EP3276630A4 - Doubly bent x-ray focusing device, doubly bent x-ray spectroscopic device, apparatuses provided therewith, and methods for manufacturing the devices - Google Patents

Doubly bent x-ray focusing device, doubly bent x-ray spectroscopic device, apparatuses provided therewith, and methods for manufacturing the devices Download PDF

Info

Publication number
EP3276630A4
EP3276630A4 EP16768843.1A EP16768843A EP3276630A4 EP 3276630 A4 EP3276630 A4 EP 3276630A4 EP 16768843 A EP16768843 A EP 16768843A EP 3276630 A4 EP3276630 A4 EP 3276630A4
Authority
EP
European Patent Office
Prior art keywords
doubly bent
ray
manufacturing
methods
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP16768843.1A
Other languages
German (de)
French (fr)
Other versions
EP3276630B1 (en
EP3276630A1 (en
Inventor
Naoki Kawahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rigaku Denki Co Ltd
Rigaku Corp
Original Assignee
Rigaku Denki Co Ltd
Rigaku Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rigaku Denki Co Ltd, Rigaku Corp filed Critical Rigaku Denki Co Ltd
Publication of EP3276630A1 publication Critical patent/EP3276630A1/en
Publication of EP3276630A4 publication Critical patent/EP3276630A4/en
Application granted granted Critical
Publication of EP3276630B1 publication Critical patent/EP3276630B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/315—Accessories, mechanical or electrical features monochromators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Optical Elements Other Than Lenses (AREA)
EP16768843.1A 2015-03-26 2016-03-23 Method for manufacturing doubly bent x-ray focusing device or doubly bent x-ray spectroscopic device Active EP3276630B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015063764A JP6069609B2 (en) 2015-03-26 2015-03-26 Double-curved X-ray condensing element and its constituent, double-curved X-ray spectroscopic element and method for producing the constituent
PCT/JP2016/059266 WO2016152940A1 (en) 2015-03-26 2016-03-23 Doubly curved x-ray condenser element, doubly curved x-ray spectroscopic element and apparatus equipped with same, and method for manufacturing said elements

Publications (3)

Publication Number Publication Date
EP3276630A1 EP3276630A1 (en) 2018-01-31
EP3276630A4 true EP3276630A4 (en) 2018-08-01
EP3276630B1 EP3276630B1 (en) 2019-06-26

Family

ID=56977439

Family Applications (1)

Application Number Title Priority Date Filing Date
EP16768843.1A Active EP3276630B1 (en) 2015-03-26 2016-03-23 Method for manufacturing doubly bent x-ray focusing device or doubly bent x-ray spectroscopic device

Country Status (5)

Country Link
US (1) US10175185B2 (en)
EP (1) EP3276630B1 (en)
JP (1) JP6069609B2 (en)
CN (1) CN107408417B (en)
WO (1) WO2016152940A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6069609B2 (en) * 2015-03-26 2017-02-01 株式会社リガク Double-curved X-ray condensing element and its constituent, double-curved X-ray spectroscopic element and method for producing the constituent
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
EP3603516A1 (en) * 2018-08-02 2020-02-05 Siemens Healthcare GmbH X-ray equipment and method for operating same
US12062465B2 (en) * 2022-08-19 2024-08-13 Uchicago Argonne, Llc System and method for bending crystal wafers for use in high resolution analyzers

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010031034A1 (en) * 1999-02-12 2001-10-18 Wittry David B. Method and apparatus for fabricating curved crystal X-ray optics

