CN205341179U - Self - cleaning device of photosensitive resist shower nozzle - Google Patents
Self - cleaning device of photosensitive resist shower nozzle Download PDFInfo
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- CN205341179U CN205341179U CN201521127452.2U CN201521127452U CN205341179U CN 205341179 U CN205341179 U CN 205341179U CN 201521127452 U CN201521127452 U CN 201521127452U CN 205341179 U CN205341179 U CN 205341179U
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- rinse bath
- light
- clearing apparatus
- cleaning case
- automatic clearing
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Abstract
The utility model discloses a self - cleaning device of photosensitive resist shower nozzle, it is including wasing the case, it is provided with the washing tank to wash case upper portion, the washing tank bottom is provided with position sensor, the basis that detects photosensitive resist shower nozzle position position sensor's the detection signal openning or the controller of shutoff power pump, the self - cleaning device is still including being located wash the washing liquid bin and the flushing pipe of the inner chamber of case, the one end of power pump is connected the washing liquid bin, the other end is connected the flushing pipe, the liquid outlet of flushing pipe is connected the washing tank, the device can focus automatically and carve glue the shower nozzle and wash, reduces the harmful effects that crystallization impurity that the photosensitive resist introduced caused photoetching process at the spraying in -process, improves photoetching process's quality.
Description
Technical field
This utility model relates to technical field of lithography, particularly relates to the automatic clearing apparatus of a kind of light-sensitive lacquer sprayer.
Background technology
In integrated circuit technology manufactures, the various physical units of crystal triode, diode, electric capacity, resistance and metal level are constituted in crystal column surface or top layer.These parts pass through photo-etching technological process, the finally part of keeping characteristics figure on wafer.The target that photoetching process (LithographicProcess) produces is the requirement according to circuit design, generates accurate in size feature pattern, and correct and correct with associating of other parts (parts) in the position of crystal column surface.
Photoetching process is the most key in the basic technology that integrated circuit technology manufactures one, and photoetching process determines the critical size of device.In processing procedure, the precision of photoetching can be impacted by various pollutant, for instance, when the crystal column surface coating photoresist provided, the light-sensitive lacquer sprayer for spraying photoresist moves at crystal column surface evenly, and sprays photoresist equably to crystal column surface；Light-sensitive lacquer sprayer is in spraying photoresist process, it is in the spray environment that photoresist is formed for a long time, mass crystallization granule can be formed about, if this crystalline particle is removed not in time, accidentally drop on the wafer of follow-up spraying photoresist, light then cause photoresist to deform, heavy then cause wafer scratch problem, and photoetching process to complete in the production process of wafer 5 layers even more to 20 layers, therefore, crystalline particle is as cleared up not in time, and the pollution problem of generation can be amplified further.
Utility model content
The purpose of this utility model is in that to propose the automatic clearing apparatus of a kind of light-sensitive lacquer sprayer, photoresist shower nozzle can be focused automatically be rinsed, the harmful effect that photoetching process is caused by the crystalline impurities that minimizing photoresist introduces in spraying process, improves the quality of photoetching process.
For reaching this purpose, this utility model by the following technical solutions:
A kind of automatic clearing apparatus of light-sensitive lacquer sprayer, including: cleaning case, it is characterized in that, described cleaning case top is provided with rinse bath, described bottom of rinse bath is provided with the position sensor of the position of detection light-sensitive lacquer sprayer, detection signal according to described position sensor is switched on or off the controller of kinetic pump, described automatic clearing apparatus also includes the cleanout fluid storage bin and the flushing pipe that are positioned at the inner chamber of described cleaning case, one end of described kinetic pump connects described cleanout fluid storage bin, the other end connects described flushing and manages, the liquid outlet of described flushing pipe connects described rinse bath.
Wherein, described rinse bath adapts with the shape of described light-sensitive lacquer sprayer.
Wherein, the liquid outlet of described flushing pipe is arranged on the medial surface of described rinse bath.
Wherein, when described light-sensitive lacquer sprayer is truncated cone-shaped, the liquid outlet of described flushing pipe has three, is evenly distributed on the circumference in cross section of described rinse bath medial surface sustained height.
