CN109715386B - 进行聚合物膜分层的方法 - Google Patents

进行聚合物膜分层的方法 Download PDF

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CN109715386B
CN109715386B CN201680086490.9A CN201680086490A CN109715386B CN 109715386 B CN109715386 B CN 109715386B CN 201680086490 A CN201680086490 A CN 201680086490A CN 109715386 B CN109715386 B CN 109715386B
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R·J·亨德里克斯
K·A·施罗德
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Abstract

公开了使聚合物膜与承载板分层的方法和装置。承载板为至少部分透明的并且其上沉积了吸光材料的像素化图案层，在所述像素化图案层上沉积一层反光材料。待分层的聚合物膜沉积在反光材料层上。接着，使用脉冲光源从与聚合物膜相反的面通过承载板照射以加热吸光材料层。吸光材料层的被加热区域又通过吸光材料层与聚合物膜之间的界面上的传导而加热聚合物膜，由此通过其热分解而由聚合物膜产生气体，这使聚合物膜从承载板上释放。

Description

进行聚合物膜分层的方法
发明背景
1.技术领域
本发明整体上涉及热方法，特别是进行聚合物膜分层(delamination)的方法。
2.相关技术描述
许多类型的印刷电子结构可沉积在聚合物基材上。印刷具有对齐层(registeredlayer)和/或具有良好限定的厚度的高分辨率电子结构的一种方法是将各个层沉积在非常平坦的表面上。这可通过将聚合物膜沉积在刚性的平坦承载板(基材)如玻璃上，然后在聚合物膜上形成随后的层而进行。在形成电子结构以后，必须将聚合物膜从承载板上除去。
发明概述
根据本发明的一个优选实施方案，首先将吸光材料的像素化图案层(pixelatedpattern layer)沉积在承载板上，然后将反光材料层沉积在吸光材料层上。待分层的聚合物膜沉积在反光材料层上。接着，使用脉冲光源从与聚合物膜相反的面通过承载板照射以加热吸光材料层。吸光材料层的被加热区域又通过承载板叠层与聚合物膜之间的界面上的传导而加热聚合物膜，由此通过其热分解而由聚合物膜产生气体，这使聚合物膜从承载板上释放。
任选地，可将表面张力受控的释放层(surface tension controlled releaselayer)沉积在反光材料层上。在聚合物膜以前也可沉积动态释放层。
承载板可由玻璃或石英构成。聚合物膜可由聚酰亚胺构成。表面张力受控的释放层可由陶瓷如氮化硅或二氧化硅构成。
本发明的所有特征和优点在以下详细书写的描述中获悉。
附图简述
在连同附图阅读时，本发明本身以及其优选的使用模式、其它目的和优点通过参考下文对说明性实施方案的详细描述而最好地理解，其中：
图1A-1B阐述根据第一实施方案的进行聚合物膜选择性分层的方法；
图2显示从顶部看见的吸光材料和反光材料的图案；和
图3A-3B阐述根据第二实施方案的进行聚合物膜选择性分层的方法。
优选实施方案详述
将聚合物膜从承载板上除去的一种方法是在沉积聚合物膜以前首先将热释放层沉积在承载板上。在聚合物膜上形成电子结构以后，将整个组件(承载板、热释放层、聚合物膜和电子结构)加热至足以使热释放层释放聚合物膜的温度。该方法的一个缺点是形成电子结构所需的加工温度必须比热释放层的释放温度更低。
将聚合物膜从承载板上除去的另一方法是在308nm使用脉冲准分子激光器(pulsed excimer laser)如XeFl。来自准分子激光器的激光束照耀通过承载板侧并聚焦在聚合物膜与承载板之间的界面上。该方法产生微量的气体，所述气体在聚合物膜与承载板之间的界面上将聚合物膜分层。由于分层的面积是非常小的(约1mm2)，激光束可脉冲并扫描以将较大的面积分层。该方法的第一缺点是准分子激光器倾向于是非常昂贵的，第二个缺点是该方法与其它方法相比产量非常低。