Family Cites Families (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4203034A (en) * 1978-06-01 1980-05-13 University Of Florida Board Of Regents Diffraction camera for imaging penetrating radiation
US4599741A (en) * 1983-11-04 1986-07-08 USC--Dept. of Materials Science System for local X-ray excitation by monochromatic X-rays
US4807268A (en) * 1983-11-04 1989-02-21 University Of Southern California Scanning monochrometer crystal and method of formation
JPH0755841B2 (en) * 1987-02-03 1995-06-14 旭硝子株式会社 Bending method of glass plate for laminated glass
JPH0833497B2 (en) * 1987-03-25 1996-03-29 株式会社島津製作所 X-ray curved crystal
NL8801019A (en) * 1988-04-20 1989-11-16 Philips Nv ROENTGEN SPECTROMETER WITH DOUBLE-CURVED CRYSTAL.
JP2727745B2 (en) * 1989-08-24 1998-03-18 旭硝子株式会社 Bending method for bent laminated glass and raw glass for laminated glass
JPH03131539A (en) * 1989-10-17 1991-06-05 Asahi Glass Co Ltd Press mold for bending molding, bending molding of plate glass and device therefor
US5127028A (en) * 1990-08-01 1992-06-30 Wittry David B Diffractord with doubly curved surface steps
US5164975A (en) * 1991-06-13 1992-11-17 The United States Of America As Represented By The United States Department Of Energy Multiple wavelength X-ray monochromators
JPH08201593A (en) 1995-01-26 1996-08-09 Nikon Corp Non-spherical surface reflection optical element
JPH08201589A (en) 1995-01-26 1996-08-09 Nikon Corp X-ray spectroscopic element
EP0765472A2 (en) * 1995-04-26 1997-04-02 Koninklijke Philips Electronics N.V. Method of manufacturing an x-ray optical element for an x-ray analysis apparatus
JP3705504B2 (en) * 1995-10-24 2005-10-12 株式会社アサヒオプティカル Mold for molding resin lenses for eyeglasses
EP0884736B1 (en) * 1997-06-11 2004-01-28 Istituto Nazionale Di Fisica Nucleare Multi-stepped diffractor constructed with constant step width angle (multi-stepped monochromator)
US5923720A (en) * 1997-06-17 1999-07-13 Molecular Metrology, Inc. Angle dispersive x-ray spectrometer
US5892809A (en) * 1997-09-10 1999-04-06 Wittry; David B. Simplified system for local excitation by monochromatic x-rays
DE19833524B4 (en) * 1998-07-25 2004-09-23 Bruker Axs Gmbh X-ray analyzer with gradient multilayer mirror
US6285506B1 (en) * 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
US6236710B1 (en) * 1999-02-12 2001-05-22 David B. Wittry Curved crystal x-ray optical device and method of fabrication
JP3766802B2 (en) * 1999-07-22 2006-04-19 コーニング インコーポレイテッド Far-UV soft X-ray projection lithography system and lithography element
JP2001057328A (en) * 1999-08-18 2001-02-27 Nikon Corp Reflection mask, exposure apparatus, and manufacture of integrated circuit
US6381303B1 (en) * 1999-09-29 2002-04-30 Jordan Valley Applied Radiation Ltd. X-ray microanalyzer for thin films
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6606371B2 (en) * 1999-12-20 2003-08-12 Agere Systems Inc. X-ray system
US6697454B1 (en) * 2000-06-29 2004-02-24 X-Ray Optical Systems, Inc. X-ray analytical techniques applied to combinatorial library screening
US6829327B1 (en) * 2000-09-22 2004-12-07 X-Ray Optical Systems, Inc. Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic
EP1402541B1 (en) * 2001-06-19 2006-08-16 X-Ray Optical Systems, Inc. Wavelength dispersive xrf system using focusing optic for excitation and a focusing monochromator for collection
AU2002363962A1 (en) * 2001-12-04 2003-06-17 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof
US6680996B2 (en) * 2002-02-19 2004-01-20 Jordan Valley Applied Radiation Ltd. Dual-wavelength X-ray reflectometry
US6816570B2 (en) * 2002-03-07 2004-11-09 Kla-Tencor Corporation Multi-technique thin film analysis tool
EP1732087A3 (en) * 2002-06-19 2007-03-28 Xenocs Optical assemblage and associated device
