CN110036343B - 水溶性组合物、图案形成剂、使用了它们的固化物的制造方法和固化物 - Google Patents

水溶性组合物、图案形成剂、使用了它们的固化物的制造方法和固化物 Download PDF

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Publication number
CN110036343B
CN110036343B CN201780072576.0A CN201780072576A CN110036343B CN 110036343 B CN110036343 B CN 110036343B CN 201780072576 A CN201780072576 A CN 201780072576A CN 110036343 B CN110036343 B CN 110036343B
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water
group
soluble
soluble composition
cured product
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CN110036343A (zh
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原宪司
入泽正福
川原友泰
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Adeka Corp
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Adeka Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F216/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an alcohol radical
    • C08F216/04—Acyclic compounds
    • C08F216/06—Polyvinyl alcohol ; Vinyl alcohol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F18/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid
    • C08F18/02—Esters of monocarboxylic acids
    • C08F18/04—Vinyl esters
    • C08F18/08—Vinyl acetate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/28—Condensation with aldehydes or ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN201780072576.0A 2016-12-22 2017-12-20 水溶性组合物、图案形成剂、使用了它们的固化物的制造方法和固化物 Active CN110036343B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016249794 2016-12-22
JP2016-249794 2016-12-22
PCT/JP2017/045662 WO2018117138A1 (ja) 2016-12-22 2017-12-20 水溶性組成物、パターン形成剤、これらを用いた硬化物の製造方法および硬化物

Publications (2)

Publication Number Publication Date
CN110036343A CN110036343A (zh) 2019-07-19
CN110036343B true CN110036343B (zh) 2023-06-13

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Country Status (5)

Country Link
JP (1) JP7096772B2 (ko)
KR (1) KR102478397B1 (ko)
CN (1) CN110036343B (ko)
TW (1) TWI753072B (ko)
WO (1) WO2018117138A1 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018230564A1 (ja) * 2017-06-16 2018-12-20 株式会社Adeka コーティング組成物
WO2019004431A1 (ja) * 2017-06-29 2019-01-03 株式会社Adeka 接着剤組成物
JP2020084156A (ja) * 2018-11-30 2020-06-04 株式会社Adeka 組成物、これを含有するバリア膜形成用組成物、これらの硬化物、それからなるガスバリア膜および硬化物の製造方法
CN112432931B (zh) * 2020-11-09 2023-04-07 合肥乐凯科技产业有限公司 一种薄膜涂层固化度的测试方法
CN114797513B (zh) * 2022-04-11 2024-01-26 云南磷化集团有限公司 一种实验室试剂瓶标签保护膜的制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08269130A (ja) * 1995-03-31 1996-10-15 Oji Kako Kk 陰極線管蛍光面作製用感光性樹脂材料
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
JP2001133976A (ja) * 1999-11-05 2001-05-18 Murakami:Kk 感光性樹脂組成物及びそれを用いたスクリーン印刷用版並びにスクリーン印刷用版の製造方法
CN104854155A (zh) * 2012-12-13 2015-08-19 株式会社Adeka 光固化性组合物
JP2016139130A (ja) * 2015-01-23 2016-08-04 東レ株式会社 感光性樹脂組成物、感光性樹脂積層体、および感光性樹脂印刷版原版

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
JP4077927B2 (ja) 1998-04-27 2008-04-23 住友化学株式会社 樹脂組成物および積層体
US20070082965A1 (en) * 2002-11-28 2007-04-12 Jsr Corporation Photocuring resin composition, medical device using same and method for manufacturing same
JP4570406B2 (ja) * 2004-07-09 2010-10-27 株式会社カネカ ポリ乳酸系樹脂発泡粒子およびその成形体
JP2007025723A (ja) * 2006-10-19 2007-02-01 Kunihiro Ichimura 感活性エネルギー線樹脂組成物、感活性エネルギー線樹脂フィルム及び該フィルムを用いるパターン形成方法
JP4943968B2 (ja) 2007-08-06 2012-05-30 三菱製紙株式会社 感熱記録材料
ATE538185T1 (de) * 2007-08-22 2012-01-15 Datalase Ltd Laserempfindliche beschichtungszusammensetzung
JP5791415B2 (ja) 2011-07-28 2015-10-07 日本合成化学工業株式会社 耐変色性ポリビニルアルコール系樹脂架橋物の製造方法
JP6123714B2 (ja) * 2014-03-19 2017-05-10 富士ゼロックス株式会社 電子写真感光体、プロセスカートリッジ、及び画像形成装置
WO2016136752A1 (ja) * 2015-02-26 2016-09-01 株式会社Adeka パターン形成方法およびこれを用いて製造した電子デバイス
JP6545506B2 (ja) * 2015-03-31 2019-07-17 株式会社Adeka 重合体及び光硬化性組成物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08269130A (ja) * 1995-03-31 1996-10-15 Oji Kako Kk 陰極線管蛍光面作製用感光性樹脂材料
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
JP2001133976A (ja) * 1999-11-05 2001-05-18 Murakami:Kk 感光性樹脂組成物及びそれを用いたスクリーン印刷用版並びにスクリーン印刷用版の製造方法
CN104854155A (zh) * 2012-12-13 2015-08-19 株式会社Adeka 光固化性组合物
JP2016139130A (ja) * 2015-01-23 2016-08-04 東レ株式会社 感光性樹脂組成物、感光性樹脂積層体、および感光性樹脂印刷版原版

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Publication number Publication date
TW201831584A (zh) 2018-09-01
JP7096772B2 (ja) 2022-07-06
WO2018117138A1 (ja) 2018-06-28
KR20190098746A (ko) 2019-08-22
TWI753072B (zh) 2022-01-21
CN110036343A (zh) 2019-07-19
KR102478397B1 (ko) 2022-12-15
JPWO2018117138A1 (ja) 2019-10-31

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