CN214077445U - Photoresist spray nozzle cleaning device - Google Patents
Photoresist spray nozzle cleaning device Download PDFInfo
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- CN214077445U CN214077445U CN202023046584.6U CN202023046584U CN214077445U CN 214077445 U CN214077445 U CN 214077445U CN 202023046584 U CN202023046584 U CN 202023046584U CN 214077445 U CN214077445 U CN 214077445U
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- cleaning
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- sprayer
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Abstract
The utility model discloses a photoresist nozzle cleaning device, which comprises a photoresist nozzle, a controller, a mechanical arm connected with the photoresist nozzle and a cleaning nozzle arranged on the side surface of the photoresist nozzle, wherein the mechanical arm, the photoresist nozzle and the cleaning nozzle are respectively connected with the controller; the mechanical arm is used for controlling the photoresist sprayer to move to a cleaning position, when the photoresist sprayer moves in place, the cleaning sprayer performs spray cleaning on the photoresist sprayer, a waste liquid recovery tank matched with the cleaning sprayer is arranged on the cleaning position, and a waste liquid recovery pipeline is arranged at the lower end of the waste liquid recovery tank. The utility model can realize the function of automatically cleaning the nozzle, avoid the contact of the personnel with acetone, reduce the operation risk of the personnel, and reasonably control the using amount of the cleaning solution on the premise of ensuring the cleaning effect, thereby reducing the production cost; in addition, conventional clean mode needs equipment to stop the operation of shutting down, and the utility model discloses a photoresist shower nozzle cleaning device, reducible equipment down time, improve equipment production efficiency promotes the productivity.
Description
Technical Field
The utility model relates to a photoresist shower nozzle cleaning device.
Background
The PSS process comprises cleaning, spin-drying, gluing, photoetching, etching, cleaning, spin-drying and the like, wherein a typical glue homogenizing process of the gluing process comprises the steps of glue dripping, high-speed rotation, drying (solvent volatilization) and the like. The dropping of photoresist is to drop the photoresist on the surface of the substrate, the high speed rotation is to spread the photoresist on the substrate to form a thin layer, and the drying is to remove the excess solvent in the glue layer.
Two commonly used glue dripping modes are static glue dripping and dynamic glue dripping, and the cleaning degree of a photoresist nozzle can directly influence the gluing quality of a product, so that a person is required to clean the nozzle regularly. At present, workers generally adopt a manual soaking or elbow glue bottle showering mode to clean a photoresist nozzle, the manual cleaning of the workers is time-consuming, and a cleaning solvent is irritant acetone or diluent and harmful to human bodies.
Disclosure of Invention
To the problem that above-mentioned prior art exists, the utility model provides a photoresist shower nozzle cleaning device.
In order to achieve the above object, the utility model discloses a photoresist nozzle cleaning device, including the photoresist nozzle, still include controller, the arm of being connected with the photoresist nozzle, set up the cleaning shower nozzle in the photoresist nozzle side, arm, photoresist nozzle and cleaning shower nozzle are connected with the controller respectively;
the mechanical arm is used for controlling the photoresist sprayer to move to a cleaning position, when the photoresist sprayer moves in place, the cleaning sprayer performs spray cleaning on the photoresist sprayer, a waste liquid recovery tank matched with the cleaning sprayer is arranged at the cleaning position, and a waste liquid recovery pipeline is arranged at the lower end of the waste liquid recovery tank.
As an improvement, the cleaning solution in the cleaning spray head is acetone.
As an improvement, the controller adopts a HIGEN FDA-7000 servo controller.
Compared with the prior art, the photoresist nozzle cleaning device can realize the function of automatically cleaning the nozzle, avoid personnel from contacting acetone (volatile and irritant liquid), reduce the operation risk of the personnel, and reasonably control the using amount of the cleaning solution on the premise of ensuring the cleaning effect, thereby reducing the production cost; in addition, the operation is shut down to conventional clean mode needs equipment, and the utility model discloses a photoresist shower nozzle cleaning device, reducible equipment down time, improve equipment production efficiency promotes the productivity.
