CN107219724B - 化学增幅型正型感光性有机绝缘膜树脂组合物及绝缘膜 - Google Patents

化学增幅型正型感光性有机绝缘膜树脂组合物及绝缘膜 Download PDF

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Publication number
CN107219724B
CN107219724B CN201710063148.3A CN201710063148A CN107219724B CN 107219724 B CN107219724 B CN 107219724B CN 201710063148 A CN201710063148 A CN 201710063148A CN 107219724 B CN107219724 B CN 107219724B
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insulating film
chemical formula
resin
group
positive photosensitive
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Chinese (zh)
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CN107219724A (zh
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任玟柱
金径录
赵庸桓
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
CN201710063148.3A 2016-03-21 2017-02-03 化学增幅型正型感光性有机绝缘膜树脂组合物及绝缘膜 Active CN107219724B (zh)

Applications Claiming Priority (2)

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KR1020160033135A KR20170109264A (ko) 2016-03-21 2016-03-21 화학증폭형 포지티브 감광형 유기절연막 수지 조성물 및 이로부터 제조된 절연막
KR10-2016-0033135 2016-03-21

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CN107219724A CN107219724A (zh) 2017-09-29
CN107219724B true CN107219724B (zh) 2020-07-14

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CN (1) CN107219724B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102564141B1 (ko) * 2018-08-20 2023-08-04 동우 화인켐 주식회사 포지티브형 감광성 수지 조성물 및 이로부터 형성된 절연막

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5075706B2 (ja) * 2007-03-27 2012-11-21 富士フイルム株式会社 ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法
TWI518458B (zh) * 2008-03-28 2016-01-21 富士軟片股份有限公司 正型感光性樹脂組成物及使用它的硬化膜形成方法
KR101357604B1 (ko) * 2010-11-12 2014-02-03 연세대학교 산학협력단 전도성 투명 접착 조성물 및 이를 이용하여 제조한 전도성 투명 접착제
JP5531034B2 (ja) * 2012-01-31 2014-06-25 富士フイルム株式会社 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置及び液晶表示装置
JP6327066B2 (ja) * 2013-09-03 2018-05-23 住友化学株式会社 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
JP6201721B2 (ja) * 2013-12-18 2017-09-27 三菱瓦斯化学株式会社 フォトレジスト用感光性樹脂組成物およびそれに用いる（メタ）アクリル共重合体
KR101494733B1 (ko) * 2014-06-25 2015-02-23 동우 화인켐 주식회사 포토레지스트 패턴 형성 방법
TWI647532B (zh) * 2014-07-01 2019-01-11 南韓商東友精細化工有限公司 光敏樹脂組成物

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CN107219724A (zh) 2017-09-29
KR20170109264A (ko) 2017-09-29

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