CN106975628B - 一种显示面板清洗装置 - Google Patents

一种显示面板清洗装置 Download PDF

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CN106975628B
CN106975628B CN201710361329.4A CN201710361329A CN106975628B CN 106975628 B CN106975628 B CN 106975628B CN 201710361329 A CN201710361329 A CN 201710361329A CN 106975628 B CN106975628 B CN 106975628B
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water jet
display panel
conveying
cleaning
jet head
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CN106975628A (zh
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简重光
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HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
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    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67288Monitoring of warpage, curvature, damage, defects or the like
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/41875Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by quality surveillance of production
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00Accessories or details of general applicability for machines or apparatus for cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/022Cleaning travelling work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity, by vibration
    • B08B3/14Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67718Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Abstract

本发明实施例提供了一种显示面板清洗装置,包括机架;水刀组件,水刀组件包括水刀喷头、通过管道与水刀喷头相连的供水箱以及控制水刀喷头喷洗强度的调节装置;传送组件,传送组件包括用于输送显示面板供水刀喷头进行清洗的输送平台;排污组件,排污组件包括用于回收污水的回收箱以及罩设在输送平台两侧防止污水飞溅的水罩;检测组件,检测组件包括传感器;以及控制开关,控制开关用于在检测到水刀喷头工作不正常时,控制显示面板清洗装置暂停运转。通过设置与水刀喷头对应的传感器,以及在检测到水刀喷头工作不正常时暂停装置运转的控制开关,从而避免了因未能及时发现水刀喷头异常而导致产出了异常的产品,确保了产品的正常制程,避免了不必要的经济损失。

Description

一种显示面板清洗装置
技术领域
本发明涉及电子技术领域,尤其涉及一种显示面板清洗装置。
背景技术
水刀清洗装置已被大量的应用于TFT-LCD(薄膜晶体管液晶显示器)的清洗制程,在TFT工艺中,在显影段、湿式蚀刻段以及去光阻段使用高压水刀清洗装置将残存的化学液体给冲除乾净,让玻璃表面维持中性。通常在水刀装置中会使用到喷嘴机构(Nozzle)进行大范围的玻璃洗净制程,某些喷嘴机构因为长时间的使用,而被水中的杂质塞住的,玻璃的某些范围就无法被清洁乾净,导致化学液体残留,造成产品有可靠度的问题。而在监控水刀的喷嘴机构是否正常工作时,通常都是在做设备保养时以人眼来做判定,故无法即时的得知喷嘴机构是否正常工作,而当发现喷嘴异常时,异常产品已被大量产出。
发明内容
本发明实施例提供一种显示面板清洗装置,可对清洗工作是否正常进行实时监控,避免出现清洗异常的产品。
本发明实施例提供了一种显示面板清洗装置,包括:
机架,所述机架包括用于安置清洗装置的机身以及支撑所述机身的支架;
水刀组件,所述水刀组件包括水刀喷头、通过管道与所述水刀喷头相连的供水箱以及控制所述水刀喷头喷洗强度的调节装置;
传送组件,所述传送组件包括用于输送显示面板供所述水刀喷头进行清洗的输送平台;
排污组件,所述排污组件包括用于回收污水的回收箱以及罩设在输送平台两侧防止污水飞溅的水罩;
检测组件,所述检测组件包括与所述水刀喷头对应设置用于检测水刀喷头工作是否正常的传感器;以及
控制开关,所述控制开关与所述传感器电性相连,用于在所述传感器检测到水刀喷头工作不正常时,控制整个显示面板清洗装置暂停运转。
进一步地,所述用于检测水刀喷头工作是否正常的传感器为光传感器,所述光传感器位于所述水刀喷头的下方。
进一步地,所述输送平台包括沿着输送方向平行设置的辊架,以及并排夹设于所述辊架之间、用于输送显示面板的输送辊。
进一步地,所述辊架靠近所述水刀喷头的一侧向上翘起一定角度,以使被输送的显示面板成一定角度向上倾斜地迎上所述水刀喷头。
进一步地,每个所述输送辊包括两个副辊,两所述副辊成V字型固定,且该其V字型夹角指向显示面板输送方向。
进一步地,所述输送辊的表面设有防滑套。
进一步地,所述水刀组件包括带动所述水刀喷头在垂直于输送方向水平往返震动的震动器。
进一步地,所述水刀喷头的喷射方向朝显示面板输送来的方向倾斜一定角度。
进一步地,所述水刀喷头与供水箱之间的管道包括一段可拆卸的滤杂管,所述滤杂管内设有滤网。
进一步地,所述装置还包括污水循环组件,所述污水循环组件包括与所述回收箱相连接的污水净化箱,所述污水净化箱内的污水通过净化后、由电机抽送至供水箱内循环利用
本发明实施例的显示面板清洗装置,通过设置与水刀喷头对应的用于检测水刀喷头工作是否正常的传感器,以及在检测到水刀喷头工作不正常时接收传感器发来的信号并暂停装置运转的控制开关,从而避免了因未能及时发现水刀喷头异常而导致产出了异常的产品,确保了产品的正常制程,避免了不必要的经济损失。
附图说明
为了更清楚地说明本发明实施例技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的一种显示面板清洗装置的结构示意图;
图2位本发明实施例提供的一种显示面板清洗装置的局部放大图;
图3位本发明实施例提供的一种显示面板清洗装置的另一局部示意图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
应当理解,当在本说明书和所附权利要求书中使用时,术语“包括”和“包含”指示所描述特征、整体、步骤、操作、元素和/或组件的存在,但并不排除一个或多个其它特征、整体、步骤、操作、元素、组件和/或其集合的存在或添加。
还应当理解,在此本发明说明书中所使用的术语仅仅是出于描述特定实施例的目的而并不意在限制本发明。如在本发明说明书和所附权利要求书中所使用的那样,除非上下文清楚地指明其它情况,否则单数形式的“一”、“一个”及“该”意在包括复数形式。
参见图1所示,本发明提供的一种显示面板清洗装置,包括机架100,机架100包括用于安置清洗装置的机身101以及支撑机身101的支架102;水刀组件200,水刀组件200包括水刀喷头201、通过管道202与水刀喷头201相连的供水箱203以及控制水刀喷头201喷洗强度的调节装置204;传送组件300,传送组件300包括用于输送显示面板310供水刀喷头201进行清洗的输送平台320;排污组件400,排污组件400包括用于回收污水的回收箱401以及罩设在输送平台320两侧防止污水飞溅的水罩402;检测组件,检测组件包括与水刀喷头201对应设置用于检测水刀喷头201工作是否正常的传感器500;以及控制开关(图中未示出),控制开关与传感器500电性相连,用于在传感器500检测到水刀喷头201工作不正常时,控制整个显示面板清洗装置暂停运转。
具体地,显示面板310由前置输送平台701送入本发明实施例提供的清洗装置内进行清洗,并在清洗完成后由后置输送平台702输送至下一制程。显示面板由前置输送平台701送入本发明实施例提供的清洗装置内的输送平台320上,由输送平台320带动显示面板310送至水刀喷头201的清洗范围内进行清洗。在显示面板310运送至清洗位置前,预先打开水刀喷头201,由传感器500来检测水刀喷头201是否工作正常,如果检测为正常,则开始输送显示面板310进行清洗动作,如果检测不正常,则由控制开关控制整个显示面板清洗装置暂停运转,提醒操作者进行检测排除故障。
通过设置与水刀喷头201对应的用于检测水刀喷头201工作是否正常的传感器500,以及在检测到水刀喷头201工作不正常时接收传感器500发来的信号并暂停装置运转的控制开关,从而避免了因未能及时发现水刀喷头201异常而导致产出了异常的产品,确保了产品的正常制程,避免了不必要的经济损失。
具体地,如果传感器500检测水刀喷头201的工作正常,则由输送平台320带动显示面板310至水刀喷头201的清洗范围内进行清洗,在输送平台下方设有回收污水的回收箱401,对清洗产生的污水进行回收,并于输送平台两侧设置水罩402,用于防止水刀喷头201清洗显示面板310时产生的污水飞溅。
具体地,水刀喷头201可以是扁条形结构,其用于喷射清洗液的喷嘴可以是设置于水刀喷头201端部、对准输送平台320的扁条形开口,或者是设在水刀喷头201端部,间隔等距成排排列的细小喷孔。例如,设定每个细小喷孔的间隔距离位3-4mm,具体的细小喷孔直径可由实际需要进行调节。
具体地,水罩402可以由透明材料制成,例如玻璃、或者透明塑料等,水罩402可沿着输送平台320的外侧、紧贴输送平台320设置。采用透明材料制成的水罩402可以直观方便的观察到内部显示面板310的清洗动作,便于对清洗情况进行掌控。水罩402上还可以开设可推拉的操作窗口,便于在操作人员需要对水罩402内部进行操作时打开窗口进行操作。
进一步地,用于检测水刀喷头201工作是否正常的传感器500为光传感器,光传感器位于水刀喷头201的下方。
具体地,光传感器可以是红外感应器,将红外感应器的监测位置设置在水刀喷头201的喷嘴处,来感应水刀喷头201喷嘴处是否能够正常的喷射清洗液。通过红外感应器来监测水刀喷头201的工作现状,并能在水刀喷头201出现异常时第一时间作出应对动作,例如,本实施例中发送信号至控制开关,让控制开关暂停整个装置的运转,从而避免了不必要的损失。
参见图1和图2所示,进一步地,输送平台320包括沿着输送方向平行设置的辊架321,以及并排夹设于辊架321之间、用于输送显示面板500的输送辊322。
进一步地,辊架321靠近水刀喷头201的一侧向上翘起一定角度,以使被输送的显示面板310成一定角度向上倾斜地迎上水刀喷头201。
进一步地,每个输送辊322包括两个副辊322a和322b,两副辊322a和322b成V字型固定,且该V字型夹角指向显示面板310输送方向。
具体地,显示面板310输送到输送平台320上后,由输送辊322带动继续向前运送,辊架321靠近水刀喷头201的一侧向上翘起一定角度,以使被输送的显示面板310成一定角度向上倾斜地迎上水刀喷头201,避免显示面板310被水刀喷头201冲洗时产生的污水流向显示面板310已经冲洗过的部位造成二次污染,使得冲洗后污水的流向具有一致性。例如,辊架321靠近水刀喷头201的一侧向上翘起30°,则显示面板在被清洗时具有一个30°的倾斜度,清洗的污水会沿着显示面板表面流向还未被清洗到的表面,而不会向上端已经清洗过的表面流淌,故可以避免清洗后的二次污染。同时,采用两个副辊322a和322b形成指向显示面板310输送方向的V字型结构,让显示面板310在输送过程中一直处于输送路径的中间位置,避免显示面板310在输送时两边晃动、甚至输送至边缘被磕碰。两个副辊成V字型的夹角角度可根据实际情况自行设置,两个副辊的长度相同并且沿着显示面板输送的路径对称分布,如此可以让显示面板不论放在输送辊322的那个部位,最终都可以被控制在输送辊322的中间位置。
进一步地,输送辊322的表面设有防滑套。
具体地,输送辊322在水刀喷头201的冲洗下会残留有冲洗的液体,显示面板310在输送辊322表面时会造成一定的打滑,设置防滑套能够让显示面板310在被冲洗时牢固的贴在输送辊322上。设置防滑套可以是整个的防滑材料包覆在输送辊322的表面,或者是在输送辊322的一部分表面套设防滑环,只需能够达到让显示面板310在输送过程中不打滑的目的即可。
参见图2所示,进一步地,水刀组件200还包括带动水刀喷头201在垂直于输送方向水平往返震动的震动器205。
具体地,设置震动器205带动水刀喷头201在垂直于输送方向水平往返动作,可以使显示面板310被冲洗的更加干净,并且可以提高冲洗效率。
进一步地,水刀喷头201的喷射方向朝显示面板310输送来的方向倾斜一定角度。
具体地,通过调节水刀喷头201的喷射方向,让水刀喷头201冲洗的水流倾斜接触显示面板310,让被冲洗后的污水流向一致,同时也可以提高冲洗的效果。
在某些实施例中,显示面板310可例如为扭曲向列型液晶显示面板,平面转换型液晶显示面板或多象限垂直配向型液晶显示面板、有机发光半导体显示面板(OLED)、量子点显示面板(QLED)、曲面显示面板或其他显示面板。
参见图3所示,进一步地,水刀喷头201与供水箱203之间的管道202包括一段可拆卸的滤杂管220,滤杂管220内设有滤网221。
具体地,在管道202上设置一段滤杂管220,滤杂管220内设有滤网221,可以有效拦截供水箱203内的杂质流向水刀喷头201,避免因杂物堵住水刀喷头201而导致整个装置无法正常运行,同时滤杂管220为可拆卸的,比如通过螺纹配合与管道202固定连接,拆卸方便,便于清理管道202内的杂物。
参见图1所示,进一步地,本发明实施例提供的显示面板310清洗装置还包括污水循环组件600,污水循环组件600包括与回收箱401相连接的污水净化箱601,污水净化箱601内的污水通过净化后、由电机抽送至供水箱203内循环利用。
具体地,回收箱401收纳的污水被抽送至污水净化箱601内,通过污水净化箱601内的污水处理系统净化后,由循环管道602将净化后的污水再抽送至供水箱203内,循环利用。因为在冲洗过程中需要用到大量的冲洗液,回收循环利用可以有效的节省冲洗成本,同时也可以减少污水的排放,从而减少对环境的污染。
请继续参照图1所示,下面说明本实施例显示面板清洗装置的整个工作流程。
在待清洗显示面板310输送至该显示面板清洗装置之前,先检查该清洗装置的工作性能是否正常,主要是检测该清洗装置的水刀喷头201是否工作正常,预先打开水刀喷头201,供水箱203内的清洗液自管道202输送至水刀喷头201处,由水刀喷头201喷洒清洗液,此时,传感器500开始对水刀喷头201是否工作正常进行检测,具体为检测每个预先设定的清洗位置是否被水刀喷头201冲洗到,或者检测水刀喷头201每个喷孔是否都能够正常的喷射清洗液。如果传感器500检测为水刀喷头201工作正常,则启动前置输送平台701,开始输送显示面板310进入该清洗装置,进入该清洗装置后,由输送辊322继续带动显示面板310进入可被水刀喷头201冲洗到的区域进行冲洗,待冲洗完毕后,输送辊322将显示面板310输送至后置输送平台702上,由后置输送平台702输送至下一制程。如果传感器500检测为水刀喷头201工作不正常,则由控制开关控制整个显示面板清洗装置暂停运转,提醒操作者进行检测排除故障。
在本申请所提供的实施例中,应该理解到,所揭露的内容,仅仅是示意性的,可以通过其它的方式实现。
以上所述,仅为本发明的具体实施方式,但本发明的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本发明揭露的技术范围内,可轻易想到各种等效的修改或替换,这些修改或替换都应涵盖在本发明的保护范围之内。因此,本发明的保护范围应以权利要求的保护范围为准。

