CN208240615U - The cleaning device of semiconductor crystal wafer - Google Patents
The cleaning device of semiconductor crystal wafer Download PDFInfo
- Publication number
- CN208240615U CN208240615U CN201820677321.9U CN201820677321U CN208240615U CN 208240615 U CN208240615 U CN 208240615U CN 201820677321 U CN201820677321 U CN 201820677321U CN 208240615 U CN208240615 U CN 208240615U
- Authority
- CN
- China
- Prior art keywords
- control system
- semiconductor crystal
- crystal wafer
- fastly
- cleaning device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
This application discloses a kind of cleaning devices of semiconductor crystal wafer, including purge chamber, arrange fastly fastly rush room, drying room, transmission system, acid adding case, control system and touch panel, transmission system respectively with control system, purge chamber, arrange fastly fastly rush room and drying room is connect, acid adding case is connect with purge chamber, and control system is connect with touch panel.The cleaning device is integrated with nearly all function required for the cleaning of semiconductor crystal wafer, reduce the frequency participated in by hand, maximumlly realize automation cleaning, it effectively solves the problems, such as to clean at present existing various, and, cleaning yields height good to the cleaning effect of semiconductor crystal wafer, there is good application prospect.
Description
Technical field
The utility model belongs to semiconductor chip manufacturing technology field, and in particular to a kind of cleaning dress of semiconductor crystal wafer
It sets.
Background technique
Semiconducter IC processing procedure is mainly (ion implanting, diffusion, outer with four fundamental technologies invented after the 1950s
Prolong growth and photoetching) based on have gradually developed, since element each in integrated circuit and line are quite fine, manufactured
Cheng Zhong, if by the pollution of grit, metal, it is easy to the damage of circuit function in chip is caused, short circuit or open circuit etc. are formed,
Lead to the failure of integrated circuit and influences the formation of geometrical characteristic.Therefore in the production process in addition to exclude extraneous pollution
Outside source, it is required to carry out wet-cleaning or dry method cleaning before IC manufacturing step such as High temperature diffusion, ion implantation.
Dry, wet-cleaning work is that chemical solution or gas is efficiently used under the premise of not destroying crystal column surface characteristic and electrical characteristics
Body removes the impurity of the micronic dust remained on wafer, metal ion and organic matter.
Automatic cleaning equipment has high degree of automation, easy-to-operate, process consistency compared with Manual-cleaning machine
The advantages that guarantee, system reliability is good.But automatic equipment is after cleaning, and the removal effect of pollutant is not fine.
Summary of the invention
The purpose of the application is to provide a kind of cleaning device of semiconductor crystal wafer, improves the pollution to semiconductor wafer surface
The cleaning effect of object has preferable market application prospect.
The present invention is implemented as follows:
A kind of cleaning device of semiconductor crystal wafer, including purge chamber, arrange fastly fastly rush room, drying room, transmission system, acid adding
Case, control system, touch panel and film magazine, transmission system respectively with film magazine, control system, purge chamber, arrange fastly fastly rush room and baking
Dry chamber connection, acid adding case are connect with purge chamber, and control system is connect with touch panel；
Heater, temperature sensor, liquid level sensor and sour water discharge tube are equipped in purge chamber, heater is placed in cleaning
Room bottom, sour water discharge tube are equipped with sour water drain valve, heater, temperature sensor, liquid level sensor and sour water drain valve point
It is not connect with control system；
It fastly arranges and rush fastly interior to be equipped with water tank, intersect spray pipeline and drainpipe, drainpipe is equipped with water discharging valve, intersects and sprays
The water outlet on shower pipe road is equipped with atomizer, and atomizer and water discharging valve are connect with control system；Water tank stores deionization
Water, during the spray of deionized water, control system can control atomizer to washing pressure, water, direction and angle
It makes adjustment test, pollutes few optimum efficiency to reach particle.Spray range covers whole semiconductor crystal wafers and film magazine.
It dries indoor top and is equipped with blower, bottom is air outlet, and blower is connect with control system；
The outlet of acid adding case is equipped with flow valve, and flow valve is connect with control system.Containing carboxyl polymer, containing face in acid adding case
Expect the polymer and water of affinity groups.
Preferably, touch panel is man-machine interface, is a kind of induction type liquid crystal of receivable contact input signal
Display device.
Preferably, control system is integrated circuit, PLC controller or single-chip microcontroller.
Preferably, control system is equipped with work light and malfunction indicator lamp.
