CN108666188B - 阴极配置、电子枪以及包括此电子枪的光刻系统 - Google Patents

阴极配置、电子枪以及包括此电子枪的光刻系统 Download PDF

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Publication number
CN108666188B
CN108666188B CN201810479190.8A CN201810479190A CN108666188B CN 108666188 B CN108666188 B CN 108666188B CN 201810479190 A CN201810479190 A CN 201810479190A CN 108666188 B CN108666188 B CN 108666188B
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cathode
focusing
focusing electrode
electrode
arrangement
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Chinese (zh)
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CN108666188A (zh
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L.迪努-格尔特勒
E.P.霍杰沃斯特
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ASML Netherlands BV
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ASML Netherlands BV
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • H01J1/28—Dispenser-type cathodes, e.g. L-cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/027—Construction of the gun or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/029—Schematic arrangements for beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/48—Electron guns
    • H01J2229/4803—Electrodes
    • H01J2229/481—Focusing electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Solid Thermionic Cathode (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201810479190.8A 2013-12-30 2014-12-22 阴极配置、电子枪以及包括此电子枪的光刻系统 Active CN108666188B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361921546P 2013-12-30 2013-12-30
US61/921,546 2013-12-30
CN201480071807.2A CN105874555B (zh) 2013-12-30 2014-12-22 阴极配置、电子枪以及包括此电子枪的光刻系统

Related Parent Applications (1)

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CN201480071807.2A Division CN105874555B (zh) 2013-12-30 2014-12-22 阴极配置、电子枪以及包括此电子枪的光刻系统

Publications (2)

Publication Number Publication Date
CN108666188A CN108666188A (zh) 2018-10-16
CN108666188B true CN108666188B (zh) 2020-06-12

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CN201810479190.8A Active CN108666188B (zh) 2013-12-30 2014-12-22 阴极配置、电子枪以及包括此电子枪的光刻系统
CN201480071826.5A Active CN105874554B (zh) 2013-12-30 2014-12-22 阴极配置、电子枪以及包括此电子枪的光刻系统
CN201480071807.2A Active CN105874555B (zh) 2013-12-30 2014-12-22 阴极配置、电子枪以及包括此电子枪的光刻系统

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CN201480071826.5A Active CN105874554B (zh) 2013-12-30 2014-12-22 阴极配置、电子枪以及包括此电子枪的光刻系统
CN201480071807.2A Active CN105874555B (zh) 2013-12-30 2014-12-22 阴极配置、电子枪以及包括此电子枪的光刻系统

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US (3) US9455112B2 (https=)
EP (2) EP3090439B1 (https=)
JP (4) JP6208371B2 (https=)
KR (2) KR102359077B1 (https=)
CN (3) CN108666188B (https=)
NL (2) NL2014030B1 (https=)
RU (1) RU2689391C2 (https=)
TW (2) TWI661457B (https=)
WO (2) WO2015101538A1 (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI661457B (zh) 2013-12-30 2019-06-01 荷蘭商Ａｓｍｌ荷蘭公司 陰極配置、電子槍以及包含此電子槍的微影系統
US10529529B2 (en) * 2016-04-20 2020-01-07 Moxtek, Inc. Electron-beam spot optimization
US10366859B2 (en) * 2016-08-24 2019-07-30 Varian Medical Systems, Inc. Electromagnetic interference containment for accelerator systems
UA113827C2 (xx) * 2016-09-07 2017-03-10 Аксіальна електронна гармата
US10535499B2 (en) * 2017-11-03 2020-01-14 Varian Semiconductor Equipment Associates, Inc. Varied component density for thermal isolation
JP6396618B1 (ja) * 2018-04-03 2018-09-26 グローテクノロジー株式会社 グロー放電システム及びこれを用いたグロー放電質量分析装置
CN111048373B (zh) * 2018-10-12 2021-04-27 中国电子科技集团公司第三十八研究所 一种电子源再生方法
WO2020213109A1 (ja) * 2019-04-18 2020-10-22 株式会社日立ハイテク 電子源、及び荷電粒子線装置
US20230330751A1 (en) * 2019-09-23 2023-10-19 Freemelt Ab Electron gun cathode technology
US10923307B1 (en) * 2020-04-13 2021-02-16 Hamamatsu Photonics K.K. Electron beam generator
JP6762635B1 (ja) * 2020-04-16 2020-09-30 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ 電子銃、電子線適用装置、および、電子ビームの射出方法
US11244800B2 (en) * 2020-06-18 2022-02-08 Axcelis Technologies, Inc. Stepped indirectly heated cathode with improved shielding
JP7554100B2 (ja) * 2020-11-19 2024-09-19 株式会社ニューフレアテクノロジー 電子放出源の動作制御方法、電子ビーム描画方法、及び電子ビーム描画装置
JP7549803B2 (ja) * 2021-02-09 2024-09-12 日新イオン機器株式会社 電子源およびイオン源
US20230154720A1 (en) * 2021-11-16 2023-05-18 Nuflare Technology, Inc. Method for estimating cathode lifetime of electron gun, and electron beam writing apparatus
CN114284121B (zh) * 2021-12-24 2023-09-19 中国科学院空天信息创新研究院 用于行波管的电子枪及其制备方法
JP7752074B2 (ja) * 2022-02-25 2025-10-09 株式会社Ihi ヒートシールド
US11961696B1 (en) * 2022-10-28 2024-04-16 Ion Technology Solutions, Llc Ion source cathode
JP2024090094A (ja) * 2022-12-22 2024-07-04 株式会社日立ハイテク 荷電粒子銃、及び荷電粒子ビーム装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3227906A (en) * 1962-05-02 1966-01-04 Eitel Mccullough Inc Cathode support and heat shielding structure for electron gun
US3462629A (en) * 1966-05-09 1969-08-19 Stromberg Carlson Corp Self-aligning electron gun construction
US4254357A (en) * 1979-09-14 1981-03-03 The United States Of America As Represented By The Secretary Of The Navy Multi-arrayed micro-patch emitter with integral control grid
US5623183A (en) * 1995-03-22 1997-04-22 Litton Systems, Inc. Diverging beam electron gun for a toxic remediation device with a dome-shaped focusing electrode
CN1830051A (zh) * 2003-02-14 2006-09-06 迈普尔平版印刷Ip有限公司 储备式阴极

Family Cites Families (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1201138A (en) 1915-05-12 1916-10-10 Wagner Mfg Company Griddle.
US2983842A (en) * 1959-06-23 1961-05-09 Zenith Radio Corp Electrode system
US3040205A (en) * 1960-05-31 1962-06-19 Harold R Walker Electrostatic vidicon
US3175115A (en) 1960-08-25 1965-03-23 Sylvania Electric Prod Cathode assembly
US3154711A (en) * 1961-06-19 1964-10-27 Gen Electric Electron beam focusing by means of contact differences of potential
US3157308A (en) 1961-09-05 1964-11-17 Clark Mfg Co J L Canister type container and method of making the same
US3159408A (en) 1961-10-05 1964-12-01 Grace W R & Co Chuck
US3154171A (en) 1962-04-02 1964-10-27 Vicon Instr Company Noise suppressing filter for microphone
DE1514490A1 (de) * 1965-06-30 1969-06-26 Siemens Ag Elektronenstrahlerzeugungssystem fuer elektrische Entladungsgefaesse
NL6513665A (https=) 1965-10-22 1967-04-24
US3500110A (en) * 1967-08-23 1970-03-10 Raytheon Co Noncurrent intercepting electron beam control element
US3573533A (en) 1968-11-12 1971-04-06 Hughes Aircraft Co Gun-supporting cylinder centered in art neck by springs connected internally of cylinder
US3594885A (en) * 1969-06-16 1971-07-27 Varian Associates Method for fabricating a dimpled concave dispenser cathode incorporating a grid
USRE30082E (en) * 1972-08-30 1979-08-21 Picker Corporation X-ray tube having focusing cup with non-emitting coating
JPS5242591B2 (https=) 1972-12-08 1977-10-25
JPS5533719A (en) * 1978-08-31 1980-03-10 Toshiba Corp Electron gun
US4354357A (en) * 1979-11-05 1982-10-19 Hofstetter Robert W Conveyor system with cooling means
US4379979A (en) 1981-02-06 1983-04-12 The United States Of America As Represented By The Secretary Of The Navy Controlled porosity sheet for thermionic dispenser cathode and method of manufacture
JPS5842141A (ja) * 1981-09-08 1983-03-11 Nec Corp ピアス形電子銃
JPS5851438A (ja) * 1981-09-22 1983-03-26 Nippon Telegr & Teleph Corp <Ntt> 電子線源
DE3407434A1 (de) 1984-02-29 1985-08-29 Siemens AG, 1000 Berlin und 8000 München Strahlerzeugersystem fuer elektronenroehren, insbesondere wanderfeldroehren
US4524308A (en) 1984-06-01 1985-06-18 Sony Corporation Circuits for accomplishing electron beam convergence in color cathode ray tubes
JPH01176641A (ja) * 1987-12-29 1989-07-13 Matsushita Electron Corp 電子銃
US4954745A (en) * 1989-03-22 1990-09-04 Tektronix, Inc. Cathode structure
US4994709A (en) * 1989-03-22 1991-02-19 Varian Associates, Inc. Method for making a cathader with integral shadow grid
US5218263A (en) * 1990-09-06 1993-06-08 Ceradyne, Inc. High thermal efficiency dispenser-cathode and method of manufacture therefor
US5293410A (en) * 1991-11-27 1994-03-08 Schlumberger Technology Corporation Neutron generator
WO1994025880A1 (en) 1993-04-30 1994-11-10 Board Of Regents, The University Of Texas System Megavoltage scanning imager and method for its use
JP3341367B2 (ja) * 1993-06-25 2002-11-05 ソニー株式会社 電子銃カソード構造体
JP3264775B2 (ja) 1994-06-29 2002-03-11 電気化学工業株式会社 熱電界放射電子銃
JP2787899B2 (ja) * 1995-03-20 1998-08-20 日本電気株式会社 冷陰極およびこれを用いた電子銃とマイクロ波管
EP0766405A1 (en) 1995-09-29 1997-04-02 STMicroelectronics S.r.l. Successive approximation register without redundancy
US5814939A (en) * 1996-02-12 1998-09-29 Chu; Kwo R. Mechanically tunable magnetron injection gun (MIG)
JPH10255679A (ja) * 1997-03-12 1998-09-25 Sony Corp 電子銃カソード構造体
US6196889B1 (en) * 1998-12-11 2001-03-06 United Technologies Corporation Method and apparatus for use an electron gun employing a thermionic source of electrons
US6455990B1 (en) * 1998-12-11 2002-09-24 United Technologies Corporation Apparatus for an electron gun employing a thermionic electron source
