CN108531880A - 一种多晶硅薄膜低温物理气相沉积装置 - Google Patents
一种多晶硅薄膜低温物理气相沉积装置 Download PDFInfo
- Publication number
- CN108531880A CN108531880A CN201810569454.9A CN201810569454A CN108531880A CN 108531880 A CN108531880 A CN 108531880A CN 201810569454 A CN201810569454 A CN 201810569454A CN 108531880 A CN108531880 A CN 108531880A
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- fixed
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- vapor deposition
- physical vapor
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- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 37
- 229920005591 polysilicon Polymers 0.000 title claims abstract description 37
- 238000005240 physical vapour deposition Methods 0.000 title claims abstract description 15
- 238000000151 deposition Methods 0.000 claims abstract description 52
- 230000008021 deposition Effects 0.000 claims abstract description 52
- 230000005611 electricity Effects 0.000 claims 1
- 239000012528 membrane Substances 0.000 abstract description 26
- 238000007740 vapor deposition Methods 0.000 abstract description 8
- 239000000463 material Substances 0.000 description 7
- 239000010408 film Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201810569454.9A CN108531880B (zh) | 2018-06-05 | 2018-06-05 | 一种多晶硅薄膜低温物理气相沉积装置 |
Applications Claiming Priority (1)
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CN201810569454.9A CN108531880B (zh) | 2018-06-05 | 2018-06-05 | 一种多晶硅薄膜低温物理气相沉积装置 |
Publications (2)
Publication Number | Publication Date |
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CN108531880A true CN108531880A (zh) | 2018-09-14 |
CN108531880B CN108531880B (zh) | 2019-12-03 |
Family
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CN201810569454.9A Expired - Fee Related CN108531880B (zh) | 2018-06-05 | 2018-06-05 | 一种多晶硅薄膜低温物理气相沉积装置 |
Country Status (1)
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CN (1) | CN108531880B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109055898A (zh) * | 2018-09-29 | 2018-12-21 | 汪玉洁 | 一种薄膜蒸镀装置 |
CN110983284A (zh) * | 2019-12-26 | 2020-04-10 | 北京大学深圳研究院 | 一种柱状件表面涂层物理气相沉积用轴向转动夹持机构 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10022159A1 (de) * | 2000-05-09 | 2001-11-29 | Deutsch Zentr Luft & Raumfahrt | Substrathalterung für Beschichtungseinrichtungen |
JP2006328518A (ja) * | 2005-05-30 | 2006-12-07 | Optrex Corp | スパッタ成膜装置 |
CN102080213A (zh) * | 2011-01-21 | 2011-06-01 | 东北大学 | 一种多运动方式的真空镀膜机行星式工件架 |
DE102011017566A1 (de) * | 2010-04-22 | 2011-12-01 | Von Ardenne Anlagentechnik Gmbh | Substratbehandlungsanlage und Substrathalter dafür |
CN103276363A (zh) * | 2013-06-13 | 2013-09-04 | 电子科技大学 | 多片双面薄膜快速沉积装置 |
CN105986229A (zh) * | 2016-06-27 | 2016-10-05 | 广东腾胜真空技术工程有限公司 | 一种均匀性的多弧离子镀膜设备 |
CN107794508A (zh) * | 2017-11-15 | 2018-03-13 | 中山市创科科研技术服务有限公司 | 一种光学镀膜装置基板承载机构 |
-
2018
- 2018-06-05 CN CN201810569454.9A patent/CN108531880B/zh not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10022159A1 (de) * | 2000-05-09 | 2001-11-29 | Deutsch Zentr Luft & Raumfahrt | Substrathalterung für Beschichtungseinrichtungen |
JP2006328518A (ja) * | 2005-05-30 | 2006-12-07 | Optrex Corp | スパッタ成膜装置 |
DE102011017566A1 (de) * | 2010-04-22 | 2011-12-01 | Von Ardenne Anlagentechnik Gmbh | Substratbehandlungsanlage und Substrathalter dafür |
CN102080213A (zh) * | 2011-01-21 | 2011-06-01 | 东北大学 | 一种多运动方式的真空镀膜机行星式工件架 |
CN103276363A (zh) * | 2013-06-13 | 2013-09-04 | 电子科技大学 | 多片双面薄膜快速沉积装置 |
CN105986229A (zh) * | 2016-06-27 | 2016-10-05 | 广东腾胜真空技术工程有限公司 | 一种均匀性的多弧离子镀膜设备 |
CN107794508A (zh) * | 2017-11-15 | 2018-03-13 | 中山市创科科研技术服务有限公司 | 一种光学镀膜装置基板承载机构 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109055898A (zh) * | 2018-09-29 | 2018-12-21 | 汪玉洁 | 一种薄膜蒸镀装置 |
CN109055898B (zh) * | 2018-09-29 | 2020-09-22 | 浙江环迪工贸有限公司 | 一种薄膜蒸镀装置 |
CN110983284A (zh) * | 2019-12-26 | 2020-04-10 | 北京大学深圳研究院 | 一种柱状件表面涂层物理气相沉积用轴向转动夹持机构 |
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Publication number | Publication date |
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CN108531880B (zh) | 2019-12-03 |
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TA01 | Transfer of patent application right |
Effective date of registration: 20191112 Address after: 314500 Building 1, No.88, Changhua Road, Heshan Town, Tongxiang City, Jiaxing City, Zhejiang Province Applicant after: ZHEJIANG HUALI PIPE Co.,Ltd. Address before: 310014 Energy Education Institute, Zhejiang University of Technology, 18 Chao Wang Road, Xiacheng District, Hangzhou, Zhejiang Applicant before: Wang Yujie |
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TR01 | Transfer of patent right |
Effective date of registration: 20201230 Address after: Industrial Zone, Heshan Town, Jiaxing City, Zhejiang Province Patentee after: BAILIDA SOLAR ENERGY Co.,Ltd. Address before: 314500 Building 1, 88 Changhua Road, Heshan Town, Tongxiang City, Jiaxing City, Zhejiang Province Patentee before: ZHEJIANG HUALI PIPE Co.,Ltd. |
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Granted publication date: 20191203 |