CN107076894B - 红外线遮蔽性组合物、固化膜及固体摄像装置 - Google Patents

红外线遮蔽性组合物、固化膜及固体摄像装置 Download PDF

Info

Publication number
CN107076894B
CN107076894B CN201580053503.8A CN201580053503A CN107076894B CN 107076894 B CN107076894 B CN 107076894B CN 201580053503 A CN201580053503 A CN 201580053503A CN 107076894 B CN107076894 B CN 107076894B
Authority
CN
China
Prior art keywords
compounds
infrared
group
light
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201580053503.8A
Other languages
English (en)
Chinese (zh)
Other versions
CN107076894A (zh
Inventor
畠山耕治
嶋田遵生子
河合孝广
若林隆太郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Publication of CN107076894A publication Critical patent/CN107076894A/zh
Application granted granted Critical
Publication of CN107076894B publication Critical patent/CN107076894B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/014—Stabilisers against oxidation, heat, light or ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/14625—Optical elements or arrangements associated with the device
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
CN201580053503.8A 2014-12-26 2015-12-22 红外线遮蔽性组合物、固化膜及固体摄像装置 Active CN107076894B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014265729 2014-12-26
JP2014-265729 2014-12-26
PCT/JP2015/085808 WO2016104491A1 (ja) 2014-12-26 2015-12-22 赤外線遮蔽性組成物、硬化膜及び固体撮像装置

Publications (2)

Publication Number Publication Date
CN107076894A CN107076894A (zh) 2017-08-18
CN107076894B true CN107076894B (zh) 2020-01-31

Family

ID=56150509

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580053503.8A Active CN107076894B (zh) 2014-12-26 2015-12-22 红外线遮蔽性组合物、固化膜及固体摄像装置

Country Status (5)

Country Link
JP (1) JP6702197B2 (ja)
KR (2) KR20220146660A (ja)
CN (1) CN107076894B (ja)
TW (1) TWI701304B (ja)
WO (1) WO2016104491A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI675907B (zh) * 2015-01-21 2019-11-01 日商Ｊｓｒ股份有限公司 固體攝像裝置
JP6788444B2 (ja) * 2016-09-07 2020-11-25 株式会社日本触媒 樹脂組成物および光学フィルター
JP6726317B2 (ja) 2017-02-09 2020-07-22 富士フイルム株式会社 感光性組成物、硬化膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
JP6922361B2 (ja) * 2017-04-07 2021-08-18 Jsr株式会社 固体撮像素子用組成物、赤外線遮蔽膜及び固体撮像素子
JP7326152B2 (ja) * 2017-04-07 2023-08-15 Jsr株式会社 固体撮像素子用組成物及び固体撮像素子用赤外線遮蔽膜の形成方法
KR101862533B1 (ko) 2018-04-12 2018-05-29 주식회사 엘엠에스 카메라 모듈에 포함되는 근적외선 컷-오프 필터용 광학물품 및 이를 포함하는 카메라 모듈용 근적외선 컷-오프 필터
JP2020042235A (ja) * 2018-09-13 2020-03-19 Jsr株式会社 撮像装置、および赤外吸収膜

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101530018A (zh) * 2006-10-25 2009-09-09 Lg化学株式会社 具有近红外屏蔽功能和透明性的电磁波屏蔽膜、包括该电磁波屏蔽膜的滤光片和等离子显示面板
JP2011191391A (ja) * 2010-03-12 2011-09-29 Sumitomo Chemical Co Ltd 硬化されたパターンの製造方法
JP2013137337A (ja) * 2011-12-27 2013-07-11 Fujifilm Corp 赤外線カットフィルタの製造方法、該製造方法に用いられる赤外線吸収性液状組成物、赤外線カットフィルタ、並びに、カメラモジュール及びその製造方法
JP2013151675A (ja) * 2011-12-27 2013-08-08 Fujifilm Corp 赤外線吸収性組成物、これを用いた赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法
CN103839952A (zh) * 2012-11-20 2014-06-04 采钰科技股份有限公司 影像感测装置
CN103858028A (zh) * 2011-10-14 2014-06-11 Jsr株式会社 滤光器及使用该滤光器的固体摄影装置及照相机模块
JP2014214262A (ja) * 2013-04-26 2014-11-17 日本化薬株式会社 熱硬化性樹脂組成物及び近赤外線カットフィルタ