US7104690B2 (en) * 2002-07-26 2006-09-12 X-Ray Optical Systems, Inc. Diagnosing system for an x-ray source assembly
WO2004013867A2 (en) * 2002-08-02 2004-02-12 X-Ray Optical Systems, Inc. An optical device for directing x-rays having a plurality of optical crystals
US7763820B1 (en) * 2003-01-27 2010-07-27 Spectramet, Llc Sorting pieces of material based on photonic emissions resulting from multiple sources of stimuli
US20050011227A1 (en) * 2003-03-26 2005-01-20 Hoya Corporation Method of preparation of lens
KR100556141B1 (en) * 2003-03-27 2006-03-03 호야 가부시키가이샤 Method of producing a glass substrate for a mask blank and method of producing a mask blank
CN1829910B (en) * 2003-06-02 2012-05-23 X射线光学系统公司 Method and apparatus for implement XANES analysis
WO2004113894A1 (en) * 2003-06-17 2004-12-29 X-Ray Optical Systems, Inc. Moveable transparent barrier for x-ray analysis of a pressurized sample
EP1661439A2 (en) * 2003-08-04 2006-05-31 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability using tube power adjustments and remote calibration
US7092843B2 (en) * 2003-10-21 2006-08-15 X-Ray Optical Systems, Inc. Apparatus and method for suppressing insignificant variations in measured sample composition data, including data measured from dynamically changing samples using x-ray analysis techniques
US7298817B2 (en) * 2003-12-01 2007-11-20 X-Ray Optical Systems, Inc. Portable and on-line arsenic analyzer for drinking water
JP4710022B2 (en) 2004-08-27 2011-06-29 国立大学法人東北大学 Curvature distribution crystal lens, X-ray apparatus having curvature distribution crystal lens, and method of manufacturing curvature distribution crystal lens
US7120228B2 (en) * 2004-09-21 2006-10-10 Jordan Valley Applied Radiation Ltd. Combined X-ray reflectometer and diffractometer
US7076024B2 (en) * 2004-12-01 2006-07-11 Jordan Valley Applied Radiation, Ltd. X-ray apparatus with dual monochromators
JP2006308487A (en) * 2005-04-28 2006-11-09 Canon Inc Multilayer film mirror, reuse method of multilayer film mirror, and exposure apparatus by multilayer film mirror
US7415096B2 (en) * 2005-07-26 2008-08-19 Jordan Valley Semiconductors Ltd. Curved X-ray reflector
CN101356589B (en) * 2005-08-01 2013-02-27 纽约州立大学研究基金会 X-ray imaging systems employing point-focusing, curved monochromating optics
US7991116B2 (en) * 2005-08-04 2011-08-02 X-Ray Optical Systems, Inc. Monochromatic x-ray micro beam for trace element mapping
US7317784B2 (en) * 2006-01-19 2008-01-08 Broker Axs, Inc. Multiple wavelength X-ray source
JP4997815B2 (en) * 2006-04-12 2012-08-08 旭硝子株式会社 Method for producing a highly flat and highly smooth glass substrate
JP2007285791A (en) * 2006-04-14 2007-11-01 Rigaku Industrial Co Concave x-ray spectral element, method for manufacturing the same and x-ray analyzer using the same
JP5315251B2 (en) * 2006-11-16 2013-10-16 エックス−レイ オプティカル システムズ インコーポレーテッド X-ray focusing optical system having multiple layers with respective crystal orientations and method of forming this optical system
US7440541B2 (en) * 2006-12-27 2008-10-21 Innov-X-Systems, Inc. Dual source XRF system
JP2008175755A (en) * 2007-01-22 2008-07-31 Institute X-Ray Technologies Co Ltd Dispersive crystal and its manufacturing method
JPWO2008090988A1 (en) * 2007-01-25 2010-05-20 株式会社ニコン Optical element, exposure apparatus using the same, and device manufacturing method
US7899154B2 (en) * 2007-03-15 2011-03-01 X-Ray Optical Systems, Inc. Small spot and high energy resolution XRF system for valence state determination
EP2075569B1 (en) * 2007-12-31 2012-02-15 Xenocs S.A. X-ray beam device
US8050382B2 (en) * 2008-02-25 2011-11-01 X-Ray Optical Systems, Inc. Sample module with sample stream spaced from window, for x-ray analysis system
US8559597B2 (en) * 2008-03-05 2013-10-15 X-Ray Optical Systems, Inc. XRF system having multiple excitation energy bands in highly aligned package
