CN107021456A - 制造高纯度氯化氢的方法和系统 - Google Patents
制造高纯度氯化氢的方法和系统 Download PDFInfo
- Publication number
- CN107021456A CN107021456A CN201610965803.XA CN201610965803A CN107021456A CN 107021456 A CN107021456 A CN 107021456A CN 201610965803 A CN201610965803 A CN 201610965803A CN 107021456 A CN107021456 A CN 107021456A
- Authority
- CN
- China
- Prior art keywords
- hydrogen
- chlorine
- hydrogen chloride
- purity
- tower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 title claims abstract description 138
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 title claims abstract description 103
- 229910000041 hydrogen chloride Inorganic materials 0.000 title claims abstract description 103
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 51
- 238000000034 method Methods 0.000 title claims abstract description 40
- 239000000460 chlorine Substances 0.000 claims abstract description 91
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 88
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 87
- 239000001257 hydrogen Substances 0.000 claims abstract description 82
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 82
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 77
- 239000007788 liquid Substances 0.000 claims abstract description 12
- 230000008859 change Effects 0.000 claims abstract description 10
- 238000007906 compression Methods 0.000 claims abstract description 10
- 230000006835 compression Effects 0.000 claims abstract description 10
- 239000002994 raw material Substances 0.000 claims abstract description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 25
- 239000007789 gas Substances 0.000 claims description 24
- 229910001868 water Inorganic materials 0.000 claims description 24
- 238000005292 vacuum distillation Methods 0.000 claims description 19
- 238000000746 purification Methods 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 10
- 238000004821 distillation Methods 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 7
- 238000010521 absorption reaction Methods 0.000 claims description 6
- 150000002431 hydrogen Chemical class 0.000 claims description 6
- 239000003463 adsorbent Substances 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 10
- 239000012535 impurity Substances 0.000 description 8
- 238000003860 storage Methods 0.000 description 8
- 238000005660 chlorination reaction Methods 0.000 description 7
- 239000001569 carbon dioxide Substances 0.000 description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000000429 assembly Methods 0.000 description 4
- 230000000712 assembly Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000012267 brine Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005194 fractionation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000007907 direct compression Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- MXXWOMGUGJBKIW-YPCIICBESA-N piperine Chemical compound C=1C=C2OCOC2=CC=1/C=C/C=C/C(=O)N1CCCCC1 MXXWOMGUGJBKIW-YPCIICBESA-N 0.000 description 1
- 229940075559 piperine Drugs 0.000 description 1
- 235000019100 piperine Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000001577 simple distillation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/01—Chlorine; Hydrogen chloride
- C01B7/012—Preparation of hydrogen chloride from the elements
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/01—Chlorine; Hydrogen chloride
