CN109807027A - A kind of glue mouth cleaning system and its cleaning method using automatically controlled suck back valve - Google Patents
A kind of glue mouth cleaning system and its cleaning method using automatically controlled suck back valve Download PDFInfo
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- CN109807027A CN109807027A CN201711159619.7A CN201711159619A CN109807027A CN 109807027 A CN109807027 A CN 109807027A CN 201711159619 A CN201711159619 A CN 201711159619A CN 109807027 A CN109807027 A CN 109807027A
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- automatically controlled
- cleaning
- glue mouth
- glue
- suck back
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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Abstract
The invention belongs in semicon industry to wafer spin processes liquid handling field, specifically a kind of glue mouth cleaning system and its cleaning method using automatically controlled suck back valve, cleaning system includes rubber head, Jiao Zui, glue mouth rinse bath, glue mouth cleaning pipe, on-off valve, glue road insulating tube, automatically controlled suck back valve and automatically controlled resorption valve control, Jiao Zui is driven into glue mouth rinse bath by lifting assembly, through automatically controlled suck back valve under the action of automatically controlled resorption valve control, cooperate the control of on-off valve again, in the clean chamber of glue mouth rinse bath, energy high-precision resorption glue mouth cleaning solution, the purpose cleaned to Jiao Zui is realized in turn.The present invention passes through the automatically controlled suck back valve accurately controlled, can more effectively clean to Jiao Zui residual photoresist, and photoresist in glue road can absolutely be blocked to contact with air, to reduce photoresist waste, save cost for enterprise.
Description
Technical field
The invention belongs in semicon industry to wafer spin processes liquid handling field, specifically a kind of use
The glue mouth cleaning system and its cleaning method of automatically controlled suck back valve.
Background technique
During semiconductor spin processes, glue mouth point is easy to appear photoetching glue residua in technology room twice in.This
Residue is not easily to fall off in air after the solvent volatilization in photoresist, causes very serious influence to subsequent technique, influences
The yield of product.
Summary of the invention
In order to solve the end Jiao Zui photoresist residue problem, automatically controlled suck back valve is used the purpose of the present invention is to provide a kind of
Glue mouth cleaning system and its cleaning method.The cleaning system and cleaning method are able to achieve multibreak resorption, can be more effectively to glue
Mouth residual photoresist is cleaned, and photoresist in glue road can absolutely be blocked to contact with air, to reduce photoresist waste.
The purpose of the present invention is achieved through the following technical solutions:
The present invention includes the part Jiao Lu, cleaning part and control section, and wherein the part Jiao Lu includes rubber head, Jiao Zui and Jiao Lu
Insulating tube, the cleaning part subpackage glue-scraping mouth rinse bath, glue mouth cleaning pipe and Jiao Zui clean inlet, and the control section includes
Automatically controlled suck back valve, automatically controlled resorption valve control and on-off valve；The rubber head is connected to the output end of lifting assembly, and the one of the rubber head
End is connected by glue road insulating tube with automatically controlled suck back valve, and the other end is equipped with Jiao Zui, and the rubber head and Jiao Zui are by lifting assembly
Driving is gone up and down above glue mouth rinse bath；Photoresist source is connected by photoetching gel feed with the automatically controlled suck back valve, to
The Jiao Zui provides photoresist, which is electrically connected with automatically controlled resorption valve control；The Jiao Zui cleaning inlet is logical
On-off valve is crossed to be connected with one end of glue mouth cleaning pipe, the other end of the glue mouth cleaning pipe is connected to the glue mouth rinse bath, to insert
The Jiao Zui entered in the glue mouth rinse bath sprays cleaning solution, cleans Jiao Zui；
Wherein: being equipped in the glue mouth rinse bath and clean chamber, which is glue mouth inlet portion, and bottom end is
Waste liquid discharge unit equipped with waste liquid outlet, centre are the cleaning solution inlet being connected with the glue mouth cleaning pipe other end；It is described
Cleaning solution inlet is aligned with the center of the Jiao Zui of insertion glue mouth inlet portion, i.e. the center line of the cleaning solution inlet
With the vertical and intersectant centerline of Jiao Zui；
The present invention uses the cleaning method of the glue mouth cleaning system of automatically controlled suck back valve are as follows:
The lifting assembly drives Jiao Zui decline insertion glue mouth rinse bath, and the automatically controlled suck back valve described at this time carries out photoresist
Resorption forms air section in the end at the tip of Jiao Zui, and the top of the air section is glue road photoresist；The glue mouth detergent line
Under the action of on-off valve hydrojet, the remaining photoresist in the sharp-tongued end of glue is cleaned；In the cleaning process, described automatically controlled time
Valve is inhaled under the action of automatically controlled resorption valve control, resorption movement is carried out to Jiao Lu, is controlled by the automatically controlled resorption valve control
Resorption speed and resorption intensity during resorption, clean Jiao Zui, to achieve the effect that photoresist cleaning and resorption.
