CN108409778A - 高折射率改性硅烷的制备方法及其应用 - Google Patents
高折射率改性硅烷的制备方法及其应用 Download PDFInfo
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- CN108409778A CN108409778A CN201711500598.0A CN201711500598A CN108409778A CN 108409778 A CN108409778 A CN 108409778A CN 201711500598 A CN201711500598 A CN 201711500598A CN 108409778 A CN108409778 A CN 108409778A
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- refractive index
- high refractive
- silane
- acid
- modified silane
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- 150000004756 silanes Chemical class 0.000 title claims abstract description 34
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- 239000000178 monomer Substances 0.000 claims abstract description 35
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 35
- 239000011593 sulfur Substances 0.000 claims abstract description 35
- 238000006243 chemical reaction Methods 0.000 claims abstract description 26
- 238000003756 stirring Methods 0.000 claims abstract description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910000077 silane Inorganic materials 0.000 claims abstract description 20
- 239000002253 acid Substances 0.000 claims abstract description 17
- 239000003960 organic solvent Substances 0.000 claims abstract description 14
- 239000003054 catalyst Substances 0.000 claims abstract description 12
- 239000003381 stabilizer Substances 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 11
- 150000007524 organic acids Chemical class 0.000 claims abstract description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Substances OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 23
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 15
- 239000005864 Sulphur Substances 0.000 claims description 11
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- -1 2- propiolic acids Chemical compound 0.000 claims description 6
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 208000032825 Ring chromosome 2 syndrome Diseases 0.000 claims description 5
- 125000003342 alkenyl group Chemical group 0.000 claims description 5
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- 150000001875 compounds Chemical class 0.000 claims description 5