US6229876B1 (en) * 1999-07-29 2001-05-08 Kevex X-Ray, Inc. X-ray tube
WO2001039243A1 (en) * 1999-11-23 2001-05-31 Ion Diagnostics, Inc. Electron optics for multi-beam electron beam lithography tool
FR2833750A1 (fr) 2001-12-19 2003-06-20 Thomson Licensing Sa Canon a electrons pour tube a vide
DE10218913B4 (de) * 2002-04-27 2005-05-04 Bruker Daltonik Gmbh Vorrichtung und Verfahren zur Bewegung einer Elektronenquelle in einem Magnetfeld
JP3996442B2 (ja) * 2002-05-27 2007-10-24 Ｎｅｃマイクロ波管株式会社 電子銃
US7233101B2 (en) * 2002-12-31 2007-06-19 Samsung Electronics Co., Ltd. Substrate-supported array having steerable nanowires elements use in electron emitting devices
ATE538412T1 (de) 2002-10-25 2012-01-15 Mapper Lithography Ip Bv Lithographisches system
AU2003276779A1 (en) 2002-10-30 2004-05-25 Mapper Lithography Ip B.V. Electron beam exposure system
US6952466B2 (en) * 2002-11-12 2005-10-04 Ge Medical Systems Global Technology Company, Llc Oil-free electron source for an EBT scanner
US6891321B2 (en) * 2002-11-12 2005-05-10 Ge Medical Systems Global Technology Company, Llc Oil-free electron source having cathode and anode members adjustable with five degrees of freedom
KR101068607B1 (ko) 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
ATE524822T1 (de) 2003-05-28 2011-09-15 Mapper Lithography Ip Bv Belichtungsverfahren für strahlen aus geladenen teilchen
JP4298399B2 (ja) * 2003-06-26 2009-07-15 キヤノン株式会社 電子線装置及び該電子線装置を用いた電子線描画装置
ATE381728T1 (de) 2003-07-30 2008-01-15 Mapper Lithography Ip Bv Modulator-schaltkreise
JP4349964B2 (ja) * 2003-09-10 2009-10-21 株式会社日立ハイテクノロジーズ 小型電子銃
JP2006012663A (ja) 2004-06-28 2006-01-12 Hitachi Displays Ltd 陰極線管
JP4134000B2 (ja) * 2004-10-28 2008-08-13 Ｎｅｃマイクロ波管株式会社 電子銃
JP2006221983A (ja) * 2005-02-10 2006-08-24 Nuflare Technology Inc 荷電粒子発生装置と荷電粒子発生装置用エミッタ温度決定方法
US7709815B2 (en) 2005-09-16 2010-05-04 Mapper Lithography Ip B.V. Lithography system and projection method
US8159118B2 (en) * 2005-11-02 2012-04-17 United Technologies Corporation Electron gun
EP1947674B1 (en) * 2005-11-08 2015-06-17 Advantest Corporation Electron gun, electron beam exposure system and exposure method
RU2321096C1 (ru) * 2006-08-21 2008-03-27 Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") Катодный узел для электронной пушки с протяженным электронным потоком
US20090108192A1 (en) * 2007-10-25 2009-04-30 Schulumberger Technology Corporation Tritium-Tritium Neutron Generator Logging Tool
JP2009187767A (ja) * 2008-02-06 2009-08-20 Sumitomo Electric Ind Ltd 電子源構造体及び電子源構造体駆動装置
JP2009205904A (ja) * 2008-02-27 2009-09-10 Hitachi High-Technologies Corp 冷陰極型電界放出電子銃及びそれを用いた電子線装置
US8294351B2 (en) * 2008-03-04 2012-10-23 Panasonic Corporation Matrix-type cold-cathode electron source device
WO2010070837A1 (ja) * 2008-12-16 2010-06-24 株式会社日立ハイテクノロジーズ 電子線装置およびそれを用いた電子線応用装置
CN104428866A (zh) * 2012-05-14 2015-03-18 迈普尔平版印刷Ip有限公司 带电粒子光刻系统和射束产生器
TWI661457B (zh) * 2013-12-30 2019-06-01 荷蘭商Ａｓｍｌ荷蘭公司 陰極配置、電子槍以及包含此電子槍的微影系統
WO2016158421A1 (ja) 2015-04-03 2016-10-06 株式会社日立ハイテクノロジーズ 光量検出装置、それを用いた免疫分析装置および荷電粒子線装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3227906A (en) * 1962-05-02 1966-01-04 Eitel Mccullough Inc Cathode support and heat shielding structure for electron gun
US3462629A (en) * 1966-05-09 1969-08-19 Stromberg Carlson Corp Self-aligning electron gun construction
US4254357A (en) * 1979-09-14 1981-03-03 The United States Of America As Represented By The Secretary Of The Navy Multi-arrayed micro-patch emitter with integral control grid
US5623183A (en) * 1995-03-22 1997-04-22 Litton Systems, Inc. Diverging beam electron gun for a toxic remediation device with a dome-shaped focusing electrode
CN1830051A (zh) * 2003-02-14 2006-09-06 迈普尔平版印刷Ip有限公司 储备式阴极