- C01B7/07—Purification ; Separation
- C01B7/0706—Purification ; Separation of hydrogen chloride
- C01B7/0712—Purification ; Separation of hydrogen chloride by distillation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/01—Chlorine; Hydrogen chloride
- C01B7/07—Purification ; Separation
- C01B7/0743—Purification ; Separation of gaseous or dissolved chlorine
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/26—Drying gases or vapours
- B01D53/261—Drying gases or vapours by adsorption
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Separation By Low-Temperature Treatments (AREA)
- Hydrogen, Water And Hydrids (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2011-0103784 | 2011-10-11 | ||
| KR1020110103784A KR20130039249A (ko) | 2011-10-11 | 2011-10-11 | 고순도 염화수소 제조방법 및 제조 시스템 |
| KR10-2011-0126071 | 2011-11-29 | ||
| KR1020110126071A KR101203490B1 (ko) | 2011-11-29 | 2011-11-29 | 고순도 염화수소 제조방법 및 제조 시스템 |
| CN2012800029460A CN103221336A (zh) | 2011-10-11 | 2012-03-09 | 制造高纯度氯化氢的方法和系统 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012800029460A Division CN103221336A (zh) | 2011-10-11 | 2012-03-09 | 制造高纯度氯化氢的方法和系统 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107021456A true CN107021456A (zh) | 2017-08-08 |
Family
ID=48082022
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610965803.XA Pending CN107021456A (zh) | 2011-10-11 | 2012-03-09 | 制造高纯度氯化氢的方法和系统 |
| CN2012800029460A Pending CN103221336A (zh) | 2011-10-11 | 2012-03-09 | 制造高纯度氯化氢的方法和系统 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012800029460A Pending CN103221336A (zh) | 2011-10-11 | 2012-03-09 | 制造高纯度氯化氢的方法和系统 |
Country Status (13)
| Country | Link |
|---|---|
| US (2) | US20130259796A1 (enExample) |
| EP (1) | EP2617678B1 (enExample) |
| JP (1) | JP5756180B2 (enExample) |
| CN (2) | CN107021456A (enExample) |
| AU (1) | AU2012321629B2 (enExample) |
| CA (1) | CA2828446C (enExample) |
| IL (1) | IL228118A (enExample) |
| MX (1) | MX347947B (enExample) |
| MY (1) | MY156181A (enExample) |
| RU (1) | RU2592794C2 (enExample) |
| SG (1) | SG192925A1 (enExample) |
| TW (1) | TWI520906B (enExample) |
| WO (1) | WO2013054989A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108545700A (zh) * | 2018-04-23 | 2018-09-18 | 大连中鼎化学有限公司 | 一种超纯氯化氢的制备装置及方法 |
| CN116639655A (zh) * | 2023-06-09 | 2023-08-25 | 山东华宇同方电子材料有限公司 | 一种合成电子级氯化氢的方法 |
| CN117619272A (zh) * | 2023-12-01 | 2024-03-01 | 浙江瑞亨电子材料有限公司 | 一种高纯氯化氢的制备设备以及生产工艺 |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6760942B2 (ja) * | 2015-08-10 | 2020-09-23 | 昭和電工株式会社 | 塩化水素の製造方法 |
| CN107848799B (zh) * | 2015-08-10 | 2020-07-17 | 昭和电工株式会社 | 氯化氢的制造方法 |
| CN105502294B (zh) * | 2015-12-28 | 2018-11-20 | 青岛科技大学 | 一种电子级高纯氯化氢高压制备方法 |
| CN105502295B (zh) * | 2015-12-31 | 2018-11-02 | 上海正帆科技股份有限公司 | 一种电子级氯化氢的提纯方法 |
| CN107311184A (zh) * | 2016-04-26 | 2017-11-03 | 内蒙古盾安光伏科技有限公司 | 一种提高冷氢化生产三氯氢硅转化率的生产工艺 |
| CN109336052A (zh) * | 2018-11-23 | 2019-02-15 | 宜宾天原集团股份有限公司 | 用于生产氯化氢的微反应系统及基于该系统的氯化氢生产方法 |
| CN110054155A (zh) * | 2019-06-05 | 2019-07-26 | 唐山三友氯碱有限责任公司 | 低水分含量氯化氢合成方法及合成系统 |
| CN110255501A (zh) * | 2019-07-11 | 2019-09-20 | 金宏气体电子材料（淮安）有限责任公司 | 一种电子级高纯氯化氢制备方法 |
| CN112578745B (zh) * | 2020-09-28 | 2022-01-14 | 山东鲁泰化学有限公司 | 一种氯化氢合成反应过程的智能化控制方法 |
| CN119317593A (zh) | 2022-06-10 | 2025-01-14 | 株式会社德山 | 高纯度盐酸的制造方法 |
| CN116946977A (zh) * | 2023-06-19 | 2023-10-27 | 三立福新材料(福建)有限公司 | 一种用于生产超净高纯盐酸的工艺 |
| WO2025129633A1 (en) * | 2023-12-22 | 2025-06-26 | Sgl Carbon Se | Process for the synthesis of anhydrous hydrogen chloride |
| CN119240613B (zh) * | 2024-12-06 | 2025-03-21 | 昊华气体有限公司 | 一种富氢氯化氢原料气制备高纯电子级氯化氢的方法及其设备 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2077310A (en) * | 1936-02-01 | 1937-04-13 | Pennsylvania Salt Mfg Co | Process of purifying chlorine |
| US2444256A (en) * | 1946-07-19 | 1948-06-29 | Shell Dev | Method for manufacturing hydrogen chloride |
| US2664342A (en) * | 1950-11-20 | 1953-12-29 | Shell Dev | Hydrogen halide production |
| US3077082A (en) * | 1958-09-04 | 1963-02-12 | Hooker Chemical Corp | Liquefaction of hydrogen chloride |
| NL129282C (enExample) * | 1963-10-21 | |||
| US4247532A (en) * | 1979-08-13 | 1981-01-27 | Shell Oil Company | Purification of electrolytically-produced chlorine |
| DE3816783A1 (de) * | 1988-05-17 | 1989-11-30 | Wacker Chemie Gmbh | Verfahren zur reinigung von rohem, gasfoermigem chlorwasserstoff |
| JP3570732B2 (ja) * | 1991-05-28 | 2004-09-29 | 三井化学株式会社 | 塩素ガスの濃縮方法および装置 |
| US5296017A (en) * | 1991-05-28 | 1994-03-22 | Mitsui Toatsu Chemicals, Inc. | Method and apparatus for concentrating chlorine gas |
| JP2775364B2 (ja) * | 1991-10-17 | 1998-07-16 | 鶴見曹達株式会社 | 塩酸の合成装置 |
| JP2923454B2 (ja) * | 1995-10-03 | 1999-07-26 | 大同ほくさん株式会社 | 水素精製方法およびこれに用いる装置 |
| DE19536976A1 (de) * | 1995-10-04 | 1997-04-10 | Basf Ag | Verfahren zur selektiven Abtrennung und Wiedergewinnung von Chlor aus Gasgemischen |
| US6340382B1 (en) * | 1999-08-13 | 2002-01-22 | Mohamed Safdar Allie Baksh | Pressure swing adsorption process for the production of hydrogen |
| US6896865B2 (en) * | 2000-04-28 | 2005-05-24 | Tosoh Corporation | Method for recovering hydrogen chloride from chlorine based waste and use of recovered hydrogen chloride |
| US20040038803A1 (en) * | 2002-02-19 | 2004-02-26 | Derong Zhou | Adsorbent for removing water vapor during corrosive gas purification and method for preparing the adsorbent |
| JP2003292304A (ja) * | 2002-03-29 | 2003-10-15 | Sumitomo Chem Co Ltd | 純塩素ガスの製造方法 |
| RU2217371C1 (ru) * | 2002-04-24 | 2003-11-27 | Открытое акционерное общество "Химпром" | Способ получения хлористого водорода |
| JP4507510B2 (ja) * | 2003-05-21 | 2010-07-21 | 三菱化学株式会社 | 高純度の塩化水素、及びその製造方法 |
| KR100849656B1 (ko) * | 2004-09-29 | 2008-08-01 | 쇼와 덴코 가부시키가이샤 | 고순도 액화 염소의 제조방법 |
| KR101335397B1 (ko) * | 2006-02-03 | 2013-12-02 | 지알티, 인코포레이티드 | 할로겐으로부터 가벼운 기체를 분리하는 방법 |
| US20070261437A1 (en) * | 2006-05-12 | 2007-11-15 | Boonstra Eric F | Enhanced process for the purification of anhydrous hydrogen chloride gas |
| RU2325321C2 (ru) * | 2006-05-15 | 2008-05-27 | Открытое акционерное общество "Каустик" (ОАО "Каустик") | Способ осушки газообразного хлора |
| US20070269690A1 (en) * | 2006-05-22 | 2007-11-22 | Doshi Kishore J | Control system, process and apparatus for hydrogen production from reforming |
| CN101948094A (zh) * | 2010-10-18 | 2011-01-19 | 天津市泰亨气体有限公司 | 一种高纯氯化氢的合成技术 |
-
2012
- 2012-02-09 MY MYPI2013003145A patent/MY156181A/en unknown
- 2012-03-09 WO PCT/KR2012/001760 patent/WO2013054989A1/ko not_active Ceased
- 2012-03-09 SG SG2013064027A patent/SG192925A1/en unknown
- 2012-03-09 RU RU2013146601/05A patent/RU2592794C2/ru active
- 2012-03-09 JP JP2013538671A patent/JP5756180B2/ja active Active
- 2012-03-09 CA CA2828446A patent/CA2828446C/en active Active
- 2012-03-09 EP EP12830913.5A patent/EP2617678B1/en active Active