Preferably, control system is equipped with buzzer.
Preferably, cleaning chamber internal surface is quartz body.
Preferably, all heater strips of heater and its conducting wire are wrapped up with PFA.
Preferably, transmission system includes variable-frequency motor, retarder, guide rail and rack-and-pinion, variable-frequency motor and is subtracted
Fast device is connect with control system.
The advantages of the application, is as follows:
1, the cleaning device of the application semiconductor crystal wafer is integrated with nearly all function required for the cleaning of semiconductor crystal wafer
Can, the frequency participated in by hand is reduced, maximumlly realizes automation cleaning, effectively solves the problems, such as to clean at present existing various；
2, the cleaning device of the application semiconductor crystal wafer can start the cleaning processing wafer, and the degree of automation is big, production effect
Rate is high, and, cleaning yields height good to the cleaning effect of semiconductor crystal wafer has good application prospect；
3, the cleaning device of the application semiconductor crystal wafer realizes the automatic of wafer process cleaning under control system control
Change, transmission system uses variable-frequency motor, retarder, guide rail and rack-and-pinion, increases cleaning device whole work efficiency and work
Stability, the reliability of work；
4, it is quartz body that chamber internal surface is cleaned in the cleaning device of the application semiconductor crystal wafer, can not only be acidproof, moreover it is possible to resistance to
High temperature.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the cleaning device of the application semiconductor crystal wafer；
The opposite component names of serial number in figure: 1, purge chamber；2, arrange fastly fastly rush room；3, drying room；4, acid adding case；5, it controls
System；6, touch panel；7, film magazine；8, liquid level sensor；9, temperature sensor；10, heater；11, sour water discharge tube；
12, sour water drain valve；13, intersect spray pipeline；14, drainpipe；15, water discharging valve；16, blower；17, flow valve；18, it is driven
System；19, water tank；20, atomizer.
Specific embodiment
It is further described below in conjunction with cleaning device of the attached drawing to the application semiconductor crystal wafer.
As shown in Figure 1, a kind of cleaning device of semiconductor crystal wafer, including purge chamber, arrange fastly fastly rush room, drying room, transmission
System, acid adding case, control system, touch panel and film magazine, transmission system are fast with film magazine, control system, purge chamber, fast row respectively
It rushes room to connect with drying room, acid adding case is connect with purge chamber, and control system is connect with touch panel；
Heater, temperature sensor, liquid level sensor and sour water discharge tube are equipped in purge chamber, heater is placed in cleaning
Room bottom, sour water discharge tube are equipped with sour water drain valve, heater, temperature sensor, liquid level sensor and sour water drain valve point
It is not connect with control system；
It fastly arranges and rush fastly interior to be equipped with water tank, intersect spray pipeline and drainpipe, drainpipe is equipped with water discharging valve, intersects and sprays
The water outlet on shower pipe road is equipped with atomizer, and atomizer and water discharging valve are connect with control system；
It dries indoor top and is equipped with blower, bottom is air outlet, and blower is connect with control system；
The outlet of acid adding case is equipped with flow valve, and flow valve is connect with control system.
Touch panel is man-machine interface, is a kind of induction type liquid crystal display device of receivable contact input signal.
Control system is integrated circuit, PLC controller or single-chip microcontroller.
Control system is equipped with work light and malfunction indicator lamp.
Control system is equipped with buzzer.
Cleaning chamber internal surface is quartz body.
All heater strips of heater and its conducting wire are wrapped up with PFA.
Transmission system includes variable-frequency motor, retarder, guide rail and rack-and-pinion, variable-frequency motor and retarder and control system
Connection.
It is not only in the description and the implementation although the embodiments of the present invention have been disclosed as above
Listed utilization, it can be applied to various fields suitable for the present invention completely, for those skilled in the art,
Other modifications may be easily implemented, therefore without departing from the general concept defined in the claims and the equivalent scope, this reality
It is not limited to specific details and legend shown and described herein with novel.
Claims (8)
1. a kind of cleaning device of semiconductor crystal wafer, it is characterised in that: including purge chamber, arrange fastly fastly rush room, drying room, power train
System, acid adding case, control system, touch panel and film magazine, transmission system respectively with film magazine, control system, purge chamber, arrange fastly fastly rush
Room is connected with drying room, and acid adding case is connect with purge chamber, and control system is connect with touch panel；
Heater, temperature sensor, liquid level sensor and sour water discharge tube are equipped in purge chamber, heater is placed in purge chamber bottom
Portion, sour water discharge tube be equipped with sour water drain valve, heater, temperature sensor, liquid level sensor and sour water drain valve respectively with
Control system connection；
It fastly arranges and rush fastly interior to be equipped with water tank, intersect spray pipeline and drainpipe, drainpipe is equipped with water discharging valve, intersects spray tube
The water outlet on road is equipped with atomizer, and atomizer and water discharging valve are connect with control system；
It dries indoor top and is equipped with blower, bottom is air outlet, and blower is connect with control system；
The outlet of acid adding case is equipped with flow valve, and flow valve is connect with control system.
2. the cleaning device of semiconductor crystal wafer according to claim 1, it is characterised in that: the touch panel is man-machine boundary
Face is a kind of induction type liquid crystal display device of receivable contact input signal.
3. the cleaning device of semiconductor crystal wafer according to claim 1, it is characterised in that: the control system is integrated electricity
Road, PLC controller or single-chip microcontroller.
4. the cleaning device of semiconductor crystal wafer according to claim 1, it is characterised in that: the control system is equipped with work
Indicator light and malfunction indicator lamp.
5. the cleaning device of semiconductor crystal wafer according to claim 1, it is characterised in that: the control system is equipped with buzzing
Device.
6. the cleaning device of semiconductor crystal wafer according to claim 1, it is characterised in that: the cleaning chamber internal surface is stone
Ying Ti.
7. the cleaning device of semiconductor crystal wafer according to claim 1, it is characterised in that: all heating of the heater
Silk and its conducting wire are wrapped up with PFA.
8. the cleaning device of semiconductor crystal wafer according to claim 1, it is characterised in that: the transmission system includes frequency conversion
Motor, retarder, guide rail and rack-and-pinion, variable-frequency motor and retarder are connect with control system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820677321.9U CN208240615U (en) | 2018-05-08 | 2018-05-08 | The cleaning device of semiconductor crystal wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820677321.9U CN208240615U (en) | 2018-05-08 | 2018-05-08 | The cleaning device of semiconductor crystal wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208240615U true CN208240615U (en) | 2018-12-14 |
Family
ID=64581947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820677321.9U Active CN208240615U (en) | 2018-05-08 | 2018-05-08 | The cleaning device of semiconductor crystal wafer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208240615U (en) |
-
2018
- 2018-05-08 CN CN201820677321.9U patent/CN208240615U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103871938B (en) | For cleaning the rinse bath of semiconductor crystal wafer | |
| CN205393078U (en) | Silicon wafers of solar cell's cleaning and drying device | |
| CN209045505U (en) | Wet processing apparatus | |
| CN105826172A (en) | Passivation protection method capable of increasing reliability and yield rate of semiconductor chip | |
| CN103346661A (en) | Treatment device and treatment method for traction current transformer cooling system cycling pipeline | |
| CN108597987A (en) | The cleaning method of semiconductor crystal wafer | |
| CN202570687U (en) | Electronic component cleaning device | |
| CN104889126B (en) | Experiment appliance wash mill | |
| CN208240615U (en) | The cleaning device of semiconductor crystal wafer | |
| CN106944394A (en) | A kind of silicon wafer turnover flusher | |
| CN109807027A (en) | A kind of glue mouth cleaning system and its cleaning method using automatically controlled suck back valve | |
| CN206541809U (en) | A kind of silicon chip cleaning device | |
| CN208091183U (en) | A kind of nitrogen drying module being used for after wafer wet cleaning | |
| CN203265121U (en) | Silicon wafer cleaning device | |
| CN205056521U (en) | Quick belt cleaning device | |
| CN207603569U (en) | A kind of photovoltaic module cleannes monitoring device | |
| CN205380104U (en) | Sapphire window sheet cleaning equipment | |
| CN209333514U (en) | A kind of carbonyl fluoride gas treatment equipment | |
| CN205863147U (en) | A kind of Novel silicon slice cleans device | |
| CN205071490U (en) | Copper -clad plate belt cleaning device | |
| CN208513195U (en) | Single slot chip purifies cleaning device | |
| CN208189541U (en) | A kind of wet process equipment dynamic etch medicine liquid spray device | |
| CN206935922U (en) | A kind of silicon chip of solar cell rinse bath | |
| CN207752978U (en) | Wafer cleaning device | |
| CN111928592A (en) | High-efficient drying system of slot type |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |