CN107408417B - 双重弯曲x射线聚光元件及其结构体、双重弯曲x射线分光元件及其结构体的制造方法 - Google Patents
双重弯曲x射线聚光元件及其结构体、双重弯曲x射线分光元件及其结构体的制造方法 Download PDFInfo
- Publication number
- CN107408417B CN107408417B CN201680018150.2A CN201680018150A CN107408417B CN 107408417 B CN107408417 B CN 107408417B CN 201680018150 A CN201680018150 A CN 201680018150A CN 107408417 B CN107408417 B CN 107408417B
- Authority
- CN
- China
- Prior art keywords
- double curvature
- ray
- glass plate
- mentioned
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 97
- 239000011521 glass Substances 0.000 claims abstract description 139
- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims description 141
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 67
- 230000003746 surface roughness Effects 0.000 claims description 48
- 238000002360 preparation method Methods 0.000 claims description 7
- 230000009977 dual effect Effects 0.000 description 18
- 238000002441 X-ray diffraction Methods 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 7
- 239000007767 bonding agent Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 239000012188 paraffin wax Substances 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 230000005260 alpha ray Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 208000037805 labour Diseases 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
- G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/315—Accessories, mechanical or electrical features monochromators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015063764A JP6069609B2 (ja) | 2015-03-26 | 2015-03-26 | 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法 |
| JP2015-063764 | 2015-03-26 | ||
| PCT/JP2016/059266 WO2016152940A1 (ja) | 2015-03-26 | 2016-03-23 | 二重湾曲ｘ線集光素子、二重湾曲ｘ線分光素子およびそれを備える装置ならびにその素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107408417A CN107408417A (zh) | 2017-11-28 |
| CN107408417B true CN107408417B (zh) | 2019-06-21 |
Family
ID=56977439
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201680018150.2A Active CN107408417B (zh) | 2015-03-26 | 2016-03-23 | 双重弯曲x射线聚光元件及其结构体、双重弯曲x射线分光元件及其结构体的制造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10175185B2 (enExample) |
| EP (1) | EP3276630B1 (enExample) |
| JP (1) | JP6069609B2 (enExample) |
| CN (1) | CN107408417B (enExample) |
| WO (1) | WO2016152940A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6069609B2 (ja) * | 2015-03-26 | 2017-02-01 | 株式会社リガク | 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法 |
| US10677744B1 (en) * | 2016-06-03 | 2020-06-09 | U.S. Department Of Energy | Multi-cone x-ray imaging Bragg crystal spectrometer |
| EP3603516A1 (de) * | 2018-08-02 | 2020-02-05 | Siemens Healthcare GmbH | Röntgenvorrichtung und verfahren zum betrieb der röntgenvorrichtung |
| US11605478B2 (en) * | 2019-11-22 | 2023-03-14 | Zygo Corporation | Method of reducing roughness and/or defects on an optical surface and mirror formed by same |
| US12062465B2 (en) * | 2022-08-19 | 2024-08-13 | Uchicago Argonne, Llc | System and method for bending crystal wafers for use in high resolution analyzers |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103057122A (zh) * | 2012-12-19 | 2013-04-24 | 青岛宙庆工业设计有限公司 | 一种制备双曲面亚克力玻璃的方法 |
Family Cites Families (88)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4203034A (en) * | 1978-06-01 | 1980-05-13 | University Of Florida Board Of Regents | Diffraction camera for imaging penetrating radiation |
| US4807268A (en) * | 1983-11-04 | 1989-02-21 | University Of Southern California | Scanning monochrometer crystal and method of formation |
