CN107359101B - 带电粒子射束产生器中的高电压屏蔽和冷却 - Google Patents

带电粒子射束产生器中的高电压屏蔽和冷却 Download PDF

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Publication number
CN107359101B
CN107359101B CN201710450157.8A CN201710450157A CN107359101B CN 107359101 B CN107359101 B CN 107359101B CN 201710450157 A CN201710450157 A CN 201710450157A CN 107359101 B CN107359101 B CN 107359101B
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configuration
charged particles
electrode
cooling
high voltage
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Chinese (zh)
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CN107359101A (zh
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A.H.V.范维恩
W.H.厄尔巴努斯
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ASML Netherlands BV
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ASML Netherlands BV
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0262—Shields electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0264—Shields magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Sources, Ion Sources (AREA)
CN201710450157.8A 2012-05-14 2013-05-14 带电粒子射束产生器中的高电压屏蔽和冷却 Active CN107359101B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261646839P 2012-05-14 2012-05-14
US61/646,839 2012-05-14
CN201380036065.5A CN104520968B (zh) 2012-05-14 2013-05-14 带电粒子光刻系统和射束产生器

Related Parent Applications (1)

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CN107359101A CN107359101A (zh) 2017-11-17
CN107359101B true CN107359101B (zh) 2019-07-12

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CN201710450157.8A Active CN107359101B (zh) 2012-05-14 2013-05-14 带电粒子射束产生器中的高电压屏蔽和冷却
CN201380036057.0A Pending CN104428866A (zh) 2012-05-14 2013-05-14 带电粒子光刻系统和射束产生器
CN201380036065.5A Active CN104520968B (zh) 2012-05-14 2013-05-14 带电粒子光刻系统和射束产生器

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CN201380036065.5A Active CN104520968B (zh) 2012-05-14 2013-05-14 带电粒子光刻系统和射束产生器

Country Status (8)

Country Link
US (2) US9653261B2 (https=)
EP (1) EP2852966A1 (https=)
JP (3) JP6239596B2 (https=)
KR (2) KR101961914B1 (https=)
CN (3) CN107359101B (https=)
NL (4) NL2010802C2 (https=)
TW (2) TWI604493B (https=)
WO (2) WO2013171214A1 (https=)

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Publication number Publication date
JP6219374B2 (ja) 2017-10-25
CN104520968B (zh) 2017-07-07
EP2852966A1 (en) 2015-04-01
TW201401331A (zh) 2014-01-01
JP2015516690A (ja) 2015-06-11
JP2018041964A (ja) 2018-03-15
WO2013171214A1 (en) 2013-11-21
US9653261B2 (en) 2017-05-16
KR20150010994A (ko) 2015-01-29
KR102023056B1 (ko) 2019-09-20
CN104428866A (zh) 2015-03-18
JP6239596B2 (ja) 2017-11-29
NL2013320C2 (en) 2015-06-15
KR101961914B1 (ko) 2019-03-25
US10037864B2 (en) 2018-07-31
US20150124229A1 (en) 2015-05-07
NL2013320A (en) 2014-11-24
TW201401330A (zh) 2014-01-01
NL2010797C2 (en) 2014-08-21
NL2013321A (en) 2014-11-06
NL2013321C2 (en) 2015-05-07
TWI604493B (zh) 2017-11-01
CN107359101A (zh) 2017-11-17
NL2010802A (en) 2013-11-18
JP6430606B2 (ja) 2018-11-28
KR20150010993A (ko) 2015-01-29
NL2010797A (en) 2013-11-18
CN104520968A (zh) 2015-04-15
JP2015517735A (ja) 2015-06-22
WO2013171229A1 (en) 2013-11-21
NL2010802C2 (en) 2014-08-25
US20170250053A1 (en) 2017-08-31

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