US7738630B2 (en) * 2008-03-05 2010-06-15 X-Ray Optical Systems, Inc. Highly aligned x-ray optic and source assembly for precision x-ray analysis applications
US7590220B1 (en) * 2008-03-10 2009-09-15 General Electric Company X-ray inspection and detection system and method
US7933383B2 (en) * 2008-04-11 2011-04-26 Rigaku Innovative Technologies, Inc. X-ray generator with polycapillary optic
JP5344123B2 (en) 2008-07-18 2013-11-20 独立行政法人 宇宙航空研究開発機構 X-ray reflector, X-ray reflector, and method for producing X-ray reflector
US8058621B2 (en) * 2009-10-26 2011-11-15 General Electric Company Elemental composition detection system and method
JP5538840B2 (en) * 2009-11-30 2014-07-02 キヤノン株式会社 X-ray monochromator, manufacturing method thereof, and X-ray spectrometer
WO2012023141A1 (en) * 2010-08-19 2012-02-23 Convergent Radiotherapy, Inc System for x-ray irradiation of target volume
WO2012050620A1 (en) * 2010-10-14 2012-04-19 Caldera Pharmaceuticals, Inc. Method for analysis using x-ray flourescence
CN103443045B (en) * 2011-04-01 2015-09-30 旭硝子株式会社 Laminated glass and manufacture method thereof
US8557149B2 (en) * 2011-04-08 2013-10-15 Uchicago Argonne, Llc System and method for implementing enhanced optics fabrication
WO2012177472A2 (en) * 2011-06-20 2012-12-27 X-Ray Optical Systems, Inc. Online monitoring of contaminants in crude and heavy fuels, and refinery applications thereof
WO2013033572A2 (en) * 2011-09-01 2013-03-07 Spectramet, Llc Material sorting technology
US9240254B2 (en) * 2011-09-27 2016-01-19 Revera, Incorporated System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy
US9335280B2 (en) * 2011-10-06 2016-05-10 X-Ray Optical Systems, Inc. Mobile transport and shielding apparatus for removable x-ray analyzer
WO2013121418A1 (en) * 2012-02-13 2013-08-22 Convergent R.N.R Ltd Imaging-guided delivery of x-ray radiation
WO2013130525A1 (en) * 2012-02-28 2013-09-06 X-Ray Optical Systems, Inc. X-ray analyzer having multiple excitation energy bands produced using multi-material x-ray tube anodes and monochromating optics
US9348217B2 (en) * 2012-03-30 2016-05-24 Hoya Corporation Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
JP6206901B2 (en) * 2012-12-14 2017-10-04 大学共同利用機関法人 高エネルギー加速器研究機構 Scattering intensity distribution measuring method and measuring apparatus
CN103057122A (en) * 2012-12-19 2013-04-24 青岛宙庆工业设计有限公司 Method for manufacturing double-curved surface acrylic glass
WO2015012151A1 (en) * 2013-07-22 2015-01-29 Hoya株式会社 Substrate with multilayered reflective film, reflective mask blank for euv lithography, reflective mask for euv lithography, process for producing same, and process for producing semiconductor device
TW201614363A (en) * 2013-09-18 2016-04-16 Hoya Corp Reflective mask blank and method for manufacturing same, reflective mask, and method for manufacturing semiconductor device
KR102127907B1 (en) * 2013-09-27 2020-06-29 호야 가부시키가이샤 Substrate provided with conductive film, substrate provided with multi-layer reflection film, reflective mask blank, reflective mask, and semiconductor device manufacturing method
US9551677B2 (en) * 2014-01-21 2017-01-24 Bruker Jv Israel Ltd. Angle calibration for grazing-incidence X-ray fluorescence (GIXRF)
US9666322B2 (en) * 2014-02-23 2017-05-30 Bruker Jv Israel Ltd X-ray source assembly
US9594036B2 (en) * 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) * 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
TWI650607B (en) * 2014-10-21 2019-02-11 日商Ａｇｃ股份有限公司 Substrate with reflective layer for euvl and process for its production, as well as reflective mask blank for euvl and reflective mask for euvl
JP6069609B2 (en) * 2015-03-26 2017-02-01 株式会社リガク Double-curved X-ray condensing element and its constituent, double-curved X-ray spectroscopic element and method for producing the constituent