Advantages of the present invention and good effect are as follows:
1. glue mouth cleaning system of the invention be divided into Jiao Lu part, cleaning part and control section, can independently to Jiao Zui into
Row effectively cleaning.
2. the glue mouth rinse bath in glue mouth cleaning system of the present invention, cleaning solution inlet are aligned with the center Jiao Zui,
Cleaning solution can form liquid turbulent flow when spraying, can effectively clean to the end Jiao Zui.
3. the automatically controlled suck back valve in glue mouth cleaning system of the present invention cooperates on-off under automatically controlled suck back valve controller action
Valve can carry out high-precision resorption to Jiao Zui, improve technological ability.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of cleaning system of the present invention；
Wherein: 1 is rubber head, and 2 be Jiao Zui, and 3 be glue mouth rinse bath, and 4 be waste liquid outlet, and 5 be glue mouth cleaning pipe, and 6 be on-off
Valve, 7 clean inlet for Jiao Zui, and 8 be automatically controlled resorption valve control, and 9 be controlling cable, and 10 be photoetching gel feed, and 11 be automatically controlled
Suck back valve, 12 be glue road insulating tube, and 13 be clean chamber.
Specific embodiment
The invention will be further described with reference to the accompanying drawing.
As shown in Figure 1, cleaning system of the invention includes the part Jiao Lu, cleaning part and control section, wherein glue road portion
Divide includes rubber head 1, glue mouth 2 and glue road insulating tube 12, cleaning part subpackage glue-scraping mouth rinse bath 3, glue mouth cleaning pipe 5 and Jiao Zui cleaning
Inlet 7, control section include automatically controlled suck back valve 11, automatically controlled resorption valve control 8 and on-off valve 6.
Rubber head 1 is connected to the output end of lifting assembly, and one end of the rubber head 1 passes through glue road insulating tube 12 and automatically controlled suck back valve
11 are connected, and the other end is connected with glue mouth 2, which is located at the surface of glue mouth rinse bath.Rubber head 1 and glue mouth 2 are by lifting group
Part driving is gone up and down in the top of glue mouth rinse bath 3.Photoresist source is connected by photoetching gel feed 10 with automatically controlled suck back valve 11,
Photoresist is provided to glue mouth 2；The automatically controlled suck back valve 11 is electrically connected by controlling cable 9 with automatically controlled resorption valve control 8, the present invention
Automatically controlled resorption valve control 8 be the prior art.Jiao Zui cleans one end phase that inlet 7 passes through on-off valve 6 and glue mouth cleaning pipe 5
Even, the other end of the glue mouth cleaning pipe 5 is connected to glue mouth rinse bath 3.It is equipped in glue mouth rinse bath 3 and cleans chamber 13, this is cleaned
The upper end of chamber 13 is glue mouth inlet portion, and bottom end is the waste liquid discharge unit equipped with waste liquid outlet 4, and centre is and glue mouth cleaning pipe 5
The connected cleaning solution inlet of the other end.Cleaning solution inlet is aligned with the center of the glue mouth 2 of insertion glue mouth inlet portion, i.e.,
The center line of the cleaning solution inlet and the vertical and intersectant centerline of glue mouth 2 can form the turbulent (spiral shell of liquid in cleaning solution sprinkling
Eddy flow), 2 end of glue mouth is effectively cleaned.
The present invention uses the cleaning method of the glue mouth cleaning system of automatically controlled suck back valve are as follows:
Lifting assembly drives the decline insertion glue mouth rinse bath 3 of glue mouth 2, until the dotted line position in Fig. 1；Automatically controlled suck back valve at this time
11 pairs of photoresists carry out resorption, form one section of air in the end at the tip of glue mouth 2, the top of this section of air is the photoetching of glue road
Glue；Glue mouth detergent line 5 under the action of on-off valve 6 hydrojet, the remaining photoresist in 2 tip of glue mouth is cleaned, this for this
The glue mouth cleaning process of invention；In the cleaning process, automatically controlled suck back valve 11 is right under the action of automatically controlled resorption valve control 8
The resorption movement that Jiao Lu is carried out can be controlled resorption speed and resorption intensity during resorption by automatically controlled resorption valve control 8,
Glue mouth 2 can effectively be cleaned, to achieve the effect that photoresist cleaning and resorption.