- 229960005215 dichloroacetic acid Drugs 0.000 claims description 5
- 229930192474 thiophene Natural products 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Divinylene sulfide Natural products C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 3
- 239000005977 Ethylene Substances 0.000 claims description 3
- 241000534944 Thia Species 0.000 claims description 3
- 125000004429 atom Chemical group 0.000 claims description 3
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- 239000002904 solvent Substances 0.000 claims description 3
- BZBYEAWKJNCPLB-UHFFFAOYSA-N 1,3-dithiane-2-carboxylic acid Chemical compound OC(=O)C1SCCCS1 BZBYEAWKJNCPLB-UHFFFAOYSA-N 0.000 claims description 2
- 125000000524 functional group Chemical group 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 claims description 2
- 238000010792 warming Methods 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N alpha-methacrylic acid Natural products CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 1
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- 238000004440 column chromatography Methods 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 8
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- 230000035943 smell Effects 0.000 description 8
- 239000012153 distilled water Substances 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 239000003921 oil Substances 0.000 description 7
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 6
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 6
- 239000001099 ammonium carbonate Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 235000019441 ethanol Nutrition 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 235000011167 hydrochloric acid Nutrition 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000004423 acyloxy group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- 238000003747 Grignard reaction Methods 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000006459 hydrosilylation reaction Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid group Chemical class S(O)(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical class CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical class CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GNVMUORYQLCPJZ-UHFFFAOYSA-M Thiocarbamate Chemical compound NC([S-])=O GNVMUORYQLCPJZ-UHFFFAOYSA-M 0.000 description 1
- WJEIYVAPNMUNIU-UHFFFAOYSA-N [Na].OC(O)=O Chemical group [Na].OC(O)=O WJEIYVAPNMUNIU-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000007171 acid catalysis Methods 0.000 description 1
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- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 238000004500 asepsis Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000011208 chromatographic data Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 125000001047 cyclobutenyl group Chemical group C1(=CCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000004815 dispersion polymer Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- BTZNPZMHENLISZ-UHFFFAOYSA-N fluoromethanesulfonic acid Chemical compound OS(=O)(=O)CF BTZNPZMHENLISZ-UHFFFAOYSA-N 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical group 0.000 description 1
- MWKFXSUHUHTGQN-UHFFFAOYSA-N n-decyl alcohol Natural products CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 239000000382 optic material Substances 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 125000005401 siloxanyl group Chemical group 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- FDRCDNZGSXJAFP-UHFFFAOYSA-M sodium chloroacetate Chemical compound [Na+].[O-]C(=O)CCl FDRCDNZGSXJAFP-UHFFFAOYSA-M 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
- C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/127—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions not affecting the linkages to the silicon atom
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/28—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen sulfur-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
Abstract
本发明公开一种高折射率改性硅烷,其制备方法包括将含硫杂环单体、硅烷单体与有机溶剂混合,加入酸性稳定剂及催化剂,搅拌条件下滴加水,然后升温反应,降温后进行中和反应,水洗、分离后得到高折射率改性硅烷;所述酸性稳定剂为0≤PKa≤3.0的有机酸。本发明通过改进工艺制备得到含硫杂环改性的硅烷单体,可以用作有机硅材料的添加剂或合成原料,以及作为封装材料的组分,提高产品的透光率,且产品产率高、气味小、利于应用。
Description
技术领域
本发明属于有机硅材料技术领域,涉及一种高折射率改性硅烷及其制备方法与应用。
技术背景
光学材料的应用领域正在拓宽,产品不断向高折射率、高透光率和高可靠性方向发展,有机硅材料由于具有良好的耐温性、机械性能及无毒环保性,在医学、生物学、通讯等光学材料制备领域得到广泛应用。目前光学透镜、光纤材料等领域应用的有机硅材料要求折射率更高、甚至高达1.7以上,同时具有良好的机械性能。
现有技术提高有机硅材料折射率的方法主要是在聚硅氧烷树脂的分子结构中引入高折射率基团,包括:
(1)引入芳香族化合物或稠环化合物,可提高折射率,但制备的聚合物色散大,且机械性能方面存在硬而脆的缺陷,折射率只能达到1.5左右。
(2)引入除F以外的卤族元素,但树脂的密度增大,耐候性差,易黄变。
(3)引入重金属离子如铅、镧或TiO2、PbS、FeS纳米粒子来提高折射率,但树脂密度大,抗冲击性降低,易黄变,实用性差。
(4)引入脂肪族多环化合物,可提高折射率,且色散较低。
另外,引入硫、氮、磷等杂元素也可提高折射率,而在聚合物里引入硫元素是提高折射率最有效的方法,得到的材料色散小,环境稳定性好.近年有关在聚合物中引入硫元素以提高树脂折射率的报道较多.通常是以硫醚键、硫酯键、硫代氨基甲酸酯和砜基等形式引入.或者以环硫的形式引入,以环硫的形式引入方法可以制备含硫量较高的聚合物(可达50mol%),从而有效提高树脂折射率。
但是,现有通过硫杂环单体引入硫元素的方法是采用超低温条件下的格氏反应制备,存在产物气味大、制备条件苛刻的缺陷,其限制了该类高折射率硅烷及树脂的应用推广。
发明内容
针对上述现有技术的不足,本发明提供一种高折射率改性硅烷及其制备方法与应用,所述高折射率改性硅烷采用改进的制备方法制备,显著提高含硫杂环单体在合成过程中的稳定性,使制备的树脂气味小、与有机硅树脂相容性佳,且制备条件温和、工艺简单。
本发明的目的通过以下技术方案实现:
高折射率改性硅烷,由包括以下步骤的方法制备:
将含硫杂环单体、硅烷单体与有机溶剂混合,加入酸性稳定剂及催化剂,搅拌条件下滴加水,然后升温反应,得到高折射率改性硅烷;所述酸性稳定剂为0≤PKa≤3.0的有机酸;
所述含硫杂环单体是具有至少一个含硫杂环基团、以及至少一个羟基的化合物,所述含硫杂环基团具有n个硫原子,n为2的整倍数;所述硅烷单体的结构式为:R2R3R4SiX,X为一价可水解官能基,R2、R3、R4选自氢基、2~10个碳原子的链烯基、(甲基)丙烯酸烷基酯基、不含脂肪族不饱和键的单价烃基中的一种或几种。
优选的,所述升温反应的条件为升温至90~120℃反应18~36h。
所述PKa是物质在25℃的酸度系数,反映物质的酸性强度,数值越小,酸性越强,可以查物性数据手册或根据化学物质登录号(CAS号)查询该数值。
优选的,所述X为卤素、烷氧基或酰氧基。更优选的,所述卤素为氯,所述烷氧基为C1~C5的烷氧基,酰氧基为C1~C5的酰氧基。
优选的,R2、R3、R4中至少一个为氢基或2~10个碳原子的链烯基。所述2~ 10个碳原子的链烯基可以为乙烯基、烯丙基、丁烯基、戊烯基、烯丙基。更优选的,所述2~10个碳原子的链烯基为-CH=CH2,-CH2-CH=CH2,-(CH2)4-CH=CH2, -(CH2)6-CH=CH2或-C3H6OOCMe3C=CH2。
优选的,所述(甲基)丙烯酸烷基酯基是丙烯酸烷基酯基和/或甲基丙烯酸烷基酯基,所述(甲基)丙烯酸烷基酯基中的烷基为C1~C5的烷基。所述C1~C5 的烷基,具体可为甲基、乙基、丙基或叔丁基,更优选为丙基。
所述不含脂肪族不饱和键的单价烃基可以列举甲基、乙基、丙基、丁基、戊基、己基、庚基或类似的烷基;环戊基、环己基或类似的环烷基;苯基、甲苯基、二甲苯基或类似的芳基;苄基、苯乙基、苯丙基或类似的芳烷基;3,3,3- 三氟丙基、3-氯丙基或类似的卤代烷基;以上最优选的是烷基和芳基,尤其是甲基和苯基。
优选的,所述硅烷单体为含有氢基或2~10个碳原子的链烯基的硅氧烷单体,选自ViMe2SiOEt、(CH2=CH-CH2)2MeSiOEt、(CH2=CH-CH2)Me2SiOEt、 (CH2=CH-CH2)3SiOEt、(CH2=CHMeCOOC3H6)SiMe2OEt、ViMe2SiCl、ViMePhSiCl、 (CH2=CH-CH2)3SiCl、(CH2=CH-CH2)2MeSiCl、(CH2=CH-CH2)Me2SiCl、 (CH2=CH(CH2)4)Me2SiCl、(CH2=CH(CH2)6)Me2SiCl、HMe2SiCl、 (CH2=CHMeCOOC3H6)SiMe2Cl、HMe2SiCl、HMe2SiOEt中的一种或几种。
优选的,所述含硫杂环基团中其他原子均为碳原子。更优选的,所述含硫杂环基团为饱和的含硫杂环基团。更优选的,所述含硫杂环基团具有对称结构。
更优选的,所述含硫杂环单体为2,5-二羟基-1,4-二噻烷 1,5,9,13-四硫杂环十六烷-3,11-二醇乙烯二硫代缩醛1,3-二噻烷-2-甲酸1,3-二噻戊环-2-羧酸4-(1,3-二硫戊环)苯酚1,3-二噻戊环-2-基甲醇1,4-二硫螺[4.5]-8-癸醇1,4-二硫杂螺[4.4]壬-6-基甲醇中的一种或几种。
优选的,所述制备方法中,含硫杂环单体的物质的量与1mol含硫杂环单体所含羟基的物质的量的乘积,与硅烷单体的物质的量与1mol硅烷单体所含可水解基团的物质的量的乘积之比为1∶(1.05~1.2)。
优选的,所述酸性稳定剂为一元羧酸。更优选的,所述酸性稳定剂为二氯乙酸、三氯乙酸、2-丙炔酸、丙酮酸中的一种或几种。更优选的,所述酸性稳定剂为含硫杂环单体、硅烷单体质量之和的0.5%~5%。本发明通过加入酸性稳定剂可以对含硫杂环基团发挥稳定作用,有效抑制其在加热反应过程中发生的开环反应,从而降低产物的气味,提高反应产率。
