CN111302516A - 一种光刻胶剥离液废液再生利用的方法 - Google Patents
一种光刻胶剥离液废液再生利用的方法 Download PDFInfo
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- CN111302516A CN111302516A CN202010101582.8A CN202010101582A CN111302516A CN 111302516 A CN111302516 A CN 111302516A CN 202010101582 A CN202010101582 A CN 202010101582A CN 111302516 A CN111302516 A CN 111302516A
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 101
- 239000002699 waste material Substances 0.000 title claims abstract description 54
- 238000000034 method Methods 0.000 title claims abstract description 36
- 238000004064 recycling Methods 0.000 title claims abstract description 24
- 239000007788 liquid Substances 0.000 claims abstract description 65
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 51
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 49
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000004697 Polyetherimide Substances 0.000 claims abstract description 17
- 229920001601 polyetherimide Polymers 0.000 claims abstract description 17
- 239000010808 liquid waste Substances 0.000 claims abstract description 16
- 238000011084 recovery Methods 0.000 claims abstract description 15
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- 238000000926 separation method Methods 0.000 claims abstract description 8
- 238000004042 decolorization Methods 0.000 claims abstract description 6
- 238000003825 pressing Methods 0.000 claims abstract description 6
- 230000001502 supplementing effect Effects 0.000 claims abstract description 3
- 230000004048 modification Effects 0.000 claims description 17
- 238000012986 modification Methods 0.000 claims description 17
- 239000007787 solid Substances 0.000 claims description 9
- 238000003756 stirring Methods 0.000 claims description 8
- 238000002360 preparation method Methods 0.000 claims description 4
- 238000005119 centrifugation Methods 0.000 claims description 2
- 238000004062 sedimentation Methods 0.000 claims description 2
- 230000008901 benefit Effects 0.000 abstract description 6
- 230000007613 environmental effect Effects 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 12
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 9
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 7
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 7
- 239000002245 particle Substances 0.000 description 6
- 238000005086 pumping Methods 0.000 description 6
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000003463 adsorbent Substances 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004811 liquid chromatography Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 2
- 239000003495 polar organic solvent Substances 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- MHABMANUFPZXEB-UHFFFAOYSA-N O-demethyl-aloesaponarin I Natural products O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=C(O)C(C(O)=O)=C2C MHABMANUFPZXEB-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
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- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
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- 239000002920 hazardous waste Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/38—Treatment of water, waste water, or sewage by centrifugal separation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
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CN202010101582.8A CN111302516B (zh) | 2020-02-19 | 2020-02-19 | 一种光刻胶剥离液废液再生利用的方法 |
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CN202010101582.8A CN111302516B (zh) | 2020-02-19 | 2020-02-19 | 一种光刻胶剥离液废液再生利用的方法 |
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CN111302516A true CN111302516A (zh) | 2020-06-19 |
CN111302516B CN111302516B (zh) | 2023-05-05 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115304187A (zh) * | 2022-08-17 | 2022-11-08 | 上海盛剑微电子有限公司 | 剥离液废液的回收处理方法 |
RU2805410C1 (ru) * | 2022-12-21 | 2023-10-16 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) | Способ очистки сточных вод производства печатных плат, содержащих фоторезист спф-вщ, и устройство для его осуществления |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001212596A (ja) * | 2000-02-03 | 2001-08-07 | Matsushita Environment Airconditioning Eng Co Ltd | 現像廃液再生方法 |
CN105314770A (zh) * | 2015-12-01 | 2016-02-10 | 杭州格林达化学有限公司 | 四甲基氢氧化铵显影废液再生系统和再生方法 |
CN106746092A (zh) * | 2017-01-19 | 2017-05-31 | 电信科学技术仪表研究所 | 一种电路板组装件清洗废液的水处理方法及系统 |
CN108911287A (zh) * | 2018-07-23 | 2018-11-30 | 华进半导体封装先导技术研发中心有限公司 | 用于集成电路制造的清洗液再生工艺方法与装置 |
-
2020
- 2020-02-19 CN CN202010101582.8A patent/CN111302516B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001212596A (ja) * | 2000-02-03 | 2001-08-07 | Matsushita Environment Airconditioning Eng Co Ltd | 現像廃液再生方法 |
CN105314770A (zh) * | 2015-12-01 | 2016-02-10 | 杭州格林达化学有限公司 | 四甲基氢氧化铵显影废液再生系统和再生方法 |
CN106746092A (zh) * | 2017-01-19 | 2017-05-31 | 电信科学技术仪表研究所 | 一种电路板组装件清洗废液的水处理方法及系统 |
CN108911287A (zh) * | 2018-07-23 | 2018-11-30 | 华进半导体封装先导技术研发中心有限公司 | 用于集成电路制造的清洗液再生工艺方法与装置 |
Non-Patent Citations (2)
Title |
---|
王海军: "改性硅藻土在线路板废水处理中的应用研究", 《中国优秀硕士学位论文全文数据库 工程科技Ⅰ辑》 * |
郑水林等: "《粉体表面改性》", 30 June 2019, 中国建材工业出版社 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115304187A (zh) * | 2022-08-17 | 2022-11-08 | 上海盛剑微电子有限公司 | 剥离液废液的回收处理方法 |
RU2805410C1 (ru) * | 2022-12-21 | 2023-10-16 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) | Способ очистки сточных вод производства печатных плат, содержащих фоторезист спф-вщ, и устройство для его осуществления |
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Address after: 215000 No. 168, Shanfeng Road, Hedong Industrial Park, Wuzhong Economic Development Zone, Suzhou, Jiangsu Applicant after: Jingrui Electronic Materials Co.,Ltd. Address before: 215000 No. 3, Chenghu East Road, Wuzhong Economic Development Zone, Suzhou, Jiangsu Applicant before: SUZHOU CRYSTAL CLEAR CHEMICAL Co.,Ltd. |
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Effective date of registration: 20231206 Address after: 215124 No. 501 Minfeng Road, Wuzhong Economic Development Zone, Suzhou City, Jiangsu Province Patentee after: Ruihong (Suzhou) Electronic Chemicals Co.,Ltd. Address before: 215000 No. 168, Shanfeng Road, Hedong Industrial Park, Wuzhong Economic Development Zone, Suzhou, Jiangsu Patentee before: Jingrui Electronic Materials Co.,Ltd. |