Drawings
Fig. 1 is a schematic structural view of the present invention;
in the figure: 1. arm, 2, photoresist shower nozzle, 3, clean shower nozzle, 4, waste liquid recovery tank, 5, waste liquid recovery pipeline, 6, controller.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clear, the present invention is further described in detail below. It should be understood, however, that the description herein of specific embodiments is only intended to illustrate the invention and not to limit the scope of the invention.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs, and the terms used herein in the specification of the present invention are for the purpose of describing particular embodiments only and are not intended to limit the present invention.
As shown in fig. 1, a photoresist nozzle cleaning device comprises a photoresist nozzle 2, a controller 6, a mechanical arm 1 connected with the photoresist nozzle 2, and a cleaning nozzle 3 arranged on the side surface of the photoresist nozzle 2, wherein the mechanical arm 1, the photoresist nozzle 2, and the cleaning nozzle 3 are respectively connected with the controller 6;
the mechanical arm 1 is used for controlling the photoresist sprayer 2 to move to a cleaning position, when the photoresist sprayer 2 moves in place, the cleaning sprayer 3 performs spray cleaning on the photoresist sprayer 2, a waste liquid recovery tank 4 matched with the cleaning sprayer 3 is arranged at the cleaning position, and a waste liquid recovery pipeline 5 is arranged at the lower end of the waste liquid recovery tank 4.
As a modification of the embodiment, the cleaning solution in the cleaning nozzle 3 is acetone.
As a modification of the embodiment, the controller 6 employs a HIGEN FDA-7000 servo controller.
When the cleaning device is used, the mechanical arm 1 drives the photoresist nozzle 2 to rise to a cleaning height under the control of the controller 6, the cleaning nozzle 3 automatically sprays a proper amount of acetone under the control of the controller 6 to clean the photoresist nozzle 2 for 3-5s (the specific time is set according to the cleaning effect), the photoresist nozzle 2 performs pre-spraying of photoresist for 1-2 times after cleaning, the excess acetone at the position of the photoresist nozzle 2 is removed, and the photoresist nozzle 2 returns to the initial position after cleaning; in addition, the waste liquid produced when the cleaning nozzle 3 cleans the photoresist nozzle 2 falls into the waste liquid recovery tank 4, and the cleaning waste liquid is collected through the waste liquid recovery pipeline 5.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modification, equivalent replacement or improvement made within the spirit and principle of the present invention should be included in the present invention.
Claims (3)
1. A photoresist nozzle cleaning device comprises a photoresist nozzle (2), and is characterized by further comprising a controller (6), a mechanical arm (1) connected with the photoresist nozzle (2), and a cleaning nozzle (3) arranged on the side surface of the photoresist nozzle (2), wherein the mechanical arm (1), the photoresist nozzle (2) and the cleaning nozzle (3) are respectively connected with the controller (6);
arm (1) is used for controlling photoresist shower nozzle (2) to remove to clean position, and when photoresist shower nozzle (2) removed when targetting in place, cleaning shower nozzle (3) carried out the hydrojet and washd photoresist shower nozzle (2), be equipped with on this clean position with cleaning shower nozzle (3) complex effluent recovery tank (4), the lower extreme of effluent recovery tank (4) is equipped with waste liquid recovery pipeline (5).
2. The photoresist nozzle cleaning device according to claim 1, wherein the cleaning solution in the cleaning nozzle (3) is acetone.
3. The photoresist nozzle cleaning device according to claim 1, wherein the controller (6) is a HIGEN FDA-7000 servo controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023046584.6U CN214077445U (en) | 2020-12-17 | 2020-12-17 | Photoresist spray nozzle cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023046584.6U CN214077445U (en) | 2020-12-17 | 2020-12-17 | Photoresist spray nozzle cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214077445U true CN214077445U (en) | 2021-08-31 |
Family
ID=77428328
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202023046584.6U Active CN214077445U (en) | 2020-12-17 | 2020-12-17 | Photoresist spray nozzle cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214077445U (en) |
-
2020
- 2020-12-17 CN CN202023046584.6U patent/CN214077445U/en active Active
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