CN106944394A - A kind of silicon wafer turnover flusher - Google Patents
A kind of silicon wafer turnover flusher Download PDFInfo
- Publication number
- CN106944394A CN106944394A CN201710188309.1A CN201710188309A CN106944394A CN 106944394 A CN106944394 A CN 106944394A CN 201710188309 A CN201710188309 A CN 201710188309A CN 106944394 A CN106944394 A CN 106944394A
- Authority
- CN
- China
- Prior art keywords
- flushing cisterns
- flushing
- silicon wafer
- rotating shaft
- cisterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 30
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 28
- 239000010703 silicon Substances 0.000 title claims abstract description 28
- 230000007306 turnover Effects 0.000 title claims abstract description 15
- 238000011010 flushing procedure Methods 0.000 claims abstract description 52
- 238000004140 cleaning Methods 0.000 claims abstract description 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 230000005540 biological transmission Effects 0.000 claims abstract description 8
- 239000012530 fluid Substances 0.000 claims description 21
- 239000003651 drinking water Substances 0.000 claims description 10
- 235000020188 drinking water Nutrition 0.000 claims description 10
- 239000007921 spray Substances 0.000 claims description 5
- 238000003780 insertion Methods 0.000 claims description 3
- 230000037431 insertion Effects 0.000 claims description 3
- 238000009826 distribution Methods 0.000 abstract description 2
- 238000001035 drying Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 241001676635 Lepidorhombus whiffiagonis Species 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/001—Drying-air generating units, e.g. movable, independent of drying enclosure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02082—Cleaning product to be cleaned
Abstract
The invention discloses a kind of silicon wafer turnover flusher, including flushing cisterns, jet box and air-heater, a flushing chamber door is provided with the flushing cisterns, the side of the flushing cisterns is provided with an electric case, one control panel is installed on the outside of the electric case, the bottom of the flushing cisterns is provided with a delivery port, the side of the sparge pipe is connected with water pump, the opposite side of the sparge pipe is embedded into inside flushing cisterns, and it is provided with several nozzles on the opposite side tube wall of sparge pipe, a rotating shaft is also equipped with inside the flushing cisterns, a number rotating shaft and No. two rotating shafts are connected by transmission belt, one air-heater is installed at the top of the flushing cisterns, the air-heater is connected by pipeline with the jet box of flushing cisterns inside top.The silicon wafer turnover flusher can install more silicon chips, and the shower nozzle distribution uniform inside cleaning case, preferably, high working efficiency, water consumption is few for cleaning performance provided with two rotating shafts.
Description
Technical field
The present invention relates to field of mechanical technique, specially a kind of silicon wafer turnover flusher.
Background technology
With the development of large scale integrated circuit, the integrated level of integrated circuit is improved constantly, line width constantly reduces, integrated electricity
Requirement of the road to the cleanliness factor, surface chemical state, oxide thickness of silicon chip surface also more and more higher.In semiconductor devices production
Silicon chip must be through strict cleaning, even if otherwise micropollution also results in component failure.
The purpose of cleaning is to remove surface contamination impurity, including inorganic matter and organic matter.These impurity have with atom
State or ionic condition, have in the form of a film or particle form is present in silicon chip surface.Organic pollution includes photoresist, had
Grease or fiber that machine solvent residues, synthetic wax and people's contact device, instrument, vessel are brought.Inorganic pollution includes a huge sum of money
Belong to gold, copper, iron, chromium etc., have a strong impact on minority carrier lifetime and surface conductance；Alkali metal and sodium etc. can cause serious drain.
Particle contamination, which includes white residue, dust, bacterium, microorganism, organic colloid fiber etc., can cause various defects.
Existing silicon wafer washing device silicon chip surface Water spray in cleaning process is uneven, causes silicon chip surface to have largely
Liquor residue, cleaning performance is good, inefficiency, and water consumption is big, and also needs to take out drying after cleaning, during waste
Between.
The content of the invention
It is an object of the invention to provide a kind of silicon wafer turnover flusher, to solve the spray proposed in above-mentioned background technology
Drench uneven, cause silicon chip surface to have substantial amounts of liquor residue, cleaning performance is not good, inefficiency, water consumption is big, and clearly
Also need to take out drying, the problem of losing time after washing.