| US4599741A (en) * | 1983-11-04 | 1986-07-08 | USC--Dept. of Materials Science | System for local X-ray excitation by monochromatic X-rays |
| JPH0755841B2 (ja) * | 1987-02-03 | 1995-06-14 | 旭硝子株式会社 | 合せガラス用ガラス板の曲げ加工方法 |
| JPH0833497B2 (ja) * | 1987-03-25 | 1996-03-29 | 株式会社島津製作所 | Ｘ線湾曲結晶 |
| NL8801019A (nl) * | 1988-04-20 | 1989-11-16 | Philips Nv | Roentgen spectrometer met dubbel gebogen kristal. |
| JP2727745B2 (ja) * | 1989-08-24 | 1998-03-18 | 旭硝子株式会社 | 曲げ合せガラス及び合せガラス用素板ガラスの曲げ加工方法 |
| JPH03131539A (ja) * | 1989-10-17 | 1991-06-05 | Asahi Glass Co Ltd | 曲げ成型用プレス型とガラス板の曲げ成型方法及びその装置 |
| US5127028A (en) * | 1990-08-01 | 1992-06-30 | Wittry David B | Diffractord with doubly curved surface steps |
| US5164975A (en) * | 1991-06-13 | 1992-11-17 | The United States Of America As Represented By The United States Department Of Energy | Multiple wavelength X-ray monochromators |
| JPH08201593A (ja) | 1995-01-26 | 1996-08-09 | Nikon Corp | 非球面反射光学素子 |
| JPH08201589A (ja) | 1995-01-26 | 1996-08-09 | Nikon Corp | Ｘ線分光素子 |
| JPH10502741A (ja) * | 1995-04-26 | 1998-03-10 | フィリップス エレクトロニクス ネムローゼ フェンノートシャップ | Ｘ線分析装置用のｘ線光学素子の製造方法 |
| JP3705504B2 (ja) * | 1995-10-24 | 2005-10-12 | 株式会社アサヒオプティカル | 眼鏡用樹脂レンズの注型成形用モールド |
| DE69727370T2 (de) * | 1997-06-11 | 2004-12-09 | Istituto Nazionale Di Fisica Nucleare | Mehrstufiger Diffraktor hergestellt mit konstantem Stufenbreite Winkel (mehrstufiger Monochromator) |
| US5923720A (en) * | 1997-06-17 | 1999-07-13 | Molecular Metrology, Inc. | Angle dispersive x-ray spectrometer |
| US5892809A (en) * | 1997-09-10 | 1999-04-06 | Wittry; David B. | Simplified system for local excitation by monochromatic x-rays |
| DE19833524B4 (de) * | 1998-07-25 | 2004-09-23 | Bruker Axs Gmbh | Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel |
| US6285506B1 (en) * | 1999-01-21 | 2001-09-04 | X-Ray Optical Systems, Inc. | Curved optical device and method of fabrication |
| US6498830B2 (en) * | 1999-02-12 | 2002-12-24 | David B. Wittry | Method and apparatus for fabricating curved crystal x-ray optics |
| US6236710B1 (en) * | 1999-02-12 | 2001-05-22 | David B. Wittry | Curved crystal x-ray optical device and method of fabrication |
| USRE41220E1 (en) * | 1999-07-22 | 2010-04-13 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| JP2001057328A (ja) * | 1999-08-18 | 2001-02-27 | Nikon Corp | 反射マスク、露光装置および集積回路の製造方法 |
| US6381303B1 (en) * | 1999-09-29 | 2002-04-30 | Jordan Valley Applied Radiation Ltd. | X-ray microanalyzer for thin films |
| US6317483B1 (en) * | 1999-11-29 | 2001-11-13 | X-Ray Optical Systems, Inc. | Doubly curved optical device with graded atomic planes |
| US6606371B2 (en) * | 1999-12-20 | 2003-08-12 | Agere Systems Inc. | X-ray system |
| US6697454B1 (en) * | 2000-06-29 | 2004-02-24 | X-Ray Optical Systems, Inc. | X-ray analytical techniques applied to combinatorial library screening |
| US6829327B1 (en) * | 2000-09-22 | 2004-12-07 | X-Ray Optical Systems, Inc. | Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic |
| ES2271277T3 (es) * | 2001-06-19 | 2007-04-16 | X-Ray Optical Systems, Inc. | Sistema xrf dispersivo de longitud de onda que usa optica de enfoque para la excitacion y un monocromador de enfoque para la recogida. |
| WO2003049510A2 (en) * | 2001-12-04 | 2003-06-12 | X-Ray Optical Systems, Inc. | X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof |
| US6680996B2 (en) * | 2002-02-19 | 2004-01-20 | Jordan Valley Applied Radiation Ltd. | Dual-wavelength X-ray reflectometry |