- 2012-03-09 CN CN201610965803.XA patent/CN107021456A/zh active Pending
- 2012-03-09 US US13/825,089 patent/US20130259796A1/en not_active Abandoned
- 2012-03-09 CN CN2012800029460A patent/CN103221336A/zh active Pending
- 2012-03-09 AU AU2012321629A patent/AU2012321629B2/en active Active
- 2012-03-09 MX MX2013009832A patent/MX347947B/es active IP Right Grant
- 2012-03-28 TW TW101110774A patent/TWI520906B/zh active
-
2013
- 2013-08-26 IL IL228118A patent/IL228118A/en active IP Right Grant
-
2021
- 2021-07-06 US US17/368,795 patent/US20210331919A1/en not_active Abandoned
Non-Patent Citations (3)
| Title |
|---|
| 孙祥芝 等: "《特种气体与研制 第二版》", 28 February 2007, 中国石化出版社 * |
| 杜淮强 等: "盐酸合成工艺安全控制设计", 《中国氯碱》 * |
| 韩长日 等: "《电子与信息化学助剂生产与应用技术》", 30 June 2009, 中国石化出版社 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108545700A (zh) * | 2018-04-23 | 2018-09-18 | 大连中鼎化学有限公司 | 一种超纯氯化氢的制备装置及方法 |
| CN108545700B (zh) * | 2018-04-23 | 2020-03-17 | 大连中鼎化学有限公司 | 一种超纯氯化氢的制备装置及方法 |
| CN116639655A (zh) * | 2023-06-09 | 2023-08-25 | 山东华宇同方电子材料有限公司 | 一种合成电子级氯化氢的方法 |
| CN117619272A (zh) * | 2023-12-01 | 2024-03-01 | 浙江瑞亨电子材料有限公司 | 一种高纯氯化氢的制备设备以及生产工艺 |
| CN117619272B (zh) * | 2023-12-01 | 2024-09-06 | 浙江瑞亨电子材料有限公司 | 一种高纯氯化氢的制备设备以及生产工艺 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2617678A4 (en) | 2014-03-05 |
| WO2013054989A1 (ko) | 2013-04-18 |
| MX2013009832A (es) | 2013-10-03 |
| MY156181A (en) | 2016-01-15 |
| RU2013146601A (ru) | 2015-11-20 |
| AU2012321629B2 (en) | 2014-10-16 |
| JP5756180B2 (ja) | 2015-07-29 |
| EP2617678A1 (en) | 2013-07-24 |
| CN103221336A (zh) | 2013-07-24 |
| CA2828446C (en) | 2019-05-07 |
| TW201315682A (zh) | 2013-04-16 |
| IL228118A0 (en) | 2013-09-30 |
| SG192925A1 (en) | 2013-09-30 |
| AU2012321629A1 (en) | 2013-09-05 |
| US20130259796A1 (en) | 2013-10-03 |
| MX347947B (es) | 2017-05-19 |
| RU2592794C2 (ru) | 2016-07-27 |
| TWI520906B (zh) | 2016-02-11 |
| EP2617678B1 (en) | 2019-07-31 |
| CA2828446A1 (en) | 2013-04-18 |
| US20210331919A1 (en) | 2021-10-28 |
| IL228118A (en) | 2015-11-30 |
| JP2013545704A (ja) | 2013-12-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107021456A (zh) | 制造高纯度氯化氢的方法和系统 | |
| EP2686627B1 (en) | Cryogenic air separation method | |
| EP3441505B1 (en) | Ammonia production method | |
| KR102084294B1 (ko) | 질산 제조공정을 이용한 반도체용 고순도 일산화질소의 제조방법 및 제조장치 | |
| JP2013545704A5 (enExample) | ||
| TW375593B (en) | Process for working up reaction gases during the oxidation of HCl to chlorine | |
| CN106288653A (zh) | 一种单塔低温精馏回收氩气的装置及纯化回收氩气的方法 | |
| KR101203490B1 (ko) | 고순도 염화수소 제조방법 및 제조 시스템 | |
| TWI507360B (zh) | 氯氣之製造 | |
| US20250033967A1 (en) | Systems and methods for producing sulfuric acid or liquefied sulfur dioxide | |
| KR20130039249A (ko) | 고순도 염화수소 제조방법 및 제조 시스템 | |
| WO2020128205A1 (fr) | Appareil et procédé de séparation d'air par distillation cryogénique | |
| RU2647297C2 (ru) | Способ и установка для производства жидких и газообразных кислородсодержащих продуктов низкотемпературным разделением воздуха | |
| CN210133884U (zh) | 一种电子级高纯氯化氢制备系统 | |
| CN107473223A (zh) | 一种采用氮循环的co深冷分离系统及其方法 | |
| CN210251281U (zh) | 一种电子级高纯氯化氢制备单元 | |
| JP2007003097A (ja) | 窒素発生方法およびそれに用いる装置 | |
| CN210133885U (zh) | 一种电子级高纯氯化氢制备装置 | |
| CN115014042A (zh) | 制氮机低压流程 | |
| US20190300376A1 (en) | Phosphorus pentafluoride reactions |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170808 |