Claims (4)

1.一种显示面板清洗装置,其特征在于,包括:
机架,所述机架包括用于安置清洗装置的机身以及支撑所述机身的支架;
水刀组件,所述水刀组件包括水刀喷头、通过管道与所述水刀喷头相连的供水箱以及控制所述水刀喷头喷洗强度的调节装置;
传送组件,所述传送组件包括用于输送显示面板供所述水刀喷头进行清洗的输送平台;
排污组件,所述排污组件包括用于回收污水的回收箱以及罩设在输送平台两侧防止污水飞溅的水罩;
检测组件,所述检测组件包括与所述水刀喷头对应设置用于检测水刀喷头工作是否正常的传感器;以及
控制开关,所述控制开关与所述传感器电性相连,用于在所述传感器检测到水刀喷头工作不正常时,控制整个显示面板清洗装置暂停运转;
其中,所述输送平台包括辊架和输送辊,所述辊架沿着输送方向平行设置,所述输送辊并排夹设于所述辊架之间;所述辊架靠近所述水刀喷头的一侧向上翘起一定角度,以使被输送的显示面板成一定角度向上倾斜地迎上所述水刀喷头;所述水刀组件包括用于带动所述水刀喷头在垂直于输送方向水平往返震动的震动器;所述水刀喷头的喷射方向朝显示面板输送来的方向倾斜一定角度;
所述用于检测水刀喷头工作是否正常的传感器为光传感器,所述光传感器位于所述水刀喷头的下方;
每个所述输送辊包括两个副辊,两所述副辊成V字型固定,且该V字型夹角指向显示面板输送方向。
2.根据权利要求1所述的显示面板清洗装置,其特征在于,所述输送辊的表面设有防滑套。
3.根据权利要求1所述的显示面板清洗装置,其特征在于,所述水刀喷头与供水箱之间的管道包括一段可拆卸的滤杂管,所述滤杂管内设有滤网。
4.根据权利要求1-3中任一项所述的显示面板清洗装置,其特征在于,还包括:
污水循环组件,所述污水循环组件包括与所述回收箱相连接的污水净化箱,所述污水净化箱内的污水通过净化后由电机抽送至供水箱内循环利用。
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