Wherein, also including the liquid-in pipe connecting described cleanout fluid storage bin, the liquid inlet of described liquid-in pipe is arranged on the side of described cleaning case.
Wherein, also include by use after cleanout fluid discharge cleaning case discharging tube, described discharging tube connect described rinse bath, the liquid outlet of described bat liquid pipe is arranged on the bottom of described cleaning case.
Wherein, also including the dehydrator dried by the light-sensitive lacquer sprayer after cleaned, described dehydrator is arranged on the upper end of described cleaning case.
The beneficial effect that the technical scheme that this utility model provides is brought:
The automatic clearing apparatus of light-sensitive lacquer sprayer of the present utility model, including cleaning case, described cleaning case top is provided with rinse bath, described bottom of rinse bath is provided with the position sensor of detection light-sensitive lacquer sprayer position, is switched on or off the controller of kinetic pump according to the detection signal of described position sensor, cleanout fluid storage bin and flushing pipe, one end of described kinetic pump connects described cleanout fluid storage bin, and the other end connects described flushing and manages；This device can focus photoresist shower nozzle automatically and be rinsed, the harmful effect that photoetching process is caused by the crystalline impurities that minimizing photoresist introduces in spraying process, improves the quality of photoetching process.
Accompanying drawing explanation
Fig. 1 is the structural representation of the automatic clearing apparatus of the light-sensitive lacquer sprayer that this utility model embodiment provides.
Fig. 2 is the top view of the automatic clearing apparatus of the light-sensitive lacquer sprayer that this utility model embodiment provides.
Fig. 3 is the control system block diagram of the cleaning process of the automatic clearing apparatus of the light-sensitive lacquer sprayer that this utility model embodiment provides.
Detailed description of the invention
The technical solution of the utility model is further illustrated referring to figs. 1 through Fig. 3 and by detailed description of the invention.
A kind of automatic clearing apparatus of light-sensitive lacquer sprayer, including: cleaning case 2, it is characterized in that, described cleaning case 2 top is provided with rinse bath 3, the position sensor 4 of the position of detection light-sensitive lacquer sprayer 1 it is provided with bottom described rinse bath 3, detection signal according to described position sensor 4 is switched on or off the controller 5 of kinetic pump 6, described automatic clearing apparatus also includes the cleanout fluid storage bin 7 and the flushing pipe 8 that are positioned at the inner chamber of described cleaning case, one end of described kinetic pump 6 connects described cleanout fluid storage bin 7, the other end connects described flushing pipe 8, the liquid outlet 9 of described flushing pipe 8 connects described rinse bath 3.
In the present embodiment, the rinser of this light-sensitive lacquer sprayer 1 is an automatic cleaning system, rinser is built-in with cleanout fluid storage box 7, light-sensitive lacquer sprayer 1 is controlled equipment by mechanical hand etc. and is loaded in rinse bath 3, detect when the distance between bottom this light-sensitive lacquer sprayer 1 and rinse bath 3 reaches predeterminable range when position sensor 4, signal is gone out to controller defeated 5, controller 5 turns on the power pump 6 according to this signal, cleanout fluid in cleanout fluid storage box 7 is extracted by kinetic pump 6, and light-sensitive lacquer sprayer 1 is rinsed.
Above-mentioned predeterminable range can be set according to the cleanliness factor reached during actual cleaning under different distance, it is preferred that can also setting the time of cleaning in the controller 5, the equally possible cleanliness factors corresponding according to cleaning durations different in actual cleaning process are set.
Preferably, this kinetic pump 6 being provided with drive motor 15, this drive motor 15 can be controlled by controller 6, thus controlling the rotating speed of impeller in kinetic pump 6, changes the hydraulic pressure of flushing liquor.
The shape of described rinse bath 3 and described light-sensitive lacquer sprayer 1 adapts.Balanced with the distance that realizes between rinse bath 3 and light-sensitive lacquer sprayer 1 everywhere, cleanout fluid can reach the sidewall of light-sensitive lacquer sprayer 1 smoothly.