To achieve the above object, the present invention provides following technical scheme：A kind of silicon wafer turnover flusher, including rinse
Case, flushing chamber door, electric case, control panel, flushing cisterns door latch, motor, transmission belt, support frame, header tank, water outlet
Mouthful, No. two rotating shafts, cleaning fluid tank, drinking-water pipe, sparge pipe, rotating shaft, jet box, air-heater, nozzle and water pump, the flushing
A flushing chamber door is provided with case, the side of the flushing cisterns is provided with an electric case, the outside of the electric case
It is provided with to be provided with a flushing cisterns door latch, the electric case on a control panel, the flushing chamber door and is provided with
One motor, the side of the motor is provided with No. two rotating shafts, and the bottom of the electric case is provided with two branch
Support, the bottom of the flushing cisterns is provided with a delivery port, and the bottom of the delivery port is provided with a header tank, the punching
The opposite side of tank-washer is provided with a cleaning fluid tank, and the bottom of the cleaning fluid tank is provided with two support frames, the drinking-water pipe
Side insertion cleaning fluid tank inside, the opposite side of the drinking-water pipe be connected with water pump, the side of the sparge pipe and water pump company
Connect, the opposite side of the sparge pipe is embedded into inside flushing cisterns, and be provided with several nozzles on the opposite side tube wall of sparge pipe,
A rotating shaft is also equipped with inside the flushing cisterns, a rotating shaft and No. two rotating shafts are connected by transmission belt,
One air-heater is installed, the air-heater is connected by pipeline and the jet box of flushing cisterns inside top at the top of the flushing cisterns
Connect.
It is preferred that, the bottom of the flushing cisterns is a funnel-shaped structure.
It is preferred that, an observation window is provided with the cleaning fluid tank.
It is preferred that, it is provided with clip in a rotating shaft and No. two rotating shafts.
It is preferred that, the bottom of the jet box is provided with several small ventilating holes.
It is preferred that, the header tank is movable fixture, and bottom is provided with four universal wheels.
Compared with prior art, the beneficial effects of the invention are as follows：The silicon wafer turnover flusher, can be with provided with two rotating shafts
More silicon chips, and the shower nozzle distribution uniform inside cleaning case are installed, cleaning performance is preferable, high working efficiency, water consumption
It is few, it is also equipped with being provided with the jet box connection inside an air-heater, air-heater and cleaning case, jet box at the top of cleaning case
Several apertures, jet scope is wider, and drying effect is preferably, easy to use, designs more hommization.
Brief description of the drawings
Fig. 1 is schematic structural view of the invention；
Fig. 2 is flushing cisterns overlooking the structure diagram of the present invention；
Fig. 3 is jet box overlooking the structure diagram of the present invention.
In figure：Flushing cisterns -1；Rinse chamber door -2；Electric case -3；Control panel -4；Flushing cisterns door latch -5；Motor-
6；Transmission belt -7；Support frame -8；Header tank -9；Delivery port -10；No. two rotating shafts -11；Cleaning fluid tank -12；Drinking-water pipe -13；Water spray
Pipe -14；A number rotating shaft -15；Jet box -16；Air-heater -17；Nozzle -18；Water pump -19.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.It is based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made
Embodiment, belongs to the scope of protection of the invention.
Fig. 1-3 are referred to, the present invention provides a kind of technical scheme：A kind of silicon wafer turnover flusher, including flushing cisterns 1,
Rinse chamber door 2, electric case 3, control panel 4, flushing cisterns door latch 5, motor 6, transmission belt 7, support frame 8, header tank 9,
Delivery port 10, No. two rotating shafts 11, cleaning fluid tank 12, drinking-water pipe 13, sparge pipe 14, rotating shaft 15, jet box 16, an air-heaters
17th, a flushing chamber door 2 is provided with nozzle 18 and water pump 19, flushing cisterns 1, the side of flushing cisterns 1 is provided with a motor
Case 3, the outside of electric case 3 is provided with a control panel 4, rinses on chamber door 2 and is provided with a flushing cisterns door latch 5, electricity
One motor 6 is installed, the side of motor 6 is provided with No. two rotating shafts 11, the bottom of electric case 3 in motivation case 3
Two support frames 8 are installed, the bottom of flushing cisterns 1 is provided with a delivery port 10, and the bottom of delivery port 10 is provided with a collection
Water tank 9, the opposite side of flushing cisterns 1 is provided with a cleaning fluid tank 12, and the bottom of cleaning fluid tank 12 is provided with two support frames 8,
Inside the side insertion cleaning fluid tank 12 of drinking-water pipe 13, the opposite side of drinking-water pipe 13 is connected with water pump 19, the side of sparge pipe 14
It is connected with water pump 19, the opposite side of sparge pipe 14 is embedded into inside flushing cisterns 1, and is provided with the opposite side tube wall of sparge pipe 14
A rotating shaft 15 is also equipped with inside several nozzles 18, flushing cisterns 1, a rotating shaft 15 and No. two rotating shafts 11 pass through transmission
Band 7 is connected, and the top of flushing cisterns 1 is provided with an air-heater 17, and air-heater 17 passes through pipeline and the inside top of flushing cisterns 1
Jet box 16 connect.