Claims (4)
1. a kind of glue mouth cleaning system using automatically controlled suck back valve, it is characterised in that: including the part Jiao Lu, cleaning part and control
Part, wherein the part Jiao Lu includes rubber head (1), Jiao Zui (2) and glue road insulating tube (12), the cleaning part subpackage glue-scraping mouth cleaning
Slot (3), glue mouth cleaning pipe (5) and Jiao Zui cleaning inlet (7), the control section includes automatically controlled suck back valve (11), automatically controlled time
Inhale valve control (8) and on-off valve (6)；The rubber head (1) is connected to the output end of lifting assembly, and one end of the rubber head (1) is logical
The road Guo Jiao insulating tube (12) is connected with automatically controlled suck back valve (11), and the other end is equipped with Jiao Zui (2), the rubber head (1) and Jiao Zui
(2) it is gone up and down above glue mouth rinse bath (3) by lifting assembly driving；Photoresist source passes through photoetching gel feed (10) and institute
It states automatically controlled suck back valve (11) to be connected, Xiang Suoshu Jiao Zui (2) provides photoresist, and the automatically controlled suck back valve (11) and automatically controlled suck back valve control
Device (8) electrical connection；Jiao Zui cleaning inlet (7) is connected by on-off valve (6) with one end of glue mouth cleaning pipe (5), the glue
The other end of mouth cleaning pipe (5) is connected to the glue mouth rinse bath (3), to Jiao Zui (2) spray being inserted into the glue mouth rinse bath (3)
Cleaning solution out cleans Jiao Zui (2).
2. using the glue mouth cleaning system of automatically controlled suck back valve according to claim 1, it is characterised in that: the glue mouth rinse bath
(3) it is equipped in and cleans chamber (13), which is glue mouth inlet portion, and bottom end is equipped with waste liquid outlet (4)
Waste liquid discharge unit, centre is the cleaning solution inlet that is connected with glue mouth cleaning pipe (5) other end.
3. using the glue mouth cleaning system of automatically controlled suck back valve according to claim 2, it is characterised in that: the cleaning solution feed liquor
Mouth is aligned with the center of the Jiao Zui (2) of insertion glue mouth inlet portion, i.e. the center line and Jiao Zui of the cleaning solution inlet
(2) vertical and intersectant centerline.
4. a kind of cleaning method of according to claim 1, the 2 or 3 glue mouth cleaning systems using automatically controlled suck back valve, feature
Be: the lifting assembly drives Jiao Zui (2) decline insertion glue mouth rinse bath (3), and the automatically controlled suck back valve (11) described at this time is to light
Photoresist carries out resorption, forms air section in the end at the tip of Jiao Zui (2), the top of the air section is glue road photoresist；It is described
Glue mouth detergent line (5) under the action of on-off valve (6) hydrojet, the remaining photoresist in Jiao Zui (2) tip is cleaned；At this
In cleaning process, it is dynamic that the automatically controlled suck back valve (11) carries out resorption under the action of automatically controlled resorption valve control (8), to Jiao Lu
Make, by the resorption speed and resorption intensity during automatically controlled resorption valve control (8) the control resorption, Jiao Zui (2) are carried out
Cleaning, to achieve the effect that photoresist cleaning and resorption.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711159619.7A CN109807027A (en) | 2017-11-20 | 2017-11-20 | A kind of glue mouth cleaning system and its cleaning method using automatically controlled suck back valve |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711159619.7A CN109807027A (en) | 2017-11-20 | 2017-11-20 | A kind of glue mouth cleaning system and its cleaning method using automatically controlled suck back valve |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109807027A true CN109807027A (en) | 2019-05-28 |
Family