优选的,所述有机溶剂为有机溶剂A和有机溶剂B的混合物,所述有机溶剂A为不溶或微溶于水,且沸点<100℃,为苯、氯仿、二氯甲烷、乙酸乙酯、石油醚、乙醚、戊烷、石脑油、环己烷、正己烷、四氯化碳、二氯乙烷、三氯乙烷、三乙胺、庚烷中的一种或几种;有机溶剂B能与水混溶,且沸点<100℃,为甲醇、乙醇、乙二醇二甲醚、异丙醇、丙酮、丁酮、四氢呋喃中的一种或几种。
优选的,所述有机溶剂A的用量为含硫杂环单体与硅烷单体质量之和的1~3 倍,有机溶剂B的用量为含硫杂环单体与硅烷单体质量之和的0.5~1倍。
所述催化剂的种类没有特殊限制,可选自常用的98%wt浓硫酸,37%wt浓盐酸、三氟甲烷磺酸或强酸性阳离子树脂中的一种或几种。所述催化剂的用量没有特殊限制,优选其用量为含硫杂环单体与硅烷单体质量之和的0.1%~0.5%。
优选的,所述水与硅烷单体的摩尔比为(0.5~0.8)∶1。
优选的,所述滴加水的速度为5~10滴/min。
本发明的制备方法中,进行所述反应后降温,然后进行中和,再经水洗、分离,得到纯化的改性硅烷。所述中和使用的中和剂以及水洗、分离操作没有特殊限制,中和剂为碳酸钠、碳酸氢钠或六甲基二硅氮烷。
优选的,所述分离是通过旋蒸除去溶剂,旋蒸过程温度为60~70℃,压强为 -0.095~-0.1MPa。
优选的,所述的分离的方法包括旋蒸除去溶剂后进行柱层析分离提纯。
本发明制备的对称环硫改性硅烷相比于直连状的含硫硅烷,在提高折射率和透光率的情况下,对铂金的催化活性影响较小,利于应用。
本发明的有益效果是:
现有含硫硅烷的制备是通过低温条件下的格氏反应制备,由于需要超低温的反应条件因而难以实现工业化,而采用现有技术中的酸催化水解缩合反应由于加热以及酸催化条件下含硫杂环容易发生开环,易形成气味更大的单体或基团而发生变质,并使改性硅烷气味大、储存不稳定。本发明的制备方法通过在反应过程中加入有机酸对含硫杂环进行稳定处理,防止含硫杂环开环,减小气味,提高产率,制得的含硫杂环改性硅烷可以用作有机硅材料的添加剂或合成原料,以及作为封装材料的组分,提高产品的透光率,制备工艺相对现有工艺具有反应条件温和、操作简单、易于工业化,以及产品产率高、气味小、利于应用的优点。
具体实施方式
本发明可通过如下的实施例进一步的说明,但实施例不是对本发明保护范围的限制。下述实施例中,Me表示甲基,Vi表示乙烯基,Et表示乙基。
实施例1
在装有冷凝管、氮气进口和恒压漏斗的四口瓶中加入2,5-二羟基-1,4-二噻烷76.10g(0.50mol)、ViMe2SiOEt 143.29g(1.1mol)、乙酸乙酯438.78g、乙醇175.51g 搅拌40min,加入二氯乙酸6.60g(0.051mol,PKa=1.48)及质量百分数为37%的浓盐酸1.76g(0.018mol),搅拌10min,加入蒸馏水13.86g(0.77mol)于恒压漏斗中滴入反应体系中,在100℃反应25h,降温至室温,加入碳酸氢铵7.52g (0.095mol),搅拌45min,用去离子水水洗2遍,分层,取油层,过滤,在60℃、 -0.095MPa下旋蒸60min,经柱层析(正己烷/乙酸乙酯=15/1)分离提纯,得到改性硅烷。
实施例2
在装有冷凝管、氮气进口和恒压漏斗的四口瓶中加入4-(1,3-二硫戊环)苯酚198.30g(1.00mol)、(CH2=CH-CH2)2MeSiOEt 180.2g(1.06mol)、环己烷378.50g、甲醇227.10g搅拌30min,加入丙酮酸3.78g(0.043mol,PKa=2.39)及质量分数为37%的浓盐酸3.78g(0.037mol),搅拌20min,加蒸馏水11.45g(0.64mol) 于恒压漏斗中滴入反应体系中,在105℃反应35h,降温至室温,加入碳酸氢铵 9.50g(0.12mol)搅拌35min,用去离子水水洗2遍,分层,取油层,过滤,在 70℃、-0.095MPa下旋蒸30min,经柱层析(石油醚/甲醇=15/1)分离提纯,得到改性硅烷。
实施例3
在装有冷凝管、氮气进口和恒压漏斗的四口瓶中加入1,3-二噻戊环-2-基甲醇136.24g(1.00mol)、CH2=CH-CH2Me2SiOEt 156.68g(1.09mol)、苯732.29g、异丙醇292.18g搅拌20min,加入二氯乙酸14.65g(0.114mol,PKa=1.48)及三氟甲烷磺酸1.46g(0.01mol),搅拌25min,加入蒸馏水15.70g(0.87mol)于恒压漏斗中滴入反应体系中,在100℃反应30h,降温至室温,加入碳酸氢铵12.76g (0.16mol),搅拌60min,用去离子水水洗2遍,分层,取油层,过滤,在60℃、 -0.095MPa下旋蒸90min,经柱层析(石油醚/甲醇=15/1)分离提纯,得到改性硅烷。
实施例4