In above-described embodiment, specifically, the bottom of flushing cisterns 1 is a funnel-shaped structure, funnel-shaped structure is easy to current
Flow downward out；
In above-described embodiment, specifically, an observation window is provided with cleaning fluid tank 12, convenient observation internal washing liquid surplus,
Cleaning fluid is added in time；
In above-described embodiment, specifically, being provided with clip in a rotating shaft 15 and No. two rotating shafts 11, silicon chip can be clamped, made
With conveniently；
In above-described embodiment, specifically, the bottom of jet box 16 is provided with several small ventilating holes, whiff pressure increases, and
Make jet scope wider；
In above-described embodiment, specifically, header tank 9 is movable fixture, bottom is provided with four universal wheels, is easy to move cleaning
Used cleaning fluid in header tank 9.
Operation principle：Chamber door 2 will first be rinsed when using to open, the silicon chip that will be rinsed is fixed on a rotating shaft 15 with clip
In No. two rotating shafts 11, close and rinse chamber door 2, connect external power source, control motor 6 and water pump 19 to open using control panel 4
Begin to run, motor 6 directly drives No. two rotating shafts 11 to rotate, and No. two rotating shafts 11 drive a rotating shaft 15 to rotate by transmission belt 7,
Cleaning fluid in cleaning fluid tank 12 is transported to sparge pipe 14 by water pump 19, and sprays to a rotating shaft from the nozzle 18 on sparge pipe 14
15 and No. two rotating shafts 11 on silicon chip, reach the purpose of cleaning, the cleaning fluid fallen from delivery port 10 flow into header tank 9, cleaning
After the completion of, run using the control air-heater 17 of control panel 4, hot blast blows to silicon chip from the aperture of the bottom of jet box 16, by silicon chip
Drying, can be by silicon chip extracting after drying, and then completes a series of operating process.
In summary, although the present invention is described in detail with reference to the foregoing embodiments, for the technology of this area
For personnel, it can still modify to the technical scheme described in foregoing embodiments, or to which part technology
Feature carries out equivalent, within the spirit and principles of the invention, any modifications, equivalent substitutions and improvements made etc.,
It should be included within protection scope of the present invention.
Claims (6)
1. a kind of silicon wafer turnover flusher, including flushing cisterns (1）, rinse chamber door (2）, electric case (3）, control panel (4）、
Flushing cisterns door latch (5）, motor (6）, transmission belt (7）, support frame (8）, header tank (9）, delivery port (10）, No. two rotating shafts
(11）, cleaning fluid tank (12）, drinking-water pipe (13）, sparge pipe (14）, a rotating shaft (15）, jet box (16）, air-heater (17）, spray
Mouth (18）With water pump (19）, it is characterised in that：The flushing cisterns (1）On be provided with one flushing chamber door (2）, the flushing cisterns
(1）Side be provided with an electric case (3）, the electric case (3）Outside one control panel (4 is installed）, institute
State flushing chamber door (2）On be provided with a flushing cisterns door latch (5）, the electric case (3）One motor is inside installed
(6）, the motor (6）Side be provided with No. two rotating shafts (11）, the electric case (3）Bottom be provided with two
Support frame (8）, the flushing cisterns (1）Bottom be provided with a delivery port (10）, the delivery port (10）Bottom be provided with
One header tank (9）, the flushing cisterns (1）Opposite side be provided with a cleaning fluid tank (12）, the cleaning fluid tank (12）'s
Bottom is provided with two support frames (8）, the drinking-water pipe (13）Side insertion cleaning fluid tank (12）Inside, the drinking-water pipe
(13）Opposite side and water pump (19）Connection, the sparge pipe (14）Side and water pump (19）Connection, the sparge pipe (14）
Opposite side be embedded into flushing cisterns (1）Inside, and sparge pipe (14）Opposite side tube wall on be provided with several nozzles (18）, institute
State flushing cisterns (1）Inside is also equipped with a rotating shaft (15）, a rotating shaft (15）With No. two rotating shafts (11）By passing
Dynamic band (7）Drive connection, the flushing cisterns (1）Top one air-heater (17 is installed）, the air-heater (17）Pass through pipe
Road and flushing cisterns (1）The jet box (16 of inside top）Connection.