ID=66599430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711159619.7A Pending CN109807027A (en) | 2017-11-20 | 2017-11-20 | A kind of glue mouth cleaning system and its cleaning method using automatically controlled suck back valve |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109807027A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114054287A (en) * | 2020-07-30 | 2022-02-18 | 中国科学院微电子研究所 | Photoresist suck-back device, photoresist coating equipment and photoresist coating method |
| CN114602872A (en) * | 2022-05-16 | 2022-06-10 | 宁波润华全芯微电子设备有限公司 | Nozzle test moisturizing box |
| CN114624017A (en) * | 2022-05-16 | 2022-06-14 | 宁波润华全芯微电子设备有限公司 | Nozzle monitoring and detecting system |
| CN117393472A (en) * | 2023-12-11 | 2024-01-12 | 宁波润华全芯微电子设备有限公司 | Liquid discharge device of wafer processing equipment and control method thereof |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1669680A (en) * | 2004-03-19 | 2005-09-21 | 大日本网目版制造株式会社 | Nozzle cleaning device and substrate treating device |
| US20080023034A1 (en) * | 2006-05-23 | 2008-01-31 | Takeshi Hirao | Nozzle cleaning apparatus, nozzle cleaning method, and a computer-readable storage medium storing nozzle cleaning program |
| US20130315627A1 (en) * | 2012-05-22 | 2013-11-28 | Minoru Sugiyama | Development processing device |
| CN103846183A (en) * | 2013-12-20 | 2014-06-11 | 深圳市华星光电技术有限公司 | Coater spraying nozzle cleaning device |
| CN104404431A (en) * | 2013-07-26 | 2015-03-11 | 苏舍美特科公司 | Method of cleaning a torch of a plasma-coating plant and a plasma-coating plant |
| CN204816984U (en) * | 2015-08-14 | 2015-12-02 | 麦斯克电子材料有限公司 | Monocrystalline silicon mounting platform supplies wax device |
| CN105435984A (en) * | 2016-01-26 | 2016-03-30 | 京东方科技集团股份有限公司 | Frame sealing glue coating device, work method thereof and frame sealing glue coating equipment |
| CN205341179U (en) * | 2015-12-29 | 2016-06-29 | 无锡宏纳科技有限公司 | Self - cleaning device of photosensitive resist shower nozzle |
| CN105728243A (en) * | 2014-12-08 | 2016-07-06 | 沈阳芯源微电子设备有限公司 | Device and method for moisture preservation of photoresist sprayer |
-
2017
- 2017-11-20 CN CN201711159619.7A patent/CN109807027A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1669680A (en) * | 2004-03-19 | 2005-09-21 | 大日本网目版制造株式会社 | Nozzle cleaning device and substrate treating device |
| US20080023034A1 (en) * | 2006-05-23 | 2008-01-31 | Takeshi Hirao | Nozzle cleaning apparatus, nozzle cleaning method, and a computer-readable storage medium storing nozzle cleaning program |
| US20130315627A1 (en) * | 2012-05-22 | 2013-11-28 | Minoru Sugiyama | Development processing device |
| CN104404431A (en) * | 2013-07-26 | 2015-03-11 | 苏舍美特科公司 | Method of cleaning a torch of a plasma-coating plant and a plasma-coating plant |
| CN103846183A (en) * | 2013-12-20 | 2014-06-11 | 深圳市华星光电技术有限公司 | Coater spraying nozzle cleaning device |
| CN105728243A (en) * | 2014-12-08 | 2016-07-06 | 沈阳芯源微电子设备有限公司 | Device and method for moisture preservation of photoresist sprayer |
| CN204816984U (en) * | 2015-08-14 | 2015-12-02 | 麦斯克电子材料有限公司 | Monocrystalline silicon mounting platform supplies wax device |
| CN205341179U (en) * | 2015-12-29 | 2016-06-29 | 无锡宏纳科技有限公司 | Self - cleaning device of photosensitive resist shower nozzle |
| CN105435984A (en) * | 2016-01-26 | 2016-03-30 | 京东方科技集团股份有限公司 | Frame sealing glue coating device, work method thereof and frame sealing glue coating equipment |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114054287A (en) * | 2020-07-30 | 2022-02-18 | 中国科学院微电子研究所 | Photoresist suck-back device, photoresist coating equipment and photoresist coating method |
| CN114602872A (en) * | 2022-05-16 | 2022-06-10 | 宁波润华全芯微电子设备有限公司 | Nozzle test moisturizing box |
| CN114624017A (en) * | 2022-05-16 | 2022-06-14 | 宁波润华全芯微电子设备有限公司 | Nozzle monitoring and detecting system |
| CN117393472A (en) * | 2023-12-11 | 2024-01-12 | 宁波润华全芯微电子设备有限公司 | Liquid discharge device of wafer processing equipment and control method thereof |
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Application publication date: 20190528 |