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010031034A1 (en) * 1999-02-12 2001-10-18 Wittry David B. Method and apparatus for fabricating curved crystal X-ray optics

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
KRAMER M ET AL: "Design of a doubly-curved crystal to improve X-ray fluorescence analysis of aerosol particles", SPECTROCHIMICA ACTA. PART B: ATOMIC SPECTROSCOPY, NEW YORK, NY, US, US, vol. 63, no. 12, 1 December 2008 (2008-12-01), pages 1408 - 1414, XP025716726, ISSN: 0584-8547, [retrieved on 20081021], DOI: 10.1016/J.SAB.2008.10.013 *
See also references of WO2016152940A1 *

Also Published As

Publication number Publication date
US20180011035A1 (en) 2018-01-11
CN107408417A (en) 2017-11-28
EP3276630B1 (en) 2019-06-26
JP2016183888A (en) 2016-10-20
EP3276630A1 (en) 2018-01-31
US10175185B2 (en) 2019-01-08
JP6069609B2 (en) 2017-02-01
WO2016152940A1 (en) 2016-09-29
CN107408417B (en) 2019-06-21
WO2016152940A8 (en) 2017-08-31

Similar Documents

Publication Publication Date Title
EP3392689A4 (en) Imaging device component, and imaging device
EP3384881A4 (en) Irradiation device
EP3404169A4 (en) Gondola device
EP3188213A4 (en) Electron source, x-ray source and device using x-ray source
EP3627146A4 (en) X-ray spectrometer
EP3438646A4 (en) Imaging device, imaging method
EP3725408A4 (en) Photocatalytic device
EP3637960A4 (en) X-ray generation device
EP3287772A4 (en) X-ray inspection device, x-ray inspection method, and method for manufacturing structure
EP3477938A4 (en) Imaging device, imaging method, and program
EP3286991A4 (en) Compact x-ray imaging devices
EP3720116A4 (en) Imaging device, imaging method, and imaging element
EP3302266A4 (en) Devices, systems and methods for in-vivo immunoassay
EP3300114A4 (en) Imaging element, multilayer imaging element and imaging device
EP3301756A4 (en) Radiation device
EP3343596A4 (en) Purge device, purge stocker, and purge method
EP3731521A4 (en) Imaging device, imaging method, and imaging element
EP3336876A4 (en) X-ray tube, x-ray tube device, and method for manufacturing x-ray tube
EP3386460A4 (en) Oral device, assembly and method for the use thereof
AU2017230910B2 (en) An apparatus for receiving, spreading/extending and flattening
EP3096346A4 (en) Exposure apparatus, exposure method, and device manufacturing method
EP3356975A4 (en) Multi-active-axis, non-exoskeletal rehabilitation device
EP3128549A4 (en) Semiconductor device, layered semiconductor device, sealed-then-layered semiconductor device, and manufacturing methods therefor
EP3432065A4 (en) Comparison device
EP3679981A4 (en) Dysuria treatment device

Legal Events

Date Code Title Description
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE

PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20170922

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

DAV Request for validation of the european patent (deleted)
DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20180703

RIC1 Information provided on ipc code assigned before grant

Ipc: G21K 1/06 20060101AFI20180627BHEP

Ipc: G01N 23/223 20060101ALI20180627BHEP

Ipc: G01N 23/207 20180101ALI20180627BHEP

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

RIC1 Information provided on ipc code assigned before grant

Ipc: G01N 23/223 20060101ALI20190129BHEP

Ipc: G01N 23/207 20180101ALI20190129BHEP

Ipc: G21K 1/06 20060101AFI20190129BHEP

INTG Intention to grant announced

Effective date: 20190219

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 1149253

Country of ref document: AT

Kind code of ref document: T

Effective date: 20190715

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602016016019

Country of ref document: DE

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: NL

Ref legal event code: FP

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190926

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190927

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190926

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1149253

Country of ref document: AT

Kind code of ref document: T

Effective date: 20190626

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191028

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191026

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200320

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602016016019

Country of ref document: DE

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG2D Information on lapse in contracting state deleted

Ref country code: IS

26N No opposition filed

Effective date: 20200603

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20200331

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200323

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200331

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200323

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200331

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200331

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200331

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20200323

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200323

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190626

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20240214

Year of fee payment: 9

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20240130

Year of fee payment: 9