2. a kind of silicon wafer turnover flusher according to claim 1, it is characterised in that：The flushing cisterns (1）Bottom
For a funnel-shaped structure.
3. a kind of silicon wafer turnover flusher according to claim 1, it is characterised in that：The cleaning fluid tank (12）On set
It is equipped with an observation window.
4. a kind of silicon wafer turnover flusher according to claim 1, it is characterised in that：A number rotating shaft (15）With two
Number rotating shaft (11）On be provided with clip.
5. a kind of silicon wafer turnover flusher according to claim 1, it is characterised in that：The jet box (16）Bottom
It is provided with several small ventilating holes.
6. a kind of silicon wafer turnover flusher according to claim 1, it is characterised in that：The header tank (9）To be removable
Dynamic device, bottom is provided with four universal wheels.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710188309.1A CN106944394A (en) | 2017-03-27 | 2017-03-27 | A kind of silicon wafer turnover flusher |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710188309.1A CN106944394A (en) | 2017-03-27 | 2017-03-27 | A kind of silicon wafer turnover flusher |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106944394A true CN106944394A (en) | 2017-07-14 |
Family
ID=59472940
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710188309.1A Pending CN106944394A (en) | 2017-03-27 | 2017-03-27 | A kind of silicon wafer turnover flusher |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106944394A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107675264A (en) * | 2017-10-29 | 2018-02-09 | 王莉娜 | A kind of sensor monocrystalline silicon Etaching device of the operating efficiency for improving equipment |
| CN111029277A (en) * | 2019-11-25 | 2020-04-17 | 大同新成新材料股份有限公司 | Semiconductor wafer surface impurity removing equipment and operation method thereof |
| CN112429532A (en) * | 2020-11-23 | 2021-03-02 | 白银一刀钢化玻璃有限公司 | Glass conveying frame |
| CN116444010A (en) * | 2023-06-05 | 2023-07-18 | 山东蓝湾新材料有限公司 | Preparation device and method of heavy metal flocculant |
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| JPH05198550A (en) * | 1991-11-19 | 1993-08-06 | Shin Etsu Handotai Co Ltd | Cleaning equipment for silicon wafer |
| CN1231500A (en) * | 1998-03-13 | 1999-10-13 | 日本电气株式会社 | Semiconductor device production technology and the used washing device thereof |
| JP2996236B1 (en) * | 1998-09-09 | 1999-12-27 | 日本電気株式会社 | Substrate processing equipment |
| CN1267243A (en) * | 1997-07-21 | 2000-09-20 | 塞米图尔公司 | Drive assembly for workpiece processing system |
| JP2005294491A (en) * | 2004-03-31 | 2005-10-20 | Sumitomo Precision Prod Co Ltd | Carrier washing apparatus |
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2017
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107675264A (en) * | 2017-10-29 | 2018-02-09 | 王莉娜 | A kind of sensor monocrystalline silicon Etaching device of the operating efficiency for improving equipment |
| CN111029277A (en) * | 2019-11-25 | 2020-04-17 | 大同新成新材料股份有限公司 | Semiconductor wafer surface impurity removing equipment and operation method thereof |
| CN112429532A (en) * | 2020-11-23 | 2021-03-02 | 白银一刀钢化玻璃有限公司 | Glass conveying frame |
| CN116444010A (en) * | 2023-06-05 | 2023-07-18 | 山东蓝湾新材料有限公司 | Preparation device and method of heavy metal flocculant |
| CN116444010B (en) * | 2023-06-05 | 2024-01-19 | 山东蓝湾新材料有限公司 | Preparation device and method of heavy metal flocculant |
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Application publication date: 20170714 |
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