在装有冷凝管、氮气进口和恒压漏斗的四口瓶中加入1,4-二硫螺[4.5]-8-癸醇190.33g(1mol)、(CH2=CH-CH2)3SiOEt 231.28g(1.18mol)、二氯甲烷579.50g、丁酮225.67g搅拌35min.加入2-丙炔酸7.73g(0.11mol,PKa=1.84)及浓硫酸 1.35g(0.014mol),搅拌15min,加入蒸馏水10.80g(0.6mol)于恒压漏斗中滴入反应体系中,在110℃反应20h,降温至室温,加入碳酸氢铵15.88g(0.20mol),搅拌50min,用去离子水水洗2遍,分层,取油层,过滤,在65℃、-0.095MPa 下旋蒸120min,经柱层析(正己烷/乙酸乙酯=15/1)分离提纯,得到改性硅烷。
实施例5
在装有冷凝管、氮气进口和恒压漏斗的四口瓶中加入乙烯二硫代缩醛51.27g(0.2mol)、CH2=CHMeCOOC3H6SiMe2OEt 265.20g(1.2mol)、石油醚474.70g、四氢呋喃189.90g和乙醇94.94g搅拌25min,加入三氯乙酸12.70g(0.078mol,PKa=0.7)及三氟甲烷磺酸1.42g(0.01mol),搅拌30min,加入蒸馏水17.28g (0.96mol)于恒压漏斗中滴入反应体系中,在110℃反应28h,降温至室温,加入碳酸氢铵21.16g(0.27mol)搅拌35min后,用去离子水水洗2遍,分层,取油层,过滤,在65℃、-0.095MPa下旋蒸100min,经柱层析(正己烷/乙酸乙酯=15/1)分离纯化,得到改性硅烷。
实施例6
在装有冷凝管、氮气进口和恒压漏斗的四口瓶中加入2,5-二羟基-1,4-二噻烷76.10g(0.50mol)、HMe2SiOEt 114.4g(1.1mol)、乙酸乙酯438.78g、乙醇175.51g 搅拌40min,加入二氯乙酸6.60g(0.051mol,PKa=1.48)及质量分数为37%的浓盐酸1.76g(0.018mol),搅拌10min,加入蒸馏水13.86g(0.77mol)于恒压漏斗中滴入反应体系中,在90℃反应30h,降温至室温,加入碳酸氢铵7.52g (0.095mol)搅拌45min,用去离子水水洗2遍,分层,取油层,过滤,在60℃、 -0.095MPa下旋蒸60min,经柱层析(正己烷/乙酸乙酯=15/1)分离纯化,得到改性硅烷。
对比例
在装有冷凝管、氮气进口和恒压漏斗的四口瓶中加入2,5-二羟基-1,4-二噻烷76.10g(0.50mol)、ViMe2SiOEt 143.29g(1.1mol)、乙酸乙酯438.78g、乙醇 175.51g搅拌40min,加入质量百分数为37%的浓盐酸1.76g(0.018mol),搅拌 10min,加入蒸馏水13.86g(0.77mol)于恒压漏斗中滴入反应体系中,在90℃的温度下反应25h,降温至室温,加入碳酸氢铵7.52g(0.095mol)于反应体系中,搅拌45min,去离子水水洗2遍,分层,取油层,过滤,在60℃、-0.095MPa 下旋蒸60min,经柱层析(正己烷/乙酸乙酯=15/1)分离纯化,得到对比的改性硅烷。
测试实施例
对实施例1~6及对比例制备的改性硅烷进行性能测试:
1、加德纳色度:按照GB/T 22295-2008测试;
2、臭气强度:按照GB/T 14675测试;
3、折射率:按GB/T 6488-2008测试;
4、透光率:在25℃下,将样品装入1cm规格的吸收池中,用紫外可见分光光度计测试其在波长405nm的透光率。
测试数据见表1。
表1
测试项目 | 实施例1 | 实施例2 | 实施例3 | 实施例4 | 实施例5 | 实施例6 | 对比例 |
加德纳色度 | 1 | 1 | 1 | 1 | 1 | 1 | 2 |
臭气强度 | 1 | 0 | 1 | 0 | 0 | 1 | 5 |
折射率 | 1.6530 | 1.6450 | 1.6580 | 1.6620 | 1.6320 | 1.6510 | 1.6830 |
透光率/% | 96 | 96 | 95 | 96 | 95 | 95 | 93 |
由表2数据可知,本发明制备的改性硅烷的气味较小,折射率高,透光率高,可应用于LED等光学材料上,且制备方法简单,具有很好的工业化前景。
另考察实施例1-6及对比例制备的改性硅烷对铂金催化剂活性的影响,测试方法参考文献:《氧化石墨负载铂配合物的制备及其催化烯烃硅氢加成反应的性能研究》,硕士论文,南昌大学,饶福原。具体是分别在烧杯中加入200g基胶和2g实施例1-6及对比例制备的改性硅烷搅拌均匀,得到含硫基胶。其中基胶是由辛烯与三乙氧基氢硅烷按摩尔比1∶1混合并加入铂金催化剂(换算后Pt的用量为5ppm,催化剂为贺利氏卡斯特铂金催化剂ACS-Pt-50,含量5000ppm) 得到。
将含硫基胶各组分混合后加热至60℃反应1h,用气相色谱(GC)进行定量分析,分析结果由色谱数据处理软件按面积归一化法进行计算得到辛稀转化率和加成产物收率,计算方法参考:改性氯乙酰树脂负载铂催化剂的制备机器催化烯烃硅氢加成反应研究,硕士学位论文,杭州师范大学,张淑芳。
气相色谱(GC)定量分析使用日本岛津公司的GC-2010,采用25m×0.32 mm×0.5μm的Rtx-1毛细管柱,分流比为50∶1,柱箱升温程序为:50℃下稳定1min,然后以15℃/min的升温速率升至260℃,在260℃下保持10min。
数据见表2.