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TW201528312A (zh) 2015-07-16
RU2689391C2 (ru) 2019-05-28
JP6462805B2 (ja) 2019-01-30
JP2018032861A (ja) 2018-03-01
EP3090439A1 (en) 2016-11-09
CN105874554B (zh) 2018-05-08
US20160314935A1 (en) 2016-10-27
NL2014029B1 (en) 2016-01-08
CN108666188A (zh) 2018-10-16
WO2015101537A4 (en) 2015-08-27
NL2014029A (en) 2015-07-01
EP3090438A1 (en) 2016-11-09
JP2020009777A (ja) 2020-01-16
CN105874554A (zh) 2016-08-17
US9455112B2 (en) 2016-09-27
JP6208371B2 (ja) 2017-10-04
US20150187541A1 (en) 2015-07-02
US10622188B2 (en) 2020-04-14
KR20160104711A (ko) 2016-09-05
JP2017501553A (ja) 2017-01-12
RU2016131081A3 (https=) 2018-06-20
JP6929910B2 (ja) 2021-09-01
EP3090438B1 (en) 2020-03-25
NL2014030B1 (en) 2016-01-08
TW201532096A (zh) 2015-08-16
TWI608511B (zh) 2017-12-11
WO2015101538A1 (en) 2015-07-09
KR102427119B1 (ko) 2022-07-29
WO2015101538A4 (en) 2015-08-27
JP2017502469A (ja) 2017-01-19
US20150187533A1 (en) 2015-07-02
RU2016131081A (ru) 2018-02-06
KR20160104712A (ko) 2016-09-05
EP3090439B1 (en) 2020-06-24
US9466453B2 (en) 2016-10-11
TWI661457B (zh) 2019-06-01
CN105874555A (zh) 2016-08-17
CN105874555B (zh) 2018-06-15
JP6590811B2 (ja) 2019-10-16
KR102359077B1 (ko) 2022-02-07
NL2014030A (en) 2015-07-01
WO2015101537A1 (en) 2015-07-09

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