体
15 电极
16 金属层
Claims (5)
1.一种热电转换元件,具备:
元件主体,由硅化物系化合物的热电转换材料构成;及电极,分别形成于该元件主体的一表面及与该一表面对置的另一表面,其特征在于,
所述电极由硅化铜的烧结体构成,并且所述电极与所述元件主体直接接合。
2.根据权利要求1所述的热电转换元件,其特征在于,
在所述电极的与所述元件主体相反的一侧的表面形成有金属层。
3.根据权利要求1或2所述的热电转换元件,其特征在于,
所述电极的厚度为10μm以上且300μm以下。
4.根据权利要求1至3中任一项所述的热电转换元件,其特征在于,
所述硅化铜中的Si与Cu的原子数比Si/Cu为0.12以上且0.4以下。
5.根据权利要求1至4中任一项所述的热电转换元件,其特征在于,
所述硅化铜中的气孔率为60%以下。
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JP2019165215A (ja) | 2019-09-26 |
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EP3767689A1 (en) | 2021-01-20 |
KR20200130806A (ko) | 2020-11-20 |
US11152554B2 (en) | 2021-10-19 |
US20200373474A1 (en) | 2020-11-26 |
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