| US6816570B2 (en) * | 2002-03-07 | 2004-11-09 | Kla-Tencor Corporation | Multi-technique thin film analysis tool |
| JP2005530170A (ja) * | 2002-06-19 | 2005-10-06 | グズノク | 光学アセンブリ及びその製造方法 |
| US7104690B2 (en) * | 2002-07-26 | 2006-09-12 | X-Ray Optical Systems, Inc. | Diagnosing system for an x-ray source assembly |
| EP1527461B1 (en) * | 2002-08-02 | 2010-11-10 | X-Ray Optical Systems, Inc. | An optical device for focusing x-rays having a plurality of curved optical crystals |
| US7763820B1 (en) * | 2003-01-27 | 2010-07-27 | Spectramet, Llc | Sorting pieces of material based on photonic emissions resulting from multiple sources of stimuli |
| US20050011227A1 (en) * | 2003-03-26 | 2005-01-20 | Hoya Corporation | Method of preparation of lens |
| KR100556141B1 (ko) * | 2003-03-27 | 2006-03-03 | 호야 가부시키가이샤 | 마스크 블랭크용 유리 기판 제조 방법 및 마스크 블랭크제조 방법 |
| WO2004111624A2 (en) * | 2003-06-02 | 2004-12-23 | X-Ray Optical Systems, Inc. | Method and apparatus for implementing xanes analysis |
| WO2004113894A1 (en) * | 2003-06-17 | 2004-12-29 | X-Ray Optical Systems, Inc. | Moveable transparent barrier for x-ray analysis of a pressurized sample |
| JP2007501503A (ja) * | 2003-08-04 | 2007-01-25 | エックス−レイ オプティカル システムズ インコーポレーテッド | 管電力調節および遠隔較正を使用して出力安定性が向上したｘ線源アセンブリ |
| US7092843B2 (en) * | 2003-10-21 | 2006-08-15 | X-Ray Optical Systems, Inc. | Apparatus and method for suppressing insignificant variations in measured sample composition data, including data measured from dynamically changing samples using x-ray analysis techniques |
| US7298817B2 (en) * | 2003-12-01 | 2007-11-20 | X-Ray Optical Systems, Inc. | Portable and on-line arsenic analyzer for drinking water |
| WO2006022333A1 (ja) | 2004-08-27 | 2006-03-02 | Tohoku University | 曲率分布結晶レンズ、曲率分布結晶レンズを有するｘ線装置及び曲率分布結晶レンズの作製方法 |
| US7120228B2 (en) * | 2004-09-21 | 2006-10-10 | Jordan Valley Applied Radiation Ltd. | Combined X-ray reflectometer and diffractometer |
| US7076024B2 (en) * | 2004-12-01 | 2006-07-11 | Jordan Valley Applied Radiation, Ltd. | X-ray apparatus with dual monochromators |
| JP2006308487A (ja) * | 2005-04-28 | 2006-11-09 | Canon Inc | 多層膜反射鏡、該多層膜反射鏡の再利用方法、及びこれらの多層膜反射鏡による露光装置 |
| US7415096B2 (en) * | 2005-07-26 | 2008-08-19 | Jordan Valley Semiconductors Ltd. | Curved X-ray reflector |
| US7583789B1 (en) * | 2005-08-01 | 2009-09-01 | The Research Foundation Of State University Of New York | X-ray imaging systems employing point-focusing, curved monochromating optics |
| US7991116B2 (en) * | 2005-08-04 | 2011-08-02 | X-Ray Optical Systems, Inc. | Monochromatic x-ray micro beam for trace element mapping |
| US7317784B2 (en) * | 2006-01-19 | 2008-01-08 | Broker Axs, Inc. | Multiple wavelength X-ray source |
| JP4997815B2 (ja) * | 2006-04-12 | 2012-08-08 | 旭硝子株式会社 | 高平坦かつ高平滑なガラス基板の作製方法 |
| JP2007285791A (ja) * | 2006-04-14 | 2007-11-01 | Rigaku Industrial Co | 湾曲ｘ線分光素子の製造方法ならびその湾曲ｘ線分光素子およびそれを用いるｘ線分析装置 |
| EP2097907B1 (en) * | 2006-11-16 | 2013-07-03 | X-ray Optical Systems, INC. | X-ray focusing optic having multiple layers with respective crystal orientations |
| US7440541B2 (en) * | 2006-12-27 | 2008-10-21 | Innov-X-Systems, Inc. | Dual source XRF system |
| JP2008175755A (ja) * | 2007-01-22 | 2008-07-31 | Institute X-Ray Technologies Co Ltd | 分光結晶およびその製造方法 |
| EP2109134B1 (en) | 2007-01-25 | 2017-03-01 | Nikon Corporation | Optical element, exposure apparatus employing the optical element, and device manufacturing method |