表2
测试项目 | 实施例1 | 实施例2 | 实施例3 | 实施例4 | 实施例5 | 实施例6 | 对比例 |
辛烯转化率/% | 47.2 | 47.8 | 48.2 | 47.5 | 48.3 | 47.6 | 8.7 |
加成产物收率% | 32.6 | 33.2 | 34.3 | 33.9 | 34.8 | 33.8 | 9.2 |
由表2数据可知,本发明制备的改性硅烷对铂金催化剂的中毒效应较弱,利于其在铂金催化剂催化固化的有机硅材料中应用。
最后应当说明的是,以上实施例仅用以说明本发明的技术方案而非对本发明保护范围的限制。本领域的技术人员应当理解,可以对本发明的技术方案进行若干推演或者等同替换,而不脱离本发明技术方案的实质和范围。
Claims (10)
1.一种高折射率改性硅烷,由包括以下步骤的方法制备:
将含硫杂环单体、硅烷单体与有机溶剂混合,加入酸性稳定剂及催化剂,搅拌条件下滴加水,然后升温反应,得到高折射率改性硅烷;所述酸性稳定剂为0≤PKa≤3.0的有机酸;
所述含硫杂环单体是具有至少一个含硫杂环基团、以及至少一个羟基的化合物,所述含硫杂环基团具有n个硫原子,n为2的整倍数;所述硅烷单体的结构式为:R2R3R4SiX,X为一价可水解官能基,R2、R3、R4选自氢基、2~10个碳原子的链烯基、(甲基)丙烯酸烷基酯基或不含脂肪族不饱和键的单价烃基。
2.如权利要求1所述的高折射率改性硅烷,其特征在于,所述升温反应的条件为升温至90~120℃反应18~36h。
3.如权利要求1所述的高折射率改性硅烷,其特征在于,所述含硫杂环基团中其他原子均为碳原子。
4.如权利要求2所述的高折射率改性硅烷,其特征在于,所述含硫杂环基团为饱和的含硫杂环基团。
5.如权利要求3所述的高折射率改性硅烷,其特征在于,所述含硫杂环基团具有对称结构。
6.如权利要求1-5任一项所述的高折射率改性硅烷,其特征在于,所述含硫杂环单体为2,5-二羟基-1,4-二噻烷1,5,9,13-四硫杂环十六烷-3,11-二醇乙烯二硫代缩醛1,3-二噻烷-2-甲酸1,3-二噻戊环-2-羧酸4-(1,3-二硫戊环)苯酚1,3-二噻戊环-2-基甲醇1,4-二硫螺[4.5]-8-癸醇1,4-二硫杂螺[4.4]壬-6-基甲醇中的一种或几种。
7.如权利要求1-5任一项所述的高折射率改性硅烷,其特征在于,所述制备方法中,含硫杂环单体的物质的量与1mol含硫杂环单体所含羟基的物质的量的乘积,与硅烷单体的物质的量与1mol硅烷单体所含可水解基团的物质的量的乘积之比为1∶(1.05~1.2)。
8.如权利要求1-5任一项所述的高折射率改性硅烷,其特征在于,所述酸性稳定剂为一元羧酸。
9.如权利要求8所述的高折射率改性硅烷,其特征在于,所述酸性稳定剂为二氯乙酸、三氯乙酸、2-丙炔酸、丙酮酸中的一种或几种。
10.如权利要求1-5任一项所述的高折射率改性硅烷,其特征在于,所述有机溶剂为有机溶剂A和有机溶剂B的混合物,所述有机溶剂A不溶或微溶于水,且沸点<100℃;有机溶剂B能与水混溶,且沸点<100℃。
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