CN107833918B - 半导体装置 - Google Patents

半导体装置 Download PDF

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Publication number
CN107833918B
CN107833918B CN201710377223.3A CN201710377223A CN107833918B CN 107833918 B CN107833918 B CN 107833918B CN 201710377223 A CN201710377223 A CN 201710377223A CN 107833918 B CN107833918 B CN 107833918B
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CN
China
Prior art keywords
insulating
semiconductor region
insulating portion
electrode
semiconductor device
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CN201710377223.3A
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English (en)
Chinese (zh)
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CN107833918A (zh
Inventor
下村纱矢
加藤浩朗
小林研也
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Toshiba Corp
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Toshiba Corp
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/177—Base regions of bipolar transistors, e.g. BJTs or IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66—Vertical DMOS [VDMOS] FETs
    • H10D30/668—Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/113—Isolations within a component, i.e. internal isolations
    • H10D62/115—Dielectric isolations, e.g. air gaps
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126—Top-view geometrical layouts of the regions or the junctions
    • H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/128—Anode regions of diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/111—Field plates
    • H10D64/117—Recessed field plates, e.g. trench field plates or buried field plates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/101—Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
    • H10D84/141—VDMOS having built-in components
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/101—Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
    • H10D84/141—VDMOS having built-in components
    • H10D84/143—VDMOS having built-in components the built-in components being PN junction diodes
    • H10D84/144—VDMOS having built-in components the built-in components being PN junction diodes in antiparallel diode configurations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401—Combinations of FETs or IGBTs with BJTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00—Diodes
    • H10D8/411—PN diodes having planar bodies

Landscapes

  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
CN201710377223.3A 2016-09-15 2017-05-25 半导体装置 Active CN107833918B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-180766 2016-09-15
JP2016180766A JP6677613B2 (ja) 2016-09-15 2016-09-15 半導体装置

Publications (2)

Publication Number Publication Date
CN107833918A CN107833918A (zh) 2018-03-23
CN107833918B true CN107833918B (zh) 2021-03-16

Family

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Family Applications (1)

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CN201710377223.3A Active CN107833918B (zh) 2016-09-15 2017-05-25 半导体装置

Country Status (3)

Country Link
US (1) US10529805B2 (enExample)
JP (1) JP6677613B2 (enExample)
CN (1) CN107833918B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6926012B2 (ja) 2018-02-14 2021-08-25 株式会社東芝 半導体装置
JP7224979B2 (ja) * 2019-03-15 2023-02-20 株式会社東芝 半導体装置
JP7242485B2 (ja) * 2019-09-13 2023-03-20 株式会社東芝 半導体装置
CN115053352A (zh) * 2020-02-07 2022-09-13 罗姆股份有限公司 半导体装置
JP7566609B2 (ja) * 2020-12-11 2024-10-15 株式会社東芝 半導体装置
JP7506628B2 (ja) 2021-03-24 2024-06-26 株式会社東芝 半導体装置
CN117558748B (zh) * 2023-09-04 2024-07-30 杭州芯迈半导体技术有限公司 一种沟槽型半导体功率器件及版图

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005286042A (ja) * 2004-03-29 2005-10-13 Toyota Motor Corp 絶縁ゲート型半導体装置およびその製造方法
CN105122457A (zh) * 2013-03-31 2015-12-02 新电元工业株式会社 半导体装置
CN105431949A (zh) * 2014-07-11 2016-03-23 新电元工业株式会社 半导体装置以及半导体装置的制造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4764998B2 (ja) 2003-11-14 2011-09-07 富士電機株式会社 半導体装置
JP5048273B2 (ja) 2006-05-10 2012-10-17 オンセミコンダクター・トレーディング・リミテッド 絶縁ゲート型半導体装置
JP6037499B2 (ja) * 2011-06-08 2016-12-07 ローム株式会社 半導体装置およびその製造方法
JP5701913B2 (ja) * 2013-01-09 2015-04-15 トヨタ自動車株式会社 半導体装置
JP6271155B2 (ja) * 2013-05-21 2018-01-31 株式会社東芝 半導体装置
JP5842896B2 (ja) * 2013-11-12 2016-01-13 トヨタ自動車株式会社 半導体装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005286042A (ja) * 2004-03-29 2005-10-13 Toyota Motor Corp 絶縁ゲート型半導体装置およびその製造方法
CN105122457A (zh) * 2013-03-31 2015-12-02 新电元工业株式会社 半导体装置
CN105431949A (zh) * 2014-07-11 2016-03-23 新电元工业株式会社 半导体装置以及半导体装置的制造方法

Also Published As

Publication number Publication date
US20180076307A1 (en) 2018-03-15
CN107833918A (zh) 2018-03-23
JP6677613B2 (ja) 2020-04-08
JP2018046201A (ja) 2018-03-22
US10529805B2 (en) 2020-01-07

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