The liquid outlet 9 of described flushing pipe 8 is arranged on the medial surface of described rinse bath 3.In a photolithographic process, the sidewall of light-sensitive lacquer sprayer 1 can generate a lot of crystalline particle, comparatively dense can be distributed in the lower section of light-sensitive lacquer sprayer 1, top distribution is less, the liquid outlet 9 rinsing pipe 8 can be arranged on the middle and upper part of rinse bath 3, and the flushing of flushing liquor primary responsibility upper zone, owing to light-sensitive lacquer sprayer 1 upper end is thick, lower end is thin, being rinsed by drainage of lower area；Or liquid outlet 9 is arranged on the middle part of the medial surface of rinse bath 3, and concrete position sets can according in actual cleaning process, and the cleannes that liquid outlet reaches when being positioned at diverse location are set.
When described light-sensitive lacquer sprayer 1 is truncated cone-shaped, the liquid outlet of described flushing pipe 8 has three, is evenly distributed on the circumference in cross section of described rinse bath 3 medial surface sustained height.Now rinsing 8 point of three tunnel output of pipe, each liquid outlet 9 is responsible for cleaning the sector region of light-sensitive lacquer sprayer 1 gusset 120 degree, it is possible to fully light-sensitive lacquer sprayer 1 is carried out.
Also including the liquid-in pipe 10 connecting described cleanout fluid storage bin 7, the liquid inlet 11 of described liquid-in pipe 10 is arranged on the side of described cleaning case 2.
When cleanout fluid is fewer, in cleanout fluid storage bin 7, inject cleanout fluid to ensure the storage level of cleanout fluid.Preferably, it is possible to liquid level sensor is set in this cleanout fluid storage bin, the liquid level of cleanout fluid is detected, and output display.
Also include by use after cleanout fluid discharge cleaning case discharging tube 12, described discharging tube 12 connects described rinse bath 3, and the liquid outlet 13 of described discharging tube 12 is arranged on the bottom of described cleaning case 2.
Also including the dehydrator 14 dried by the light-sensitive lacquer sprayer after cleaned, described dehydrator 14 is arranged on the upper end of described cleaning case 2.
After cleaning terminates, light-sensitive lacquer sprayer 1 is automatically taken out, be provided with dehydrator 14 in the upper end of cleaning case 2 and cleanout fluid is dried evaporation, in order to avoid owing to light-sensitive lacquer sprayer 1 is caused new pollution by the residual of cleanout fluid.
In this embodiment, above-mentioned cleanout fluid is propylene or deionized water, and rinse bath 3 is uncorruptible material, such as Teflon.
The above; it is only this utility model preferably detailed description of the invention; but protection domain of the present utility model is not limited thereto; any people being familiar with this technology is in the technical scope disclosed by this utility model; the change that can readily occur in or replacement, all should be encompassed within protection domain of the present utility model.Therefore, protection domain of the present utility model should be as the criterion with scope of the claims.
Claims (7)
1. the automatic clearing apparatus of a light-sensitive lacquer sprayer, including cleaning case, it is characterized in that, described cleaning case top is provided with rinse bath, described bottom of rinse bath is provided with the position sensor of the position of detection light-sensitive lacquer sprayer, detection signal according to described position sensor is switched on or off the controller of kinetic pump, described automatic clearing apparatus also includes the cleanout fluid storage bin and the flushing pipe that are positioned at the inner chamber of described cleaning case, one end of described kinetic pump connects described cleanout fluid storage bin, the other end connects described flushing and manages, the liquid outlet of described flushing pipe connects described rinse bath.
2. automatic clearing apparatus according to claim 1, it is characterised in that the shape of described rinse bath and described light-sensitive lacquer sprayer adapts.
3. automatic clearing apparatus according to claim 2, it is characterised in that the liquid outlet of described flushing pipe is arranged on the medial surface of described rinse bath.
4. automatic clearing apparatus according to claim 3, it is characterised in that when described light-sensitive lacquer sprayer is truncated cone-shaped, the liquid outlet of described flushing pipe has three, is evenly distributed on the circumference in cross section of the medial surface sustained height of described rinse bath.
5. automatic clearing apparatus according to claim 1, it is characterised in that also including the liquid-in pipe connecting described cleanout fluid storage bin, the liquid inlet of described liquid-in pipe is arranged on the side of described cleaning case.
