CN107923042A - 金属镀层及其制备方法 - Google Patents
金属镀层及其制备方法 Download PDFInfo
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- CN107923042A CN107923042A CN201680051671.8A CN201680051671A CN107923042A CN 107923042 A CN107923042 A CN 107923042A CN 201680051671 A CN201680051671 A CN 201680051671A CN 107923042 A CN107923042 A CN 107923042A
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- Prior art keywords
- nano diamond
- metal
- detonation
- plating
- coating
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- JVVXZOOGOGPDRZ-SLFFLAALSA-N [(1R,4aS,10aR)-1,4a-dimethyl-7-propan-2-yl-2,3,4,9,10,10a-hexahydrophenanthren-1-yl]methanamine Chemical compound NC[C@]1(C)CCC[C@]2(C)C3=CC=C(C(C)C)C=C3CC[C@H]21 JVVXZOOGOGPDRZ-SLFFLAALSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
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- 238000004220 aggregation Methods 0.000 description 1
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- 125000004429 atom Chemical group 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- QDWJUBJKEHXSMT-UHFFFAOYSA-N boranylidynenickel Chemical compound [Ni]#B QDWJUBJKEHXSMT-UHFFFAOYSA-N 0.000 description 1
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- 150000007516 brønsted-lowry acids Chemical class 0.000 description 1
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- 238000001246 colloidal dispersion Methods 0.000 description 1
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- 229910001651 emery Inorganic materials 0.000 description 1
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- 230000007613 environmental effect Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 210000002615 epidermis Anatomy 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 231100000321 erythema Toxicity 0.000 description 1
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- 238000011049 filling Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
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- 238000005087 graphitization Methods 0.000 description 1
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
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- 229910052738 indium Inorganic materials 0.000 description 1
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- 230000003993 interaction Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000003879 lubricant additive Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000000320 mechanical mixture Substances 0.000 description 1
- 238000005374 membrane filtration Methods 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
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- 150000002738 metalloids Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
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- 231100000989 no adverse effect Toxicity 0.000 description 1
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- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
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- 229920003023 plastic Polymers 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000001485 positron annihilation lifetime spectroscopy Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 1
- 230000003334 potential effect Effects 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
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- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000001507 sample dispersion Methods 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
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- 230000002269 spontaneous effect Effects 0.000 description 1
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- 230000003746 surface roughness Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000000954 titration curve Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1662—Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1689—After-treatment
- C23C18/1692—Heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/52—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
- C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Chemically Coating (AREA)
- Carbon And Carbon Compounds (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/791,902 US9702045B2 (en) | 2015-07-06 | 2015-07-06 | Metallic coating and a method for producing the same |
FI20155534 | 2015-07-06 | ||
FI20155534A FI128327B (en) | 2015-07-06 | 2015-07-06 | METAL COATING AND PROCEDURES FOR ITS PREPARATION |
US14/791902 | 2015-07-06 | ||
PCT/FI2016/050501 WO2017005985A1 (en) | 2015-07-06 | 2016-07-05 | Metallic coating and a method for producing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
CN107923042A true CN107923042A (zh) | 2018-04-17 |
Family
ID=56413701
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201680051671.8A Pending CN107923042A (zh) | 2015-07-06 | 2016-07-05 | 金属镀层及其制备方法 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP3320126A1 (ja) |
JP (2) | JP2018526531A (ja) |
KR (1) | KR20180025959A (ja) |
CN (1) | CN107923042A (ja) |
WO (1) | WO2017005985A1 (ja) |
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CN109652845A (zh) * | 2019-01-18 | 2019-04-19 | 东华大学 | 一种石墨烯增强铬基复合镀层的制备方法 |
