KR102359077B1 - 캐소드 어레인지먼트, 전자총, 및 그런 전자총을 포함하는 리소그래피 시스템 - Google Patents

캐소드 어레인지먼트, 전자총, 및 그런 전자총을 포함하는 리소그래피 시스템 Download PDF

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KR102359077B1
KR102359077B1 KR1020167021108A KR20167021108A KR102359077B1 KR 102359077 B1 KR102359077 B1 KR 102359077B1 KR 1020167021108 A KR1020167021108 A KR 1020167021108A KR 20167021108 A KR20167021108 A KR 20167021108A KR 102359077 B1 KR102359077 B1 KR 102359077B1
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cathode
focusing
focusing electrode
arrangement
electrode
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KR20160104712A (ko
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라우라 디누-거틀러
에릭 페트러스 호거보스트
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에이에스엠엘 네델란즈 비.브이.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • H01J1/28—Dispenser-type cathodes, e.g. L-cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/027—Construction of the gun or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/029—Schematic arrangements for beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/48—Electron guns
    • H01J2229/4803—Electrodes
    • H01J2229/481—Focusing electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Solid Thermionic Cathode (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020167021108A 2013-12-30 2014-12-22 캐소드 어레인지먼트, 전자총, 및 그런 전자총을 포함하는 리소그래피 시스템 Active KR102359077B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361921546P 2013-12-30 2013-12-30
US61/921,546 2013-12-30
PCT/EP2014/078993 WO2015101537A1 (en) 2013-12-30 2014-12-22 Cathode arrangement, electron gun, and lithography system comprising such electron gun

Publications (2)

Publication Number Publication Date
KR20160104712A KR20160104712A (ko) 2016-09-05
KR102359077B1 true KR102359077B1 (ko) 2022-02-07

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KR1020167021105A Active KR102427119B1 (ko) 2013-12-30 2014-12-22 캐소드 어레인지먼트, 전자총, 및 그런 전자총을 포함하는 리소그래피 시스템

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US (3) US9455112B2 (https=)
EP (2) EP3090439B1 (https=)
JP (4) JP6208371B2 (https=)
KR (2) KR102359077B1 (https=)
CN (3) CN108666188B (https=)
NL (2) NL2014030B1 (https=)
RU (1) RU2689391C2 (https=)
TW (2) TWI661457B (https=)
WO (2) WO2015101538A1 (https=)

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US10535499B2 (en) * 2017-11-03 2020-01-14 Varian Semiconductor Equipment Associates, Inc. Varied component density for thermal isolation
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CN111048373B (zh) * 2018-10-12 2021-04-27 中国电子科技集团公司第三十八研究所 一种电子源再生方法
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US11244800B2 (en) * 2020-06-18 2022-02-08 Axcelis Technologies, Inc. Stepped indirectly heated cathode with improved shielding
JP7554100B2 (ja) * 2020-11-19 2024-09-19 株式会社ニューフレアテクノロジー 電子放出源の動作制御方法、電子ビーム描画方法、及び電子ビーム描画装置
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CN114284121B (zh) * 2021-12-24 2023-09-19 中国科学院空天信息创新研究院 用于行波管的电子枪及其制备方法
JP7752074B2 (ja) * 2022-02-25 2025-10-09 株式会社Ihi ヒートシールド
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TW201528312A (zh) 2015-07-16
RU2689391C2 (ru) 2019-05-28
JP6462805B2 (ja) 2019-01-30
JP2018032861A (ja) 2018-03-01
EP3090439A1 (en) 2016-11-09
CN105874554B (zh) 2018-05-08
US20160314935A1 (en) 2016-10-27
NL2014029B1 (en) 2016-01-08
CN108666188A (zh) 2018-10-16
WO2015101537A4 (en) 2015-08-27
NL2014029A (en) 2015-07-01
EP3090438A1 (en) 2016-11-09
JP2020009777A (ja) 2020-01-16
CN105874554A (zh) 2016-08-17
CN108666188B (zh) 2020-06-12
US9455112B2 (en) 2016-09-27
JP6208371B2 (ja) 2017-10-04
US20150187541A1 (en) 2015-07-02
US10622188B2 (en) 2020-04-14
KR20160104711A (ko) 2016-09-05
JP2017501553A (ja) 2017-01-12
RU2016131081A3 (https=) 2018-06-20
JP6929910B2 (ja) 2021-09-01
EP3090438B1 (en) 2020-03-25
NL2014030B1 (en) 2016-01-08
TW201532096A (zh) 2015-08-16
TWI608511B (zh) 2017-12-11
WO2015101538A1 (en) 2015-07-09
KR102427119B1 (ko) 2022-07-29
WO2015101538A4 (en) 2015-08-27
JP2017502469A (ja) 2017-01-19
US20150187533A1 (en) 2015-07-02
RU2016131081A (ru) 2018-02-06
KR20160104712A (ko) 2016-09-05
EP3090439B1 (en) 2020-06-24
US9466453B2 (en) 2016-10-11
TWI661457B (zh) 2019-06-01
CN105874555A (zh) 2016-08-17
CN105874555B (zh) 2018-06-15
JP6590811B2 (ja) 2019-10-16
NL2014030A (en) 2015-07-01
WO2015101537A1 (en) 2015-07-09

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