6. automatic clearing apparatus according to claim 1, it is characterised in that also include by use after cleanout fluid discharge cleaning case discharging tube, described discharging tube connect described rinse bath, the liquid outlet of described discharging tube is arranged on the bottom of described cleaning case.
7. automatic clearing apparatus according to claim 1, it is characterised in that also including the dehydrator dried by the light-sensitive lacquer sprayer after cleaned, described dehydrator is arranged on the upper end of described cleaning case.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521127452.2U CN205341179U (en) | 2015-12-29 | 2015-12-29 | Self - cleaning device of photosensitive resist shower nozzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521127452.2U CN205341179U (en) | 2015-12-29 | 2015-12-29 | Self - cleaning device of photosensitive resist shower nozzle |
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| Publication Number | Publication Date |
|---|---|
| CN205341179U true CN205341179U (en) | 2016-06-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201521127452.2U Active CN205341179U (en) | 2015-12-29 | 2015-12-29 | Self - cleaning device of photosensitive resist shower nozzle |
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| CN (1) | CN205341179U (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106733440A (en) * | 2016-12-02 | 2017-05-31 | 信利（惠州）智能显示有限公司 | A kind of gluing head cleaning device |
| CN107175188A (en) * | 2017-06-27 | 2017-09-19 | 武汉华星光电技术有限公司 | A kind of coating machine sizer and system |
| CN109807027A (en) * | 2017-11-20 | 2019-05-28 | 沈阳芯源微电子设备股份有限公司 | A kind of glue mouth cleaning system and its cleaning method using automatically controlled suck back valve |
| CN111054589A (en) * | 2019-12-30 | 2020-04-24 | 深圳市辉翰科技发展有限公司 | Self-cleaning glue sprayer |
| CN111570150A (en) * | 2020-04-09 | 2020-08-25 | 中国科学院微电子研究所 | Photoresist coating system and method |
| CN113070184A (en) * | 2021-06-07 | 2021-07-06 | 成都拓米电子装备制造有限公司 | Cleaning device and cleaning method for slit extrusion coating head |
| CN113457894A (en) * | 2021-05-30 | 2021-10-01 | 周洪 | Plugging joint for photoresist nozzle |
-
2015
- 2015-12-29 CN CN201521127452.2U patent/CN205341179U/en active Active
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106733440A (en) * | 2016-12-02 | 2017-05-31 | 信利（惠州）智能显示有限公司 | A kind of gluing head cleaning device |
| CN106733440B (en) * | 2016-12-02 | 2019-06-07 | 信利（惠州）智能显示有限公司 | A kind of gluing head cleaning device |
| CN107175188A (en) * | 2017-06-27 | 2017-09-19 | 武汉华星光电技术有限公司 | A kind of coating machine sizer and system |
| CN107175188B (en) * | 2017-06-27 | 2019-05-24 | 武汉华星光电技术有限公司 | A kind of coating machine sizer and system |
| CN109807027A (en) * | 2017-11-20 | 2019-05-28 | 沈阳芯源微电子设备股份有限公司 | A kind of glue mouth cleaning system and its cleaning method using automatically controlled suck back valve |
| CN111054589A (en) * | 2019-12-30 | 2020-04-24 | 深圳市辉翰科技发展有限公司 | Self-cleaning glue sprayer |
| CN111054589B (en) * | 2019-12-30 | 2021-07-27 | 普洛赛斯（苏州）智能装备有限公司 | Self-cleaning glue sprayer |
| CN111570150A (en) * | 2020-04-09 | 2020-08-25 | 中国科学院微电子研究所 | Photoresist coating system and method |
| CN113457894A (en) * | 2021-05-30 | 2021-10-01 | 周洪 | Plugging joint for photoresist nozzle |
| CN113457894B (en) * | 2021-05-30 | 2022-07-15 | 唐山国芯晶源电子有限公司 | Plugging joint for photoresist nozzle |
| CN113070184A (en) * | 2021-06-07 | 2021-07-06 | 成都拓米电子装备制造有限公司 | Cleaning device and cleaning method for slit extrusion coating head |
| CN113070184B (en) * | 2021-06-07 | 2021-09-07 | 成都拓米电子装备制造有限公司 | Cleaning device and cleaning method for slit extrusion coating head |
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