| US7899154B2 (en) * | 2007-03-15 | 2011-03-01 | X-Ray Optical Systems, Inc. | Small spot and high energy resolution XRF system for valence state determination |
| ATE545858T1 (de) * | 2007-12-31 | 2012-03-15 | Xenocs S A | Röntgenstrahlvorrichtung |
| EP2260294A4 (en) * | 2008-02-25 | 2012-02-08 | X Ray Optical Sys Inc | SAMPLE MODULE WITH SAMPLE FLOWS WINDOW SPLIT, FOR X-RAY ANALYSIS SYSTEM |
| MX2010009713A (es) * | 2008-03-05 | 2011-03-29 | X Ray Optical Sys Inc | Sistema xrf teniendo bandas de energia de excitacion multiples en un paquete altamente alineado. |
| US7738630B2 (en) * | 2008-03-05 | 2010-06-15 | X-Ray Optical Systems, Inc. | Highly aligned x-ray optic and source assembly for precision x-ray analysis applications |
| US7590220B1 (en) * | 2008-03-10 | 2009-09-15 | General Electric Company | X-ray inspection and detection system and method |
| EP2263238B1 (en) * | 2008-04-11 | 2012-06-20 | Rigaku Innovative Technologies, Inc. | X-ray generator with polycapillary optic |
| JP5344123B2 (ja) * | 2008-07-18 | 2013-11-20 | 独立行政法人 宇宙航空研究開発機構 | Ｘ線反射体、ｘ線反射装置およびｘ線反射鏡作成方法 |
| US8058621B2 (en) * | 2009-10-26 | 2011-11-15 | General Electric Company | Elemental composition detection system and method |
| JP5538840B2 (ja) * | 2009-11-30 | 2014-07-02 | キヤノン株式会社 | Ｘ線モノクロメータ、その製造方法及びｘ線分光装置 |
| US9008271B2 (en) * | 2010-08-19 | 2015-04-14 | Convergent R.N.R. Ltd | System for X-ray irradiation of target volume |
| WO2012050620A1 (en) * | 2010-10-14 | 2012-04-19 | Caldera Pharmaceuticals, Inc. | Method for analysis using x-ray flourescence |
| BR112013024972A2 (pt) * | 2011-04-01 | 2017-03-21 | Asahi Glass Co Ltd | vidro laminado e seu processo de produção |
| US8557149B2 (en) * | 2011-04-08 | 2013-10-15 | Uchicago Argonne, Llc | System and method for implementing enhanced optics fabrication |
| WO2012177472A2 (en) * | 2011-06-20 | 2012-12-27 | X-Ray Optical Systems, Inc. | Online monitoring of contaminants in crude and heavy fuels, and refinery applications thereof |
| US8855809B2 (en) * | 2011-09-01 | 2014-10-07 | Spectramet, Llc | Material sorting technology |
| US9240254B2 (en) * | 2011-09-27 | 2016-01-19 | Revera, Incorporated | System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy |
| US9335280B2 (en) * | 2011-10-06 | 2016-05-10 | X-Ray Optical Systems, Inc. | Mobile transport and shielding apparatus for removable x-ray analyzer |
| WO2013121418A1 (en) * | 2012-02-13 | 2013-08-22 | Convergent R.N.R Ltd | Imaging-guided delivery of x-ray radiation |
| CN107424889A (zh) * | 2012-02-28 | 2017-12-01 | X射线光学系统公司 | 具有使用多材料x射线管阳极和单色光学装置产生的多激励能带的x射线分析器 |
| KR101477469B1 (ko) * | 2012-03-30 | 2014-12-29 | 호야 가부시키가이샤 | 마스크 블랭크용 기판, 다층 반사막 부착 기판, 투과형 마스크 블랭크, 반사형 마스크 블랭크, 투과형 마스크, 반사형 마스크 및 반도체 장치의 제조 방법 |
| JP6206901B2 (ja) * | 2012-12-14 | 2017-10-04 | 大学共同利用機関法人 高エネルギー加速器研究機構 | 散乱強度分布の測定方法及び測定装置 |
| US9740091B2 (en) * | 2013-07-22 | 2017-08-22 | Hoya Corporation | Substrate with multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method of manufacturing the same, and method of manufacturing a semiconductor device |
| KR20170120212A (ko) * | 2013-09-18 | 2017-10-30 | 호야 가부시키가이샤 | 반사형 마스크 블랭크 및 그 제조방법, 반사형 마스크 그리고 반도체 장치의 제조방법 |
| SG10201805079YA (en) * | 2013-09-27 | 2018-07-30 | Hoya Corp | Conductive film coated substrate, multilayer reflectivefilm coated substrate, reflective mask blank, reflectivemask, and semiconductor device manufacturing method |
| US9551677B2 (en) * | 2014-01-21 | 2017-01-24 | Bruker Jv Israel Ltd. | Angle calibration for grazing-incidence X-ray fluorescence (GIXRF) |