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014203044A (ja) * 2013-04-09 2014-10-27 日本板硝子株式会社 赤外線カットフィルタおよび撮像装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101530018A (zh) * 2006-10-25 2009-09-09 Lg化学株式会社 具有近红外屏蔽功能和透明性的电磁波屏蔽膜、包括该电磁波屏蔽膜的滤光片和等离子显示面板
JP2011191391A (ja) * 2010-03-12 2011-09-29 Sumitomo Chemical Co Ltd 硬化されたパターンの製造方法
CN103858028A (zh) * 2011-10-14 2014-06-11 Jsr株式会社 滤光器及使用该滤光器的固体摄影装置及照相机模块
JP2013137337A (ja) * 2011-12-27 2013-07-11 Fujifilm Corp 赤外線カットフィルタの製造方法、該製造方法に用いられる赤外線吸収性液状組成物、赤外線カットフィルタ、並びに、カメラモジュール及びその製造方法
JP2013151675A (ja) * 2011-12-27 2013-08-08 Fujifilm Corp 赤外線吸収性組成物、これを用いた赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法
CN103839952A (zh) * 2012-11-20 2014-06-04 采钰科技股份有限公司 影像感测装置
JP2014214262A (ja) * 2013-04-26 2014-11-17 日本化薬株式会社 熱硬化性樹脂組成物及び近赤外線カットフィルタ

Also Published As

Publication number Publication date
KR20220146660A (ko) 2022-11-01
KR20170099845A (ko) 2017-09-01
WO2016104491A1 (ja) 2016-06-30
TW201631058A (zh) 2016-09-01
JP6702197B2 (ja) 2020-05-27
TWI701304B (zh) 2020-08-11
CN107076894A (zh) 2017-08-18
JPWO2016104491A1 (ja) 2017-11-24

Similar Documents

Publication Publication Date Title
CN107076894B (zh) 红外线遮蔽性组合物、固化膜及固体摄像装置
US10854661B2 (en) Solid-state imaging device, infrared-absorbing composition, and flattened-film-forming curable composition
TWI682972B (zh) 硬化性組成物、硬化膜、紅外線透過濾光片及固態攝影裝置
US20170317131A1 (en) Solid-state imaging device and infrared-absorbing composition
KR102158230B1 (ko) 고체 촬상 소자용 근적외선 흡수성 조성물 및 필터
JP6464850B2 (ja) 硬化性組成物、硬化膜、赤外光透過フィルタ及び固体撮像装置
TWI759432B (zh) 組成物、紅外線吸收膜、紅外線截止濾波器、固體攝像元件、紅外線感測器、照相機模組以及新穎的化合物
WO2021059977A1 (ja) 硬化性組成物、硬化膜、カラーフィルタ、固体撮像素子及び画像表示装置
KR20200031054A (ko) 촬상 장치, 및 적외 흡수막
TW202009243A (zh) 著色組成物、膜、濾色器、濾色器的製造方法、固體攝像元件及圖像顯示裝置
CN112513692A (zh) 遮光膜、遮光膜的制造方法、光学元件、固体摄像元件、前照灯单元
JP2010134352A (ja) カラーフィルタの製造方法及び固体撮像素子
KR20180086128A (ko) 감광성 조성물, 경화막 및 그의 제조 방법, 그리고 표시 소자, 발광 소자 및 수광 소자
US20220206387A1 (en) Photosensitive composition, cured film, color filter, light shielding film, optical element, solid-state imaging element, infrared sensor, and headlight unit
JP5510080B2 (ja) カラーフィルタ用着色組成物、カラーフィルタ及びカラー液晶表示素子
JP7185058B2 (ja) 硬化性組成物、硬化物、カラーフィルタ、固体撮像素子及び画像表示装置
JP2010080687A (ja) 遮光膜の形成方法及び固体撮像素子の製造方法
WO2021177027A1 (ja) 感光性組成物、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、赤外線センサ、ヘッドライトユニット
TWI846952B (zh) 硬化性組成物、硬化膜、濾色器、固體攝像元件及圖像顯示裝置
KR20160114999A (ko) 적색, 녹색 화소용 착색 감광성 수지 조성물
KR20160112474A (ko) 녹색 화소용 착색 감광성 수지 조성물

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant