CN106575631B - 用于同步暗场及相位对比检验的系统及方法 - Google Patents

用于同步暗场及相位对比检验的系统及方法 Download PDF

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Publication number
CN106575631B
CN106575631B CN201580038195.1A CN201580038195A CN106575631B CN 106575631 B CN106575631 B CN 106575631B CN 201580038195 A CN201580038195 A CN 201580038195A CN 106575631 B CN106575631 B CN 106575631B
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signal
illumination
sample
sensor
path
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CN106575631A (zh
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黄传勇
李晴
D·佩蒂伯恩
B·格拉韦斯
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KLA Corp
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KLA Tencor Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
CN201580038195.1A 2014-07-22 2015-07-21 用于同步暗场及相位对比检验的系统及方法 Active CN106575631B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201462027393P 2014-07-22 2014-07-22
US62/027,393 2014-07-22
US14/804,296 US9726615B2 (en) 2014-07-22 2015-07-20 System and method for simultaneous dark field and phase contrast inspection
US14/804,296 2015-07-20
PCT/US2015/041409 WO2016014590A1 (en) 2014-07-22 2015-07-21 System and method for simultaneous dark field and phase contrast inspection

Publications (2)

Publication Number Publication Date
CN106575631A CN106575631A (zh) 2017-04-19
CN106575631B true CN106575631B (zh) 2019-02-01

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Country Link
US (1) US9726615B2 (enExample)
JP (1) JP6807829B2 (enExample)
KR (1) KR102241899B1 (enExample)
CN (1) CN106575631B (enExample)
DE (1) DE112015003394B4 (enExample)
SG (1) SG11201610820YA (enExample)
TW (1) TWI639822B (enExample)
WO (1) WO2016014590A1 (enExample)

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CN108022849B (zh) * 2017-11-30 2020-06-16 上海华力微电子有限公司 一种亮场缺陷检测设备自动优化光强条件的方法及系统
US10845187B2 (en) * 2018-03-02 2020-11-24 Drexel University Multiscale deformation measurements leveraging tailorable and multispectral speckle patterns
US11067389B2 (en) * 2018-03-13 2021-07-20 Kla Corporation Overlay metrology system and method
US10732130B2 (en) * 2018-06-19 2020-08-04 Kla-Tencor Corporation Embedded particle depth binning based on multiple scattering signals
US11017520B2 (en) * 2018-09-04 2021-05-25 Kla Corporation Multi-wavelength interferometry for defect classification
US10705026B2 (en) * 2018-10-26 2020-07-07 Kla Corporation Scanning differential interference contrast in an imaging system design
US10948423B2 (en) * 2019-02-17 2021-03-16 Kla Corporation Sensitive particle detection with spatially-varying polarization rotator and polarizer
CN115380203B (zh) * 2020-02-12 2025-07-22 深圳华大智造科技股份有限公司 光学成像系统及应用所述光学成像系统的生化物质检测系统
US20240280483A1 (en) * 2021-07-14 2024-08-22 Hitachi High-Tech Corporation Defect inspection device

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Also Published As

Publication number Publication date
DE112015003394T5 (de) 2017-03-30
WO2016014590A1 (en) 2016-01-28
DE112015003394B4 (de) 2023-04-27
SG11201610820YA (en) 2017-02-27
JP2017531162A (ja) 2017-10-19
CN106575631A (zh) 2017-04-19
TW201617603A (zh) 2016-05-16
TWI639822B (zh) 2018-11-01
US9726615B2 (en) 2017-08-08
JP6807829B2 (ja) 2021-01-06
KR20170033884A (ko) 2017-03-27
KR102241899B1 (ko) 2021-04-16
US20160025645A1 (en) 2016-01-28

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