| US9666322B2 (en) * | 2014-02-23 | 2017-05-30 | Bruker Jv Israel Ltd | X-ray source assembly |
| US9594036B2 (en) * | 2014-02-28 | 2017-03-14 | Sigray, Inc. | X-ray surface analysis and measurement apparatus |
| US9823203B2 (en) * | 2014-02-28 | 2017-11-21 | Sigray, Inc. | X-ray surface analysis and measurement apparatus |
| TWI650607B (zh) * | 2014-10-21 | 2019-02-11 | 日商Ａｇｃ股份有限公司 | Euvl用附反射層之基板及其製造方法、以及euvl用反射型光罩基底及euvl用反射型光罩 |
| JP6069609B2 (ja) * | 2015-03-26 | 2017-02-01 | 株式会社リガク | 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法 |
-
2015
- 2015-03-26 JP JP2015063764A patent/JP6069609B2/ja active Active
-
2016
- 2016-03-23 WO PCT/JP2016/059266 patent/WO2016152940A1/ja not_active Ceased
- 2016-03-23 CN CN201680018150.2A patent/CN107408417B/zh active Active
- 2016-03-23 EP EP16768843.1A patent/EP3276630B1/en active Active
-
2017
- 2017-09-22 US US15/712,799 patent/US10175185B2/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103057122A (zh) * | 2012-12-19 | 2013-04-24 | 青岛宙庆工业设计有限公司 | 一种制备双曲面亚克力玻璃的方法 |
Non-Patent Citations (1)
| Title |
|---|
| 《红外玻璃的微压印研究》;刘君娥;《中国优秀硕士学位论文全文数据库（电子期刊）》;20110415(第4期);第41-42页 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016183888A (ja) | 2016-10-20 |
| EP3276630A1 (en) | 2018-01-31 |
| EP3276630A4 (en) | 2018-08-01 |
| WO2016152940A1 (ja) | 2016-09-29 |
| CN107408417A (zh) | 2017-11-28 |
| EP3276630B1 (en) | 2019-06-26 |
| US20180011035A1 (en) | 2018-01-11 |
| JP6069609B2 (ja) | 2017-02-01 |
| US10175185B2 (en) | 2019-01-08 |
| WO2016152940A8 (ja) | 2017-08-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107408417B (zh) | 双重弯曲x射线聚光元件及其结构体、双重弯曲x射线分光元件及其结构体的制造方法 | |
| CN105074512B (zh) | 曲面衍射光栅、其制造方法以及光学装置 | |
| EP2860557B1 (en) | Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same | |
| US9761340B2 (en) | Method of preparing strain released strip-bent x-ray crystal analyzers | |
| JP2011056519A (ja) | 接合方法および接合体の製造方法 | |
| KR20080111573A (ko) | 무기안료의 단면 이미지 관찰을 위한 투과전자현미경용시편의 제조방법 | |
| CN112888983A (zh) | 用于超分辨率显微的镜头组件 | |
| Iwert et al. | First results from a novel curving process for large area scientific imagers | |
| JP5567135B2 (ja) | 積層鏡面プレートの組み立て方法 | |
| Rendler et al. | Modelling and verification of mechanical stress induced by soldering of wires for multi busbar interconnection | |
| Demirhan Aydin et al. | Wafer level vacuum packaging of MEMS-based uncooled infrared sensors | |
| Stout et al. | Mechanical characterization of plastic ball grid array package flexure using moire interferometry | |
| US12174360B2 (en) | Imaging mechanism and sample analyzing apparatus provided with the same | |
| Wu et al. | Process Parameters and Modeling Study of Thermosonic Flip Chip Bonding | |
| US8834988B2 (en) | Precision spacing for stacked wafer assemblies | |
| Reutlinger et al. | Glue test results for high-precision large cryogenic lens holder | |
| Farshchi Yazdi et al. | An experimental and numerical study on glass frit wafer-to-wafer bonding | |
| US7916397B2 (en) | Micro array lens using optical fiber | |
| US6244755B1 (en) | Method for aligning the optical fiber and laser of fiber-optic laser modules | |
| JP2020003361A (ja) | 検査冶具、半導体チップの検査方法、および半導体装置の製造方法 | |
| CN110243679B (zh) | 一种热双金属拉伸驱动器及其制备方法 | |
| CN109786495A (zh) | 超大规模凝视型红外探测器拼接基板及其制备方法 | |
| Jedamzik et al. | Dos and don’ts in mounting ZERODUR | |
| JP2003215140A (ja) | マイクロチップの製造方法 | |
| CN119374768B (zh) | 基于压力测量胶片的芯片粘接残余应力的测量结构和方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |