CN110794651B - 图案描绘装置 - Google Patents

图案描绘装置 Download PDF

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Publication number
CN110794651B
CN110794651B CN201911069205.4A CN201911069205A CN110794651B CN 110794651 B CN110794651 B CN 110794651B CN 201911069205 A CN201911069205 A CN 201911069205A CN 110794651 B CN110794651 B CN 110794651B
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China
Prior art keywords
substrate
speed
pattern
line
lines
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CN201911069205.4A
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English (en)
Chinese (zh)
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CN110794651A (zh
Inventor
铃木智也
奈良圭
加藤正纪
渡辺智行
鬼头义昭
堀正和
林田洋祐
小宫山弘树
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
CN201911069205.4A 2015-02-27 2016-02-26 图案描绘装置 Active CN110794651B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015039243 2015-02-27
JP2015-039243 2015-02-27
CN201680006570.9A CN107209461B (zh) 2015-02-27 2016-02-26 基板处理装置、元件制造系统及元件制造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201680006570.9A Division CN107209461B (zh) 2015-02-27 2016-02-26 基板处理装置、元件制造系统及元件制造方法

Publications (2)

Publication Number Publication Date
CN110794651A CN110794651A (zh) 2020-02-14
CN110794651B true CN110794651B (zh) 2021-07-09

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Family Applications (3)

Application Number Title Priority Date Filing Date
CN201680006570.9A Active CN107209461B (zh) 2015-02-27 2016-02-26 基板处理装置、元件制造系统及元件制造方法
CN201911069205.4A Active CN110794651B (zh) 2015-02-27 2016-02-26 图案描绘装置
CN201810732338.4A Active CN108919610B (zh) 2015-02-27 2016-02-26 基板处理装置及元件制造方法

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Application Number Title Priority Date Filing Date
CN201680006570.9A Active CN107209461B (zh) 2015-02-27 2016-02-26 基板处理装置、元件制造系统及元件制造方法

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CN201810732338.4A Active CN108919610B (zh) 2015-02-27 2016-02-26 基板处理装置及元件制造方法

Country Status (6)

Country Link
JP (2) JP6794980B2 (ja)
KR (1) KR102206992B1 (ja)
CN (3) CN107209461B (ja)
HK (1) HK1257065A1 (ja)
TW (2) TWI699624B (ja)
WO (1) WO2016136974A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016136974A1 (ja) * 2015-02-27 2016-09-01 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法
CN115561736B (zh) * 2022-10-25 2023-10-13 山东莱恩光电科技股份有限公司 一种激光雷达免维护护罩及雷达

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001305454A (ja) * 2000-04-24 2001-10-31 Asahi Optical Co Ltd 走査式描画装置
JP2003140069A (ja) * 2001-10-30 2003-05-14 Panasonic Communications Co Ltd 光走査装置及びその調整方法
CN101840162A (zh) * 2005-06-20 2010-09-22 集成方案株式会社 曝光装置及图形形成方法
JP2013200463A (ja) * 2012-03-26 2013-10-03 Nikon Corp 基板処理装置
CN104204956A (zh) * 2012-03-26 2014-12-10 株式会社尼康 基板处理装置、处理装置以及元件制造方法

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JPS6111720A (ja) * 1984-06-26 1986-01-20 Canon Inc 画像形成装置
JPH03163477A (ja) * 1989-11-21 1991-07-15 Brother Ind Ltd 分割露光装置
US5668588A (en) * 1993-04-01 1997-09-16 Dainippon Screen Mfg. Co., Ltd. Spiral scanning image recording apparatus and image recording method
JPH07246729A (ja) * 1994-03-11 1995-09-26 Dainippon Screen Mfg Co Ltd 画像記録装置
JPH10142538A (ja) * 1996-11-12 1998-05-29 Asahi Optical Co Ltd マルチヘッド走査光学系を持つレーザ描画装置
JPH10246861A (ja) * 1997-01-06 1998-09-14 Asahi Optical Co Ltd カスケード走査光学系を備えた記録装置
JP2000019438A (ja) * 1998-06-30 2000-01-21 Mitsubishi Chemicals Corp 走査装置
JP3648516B2 (ja) 1999-02-05 2005-05-18 ペンタックスインダストリアルインスツルメンツ株式会社 走査式描画装置
JP2003115449A (ja) * 2001-02-15 2003-04-18 Nsk Ltd 露光装置
WO2004053952A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
JP2007298603A (ja) 2006-04-28 2007-11-15 Shinko Electric Ind Co Ltd 描画装置および描画方法
JP4683016B2 (ja) * 2007-07-17 2011-05-11 ブラザー工業株式会社 光走査装置及び印刷装置
JP5319175B2 (ja) * 2008-06-17 2013-10-16 日立造船株式会社 パターン描画方法及び装置
US8264666B2 (en) * 2009-03-13 2012-09-11 Nikon Corporation Exposure apparatus, exposure method, and method of manufacturing device
JP5842925B2 (ja) * 2011-11-04 2016-01-13 株式会社ニコン 基板処理装置、及び基板処理方法
KR101999497B1 (ko) * 2012-08-28 2019-07-11 가부시키가이샤 니콘 패턴 형성 장치
CN102890429B (zh) * 2012-09-18 2015-02-11 天津芯硕精密机械有限公司 光刻系统中倾斜扫描显示下提高数据传输速度的方法
JP2015145990A (ja) * 2014-02-04 2015-08-13 株式会社ニコン 露光装置
JP6361273B2 (ja) * 2014-05-13 2018-07-25 株式会社ニコン 基板処理装置及びデバイス製造方法
WO2016136974A1 (ja) * 2015-02-27 2016-09-01 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001305454A (ja) * 2000-04-24 2001-10-31 Asahi Optical Co Ltd 走査式描画装置
JP2003140069A (ja) * 2001-10-30 2003-05-14 Panasonic Communications Co Ltd 光走査装置及びその調整方法
CN101840162A (zh) * 2005-06-20 2010-09-22 集成方案株式会社 曝光装置及图形形成方法
JP2013200463A (ja) * 2012-03-26 2013-10-03 Nikon Corp 基板処理装置
CN104204956A (zh) * 2012-03-26 2014-12-10 株式会社尼康 基板处理装置、处理装置以及元件制造方法

Also Published As

Publication number Publication date
JP6648798B2 (ja) 2020-02-14
CN107209461A (zh) 2017-09-26
HK1257065A1 (zh) 2019-10-11
CN108919610A (zh) 2018-11-30
TW202036178A (zh) 2020-10-01
CN107209461B (zh) 2019-10-18
TW201702746A (zh) 2017-01-16
KR20170121168A (ko) 2017-11-01
CN108919610B (zh) 2021-02-02
JP2019049731A (ja) 2019-03-28
WO2016136974A1 (ja) 2016-09-01
KR102206992B1 (ko) 2021-01-25
TWI699624B (zh) 2020-07-21
JP6794980B2 (ja) 2020-12-02
CN110794651A (zh) 2020-02-14
TWI720911B (zh) 2021-03-01
JPWO2016136974A1 (ja) 2017-12-07

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