现在参考附图，特别是图1A-1B，描述了根据第一实施方案的进行聚合物膜选择性分层的方法的两个图。首先将承载板11用一层吸光材料12部分覆盖。优选，承载板11为至少部分透光的，并且吸光材料12可以例如以像素化图案沉积在承载板11上。接着，将一层反光材料13沉积在吸光材料层12上，这使承载板11的未被吸光材料层12覆盖的部分从承载板11顶部看是反射的，如图2中所示。然后将聚合物膜14沉积在吸光材料层12和反光材料层13上，其后在聚合物膜14上形成电子结构(未显示)，如图1A所示。
聚合物膜14可通过将承载板11从与聚合物膜14相反的面用来自闪光灯19的光脉冲照射而与承载板11分层，如图1B所示。来自闪光灯19的光脉冲将吸光材料层12加热，并且热传递至聚合物膜14以通过将聚合物膜14分解而在吸光材料层12与聚合物膜14之间的界面上产生气体。
由于气体在吸光材料层12与聚合物膜14之间的界面21上产生，在吸光材料层12表面下面的聚合物膜14表面上也不产生气体。通过改变吸收与反射表面的比(即吸光材料层12与反光材料层13的比)，可在聚合物膜14面对灯的面上控制气体产生水平以将聚合物膜14与承载板11分层而不损害在聚合物膜14上形成的电子结构。
气体产生的另一控制可通过提高来自闪光灯19的光脉冲的强度和改变持续时间而获得。为实现聚合物膜14面对承载板11的表面上产生的气体的另外控制，可在吸光材料层12和反光材料层13后沉积其它层，如图3A-3B中所解释的。
现在参考图3A-3B，描述了根据第二实施方案进行聚合物膜选择性分层的方法的两个图。首先，将承载板31用第一吸光材料层32a部分覆盖，例如以像素化图案。优选，承载板31为至少部分透光的。接着，将透明阻热层35沉积在第一吸光材料层32a上。然后将阻热层35用第二吸光材料层32b部分覆盖，例如以像素化图案。随后，将反光膜33沉积在吸光材料膜32b上，这使阻热层35的未被吸光材料层32b覆盖的部分从承载板31顶部看是反射的，类似于图2。然后将聚合物膜34沉积在第二吸光材料层32b和反光材料层33上，其后在聚合物膜34上形成电子结构(未显示)，如图3A所示。图3B中的41是类似与图1B中的界面21的界面41。
阻热层35容许另外控制气体产生，因为吸光材料层32a、32b同时被单一光脉冲加热。然而，来自面对第一吸光材料层32a的承载板31的热脉冲在时间上与位置更接近聚合物膜34的第二吸光材料层32b相比延迟。热脉冲的时间延迟产生拉链效应，从而比来自如图1B所示单一光脉冲更加温和地将聚合物膜34分层。
上述聚合物膜34与承载板31分层的相同拉链效应也可通过使用灰度像素(gray-scale pixels)产生，其中内部吸收多数光，且外部吸收较少的光。在照射期间，相变总是在内部开始并向外传播。
此外，在沉积聚合物膜34以前可将表面张力受控的释放层(未显示)沉积在反光材料层33上。另外，在沉积聚合物膜34以前可沉积动态释放层(未显示)。动态释放层可由具有比聚合物膜34更低的相变温度的材料构成，这帮助防止来自热吸光材料层32a、32b对聚合物膜34的热损害。动态释放层可具有两种不同的机制，因为在加热时，它可经历两种不同类型的相变。第一类相变为动态释放层的气化。第二类为动态释放层的熔融，由于表面张力，这导致其不稳定。在这两种情况下，聚合物膜34可从承载板31上释放。关于动态释放层熔融的情况，它优选由具有低熔点，但具有非常高的表面张力的材料如金属或金属合金构成。优选，动态释放层由锌或铝构成。
任选，在图1A所示第一实施方案中，在沉积聚合物层14以前可将动态释放层沉积在反光材料层13上。在沉积聚合物层14以前也可将表面张力受控的层沉积在反光材料层13上。
承载板11和31可由玻璃或石英构成。吸光材料层12和32a-32b可由钨构成。反光材料层13和33可由铝构成。聚合物膜14和34可由聚酰亚胺构成。阻热层36可由氧化硅或二氧化硅构成。表面张力受控的层可由陶瓷如二氧化硅或氮化硅构成。动态释放层可以为聚合物或具有相对低熔融温度的金属。
如所述，本发明提供进行聚合物膜分层的改进方法。本发明方法与准分子激光分层技术相比的优点是光源是非常便宜的(～10X)，并且单位光脉冲的分层面积可比准分子激光大得多(～1,000X)。
尽管特别参考优选实施方案显示和描述了本发明，本领域技术人员应当理解在本文中可不偏离本发明的精神和范围而做出形式和细节的各种变化。