CN110344039A (zh) * | 2019-07-30 | 2019-10-18 | 暨南大学 | 一种在塑料表面制备银/纳米金刚石复合导电涂层的方法 |
CN110636693A (zh) * | 2018-06-21 | 2019-12-31 | 四川聚创石墨烯科技有限公司 | 一种利用复杂脉冲电镀石墨烯-金属复合材料镀层的方法和一种pcb及电机 |
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WO2017061246A1 (ja) * | 2015-10-08 | 2017-04-13 | 株式会社ダイセル | メッキ液からのナノダイヤモンド回収方法 |
JP6973242B2 (ja) * | 2018-03-30 | 2021-11-24 | 豊田合成株式会社 | 電気めっき浴、めっき製品の製造方法、及びめっき製品 |
KR102165361B1 (ko) * | 2019-01-08 | 2020-10-14 | 주식회사 아이엠기술 | 강건성이 요구되는 플라스틱 외형의 금속코팅방법 |
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JPWO2020246501A1 (ja) * | 2019-06-05 | 2020-12-10 | ||
JP7350307B2 (ja) * | 2019-10-30 | 2023-09-26 | 国立大学法人 名古屋工業大学 | Ag-グラフェン複合めっき膜金属製端子とその製造方法 |
JP7423051B2 (ja) * | 2020-02-12 | 2024-01-29 | 学校法人金沢工業大学 | 砥粒の製造方法 |
KR102688362B1 (ko) * | 2023-10-27 | 2024-07-24 | 조성강 | 강도 및 도금 효율성이 개선된 복합 크롬 다이아몬드 도금을 위한 전해질 용액 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0574587A4 (ja) * | 1991-12-25 | 1994-03-30 | Nauchno-Proizvodstvennoe Obiedinenie" Altai" | |
US6156390A (en) * | 1998-04-01 | 2000-12-05 | Wear-Cote International, Inc. | Process for co-deposition with electroless nickel |
EP1288162A2 (en) * | 2001-08-30 | 2003-03-05 | Fujimura, Tadamasa | Stable aqueous suspension liquid of finely divided diamond particles metallic film containing diamond particles and method of producing the same |
US20080127475A1 (en) * | 2006-05-01 | 2008-06-05 | Smith International, Inc. | Composite coating with nanoparticles for improved wear and lubricity in down hole tools |
EP2216642A1 (en) * | 2009-02-06 | 2010-08-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Surface plasmon resonance sensor |
CN102910626A (zh) * | 2012-11-07 | 2013-02-06 | 成都天成鑫钻纳米科技股份有限公司 | 一种爆轰制备纳米金刚石黑粉的工艺 |
WO2015092142A1 (en) * | 2013-12-19 | 2015-06-25 | Carbodeon Ltd Oy | Zeta positive amino-functionalized nanodiamond powder, zeta positive amino-functionalized nanodiamond dispersion, and methods producing the same |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100795166B1 (ko) | 2006-04-27 | 2008-01-16 | 백승룡 | 나노다이아몬드 분말액을 이용한 복합무전해도금방법 |
US20110165433A1 (en) * | 2010-01-06 | 2011-07-07 | General Electric Company | Erosion and corrosion resistant coating system for compressor |
JP5435477B2 (ja) | 2010-01-22 | 2014-03-05 | アイテック株式会社 | ダイヤモンド微粒子を分散させた複合めっき液及びその製造方法 |
JP2013108598A (ja) * | 2011-11-24 | 2013-06-06 | Nihon Mekki Industry Co Ltd | 摺動部品及びその製造方法 |
FI126428B (fi) * | 2013-05-31 | 2016-11-30 | Carbodeon Ltd Oy | Zeta-positiivinen hydrogenoitu nanotimanttijauhe, zeta-positiivinen hydrogenoitu nanotimanttidispersio, ja menetelmät niiden valmistamiseksi |
-
2016
- 2016-07-05 CN CN201680051671.8A patent/CN107923042A/zh active Pending
- 2016-07-05 KR KR1020187003557A patent/KR20180025959A/ko not_active Application Discontinuation
- 2016-07-05 WO PCT/FI2016/050501 patent/WO2017005985A1/en active Application Filing
- 2016-07-05 JP JP2018500495A patent/JP2018526531A/ja active Pending
- 2016-07-05 EP EP16739196.0A patent/EP3320126A1/en active Pending
-
2021
- 2021-08-20 JP JP2021134696A patent/JP2021179015A/ja active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0574587A4 (ja) * | 1991-12-25 | 1994-03-30 | Nauchno-Proizvodstvennoe Obiedinenie" Altai" | |
US6156390A (en) * | 1998-04-01 | 2000-12-05 | Wear-Cote International, Inc. | Process for co-deposition with electroless nickel |
EP1288162A2 (en) * | 2001-08-30 | 2003-03-05 | Fujimura, Tadamasa | Stable aqueous suspension liquid of finely divided diamond particles metallic film containing diamond particles and method of producing the same |
US20080127475A1 (en) * | 2006-05-01 | 2008-06-05 | Smith International, Inc. | Composite coating with nanoparticles for improved wear and lubricity in down hole tools |
EP2216642A1 (en) * | 2009-02-06 | 2010-08-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Surface plasmon resonance sensor |
CN102910626A (zh) * | 2012-11-07 | 2013-02-06 | 成都天成鑫钻纳米科技股份有限公司 | 一种爆轰制备纳米金刚石黑粉的工艺 |
WO2015092142A1 (en) * | 2013-12-19 | 2015-06-25 | Carbodeon Ltd Oy | Zeta positive amino-functionalized nanodiamond powder, zeta positive amino-functionalized nanodiamond dispersion, and methods producing the same |
Non-Patent Citations (1)
Title |
---|
汪旭光: "《爆破设计与施工》", 30 November 2012, 冶金工业出版社 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110636693A (zh) * | 2018-06-21 | 2019-12-31 | 四川聚创石墨烯科技有限公司 | 一种利用复杂脉冲电镀石墨烯-金属复合材料镀层的方法和一种pcb及电机 |
CN109536936A (zh) * | 2018-12-29 | 2019-03-29 | 河南联合精密材料股份有限公司 | 一种金刚石复合磁性磨料及其制备方法、金刚石复合磁性磨料用化学镀液 |
CN109536936B (zh) * | 2018-12-29 | 2021-01-22 | 河南联合精密材料股份有限公司 | 一种金刚石复合磁性磨料及其制备方法、金刚石复合磁性磨料用化学镀液 |
CN109652845A (zh) * | 2019-01-18 | 2019-04-19 | 东华大学 | 一种石墨烯增强铬基复合镀层的制备方法 |
CN110344039A (zh) * | 2019-07-30 | 2019-10-18 | 暨南大学 | 一种在塑料表面制备银/纳米金刚石复合导电涂层的方法 |
CN111621820A (zh) * | 2020-05-26 | 2020-09-04 | 珠海冠宇电池股份有限公司 | 一种高耐磨防静电卷针及其制备方法 |
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JP2018526531A (ja) | 2018-09-13 |
WO2017005985A1 (en) | 2017-01-12 |
EP3320126A1 (en) | 2018-05-16 |
JP2021179015A (ja) | 2021-11-18 |
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