Claims (18)

1.进行聚合物膜分层的方法，所述方法包括：
提供光学透明承载板；
将吸光材料层以像素化图案沉积在所述承载板上；
将反光材料层沉积在所述吸光材料层上，使得没有被所述吸光材料层覆盖的所述承载板的部分是反射的；
将动态释放层沉积在所述反光材料层上；
将聚合物膜沉积在所述反光材料层和所述吸光材料层上；
在所述聚合物膜上形成电子结构；和
将所述承载板用脉冲光照射以加热所述吸光材料层以使所述聚合物膜从所述承载板上释放。
2.根据权利要求1的方法，其中所述照射进一步包括将所述承载板用闪光灯照射。
3.根据权利要求1的方法，其中所述照射在所述吸光材料层与所述聚合物膜之间的界面上产生气体以使所述聚合物膜从所述承载板上释放。
4.根据权利要求3的方法，其中所述气体产生的水平通过改变所述吸光材料层与所述反光材料层之间的表面的比控制。
5.根据权利要求1的方法，其中所述动态释放层由金属构成。
6.根据权利要求1的方法，其中所述承载板由石英构成。
7.根据权利要求1的方法，其中所述承载板由玻璃构成。
8.根据权利要求1的方法，其中所述吸光材料层为图案化的。
9.进行聚合物膜分层的方法，所述方法包括：
提供光学透明承载板；
将第一吸光材料层沉积在所述承载板上；
将阻热层沉积在所述第一吸光材料层上；
将第二吸光材料层沉积在所述阻热层上；
将反光材料层沉积在所述第二吸光材料层上；
将聚合物膜沉积在所述反光材料层和所述第二吸光材料层上；
在所述聚合物膜上形成电子结构；和
将所述承载板用脉冲光照射以加热吸光材料层，以使所述聚合物膜从所述承载板上释放。
10.根据权利要求9的方法，其中所述照射进一步包括将所述承载板用闪光灯照射。
11.根据权利要求9的方法，其中所述方法进一步包括在沉积所述聚合物膜以前将表面张力受控的释放层沉积在所述反光材料层上。
12.根据权利要求11的方法，其中所述表面张力受控的释放层由陶瓷构成。
13.根据权利要求11的方法，其中所述方法进一步包括在沉积所述聚合物膜以前将动态释放层沉积在所述表面张力受控的释放层上。
14.根据权利要求13的方法，其中所述动态释放层由金属构成。
15.根据权利要求9的方法，其中吸光材料层中的一个为图案化的。
16.根据权利要求9的方法，其中所述承载板由石英构成。
17.根据权利要求9的方法，其中所述承载板由玻璃构成。
18.根据权利要求9的方法，其中所述阻热层由氧化硅构成。
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